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1.
基于模糊粗糙集的知识获取方法在模糊粗糙集的研究中具有十分重要的作用,通过矩阵来刻画粗糙集理论,用模糊矩阵定义了模糊粗糙集和粗糙模糊集的上(下)近似、重要度等概念,给出模糊信息系统的属性约简算法,并用UCI数据集说明算法的可行性。  相似文献   

2.
基于互信息的模糊粗糙集属性约简   总被引:6,自引:1,他引:5  
模糊粗糙集知识约简是模糊粗糙集理论的核心内容之一。该文从粗糙集知识熵出发,结合模糊集隶属度函数,将其应用于模糊环境下,推广了互信息的度量概念,使其能评价模糊决策表中属性的重要性。并给出了一种模糊决策表的启发式属性约简算法,通过实例验证了它的可行性,为模糊决策表的属性约简提供了一种有效的方法。  相似文献   

3.
续欣莹  张扩  谢珺  谢刚 《电子学报》2017,45(11):2695-2704
最小属性约简是粗糙集理论中属性约简的优化问题.在寻找最小属性约简的问题上,基于粒子群优化的属性约简算法(ARPSO算法)优于传统的属性约简算法.在现有的ARPSO算法中,正域部分通常被作为启发式信息,但是它并不能够很好地衡量不确定性,而互信息是粗糙集理论中一种更有效的度量不确定信息的重要工具.为此,提出基于互信息下的粒子群优化的属性约简算法(MIPSO算法),该算法把互信息作为适应度函数,通过增强粒子能迅速靠近吸引子的这一特性,改进了内嵌区域震荡搜索的粒子群优化算法(简记为RSPSO算法),防止算法较早的陷入局部最优,使得粒子群中的粒子更快的找到最优值,因此使得算法尽可能实现全局收敛.实验结果表明,该算法不仅提高了寻优的能力,加快了算法的速度,提升了算法的精度,而且也能够使得约简后剩余属性的互信息值与约简前所有属性的互信息值近似相等.  相似文献   

4.
粗糙集近似集不确定性研究   总被引:2,自引:0,他引:2       下载免费PDF全文
张清华  薛玉斌  胡峰  于洪 《电子学报》2016,44(7):1574-1580
粗糙集用上、下近似集刻画不确定目标集合,而粗糙集的近似集用0.5-近似集作为不确定目标集合的近似集.本文首先分析了基于粗糙集的0.5-近似集相似度的属性约简算法存在理论不完备的不足,指出这种相似度具有随知识粒度变化不敏感的缺陷.然后进一步给出了多粒度知识空间下相似度的变化规律,提出了粗糙集近似集的模糊度概念,分析了粗糙集近似集的模糊度在多粒度知识空间下的变化规律,进而提出了相应的属性约简算法.从新的视角构建了目标概念与其近似集的差异性度量方法.  相似文献   

5.
李艳荣 《信息技术》2009,33(9):129-131
在经典粗糙集分类模型的基础上利用变精度粗糙集模型,引入近似区分矩阵的概念,提出了一种基于变精度粗糙集的图像分类模型及其分类算法,在变精度粗糙集分类模型的基础上利用贝叶斯粗糙集模型,通过引入全局相对增益函数给出了贝叶斯粗糙集属性约简的另外一种算法,最后提出了一种基于贝叶斯粗糙集的图像分类模型及其分类算法.实验结果表明在处理决策表不协调的图像分类问题,贝叶斯粗糙集图像分类方法性能良好,分类准确和高效.  相似文献   

6.
基于粗糙集理论,对基于属性重要度的启发式属性约简算法进行了改进,并将改进后算法运用于纳税人属性约简的实际工作中.该算法解决了原有基于属性重要度的启发式属性约简算法结果中存在冗余属性问题,实现了属性选择较小化,并保持原有数据分类能力不发生大的变化.通过属性约简实验结果和实际工作情况对比,证明该算法具有很好的性能.  相似文献   

7.
《现代电子技术》2016,(7):115-119
针对传统数据挖掘算法在数据量级方面的局限性,提出在粗糙集理论的基础上,采用类分布链表结构改进传统的基于属性重要性的数据离散化算法、属性约简算法以及基于启发式的值约简算法。讨论了基于动态聚类的两步离散化算法,当算法适应大数据处理之后,采用并行计算的方法提高算法的执行效率。算法测试结果表明,改进算法能有效地处理大数据量,同时并行计算解决了大数据量处理带来的效率问题。  相似文献   

8.
针对传统数据挖掘算法在数据量级方面的局限性,提出在粗糙集理论的基础上,采用类分布链表结构改进传统的基于属性重要性的数据离散化算法、属性约简算法以及基于启发式的值约简算法;讨论了基于动态聚类的两步离散化算法,当算法适应大数据处理之后,采用并行计算的方法提高算法的执行效率。算法测试结果表明改进的算法能有效地处理大数据量,同时并行计算解决了大数据量处理带来的效率问题。  相似文献   

9.
粗糙集理论中属性相对约简算法   总被引:35,自引:2,他引:33       下载免费PDF全文
张腾飞  肖健梅  王锡淮 《电子学报》2005,33(11):2080-2083
粗糙集理论是近年来发展起来的一种有效地处理模糊和不确定性知识的数学工具,而求核与约简是粗糙集理论中的两个重要问题,现已证明求决策表所有约简和最小约简是一个典型的NP难题.本文在分析粗糙集理论的基础上,发现了正区域的一些有用性质,提出了一种利用正区域直接求核的方法,并利用正区域的启发式信息给出了两种相对约简算法.  相似文献   

10.
本文以同时具有丢失型和遗漏型未知属性值的广义不完备模糊决策系统为研究对象,提出了确定特征优势关系的概念,构建基于确定特征优势关系的模糊粗糙集模型,并提出相对下、上近似约简的概念,在此基础上得到近似约简的的判定定理及区分函数。并进行实例分析说明其有效性。  相似文献   

11.
DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.  相似文献   

12.
High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET > PDMAT > TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.  相似文献   

13.
In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal (200) (2d = 0.4027 nm) is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line(w), the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line(x), the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines(y), the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line(z) in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line(q) in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution(λ/△ 2) is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.  相似文献   

14.
From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.  相似文献   

15.
The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.  相似文献   

16.
The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.  相似文献   

17.
Today, micro-system technology and the development of new MEMS (Micro-Electro-Mechanical Systems) are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.  相似文献   

18.
This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel's.  相似文献   

19.
This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.  相似文献   

20.
An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.  相似文献   

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