2.45 GHz 0.18 μm全差分CMOS低噪声放大器设计

设计了一个基于TSMC 0.18 μm CMOS工艺的2.45 GHz全差分CMOS低噪声放大器.根据电路结构特点,采用图解法对LNA进行功耗约束下的噪声优化,以选取最优的晶体管栅宽;设计了仅消耗15 μA电流的偏置电路;采用在输入级增加电容的方法,在改善输入匹配网络特性的同时,解决了栅极电感的集成问题.仿真结果表明:LNA噪声系数为1.96 dB,功率增益S_(21)超过20 dB,输入反射系数S_(11)和输出反射系数S_(22)分别小于-30 dB和-20 dB,反向功率增益S_(12)小于-30 dB,1 dB压缩点和三阶互调输入点IIP3分别达到-17.1 dBm和-2.55 dBm,整个电路在1.8 V电源下功耗为22.4 mW.     

基于SiGe HBT工艺的GNSS接收机混频器设计

针对目前国内RFIC发展比较滞后的现状,设计了3款应用于GNSS接收机的基于0.5 μm SiGe HBT工艺的混频器(Ⅰ、Ⅱ、Ⅲ),并采用针对混频器的优良指数FOM(figure-of-merit)对这3个混频器进行结构和综合性能比较.3款混频器的供电电压为3.3 V,本振LO输入功率为-10 dBm,其消耗总电流、转换增益、噪声系数、1 dB增益压缩点依次为:Ⅰ)8.7 mA,15 dB,4.1 dB,-17 dBm;Ⅱ)8.4 mA ,10 dB,4.6 dB,-10 dBm;Ⅲ)5.4 mA,11 dB,4.9 dB,-10 dBm.而3款混频器的FOM分别为-57.8、-56.6、-54.3,表明混频器Ⅲ的综合性能最佳,混频器Ⅱ次之,最后为混频器Ⅰ.     

应用于IEEE 802.11b无线局域网系统的2.4GHzCMOS单片收发机射频前端

实现了一个应用于IEEE 802.11b无线局域网系统的2.4GHz CMOS单片收发机射频前端,它的接收机和发射机都采用了性能优良的超外差结构.该射频前端由五个模块组成:低噪声放大器、下变频器、上变频器、末前级和LO缓冲器.除了下变频器的输出采用了开漏级输出外,各模块的输入、输出端都在片匹配到50Ω.该射频前端已经采用0.18μm CMOS工艺实现.当低噪声放大器和下变频器直接级联时,测量到的噪声系数约为5.2dB,功率增益为12.5dB,输入1dB压缩点约为-18dBm,输入三阶交调点约为-7dBm.当上变频器和末前级直接级联时,测量到的噪声系数约为12.4dB,功率增益约为23.8dB,输出1dB压缩点约为1.5dBm,输出三阶交调点约为16dBm.接收机射频前端和发射机射频前端都采用1.8V电源,消耗的电流分别为13.6和27.6mA.     

一种用于电视调谐器的宽带CMOS低噪声放大器设计

介绍了一种宽带CMOS低噪声放大器设计方法,采用噪声抵消技术消除输入MOS管的噪声贡献.芯片采用TSMC 0.25μm 1P5M RF CMOS工艺实现.测试结果表明:在50～860MHz工作频率内,电压增益约为13.4dB;噪声系数在2.4～3.5dB之间;增益1dB压缩点为-6.7dBm;输入参考三阶交调点为3.3dBm.在2.5V直流电压下测得的功耗约为30mW.     

一种用于电视调谐器的宽带CMOS低噪声放大器设计

介绍了一种宽带CMOS低噪声放大器设计方法,采用噪声抵消技术消除输入MOS管的噪声贡献.芯片采用TSMC 0.25μm 1P5M RF CMOS工艺实现.测试结果表明:在50～860MHz工作频率内,电压增益约为13.4dB;噪声系数在2.4～3.5dB之间;增益1dB压缩点为-6.7dBm;输入参考三阶交调点为3.3dBm.在2.5V直流电压下测得的功耗约为30mW.     

一种输出匹配可调的、高线性度宽带功率放大器

采用自适应偏置技术和有源电感实现了一款输出匹配可调的、高线性度宽带功率放大器(PA)。自适应偏置技术抑制了功放管直流工作点的漂移,提高了PA的线性度。有源电感参与输出匹配,实现了输出匹配可调谐,该策略可调整因工艺偏差、封装寄生造成的输出匹配退化。利用软件ADS对电路进行验证,结果表明,在4 GHz频率下,输入1dB压缩点(Pin 1dB)为-7dBm,输出1dB压缩点(Pout 1dB)为11dBm,功率附加效率(PAE)为8.7%。在3.1GHz~4.8 GHz频段内,增益为(20.3±1.1)d B,输入、输出的回波损耗均小于-10dB。     

4H-SiC MESFET大信号非线性特性分析

采用Voherra级数法对4H-SiC射频MESFET的大信号非线性特性进行了分析,并研究了器件尺寸与线性度的关系.模型考虑了陷阱效应对非线性特性的影响,模拟结果能够较好地反映实验结果.进一步分析表明,在1GHz和1.01GHz频率下,当栅长从0.8μm增大到1.6μm,器件的输入(输出)三阶截取点从33.55dBm(36.26dBm)减小到18.1dBm(13.4dBm),1dB压缩点从24dBm下降到7.43dBm.为实际器件的线性化设计提供理论依据.     

单片分布式放大器的研制

采用0.15μm GaAs pHEMT工艺,研制了单级和两级两种结构的微波毫米波单片分布式放大器.在设计中采用电阻-电容结构代替传统分布式放大器中的终端电阻以降低直流功耗,在输入端加入短路线增强静电保护.根据应用需求设计了相应的放大器电路结构,实现了两种分布式放大器,比较了这两种结构在增益与功率容限方面的特点.第1种分布式放大器采用单级四管结构,在10～40GHz频段内,增益为(9.4±1.1)dB,1dB压缩点最大输出功率为21.5dBm;第2种分布式放大器采用两级双管级联结构,在15～40GHz频段内,增益为(12.2±1.4)dB,1dB压缩点最大输出功率为17dBm.     

一种高线性短波宽带混频器的设计

采用双平衡场效应管结构和阻抗匹配技术设计了一种适用于短波宽带接收机的高线性混频器,通过调整场效应管的沟道宽度和偏置电压优化了混频器的性能指标.该混频器射频输入频率为1.5～ 30 MHz,本振输入频率为71.5～100MHz,中频输出频率为70 MHz.测试结果表明:输入三阶截点高于40 dBm,变频损耗小于7dB,1 dB压缩点高于12 dBm,单边带噪声系数小于7dB.     

A Wide-Band Low Noise Amplifier for Terrestrial and Cable Receptions

提出并设计了一种用于数字电视接收调谐芯片的宽带低噪声放大器.该设计采用0.35μm SiGe BiCMOS工艺,器件的主要性能为:增益等于18.8dB,增益平坦度小于1.4dB,噪声系数小于5dB,1dB压缩点为-2dBm,输入三阶交调为8dBm.在5V供电的情况下,直流功耗为120mW.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.     

Theoretical analysis of the relationship between the Brillouin gain coefficient and the strain in the optical-fiber sensors

The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.     

Novel fiber-optical interferometer with miniaturized probe for in-hole measurements

Today, micro-system technology and the development of new MEMS （Micro-Electro-Mechanical Systems） are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.     

Study of waveguide coupling efficiency in hybrid silicon lasers

This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel＇s.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.