协作系统中基于比例公平的资源分配方法

针对多用户协作中继系统中的资源分配问题,提出了一种在满足用户速率比例公平约束条件下的新算法。该算法先将由2个时隙组成的中继用户传输链路转换为一个等效信道链路,将涉及子载波分配、中继选择和功率分配的组合优化问题转化为分步的次优化问题。该算法在等功率分配情况下,根据各用户速率比例公平系数进行初步子载波数目分配;以瞬时信道增益最佳原则,进行剩余子载波数目分配及具体子载波分配,同时完成中继选择;在速率比例公平约束条件下推导出次优化功率分配的闭式表达式,从而完成各子载波上的功率分配。仿真结果表明,该算法在有效提高系统容量的同时,保证了各用户速率之间的比例公平性。     

OFDMA协同通信系统子载波和功率联合分配算法

针对OFDMA协同通信系统资源分配仅考虑平均功率下的子载波分配,中继存在未用功率情况,研究子载波分配后中继剩余功率分配问题。提出一种既满足业务QoS需求又兼顾用户间公平性的子载波和功率联合分配算法,并设计一种基于二分法的功率注水分配方案。测试表明,该算法能在满足业务QoS需求及用户公平性的同时,提升系统容量。     

中继网中基于QoS保证和比例公平的资源分配

中继系统下的众多资源分配策略很少同时考虑多用户情形下的子载波配对和不同用户需求。针对这一问题,提出了一种基于QoS(服务质量)保证和比例公平的多用户子载波配对和功率分配算法,该算法既能保证QoS用户的最小速率要求,又能满足BE(尽力而为)用户之间速率比例公平的准则。该算法首先根据不同用户需求分配第二跳的子载波,然后利用匈牙利配对算法得到两跳子载波的最佳配对,最后用类似注水算法进行功率分配。仿真结果表明,所提算法在满足用户QoS保证和比例公平准则的同时有效提升了系统的吞吐量。     

基于比例速率约束的OFDMA-DF中继系统上行链路资源分配算法

针对正交频分多址接入解码转发(OFDMA-DF)中继上行链路通信系统,提出了一种基于比例速率公平约束的资源分配算法.新算法主要分为两个步骤:首先在假定平均功率分配下,按照速率约束比越小的用户越优先选择子载波和中继这一准则进行载波分配和中继选择;然后在此基础上进行子载波上的优化功率分配,并给出了功率分配结果.分析结果显示,新算法在获得较高系统容量的同时能很好地保证用户之间的公平性.     

优化公平性的多用户OFDM系统下行链路资源分配算法

研究了优化公平性的多用户OFDM系统下行链路的资源分配算法,根据系统各用户的业务需求,在保证用户所得数据速率满足一定比例以及系统总功率限制的前提下,提高系统总数据速率。首先,根据公平性原则进行用户的子载波分配,子载波功率分配使用注水算法;子载波分配完成后,利用贪婪功率分配算法,以最大化用户数据速率和提高功率利用率为目标,对各用户内部子载波功率和比特数进行再分配。仿真结果表明,相比参考文献[10]的算法,该算法在提高系统总速率的同时,更好地保证了用户数据速率的公平性;相比参考文献[12]的算法,该算法虽然牺牲了一定的系统总速率,但能提供更高的用户数据速率公平性。     

OFDMA系统下行链路自适应带宽与子载波分配方案

该文分析了OFDMA系统下行链路自适应资源分配问题,在系统总功率约束下提出了最小化系统中断概率的次最佳两步子载波分配算法。首先分析用户带宽分配与子载波功率分配特点,在此基础上提出了根据系统可用资源、用户QoS要求及信道状态为用户分配带宽和子载波的两步分配算法。仿真结果表明,该文提出的算法能在极小化系统中断概率的同时满足总功率约束。     

基于两跳匹配的OFDMA中继网络联合资源分配算法

针对OFDMA中继网络的两跳特性,提出一种基于两跳匹配的中继网络联合资源分配算法。首先根据中继网络的两跳性建立两跳速率匹配模型,然后利用对偶分解理论将中继网络资源分配的主问题分解为：中继选择、子载波分配和功率分配三个主要的子问题并进行联合优化,同时基于中继网络两跳性在子载波分配的过程中考虑两跳子载波配对,以逼近系统最优解。最后为了保证算法的公平性,考虑子载波分配因子约束以优化子载波分配。仿真结果表明：所提算法将中继选择、两跳子载波配对与功率分配联合优化以进一步提升系统吞吐量,同时引入子载波分配因子约束,保证了算法的公平性。     

OFDM固定中继系统中单中继多源用户资源分配方案

通过基站的反馈信息,一个固定中继节点可以用一个OFDM符号同时帮助多个源用户转发信息,这样可以有效地利用带宽。因此,为了进一步提高系统容量,降低中断概率,先在中继节点间进行子载波调整,然后以获取信道容量最大为原则,提出了源用户和中继节点间子载波配对和功率分配的联合优化算法。仿真结果表明,相对于随机中继子载波选择算法以及平均功率分配算法,所提算法的中继系统容量有较大提升,同时中断概率有较为明显的下降。     

基于速率约束的OFDM中继链路能效最优资源分配策略

该文研究解码转发(DF)模式的OFDM中继链路的能效最大化资源分配问题。与现有典型的固定速率最小化发射功率或无约束最大化能效算法不同,该文考虑电路功率消耗的前提下,将问题建模为以最大化系统能效为目标,同时考虑用户最小速率需求、源节点S和中继节点R各自总发射功率约束下的联合子载波配对和最优功率分配问题。证明了速率和功率联合约束条件下中继链路全局能效最优解的唯一性,在此基础上提出一种低复杂度联合最优资源分配策略。仿真结果表明,该文所提方案能够在最小速率和S/R节点最大发射功率约束下自适应分配功率资源,实现系统能效最优,并能够降低链路的中断概率。     

多用户OFDM系统中一种新颖的自适应功率分配方案

针对多用户正交频分复用(OFDM)系统自适应资源分配的问题,提出了一种新的自适应子载波分配方案。子载波分配中首先通过松弛用户速率比例约束条件确定每个用户的子载波数量,然后对总功率在所有子载波间均等分配的前提下,按照最小比例速率用户优先选择子载波的方式实现子载波的分配;在功率分配中提出了一种基于人工蜂群算法和模拟退火算法(ABC-SA)相结合的新功率分配方案,并且通过ABC-SA算法的全局搜索实现了在所有用户之间的功率寻优,同时利用等功率的分配方式在每个用户下进行子载波间的功率分配,最终实现系统容量的最大化。仿真结果表明,与其他方案相比,所提方案在兼顾用户公平性的同时还能有效地提高系统的吞吐量,进而证明了所提方案的有效性。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.