高频应用的NiZn铁氧体磁性能影响因素研究

讨论了Fe2O3、Co2O3、烧结温度对高频应用的NiZn铁氧体磁性能的影响,实验研究了Fe2O3、Co2O3和烧结温度对起始磁导率μi、饱和磁感应强度Bs、矫顽力Hc及样品密度d的影响规律.结果发现,当x(Fe2 O3)=45％～49％时,μi从11单调增加到17,材料的B.从176 mT单调增加到223 mT;当w(Co2O3)=0.4％～2.0％时,μi从20单调降低到11;烧结温度为1 040～1 120℃时,μi从12增加到19,Hc从1 543 A/m降低到926 A/m,d从4.97 g/cm3增加到了5.12 g/cm3.最后,得到性能较好的高频应用NiZn铁氧体Ni0.96 Zn0.04Fe1.88O4(添加w(Co2 O3)=0.8％,w(CuO)=3％,1 080℃下烧结),μ1=11,Bs=195 mT,Hc=1 238 A/m,d=4.82 g/cm3.     

球磨时间对低温烧结BaO-TiO_2-Nb_2O_5微波陶瓷性能的影响

为实现Ba2Ti3Nb4O18(BaO-TiO2-Nb2O5)材料的低温烧结,添加质量分数为5%的ZnO-B2O3玻璃作助熔剂,研究了行星球磨时间对粉料粒径、陶瓷样品的烧结密度、显微结构和介电性能的影响。结果显示:行星球磨6h的粉料粒径适中(约90nm),用该粉料制备的样品可在900℃致密烧结(>95%理论密度),且介电性能优良(1MHz),εr约为36,tanδ小于4×10–4,电容温度系数为(–5～+5)×10–6/℃;微波介电性能如下:εr约为33,Q为2380(5.998GHz)。     

Bi_2O_3-Nb_2O_5复合掺杂对NiCuZn铁氧体性能的影响

运用Bi2O3-Nb2O5复合掺杂的陶瓷工艺,制备了NiCuZn铁氧体。从其微观结构出发,采用SEM分析手段,研究了Bi2O3-Nb2O5复合掺杂对NiCuZn铁氧体性能的影响。结果表明:适量的Bi2O3-Nb2O5复合掺杂,既有利于细化晶粒、促进晶粒均匀致密,又提高了品质因数Q,其磁性能明显优于单独掺杂。在掺杂总量的质量分数为0.5%、烧结温度为900℃、ζ(Bi2O3:Nb2O5)为7:3时,铁氧体的密度ρ为5.15g/cm3、起始磁导率μi为820.9、Q值可达110.5。     

添加剂对CaTiO_3陶瓷性能的影响

研究了Nb2O5、La2O3、ZnO、NiO的加入对CaTiO3陶瓷的烧结和介电性能的影响,并对影响机理作了初步探讨。结果表明:选择合适种类和数量的添加剂能够降低CaTiO3烧结温度并能在1260～1300℃之间烧结,该材料的温度系数为–1000×10–6℃–1,在10kHz～20MHz的相对介电常数为175、介质损耗为10–4,是一种理想的高频热补偿电容器材料。     

低温烧结0.5CaTiO3-0.5CaTiSiO5高频介质陶瓷

对添加2ZnO-B2O3玻璃实现0.5CaTiO3-0.5CaTiSiO5 高频介质材料900℃下低温烧结进行了系统研究.实验结果表明添加质量分数为5%～10% 2ZnO-B2O3玻璃可使体积密度达到0.5CaTiO3-0.5CaTiSiO5理论密度的97%以上,且介电性能优异,εr = 58～76,tgδ≤ 3.3×10-4,αε= (329～472)×10-6/℃,ρν≥ 1012 Ω?cm.利用XRD、SEM和介电测量技术分析材料的晶相组成、显微结构和介电特性发现材料由三种晶相组成,分别是单斜型CaTiSiO5、正交型CaTiO3以及一个新相,新相的生成可能是在液相烧结后期2ZnO-B2O3 玻璃在晶界处结晶而形成,低温烧结0.5CaTiO3-0.5CaTiSiO5 介质材料的介电性能很好地遵循李氏对数混合法则.     

Ni/Cu电极MLCC烧成工艺的研究

通过各项工艺对比实验,研究了烧成工艺参数对成品性能的影响。给出了最佳工艺参数:烧结温度为1280～1300℃,保温2h,用N2/H2/H2O的混合气控制P(O2)为10–8～10–10MPa,回火温度900～1100℃,保温2～5h,回火气氛氧含量(5～50)×10–6;1000℃以上的升降温速率控制在2～4℃/min。在此工艺条件下,选用合适的烧炉,可以得到性能合格的Ni/Cu电极MLCC。     

掺镁铌酸钾锂晶体的介电性和热释电性

在 10～ 70 0 K温度范围内 ,研究了掺 Mg的铌酸钾锂 (L i3K2 Nb5 O1 5 )单晶的 c、a片的介电温度特性和低温热释电性质 ,测量了在 5× 10 2 ～ 5× 10 8Hz频率范围内介电常数和频率的依赖关系。结果表明 ,除了在 6 2 3 K附近有一铁电 -顺电相变以外 ,在 80 K左右还存在铁电 -铁电相变 ,其介电弛豫频率在 2 5 0 MHz左右。     

B-Zn复合掺杂的LNT微波介质陶瓷的低温烧结

研究了烧结助剂B2O3、ZnO对Li0.925Nb0.375Ti0.8O3(LNT)陶瓷烧结特性及介电性能的影响。结果表明:B2O3-ZnO复合掺杂能有效降低烧结温度至900℃。ZnO的添加调节了LNT陶瓷正的频率温度系数,质量分数为1%的B2O3和4%的ZnO是最佳添加量,可得到εr为59.5,Q·f为7840GHz,τf为0×10–6℃–1的微波介质陶瓷材料。     

Co_2O_3掺杂对0.965MgTiO_3-0.035SrTiO_3微波介质陶瓷性能的影响

采用传统电子陶瓷制备方法研究了Co2O3(1.5%～5.0%,质量分数)掺杂的0.965MgTiO3-0.035SrTiO3(MST0.035)微波介质陶瓷,分析了Co2O3含量对MST0.035陶瓷的烧结性能、晶相结构、显微形貌以及微波介电性能的影响。结果表明:Co2O3的掺杂促进了MST0.035陶瓷的烧结。随着Co2O3掺杂量的增加,陶瓷介电常数略有下降,谐振频率温度系数以及品质因数增加,同时中间相MgTi2O5逐渐减少直至完全消失。当Co2O3掺杂量为质量分数3.0%时,MST0.035陶瓷的烧结温度由1 380℃降低到1 290℃,其烧结所得的样品具有优良的微波介电性能:谐振频率温度系数τf=–2.53×10–6/℃,高的品质因数Q·f=19 006 GHz和介电常数εr=20.5。     

PbO和Bi_2O_3-Li_2CO_3助烧剂对Pb(Zr_(0.9)Ti_(0.1))O_3厚膜热释电性能的影响

采用丝网印刷工艺制备了Pb(Zr0.9T0.1)O3(PZT)厚膜,研究了过量PbO和Bi2O3-Li2CO3共同助烧对PZT厚膜低温烧结特性、微观结构、相构成以及介电和热释电性能的影响。结果表明:随着过量PbO及Bi2O3-Li2CO3添加量的增加,PZT厚膜的烧结温度和晶粒尺寸均逐渐降低。当PbO过量6.4%(质量分数)、Bi2O3-Li2CO3添加量为5.4%(质量分数)时,PZT厚膜可在900℃低温下致密成瓷,且其热释电系数和探测率优值均得到大幅提高;所得样品在30℃时的热释电系数为10.6×10–8C.cm–2.K–1,探测率优值为8.2×10–5Pa–1/2。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.