基于O2分子1.27 μm气辉反演临近空间温度廓线的新方法

1.27 μm波段O₂（a¹?_g）气辉的辐射强度高、自吸收效应弱,是反演临近空间大气温度的理想目标源。基于O₂分子气辉光谱理论以及“剥洋葱”算法,利用扫描成像大气吸收光谱仪（SCIAMACHY）的近红外临边观测数据,成功反演50~100 km区域的大气温度廓线。与SABER、ACE-FTS及激光雷达的观测结果对比表明,在55~85 km的切线高度范围内温度测量误差优于±10 K,而在55 km以下与85 km以上空间区域,由于受到自吸收效应、大气散射以及OH气辉的光谱污染等干扰,温度反演结果出现显著偏差。     

Leakage currents over the Surface of CdHgTe-based photodiodes

The leakage current I _p over the surface of Cd_xHg_1−x Te-based photodiodes that have a cutoff wavelength of the photosensitivity spectrum of λ=9.8–11.6 μm and are fabricated by implanting Zn⁺⁺ ions into the p-type solid solution is investigated. The surface character of the I _p current is indicated by a coordinate shift of the peak in the sensitivity profile of n ⁺-p junctions, which is measured in a scanning mode by the beam of a CO₂ laser with a wavelength of 10.6 μm, with an increase in voltage U across the photodiode and the shift of spectral characteristics to shorter wavelengths with increasing U. __________ Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 38, No. 7, 2004, pp. 890–895. Original Russian Text Copyright ? 2004 by Biryulin, Turinov, Yakimov.     

InyAl1-yAs线性渐变缓冲层对InP基HEMT材料性能的影响

采用气体源分子束外延（GSMBE）技术,研究了InP衬底上In_yAl_1-yAs线性渐变缓冲层对In_0.66Ga_0.34As/In_yAl_1-yAs高迁移率晶体管（HEMT）材料特性影响。研究了不同厚度和不同铟含量的In_yAl_1-yAs线性渐变缓冲层对材料的表面质量、电子迁移率和二维电子气浓度的影响。结果表明,在300 K（77 K）时,电子迁移率和电子浓度分别为8 570 cm²/（Vs）^-1（23 200 cm²/（Vs）-1）3.255E12 cm^-2（2.732E12 cm^-2）。当In_yAl_1-yAs线性渐变缓冲层厚度为50 nm时,材料的表面形貌得到了很好的改善,均方根粗糙度（RMS）为0.154 nm。本研究可以为HEMT器件性能的提高提供强有力的支持。     

Simulation of double junction In0.46Ga0.54N/Si tandem solar cell

A comprehensive study of high efficiency In_0.46Ga_0.54N/Si tandem solar cell is presented. A tunnel junction (TJ) was needed to interconnect the top and bottom sub-cells. Two TJ designs, integrated within this tandem: GaAs(n⁺)/GaAs(p⁺) and In_0.5Ga_0.5N(n⁺)/Si(p⁺) were considered. Simulations of GaAs(n⁺)/GaAs(p⁺) and In_0.5Ga_0.5N (n⁺)/Si(p⁺) TJ I-V characteristics were studied for integration into the proposed tandem solar cell. A comparison of the simulated solar cell I-V characteristics under 1 sun AM1.5 spectrum was discussed in terms of short circuit current density (J_sc), open circuit voltage (V_OC), fill factor (FF) and efficiency (η) for both tunnel junction designs. Using GaAs(n⁺)/GaAs(p⁺) tunnel junction, the obtained values of J_sc = 21.74 mA/cm², V_OC= 1.81 V, FF = 0.87 and η = 34.28%, whereas the solar cell with the In_0.5Ga_0.5N/Si tunnel junction reported values of J_sc = 21.92 mA/cm², V_OC = 1.81 V, FF = 0.88 and η = 35.01%. The results found that required thicknesses for GaAs(n⁺)/GaAs(p⁺) and In_0.5Ga_0.5N (n⁺)/Si(p⁺) tunnel junctions are around 20 nm, the total thickness of the top InGaN can be very small due to its high optical absorption coefficient and the use of a relatively thick bottom cell is necessary to increase the conversion efficiency.     

Cathodoluminescence of p-n-p microstructures in CuInSe2 crystals

Microstructures in p-CuInSe₂ single crystals tailored by the strong electric field have been studied using the method of local (d⩽1 μm) cathodoluminescence (CL). The shortest-wavelength radiation (ℏω=1.023 eV) has been observed from the n-type layer and longer-wavelength radiation (ℏω=1.006 eV)—from the p-type regions. An analysis of the cathodoluminescence spectra has allowed us to attribute the experimental features to optical transitions associated with donor and acceptor levels of V _Cu, V _Se, and Cu_i point defects in the crystal. Test measurements of EBIC, the C–V characteristics, and the DLT spectra confirm the cathodoluminescence data and reveal additional features of the p-n-p microstructures. Fiz. Tekh. Poluprovodn. 31, 114–119 (January 1997)     

基于光声光谱的二氧化碳测量技术研究

光声光谱技术是一种以光声效应为基础,具有响 应速度快、测量时间短、检测灵敏度 高等优点的新型光谱分析检测技术,已成为一种快速、安全、可靠的痕量气体检测手段。本 文利用中心波长位于2.0 μm的分布反馈式可调谐二极管激光器作为 光源,搭建了二氧化碳(C O₂)光声光谱测量系统,实验中采用对样品气体加湿的方式,通过引入弛豫速率快的H₂O 分子 有效降低CO₂分子的弛豫时间,增加了CO₂气体的光声信号强度,提高了系统的探测灵敏 度。 测量中选取4998.35 cm－1处的CO₂吸 收谱线为研究对象,结合波长调制技术,对CO₂气体进 行了探测研究。首先通过对系统的评估,确定了系统的最佳调制频率和最佳调制振幅为785 Hz和7.586 cm－1。然后通过对一系列 不同浓度的CO₂-N₂混合样品气体在最优实验条件下的测 量研究发现,所测光声信号与CO₂气体浓度之间具有良好的线性关系,进而反演出大气中C O₂气体的含量,其浓度值约为3.82×10－4。最后利用此系统对 室外大气中CO₂含量进行了连续 24小时的连续实时测量,得到了CO₂气体在一天中的浓度变化情况,并利用Allan方差对系 统 的长期稳定性进行了分析,当系统平均时间为1000 s时,探测灵敏度 约为1×10－7,证实了系统具有良好的稳定性和探测灵敏度。     

矿业开发密集区地表热环境分异效应遥感评价模型构建研究

矿产资源的开发推动了社会经济的迅速发展,但同时也使矿区成为地表高温聚集区,对生态环境带来不利影响。本文基于2000-2018年研究区的Landsat卫星遥感影像,利用辐射传输方程法（Radiative Transfer Equation,RTE）反演地表温度（Land Surface Temperature,LST）;基于NDVI-DFI像元三分模型反演植被覆盖度（Vegetation Fractional Coverage,VFC）;借助回归分析法定量分析4个陆表生物物理指标（光合植被覆盖度（Fractional Cover of Photosynthetic Vegetation,f_PV）,土壤湿度（Normalized Difference Moisture Index,NDMI）,建筑指数（Normalized Difference Build-Up Index,NDBI）,裸土指数（bare soil index,BSI））对地表温度的驱动机制;利用主成分分析方法（Principal Component Analysis,PCA）耦合以上4个生态参数,提出一种能够综合分析矿业开发密集区地表热环境分异效应的遥感综合生态模型（Remote Sensing Integrated Ecological Index,RSIEI）,利用时空分析法定量化和可视化分析矿业开发密集区地表热环境时空分异的影响机理;借助热场变异指数（Heat Index,HI）分析研究区地表热环境分异效应与生态环境质量之间的关系。结果表明：4个生态参数对地表热环境分异效应具有不同的驱动作用,定量回归分析表明,f_PV和NDMI与LST均呈线性负相关关系,并通过了p<0.01的显著性检验,说明光合植被覆盖度和土壤湿度的增加,对地表均具有降温效应;NDBI和BSI与LST均呈线性正相关关系,并通过了p<0.01的显著性检验,说明建筑用地和裸土面积的增加,对地表起升温效应。4个镇域矿业开发密集区RSIEI影像与LST影像的空间光谱分布特征表明,二者具有空间逆关联特点,即RSIEI值高（生态环境质量好）的像元对应于LST值低的像元,反之亦然。对4个矿业开发密集区3个年份的RSIEI与LST的定量回归分析表明,RSIEI的值每上升10%,LST的值相应下降0.67–0.77°C。经验证基于主成分分析方法建立的RSIEI模型适用于矿业开发密集区地表热环境分异效应的综合评估。     

Photosensitivity of thin-film structures based on (CuInSe2)x(2ZnSe)1−x solid solutions

Polycrystalline (CuInSe₂)_x(2ZnSe)_1−x films (x=0.6–1.0) with p-type conductivity and a thickness of 0.5–0.9 μm were obtained by pulsed laser evaporation. It is shown that a chalcopyrite-sphalerite transition occurs in the above system for x=0.7. The obtained films were used to fabricate the photosensitive structure of the In/p-(CuInSe₂)_x(2ZnSe)_1−x and InSe(GaSe)/(CuInSe₂)_x(2ZnSe)_1−x types. Spectral dependences of photovoltaic-conversion quantum efficiency were studied, and the photosensitivity of the structures in relation to the type of energy barrier and the composition was analyzed. It is concluded that the structures under consideration can be used as broadband photovoltaic converters. __________ Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 34, No. 5, 2000, pp. 576–581. Original Russian Text Copyright ? 2000 by V. Rud’, Yu. Rud’, Bekimbetov, Gremenok, Bodnar’, Rusak.     

具有低噪声及高线性度的高性能MOCVD-SiNx/AlN/GaN 毫米波MIS-HEMTs

文章在超薄势垒AlN/GaN异质结构上采用金属有机化学气相沉积（MOCVD）原位生长SiN_x栅介质,成功制备了高性能的SiN_x/AlN/GaN金属-绝缘体-半导体高电子迁移率晶体管（MIS-HEMTs）。深能级瞬态谱（DLTS）技术测试SiN_x/AlN的界面信息,显示其缺陷能级深度为0.236 eV,俘获截面为3.06×10^-19 cm^-2,提取的界面态密度为10¹⁰~10¹² cm^-2eV^-1,表明MOCVD原位生长的SiN_x可以有效降低界面态。同时器件表现出优越的直流、小信号和噪声性能。栅长为0.15 μm的器件在2 V的栅极电压（V_gs）下具有2.2 A/mm的最大饱和输出电流,峰值跨导为506 mS/mm,最大电流截止频率（f_T）和最大功率截止频率（f_MAX）分别达到了65 GHz和123 GHz,40 GHz下的最小噪声系数（NF_min）为1.07 dB,增益为 9.93 dB。V_ds = 6 V时对器件进行双音测试,器件的三阶交调输出功率（OIP3）为32.6 dBm,OIP3/P_dc达到11.2 dB。得益于高质量的SiN_x/AlN界面,SiN_x/AlN/GaN MIS-HEMT显示出了卓越的低噪声及高线性度,在毫米波领域具有一定的应用潜力。     

0.75PZT-xPZN-(0.25-x)PNN压电陶瓷的相结构和电性能

采用传统固相法制备了0.75Pb(Zr_1/2Ti_1/2)O₃-xPb(Zn_1/3Nb_2/3)O₃-(0.25-x)Pb(Ni_1/3Nb_2/3)O₃(0.75PZTxPZN(_0.25-x)PNN,摩尔分数x=0.05,0.10,0.15,0.20)压电陶瓷,研究了x值对陶瓷晶体结构、烧结特性、微观组织和介电、铁电、压电性能的影响规律。结果表明,陶瓷中三方相和四方相共存,当x=0.10~0.20时,陶瓷组分位于准同型相界(MPB)附近。随着PZN含量的增加,三方相含量减少,四方相含量增加,陶瓷的介电常数(ε_T)、压电常数(d₃₃)、机电耦合系数(k_p)和能量转化因子(d₃₃×g₃₃)均随之先增大后减小,当x=0.15时,0.75PZT-0.15PZN-0.10PNN陶瓷具有最佳电学性能,即ε_T=1 850,公电损耗tan δ=0.029,居里温度T_C=280 ℃,d₃₃=370 pC/N,k_p=0.67。     

VOLTE容灾机制研究及优化方案

_{本文首先对VOLTE现网网络结构及容灾机制进行研究分析,发现现存容灾机制中存在的缺点和不确定性,针对其中的问题,针对性地进行了深入研究和分析,创新的提出了1种快速容灾抢通方案,以达到提升VOLTE业务运维能力和用户业务感知的目的。}     

Calculation of energy band gaps in quaternary iii/v alloys

The dielectric theory of electronegativity is applied to the calculation of the compositional dependence of the energy band gap for quaternary III/V alloys of type A_l-xB_xC_1-yD_y and A_1-x-yB_xC_yD. The departure from linearity of E_G versus x and y is taken to be the sum of two terms, the intrinsic or virtual crystal term and the extrinsic term due to effects of aperiodicity which for one type of alloy may occur on both sublattices. Rather than simply treating the quaternary as an average of the bounding ternary systems, as has been common in the past, the intrinsic departure from linearity is calculated by assuming E_h,i,C, and D_av to vary linearly with x and y. The result is a smaller intrinsic deviation from linearity and a much better fit to existing data in the system Ga_1-xIn_xAs_1-y P_y. The calculation is also applied to three systems where no data exist but which are of great interest because of their potential application for the fabrication of lattice matched tandem solar cells: Ga_l-xA1_xAs_l-ySb_y. Ga_1-x-yA1_xIn_yAs, and GaAs_1-x-yP_xSb_y.     

新形势下河北移动全业务支撑策略研究

随着铁塔公司的成立及国家在“宽带中国”“提速降费”等一系列通信领域的重大战略实施,全业务运营越来越成为河北移动保持领先,实现卓越的重要支点。基于此河北移动启动大规模综合业务区建设,由传统传输网围绕基站建设转向全业务支撑。河北移动将综合业务区建设与全业务机房的选取统筹安排,建设综合业务区与全业务机房的联络光缆,将综合业务区光缆网成为承载重要集客数据专线和4G拉远站的载体,合理、有序、迅速实现“一张光缆网”的建设,鼎力支撑全业务及4G的发展。     

Nickel silicidation techniques for strained Si1?xGex, Si1?x?yGexCy, and Si1?yCy alloys material-device applications

A nickel silicide process for Si_1-xGe_x, Si_1-x-yGe_xC_y, and Si_1-yC_y alloy materials compatible with Si technology has been developed. Low-resistivity-phase (12–20 μΘ cm) nickel silicides have been obtained for these alloys with different low sheet-resistance temperature windows. The study shows that thin (15–18 nm) silicide layers with high crystalline quality, smooth silicide surface, and smooth interface between silicide and the underlying material are achievable. The technique could be used to combine the benefits of Ni silicide and Si_1-xGe_x, Si_1-x-yGe_xC_y, and Si_1-yC_y alloys. The technique is promising for Si or Si_1-xGe_x, Si_1-x-yGe_xC_y, and Si_1-yC_y alloy-based metal-oxide semiconductor, field-effect transistors (MOSFETs) or other device applications.     

Low pressure metalorganic chemical vapor deposition of InP and related compounds

The low pressure metalorganic chemical vapor deposition epitaxial growth and characterization of InP, Ga_0.47In_0.53 As and Ga_xIn_1-xAs_yP_1-y, lattice-matched to InP substrate are described. The layers were found to have the same etch pit density (EPD) as the substrate. The best mobility obtained for InP was 5300 cm² V⁻¹S⁻¹ at 300 K and 58 900 cm² V⁻¹ S⁻¹ at 77₂K, and for GaInAs was 11900 cm² V⁻¹ S⁻¹ at 300 K, 54 600 cm² V⁻¹ S⁻¹ at 77 K and 90 000 cm V⁻¹S⁻¹ at 2°K. We report the first successful growth of a GaInAs-InP superlattice and the enhanced mobility of a two dimensional electron gas at a GaInAs -InP heterojunction grown by LP-MO CVD. LP MO CVD material has been used for GaInAsPInP, DH lasers emitting at 1.3 um and 1.5 um. These devices exhibit a low threshold current, a slightly higher than liquid phase epitaxy devices and a high differential quantum efficiency of 60%. Fundamental transverse mode oscillation has been achieved up to a power outpout of 10 mW. Threshold currents as low as 200 mA dc have been measured for devices with a stripe width of 9 um and a cavity length of 300 um for emission at 1.5 um. Values of T in the range 64–80 C have been obtained. Preliminary life testing has been carried out at room temperature on a few laser diodes (λ = 1.5μm). Operation at constant current for severalthousand hours has been achieved with no change in the threshold current.     

Characterization of a rapid thermal anneal TiNxOy/TiSi2 contact barrier

In this paper, the physical and electrical properties of a TiN_xO_y/TiSi₂ dual layer contact barrier are reported. The TiN_xO_y/TiSi₂ barrier was formed by rapidly annealing a Ti thin film on Si in an N₂ ambient. During this process, the Ti film surface reacts with N₂ to form a TiN_xO_y skin layer and the bulk of the Ti film reacts with Si to form an underlying TiSi₂ layer. The influences of rapid thermal anneal (RTA) conditions on the TiN_xO_y layer were investigated by varying the RTA temperature from 600 to 1100° C and cycle duration from 30 to 100 s. It is found that the resulting TiN_xO_y and TiSi₂ layer thicknesses are dependent on RTA temperature and the starting Ti thickness. For a starting Ti thickness of 500Å, 150Å thick TiN_xO_y and 800Å thick TiSi₂ are obtained after an RTA at 900° C for 30 s. The TiN_xO_y thickness is limited by a fast diffusion of Si into Ti to form TiSi₂. When a Ti film is deposited on SiO₂, Ti starts to react with SiO₂ from 600° C and a significant reduction of the SiO₂ thickness is observed after an RTA at 900° C. The resulting layer is composed of a surface TiN_xO_y layer followed by a complex layer of titanium oxide and titanium suicide. In addition, when Ti is depos-ited on TiSi₂, thicker TiN_xO_y and TiSi₂ layers are obtained after RTA. This is because the TiSi₂ layer retards the diffusion of Si from the underlying substrate into the Ti layer. NMOSFETs were fabricated using the TiN_xO_y/TiSi₂ as a contact barrier formed by RTA at 900° C for 30 s and a significant reduction of contact resistance was obtained. In addition, electromigration test at a high current density indicated that a significant improvement in mean time to failure (MTF) has been obtained with the barrier.     

Transport properties of thermoelectric materials for coolers

The Seebeck coefficient, thermal conductivity, electrical conductivity and Hall coefficient of cooler grade, p-and n-type ternary alloys of Bi₂Te₃-Sb₂Te₃-Sb₂Se₃ were measured between 10 and 300 K. Between 300 K and about 150 K the temperature dependence of the transport properties can be explained by assuming nondegeneracy and a lattice scattering mechanism. The difference between the temperature dependence of the Hall effect in n-and p-type alloys can be explained by the presence of sub-bands of light and heavy holes in the valence band of p-type alloys.     

Processing of large YBa2 Cu3Ox domains for levitation applications by a Nd1+x Ba2−x Cu3 Oy-Seeded melt-growth technique

YBa₂Cu₃O_x domains for levitation applications have been produced by a seeding technology that includes Nd_1+x Ba_2−x Cu₃O_y seeds and melt-processing technologies such as conventional melt-textured growth, melt-texturing with PtO₂ and Y₂BaCuO₅ additions, and the new solid-liquid-melt-growth technology. Large domains (∼20 mm) with high levitation forces (F₁ up to 8.2 N) have been produced. The reproducibility of the results is good, and the capability of producing a large number of pellets in a single batch indicates good potential for the production of large amounts of this material.     

基于InP衬底的晶格失配In0.68Ga0.32As的MOCVD生长及其特性研究

采用MOCVD生长技术在InP衬底上成功实现了晶格失配的3μm In0.68 Ga0.32As薄膜生长.通过As组分的改变,利用张应变和压应变交替补偿的InAsxP1-x应变缓冲层结构来释放由于晶格失配所产生的应力,在InP衬底上得到了与In0.68Ga0.32 As晶格匹配的InAsxP1-x“虚拟”衬底,通过对缓冲层厚度的优化,使应力能够在“虚拟”衬底上完全豫弛.通过原子力显微镜(AFM)、高分辨XRD、透射电镜(TEM)和光致发光(PL)等测试分析表明,这种释放应力的方法能够有效提高In0.68 Ga0.32 As外延层的晶体质量.     

The effect of Tl2Te3 on the properties of the solid solution (Sb2Te3)0.75.(Bi2Te3)0.25

The effect on transport properties of the addition of 0.5-5% Tl₂Te₃ to p-type solid solutions of antimony and bismuth tellurides was studied. It was found that the addition of Tl₂Te₃ caused a lessening of the increase of hole concentration as low temperatures were approached, resulting in a slower decrease of the Seebeck coefficient with a decrease in temperature. In partial fulfillment of M.Sc. degree, Hebrew University, Jerusalem. Permanent address, Dept. of Inorganic and Analytical Chemistry, Hebrew University, Jerusalem.