The domain structure and magnetic properties of Co-Cr, Mo films

The magnetic properties of Co-Cr and Co-Mo films prepared by d.c. triode sputtering are discussed. The films are found to have perpendicular magnetisation in certain composition ranges. The magnetic domain structure of the films as observed by Lorentz electron microscopy is interpreted in terms of the deposition parameters and the properties of the films. In particular the microstructure of the films is seen to have an overwhelming influence on the domain structure.     

WO3/Si纳米晶薄膜的脉冲准分子激光沉积及结构分析

采用脉冲准分子激光大面积扫描沉积技术,在Ｓｉ（１１１）单晶衬底上沉积了 ＷＯ_ｘ薄膜．采用Ｘ射线衍射（ＸＲＤ）、喇曼光谱（ＲＳ）、付里叶红外光谱（ＦＴ－ＩＲ）及透射电镜扫描附件（ＳＴＥＭ）对不同条件下沉积的样品进行了结构分析．结果表明,氧分压和沉积温度是决定薄膜结构和成份的主要参数．在沉积温度３００℃以上及２０Ｐａ氧压下得到了三斜相纳米晶ＷＯ_３薄膜．     

Structure, Optical Property and Thermal Stability of Copper Nitride Films Prepared by Reactive Radio Frequency Magnetron Sputtering

Copper nitride (Cu3N) films were prepared by reactive radio frequency magnetron sputtering at various nitrogen partial pressures, and the films were annealed at different temperatures. The crystal structure of the films was identified by X-ray diffraction technique. The Cu3N films have a cubic anti-ReO3 structure, and lattice constant is 0.3855 nm. With increasing nitrogen partial pressure, the Cu3N films are strongly textured with the crystal direction [100]. The atomic force microscope images show that the films presence a smooth and compact morphology with nanocrystallites of about 70 nm in size. The films were further characterized by UV-visible spectrometer, and the optical band gap of the films was calculated from the Tauc equation. The typical value of optical band gap of the films is about 1.75 eV, and it increases with increasing nitrogen partial pressure. The thermal property of the films was measured by thermogravimetry, and the decomposition temperature of the films was about 530 K.     

Chemical bath deposition of SnS films with different crystal structures

SnS (stannous sulfide) films were prepared by chemical bath deposition in which a novel chelating reagent ammonium citrate was used. The film has a zinc blende structure or orthorhombic structure which is determined by the pH value of the deposition solution (zinc blende structure at pH = 5 and orthorhombic structure at pH = 6). The reason for this result may be that SnS films prepared at different pH values have different deposition mechanisms, which results in different structures. The prepared SnS films are all smooth and well adhered. The optical bandgaps of the SnS films are determined to be 1.75 eV and 1.12 eV for zinc blende structure and orthorhombic structure, respectively.     

溅射法生长 MgxZn1- xO薄膜的结构和光学特性

用射频磁控溅射法在不同衬底上制备出了MgxZn1-xO薄膜。X射线衍射(XRD)和原子力显微镜(AFM)研究结果表明,薄膜为六角纤锌矿结构,具有(002)方向择优取向;随氧分压增加,(002)衍射峰的角度变大,表征薄膜表面粗糙程度的方均根粗糙度减小。室温光致发光谱中有多个紫外及可见光致发光峰,其中344nm发光峰应来源于近带边发射。室温透射谱表明薄膜在可见光区具有极高的透过率,薄膜的吸收边位于340nm附近,进而估算出Mg、Zn1-xO薄膜的带隙宽度为3．59eV,与光致发光结果一致。     

高取向锐钛矿TiO2薄膜的MOCVD法制备与表征

采用热壁低压ＭＯＣＶＤ方法，以Ｔｉ（ＯＣ４Ｈ９）４为源在ＳｉＯ２／Ｓｉ衬底上制备出高取向锐钛矿ＴｉＯ２薄膜。用Ｘ射线衍射技术研究了沉积温度和衬底对薄膜的结构和相组成的影响规律，采用ＸＰＳ和ＳＥＭ分别研究了薄膜的组成和形貌，结果表明，当沉积温度为５００＾０Ｃ和６００＾０Ｃ时，薄膜为锐钛矿结构，３００＾０Ｃ和４００＾０Ｃ地，薄膜以无定形结构为主，薄膜的组成为ＴｉＯ２，衬底影响薄膜的相组成，不同沉积温度     

YZO薄膜的Sol-gel制备及其性能

采用Sol-gel法在普通载玻片上制备YZO薄膜.研究了陈化时间和Y掺杂量对薄膜晶体结构、表面形貌和光学性能的影响,并分析和探讨了工艺参数与结构和性能之间的关系.实验结果表明,YZO薄膜为纤锌矿结构,呈c轴择优取向生长,平均透光率(380～760nm)超过85%.实验还发现,陈化时间存在最优值,YZO薄膜随着Y掺杂量的增加晶体结晶质量下降.     

直流磁控溅射法制备ZnO∶Zr透明导电薄膜及性能研究

利用直流磁控溅射法在玻璃衬底上制备了ZnO∶Zr(ZZO)透明导电薄膜。研究了厚度对薄膜结构及光电性能的影响。研究结果表明,厚度对薄膜的结构和电学性能有很大的影响。制备的ZZO薄膜为六角纤锌矿结构的多晶薄膜,具有c轴择优取向。在厚度为593nm时,薄膜的电阻率具有最小值1.9×10-3Ω·cm。所制备薄膜样品的可见光平均透过率都超过93%。     

Structural study of single-walled carbon nanotube films doped by a solution method

Herein, we have studied a structure of SWNT films doped by organic molecules. In this study, we reacted organic molecules with SWNT films by a vapor phase and a liquid phase, respectively. The structure of doped SWNT films was investigated using synchrotron X-ray powder diffraction measurements, and we found the clear difference between the vapor phase reaction (v-doped) and the liquid phase reaction (I-doped). In v-doped SWNT films, organic molecules are predominantly encapsulated inside SWNTs, although molecules adsorbed on the surface of SWNT bundles in l-doped SWNT films.     

TiO2薄膜的结构和光催化活性研究

薄膜型的TiO2光催化剂克服了悬浮型的许多缺点,具有广阔的应用前景.阐述TiO2的结构及其影响因素;评述了晶型、晶粒尺寸、结晶度和晶格缺陷、表面积和表面预处理、表面羟基、温度、薄膜厚度、基体、光源及光强等因素对TiO2薄膜光催化活性的影响;探讨了提高TiO2薄膜光催化活性的措施,包括掺杂、贵金属沉积、半导体复合、表面光敏化等.指出需进一步研究的问题:加强影响因素的综合研究,探索最佳的工艺条件和反应条件;进一步提高TiO2薄膜的光催化效率;将光源种类从紫外光扩展到可见光;将TiO2薄膜的光催化性能同其它性能结合起来研究.     

Nano structure formation in vacuum evaporated zinc phthalocyanine (ZnPc) thin films

In this article we have reported the nano structure formation in ZincPhthalocyanine (ZnPc) thin films coated on glass substrates by thermal evaporation method. The structure of the films was analyzed by an X-ray diffractometer (using Cu K_α radiation with λ = 1.5418 Å). It reveals that the vacuum evaporated ZnPc thin films are having nano particles in its structure. It is confirmed by the scanning electron microscopy (SEM), X-ray diffraction (XRD) and optical absorption studies. The results of the XRD, SEM and AFM studies have been discussed in this article. A metastable α to the stable β-phase transformation has been observed when the films are coated at higher substrate temperatures. The core structure of the ZnPc macrocycle is formed by four isoindole units endowing the molecule with a two-dimensional conjugated π electron system.     

Manganese ferrite thin films Part I: Preparation and structure

The preparation of manganese ferrite thin films by the reactive evaporation of oxidic materials is reported. The process is not critical and provides homogeneous mirror-like films with spinel structure. An annealing procedure below 750 °C has a strong influence on the properties of the films. Special attention is paid to the partial oxygen pressure during the annealing process. For this purpose data are collected from the literature concerning the equilibrium conditions of the spinel structure for varying manganese-iron contents. The lattice constant of the spinel structure of the films is determined by electron diffraction.     

Properties of CdS Films Prepared from Thiourea Complexes of Cadmium Salts

Cadmium sulfide films were prepared by spray pyrolysis of thiourea complexes, and their optical, electrical, luminescent, and structural properties were investigated. The results are used to elucidate the mechanism underlying the effect of the nature of the thiourea complex on the properties of the films. The crystal structure and perfection of the films are shown to correlate with the structure of the first coordination sphere of the thiourea complex.     

TiO2薄膜的液相沉积法制备及其性能表征

采用液相沉积法（LPD）制备了透明TiO2薄膜,并研究了所制薄膜的形貌、结构和在紫外光照射下亲水性能的变化．结果表明,用此法制得的TiO₂薄膜较为均匀致密,热处理前后的薄膜具有相似的亲水性能,在紫外光照射下亲水性能都有提高．热处理后的薄膜在紫外光照射一定时间后可与水完全润湿．     

NPC太阳电池的TiO2薄膜结构的研究

采用溶胶凝胶法、粉末涂敷法和磁控溅射法在导电玻璃上制得纳米TiO2薄膜。电子衍射和X射线衍射实验表明该薄膜主要是锐钛矿相结构，透射电子显微镜实验证明了薄膜晶粒为纳米尺度，扫描电子显微镜实验观察了薄膜的表面形貌。分析并讨论了利用以上各种方法制得的纳米TiO2薄膜的结构及其所组成的染料敏化太阳电池的性能。发现由致密TiO2层和多孔TiO2层组成的多层TiO2薄膜组装的太阳电池的性能优于任一种单层TiO2薄膜。     

连续离子层吸附与反应法(SILAR)生长ZnO多晶薄膜的研究

采用连续离子层吸附与反应法(SILAR),以锌氨络离子([Zn(NH₃)₄]²⁺)为前驱体溶液,在玻璃衬底上沉积了ZnO薄膜,以XRD和SEM等手段分析了薄膜的晶体结构和表面、断面形貌,考察了空气气氛下的退火过程对ZnO薄膜晶体结构与微观形貌的影响,并初步探讨了以SILAR方法沉积ZnO薄膜的机理.结果表明,经200次SILAR沉积循环,所得ZnO薄膜为红锌矿结构的多晶薄膜,沿<002>方向择优生长;薄膜表面致密、光滑均匀,厚度约800nm.退火处理使ZnO薄膜氧缺位减少,晶粒沿c轴取向增强;随退火温度升高,锌间隙原子增加;500℃退火时,ZnO薄膜发生再结晶.减小前驱体溶液的[NH₃·H₂O]/[Zn²⁺]比率可提高ZnO薄膜生长速率.     

退火温度对NiZn铁氧体薄膜性能的影响

采用射频磁控溅射法在Si(100)基片上制备了NiZn铁氧体薄膜,研究了退火温度对薄膜性能的影响.采用XRD分析仪分析了薄膜的相结构,原子力显微镜分析了薄膜的表面形貌,振动样品磁强计测量了薄膜的磁性能,结果表明,随着退火温度的升高,薄膜的结晶状态越好,晶粒尺寸越大,饱和磁感应强度越高,面内矫顽力越小.     

Structure of vacuum-deposited thick films of NiCrAl

Vacuum-deposited thick films for resistors of low sheet resistance cannot be investigated by electron optical techniques because of their thickness. For the X-ray investigation of the structure of NiCrAl films it was necessary to produce very thick films by vapour deposition in a step-by-step manner. These films were deposited at a substrate temperature of 250 °C and subsequently tempered under a high vacuum for 30 min at 300, 400, 500 and 700 °C. It was found that these very thick as-deposited films are amorphous while reflections of the phases Ni₃Al, NiAl and chromium became visible with increasing annealing temperature.Thus the structure of these thick films corresponds to that found by electron optical techniques for thin films of the same composition.     

The structure and optical properties of ZnO films on various LiNbO3 substrates

ZnO films thin films have been deposited on glass and three different LiNbO₃ (LNO) substrates at room temperature using radio frequency magnetron sputtering. The structure and optical properties of the films were investigated by X-ray diffraction (XRD), optical transmission spectroscopy and spectro-photometry. XRD analysis shows that all the films are hexagonal wurtzite structure, and there is compressive strain in the films. Typical optical transmittance values in the order of 80% were obtained for all the films, and the band gaps are in the range of 3.273-3.282 eV. The Photo-Luminescence (PL) spectra results indicate that the type of substrate affects the photoluminecence of ZnO films significantly, and the films on rotated Y-cut 128° LNO substrates have strong UV emission at room temperature.     

射频磁控溅射制备p-Bi2Te3热电薄膜的电学性能研究

通过射频磁控溅射并控制溅射时间在玻璃基底上沉积了不同厚度和成分的p型Bi2Te3薄膜.Bi2Te3薄膜主要以(221)晶面平行于基底进行生长,先在基底形成大量微小晶粒,合并长大成典型的纤维状组织结构;退火后薄膜沿平面方向形成片状结构.薄膜的电导率和Seebeck系数受薄膜厚度和成分的影响,退火前受薄膜厚度的影响较大,退火后受薄膜成分和均匀性的影响较大,自掺杂Bi质量分数在5%左右时,薄膜功率因子约为760μW/(K2·m).