金刚石薄膜的沉积技术及其应用

本文介绍了金刚石气相合成的历史,金刚石薄膜的沉积方法、沉积机理以及金刚石薄膜的性能,分析了金刚石薄膜沉积技术的发展方向及其应用前景。     

金刚石薄膜的发展、制备及应用

简要介绍了金刚石薄膜的发展,总结了金刚石薄膜的几种主要制备工艺并对各种工艺的优、缺点进行了分析。结合对金刚石应用的讨论,阐述了金刚石薄膜在工业领域中的应用前景和发展趋势。     

金刚石薄膜的性质、制备及应用

金刚石有着优异的物理化学性质，化学气相沉积金刚石薄膜的研究受到研究人员和工业界的广泛关注。通过评述金刚石薄膜的性质、制备方法及应用等方面的研究成果，着重阐述化学气相沉积金刚石薄膜技术的基本原理，分析了各种沉积技术的优、缺点。结合对金刚石薄膜应用的讨论，分析了金刚石薄膜在工业应用中存在的问题和制备技术的发展方向。分析结果表明：MWCVD法是高速率、高质量、大面积沉积金刚石薄膜的首选方法；而提高金刚石的生长速度、降低生产成本等是进一步开发刚石薄膜工业化应用所需解决的主要问题。     

金刚石薄膜的研究现状与发展前景

文章介绍了金刚石的性质和应用,总结了金刚石薄膜研究的历史,论述了金刚石薄膜的优良特性和技术发展,指出国内外学术界都在不断地开拓和发展金刚石薄膜的应用领域。     

金刚石薄膜压力传感器的研究

金刚石的许多性质使它成为微结构为器件的优异材料。现已证明金刚石薄膜有压阻效应,这个性能打开了金刚石薄膜在压力传感器领域的应用,研究了金刚石薄膜的欧姆接触,热敏特性和压阻特性,研究表明金刚石薄膜可制成适于高温工作的传感器。     

类金刚石薄膜残余应力的研究进展

类金刚石薄膜由于存在很大的残余应力,在实际应用中薄膜易产生裂纹、破裂甚至脱落。这些问题导致类金刚石薄膜在使用过程中过早失效。因此,缓解残余应力是类金刚石薄膜急需解决的问题和实际应用的需要。介绍了类金刚石薄膜残余应力的产生,对国内外调控残余应力的途径以及研究进展进行综述。使用有限元分析法模拟薄膜的残余应力可为类金刚石薄膜的制备和工艺设计提供参考。     

纳米金刚石薄膜的制备特点及特性

纳米金刚石薄膜具有金刚石薄膜和纳米材料的双重优异特性，而在制备工艺上又与金刚石薄膜有所不同，通过与金刚石作比较，综述了纳米金刚石薄膜的制备特点，表征方法；并列举了其在场发射、耐磨减摩等领域的应用和其独特性能。     

金刚石薄膜材料的应用与合成技术

本文对金刚石薄膜的性能、应用，金刚石薄膜的合成方法以及薄膜样品的表征等作了较详细的介绍。并根据金刚石薄膜研究的现状提出应进一步探讨的几个问题。     

金刚石薄膜摩擦学性能研究进展

化学气相沉积的金刚石薄膜通常是一种表面粗糙的多晶薄膜,其摩擦系数相对于单晶金刚石明显偏高,制约着其在摩擦学领域的应用.本文介绍了近年来国内外学者为提高金刚石薄膜摩擦学性能而进行的探索研究及其发展现状.简要分析了影响金刚石薄膜摩擦学性能的主要因素,并提出金刚石薄膜应用于摩擦学领域需要重视解决的几个问题.     

提高CVD金刚石薄膜附着力的方法及其研究进展

概述了金刚石薄膜与衬底附着力研究的最新进展,详细讨论了衬底材料的性质、衬底预处理方法、过渡层、负偏压以及CVD沉积条件对金刚石薄膜附着力的影响,总结出提高附着力的主要方法,并分析了金刚石薄膜的应用状况,指出了扩大金刚石薄膜应用的新方向及存在的主要问题.     

Electrical properties of diamond films grown at low temperature

The unique electronic properties of diamond, associated with the emergence of chemical vapour deposition (CVD) methods for the growth of thin films on non-diamond substrates, have led to considerable interest in electronic devices fabricated from this material. In our previous work, we found that polycrystalline diamond films can be deposited at 250 °C using CH₄---CO₂ gas mixtures. Studying the electrical properties and the upcoming problems of applications of low-temperature diamond films are relevant concerns.

In this work, the electrical properties of diamond films grown at low temperatures were studied and compared with those of conventional diamond films. Platinum was used as the upper electrode. The resistivity of low-temperature diamond was around three orders of magnititude lower than that of conventional diamond. However, both the low temperature and conventional growth diamond exihibited rectifying behavior when platinum was used as the upper electrode.     

The versatility of hot-filament activated chemical vapor deposition

In the field of activated chemical vapor deposition (CVD) of polycrystalline diamond films, hot-filament activation (HF-CVD) is widely used for applications where large deposition areas are needed or three-dimensional substrates have to be coated. We have developed processes for the deposition of conductive, boron-doped diamond films as well as for tribological crystalline diamond coatings on deposition areas up to 50 cm × 100 cm. Such multi-filament processes are used to produce diamond electrodes for advanced electrochemical processes or large batches of diamond-coated tools and parts, respectively. These processes demonstrate the high degree of uniformity and reproducibility of hot-filament CVD. The usability of hot-filament CVD for diamond deposition on three-dimensional substrates is well known for CVD diamond shaft tools. We also develop interior diamond coatings for drawing dies, nozzles, and thread guides.Hot-filament CVD also enables the deposition of diamond film modifications with tailored properties. In order to adjust the surface topography to specific applications, we apply processes for smooth, fine-grained or textured diamond films for cutting tools and tribological applications. Rough diamond is employed for grinding applications. Multilayers of fine-grained and coarse-grained diamond have been developed, showing increased shock resistance due to reduced crack propagation.Hot-filament CVD is also used for in situ deposition of carbide coatings and diamond-carbide composites, and the deposition of non-diamond, silicon-based films. These coatings are suitable as diffusion barriers and are also applied for adhesion and stress engineering and for semiconductor applications, respectively.     

金刚石膜技术研究开发进展——专利文献分析

金刚石膜具有特别优异的性能,在高技术领域有着极为广泛的应用。本文采集1985年到2008年6月世界金刚石膜技术专利文献,并对其发展脉络和竞争格局进行定量和定性分析,揭示出国际上金刚石膜技术已处于较成熟阶段,工具级、热沉级金刚石膜产品已进入实用阶段,光学级和器件级金刚石膜技术尚未成熟;美国、日本技术实力占优势;德国、美国、日本市场被看好;不同应用领域竞争态势差异很大;通过引证分析得出了相关领域的核心的基础专利。     

金刚石薄膜抗激光破坏研究

介绍了金刚石优异的光学和力学特性,对金刚石薄膜在从紫外到红外波段以及不同脉宽激光参数下的激光损伤行为和损伤阈值进行了评述。分析了不同激光工作参数对金刚石薄膜的激光损伤机理,认为石墨化导致晶格失稳是金刚石薄膜激光损伤的主要原因。金刚石薄膜石墨化有两种方式:垂直表面向体层方向石墨化和平行表面按分层的方式逐层石墨化。     

稀土化合物浆料对CVD金刚石厚膜的刻蚀

ＣＶＤ金刚石厚膜具有极高的硬度,使得对其进行表面抛光极为困难．传统的机械抛光方法既不经济又耗费时间,而一些新的抛光技术又由于实验条件限制而难以推广．针对以上情况,我们寻求到一种新的化学刻蚀方法,即利用稀土化合物浆料对金刚石厚膜生长表面进行刻蚀,破坏表面的晶粒使之成为晶骸,降低表面的耐磨性,以提高表面粗糙的金刚石厚膜的抛光效率．     

Study on hybrid nano-diamond films formed by plasma chemical vapor deposition (CVD)

Diamond-like carbon (DLC) films made by plasma chemical vapor deposition (CVD) have many useful properties for tribological characteristics. Especially, friction coefficient is very low. However, the films have weak points i.e., very low heatproof temperature of less than 300 °C and low hardness insufficient for industrial applications like machine tools. On the other hand, it is well known that diamond films made by plasma CVD have excellent hardness. But, they also have inferior properties for industrial applications, such as higher surface roughness and lower critical load than DLC films. In this study, we developed hybrid nano-diamond (HND) films that are formed by alternately depositing DLC films and diamond films in a same chamber. The HND films have sufficiently high hardness as well as excellent tribological characteristics due to the multi-layer structure of DLC and diamond. The process of forming HND films are discussed.     

类金刚石膜的性能及应用研究

研究了利用低能离子束技术，在单晶硅片等多种基体表面形成类金刚石薄膜（ＤＬＣ膜）的工艺，测试了其物理化学力学性能，在硅片，硅太阳电池和半导体等表面进行了形成类金刚石膜的应用研究。     

金刚石自支撑膜的高温红外透过性能

由于金刚石具有低吸收和优异的力学与导热性能使其成为长波(8~12μm)红外光学窗口材料的重要选择。对于许多极端条件的应用,化学气相沉积(CVD)金刚石自支撑膜的高温光学性质至关重要。应用直流电弧等离子喷射法制备光学级金刚石自支撑膜进行变化温度的红外光学透过性能研究,采用光学显微镜、X射线衍射、激光拉曼和傅里叶变换红外-拉曼光谱仪检测CVD金刚石膜的表面形貌、结构特征和红外光学性能。结果表明:在27℃时金刚石膜长波红外8~12μm之间的平均透过率达到65.95%,在500℃时8~12μm处的平均透过率为52.5%。透过率下降可分为3个阶段。对应于透过率随温度的下降,金刚石膜的吸收系数随温度的升高而增加。金刚石自支撑膜表面状态的变化,对金刚石膜光学性能的影响显著大于内部结构的影响。     

CVD金刚石薄膜抛光技术的研究进展

采用化学气相沉积 (CVD)方法在非金刚石衬底上沉积的金刚石薄膜 ,本质上为多晶 ,而且表面粗糙。然而 ,在金刚石薄膜的许多重要应用领域 ,如光学和电子学 ,都要求金刚石薄膜具有光滑表面 ,以便器件的制备或后续加工。本文论述了目前国际上出现的抛光CVD金刚石薄膜的主要方法 ,包括机械抛光法、热 化学抛光法、化学 机械抛光法、等离子体 /离子束抛光法以及激光抛光法等 ,深入分析了这些抛光方法的优点和不足 ,指出了今后需要重点解决的问题。最后 ,展望了CVD金刚石薄膜抛光技术的发展趋势