小口径深度凸非球面的高精度面形检测

凸非球面反射镜在反射式光学系统中的应用非常广泛,但其面形高精度检测一直是光学制造领域的难题。为了实现小口径、深度凸非球面的面形高精度检测,提出了一种基于计算全息图（Computer Generated Hologram,CGH）的零位干涉检测技术。首先,详细阐述了该技术的检测原理和方法,给出了计算全息中补偿测试全息和对准标记全息设计过程中的技术要点;然后结合工程应用,针对口径15 mm、顶点曲率半径11.721 mm、非球面度达到72 μm的深度凸非球面,设计并制造了相应的CGH补偿元件,完成了相应零位干涉检测系统的搭建和检测实验;最后,与Luphoscan的检测结果交叉对比,验证了该检测方法的准确性。该技术为小口径凸非球面的高精度检测提供了一种有效的方法,具有显著的工程应用价值。     

高精度离轴非球面透镜的制造与检测

针对强激光系统所需大口径非球面元件高精度、批量化的加工需求,提出了一种气囊抛光技术与柔性沥青小工具抛光技术相结合的大口径非球面元件高效制造方法。采用气囊抛光技术进行非球面保形抛光和快速修正抛光,实现磨削缺陷层快速去除以及低频误差快速修正。采用柔性沥青工具匀滑抛光技术,在低频误差不被恶化的情况下,控制元件中高频误差。在抛光过程中,利用球面干涉仪搭建的自准直波前干涉检测系统和粗糙度仪对非球面元件进行全频段误差检测。基于上述加工与检测方法完成了430 mm430 mm口径离轴非球面透镜样件实验加工,实验结果为元件通光口径内透射波前PV=0.1,GRMS=5.7 nm/cm,PSD1 RMS=1.76 nm,PSD2 RMS=1 nm,Rq=0.61 nm,并且中频段功率谱密度曲线均在要求的评判曲线之下。实验结果表明,离轴非球面透镜样件全频段指标均达到了合格指标要求。所述制造方法也适用于其他类型大口径非球面光学元件的高精度加工。     

部分补偿数字莫尔移相干涉的回程误差消除

为了实现非球面面形误差的高精度测量,研究了基于部分补偿原理的数字莫尔移相干涉技术中回程误差的消除方法。通过建立实际干涉仪和建模理想干涉仪,并运用数字莫尔移相干涉技术,获得实际干涉仪像面与被测非球面面形误差相关的波前;分析了该测量系统的误差,提出采用逆向优化法消除大面形误差时的回程误差实现被测非球面的面形误差检测。实验结果表明:与轮廓仪结果比对,面形误差较小时二分之一法重构面形误差,峰谷值和均方根值分别优于/20,面形误差较大时运用逆向优化法消除回程误差,重构的非球面面形误差峰谷值和均方根值偏差均优于/5。基于逆向优化法的部分补偿数字莫尔移相干涉非球面检测,有效消除了大面形误差时的回程误差,可实现高精度的面形误差重构检测。     

自由曲面的CGH光学检测方法与实验

自由曲面能有效地简化光学系统结构并提高其性能,在照明光学系统和成像光学系统中均具有良好的应用前景。为了实现自由曲面的高精度光学检测,分析了自由曲面的计算机全息图(CGH)检测方法并讨论了它的限制因素;探讨了使用基准CGH区域解决自由曲面检测时的对准问题;设计并制作了直径为180 mm的CGH对某三次方项波前编码自由曲面(口径150 mm,PV为6λ,λ@632.8 nm)进行了光学检测,该方法的检测结果(0.068λrms)与非零位检测方法的检测结果(0.067λrms)一致,实验验证了自由曲面的CGH检测方法。该方法具有易对准、精度高和效率高的优点。     

猫眼波前定位虚实结合干涉非球面参数误差测量 (特邀)

非球面广泛应用于光学系统中。表征非球面的基本参数包括顶点曲率半径、圆锥系数以及高阶非球面系数,它们贯穿了非球面的设计、制造、检测、装调过程。对非球面参数的高精度测量是加工和装调的前提。提出了一种基于虚实结合干涉仪的部分补偿非球面参数误差测量系统。在该系统中,采用部分补偿干涉法测量剩余波前,复用干涉仪利用轴向扫描透镜的猫眼波前定位法测量补偿镜与被测镜之间的间距,采用虚实结合迭代算法进行参数误差求解。该系统仅需在部分补偿干涉光路中引入会聚透镜,装调简单,测量精度高。通过一个四次非球面参数误差测量实验验证了该方法的有效性和精度。     

基于差分方法的高精度球面调整误差校正

针对高精度球面检测中待测球面调整误差所引入的高阶像差影响,提出了一种基于差分方法的高精度调整误差校正方法。通过对待测球面分别引入两个不同的波前离焦量,对测得的波面数据取差分,由此得到测量中调整误差所引入的高阶像差,并将其从面形数据中分离出来,进而实现高精度的球面调整误差校正。通过Zygo干涉仪对提出方法的可行性进行了实验验证,并给出了实验结果。测量中,对大数值孔径待测球面同时引入波前离焦和倾斜,运用本文方法实现调整误差的校正精度达到了均方根(RMS)为0.001 5λ和峰谷(PV)为0.018 9λ。本文方法无需了解检测系统或待测球面的任何先验信息,并可有效降低对待测球面调整的要求,在实际的高精度球面检测中有很好的适用性。     

凸非球面无光焦度双透镜Hindle检验研究

为实现小口径Hindle透镜对大口径凸非球面的高精度检测,提出了一种新的凸非球面无光焦度双透镜Hindle检验方法,通过加入无光焦度校正透镜有效解决了传统Hindle检验的不足.对口径180mm、半径380mm、偏心率2.8的凸非球面进行了设计分析,分别给出了不同光焦度分配及不同无光焦度双透镜间距时系统的残余波像差曲线图,得出较优的系统残余波像差为0.0006λ,验证了该方法的可行性.     

非球面面形精细重构方法研究

针对非球面反射镜在抛光初期干涉仪不能全口径检测面形误差的问题,提出一种三坐标测量机(CMM)和数字干涉仪组合测量以实现全口径波前复原的方法.将CMM与干涉仪测量数据组合,即面形误差以干涉测量为主,干涉检测不能复原的局部波前采用CMM测量数据进行精细重构,从而获得可用于数字化加工的全口径面形误差,并最终达到非球面镜全口径干涉检测.采用该方法对Φ为540 mm的离轴非球面反射镜在精磨后期进行数据组合补偿,成功实现了反射镜从精磨阶段到抛光阶段的全口径波前检测,从而证明了该方法对实现非球面镜全口径检测有效可行.     

非球面非零位拼接测量的对准误差模型

为消除非零位拼接检测非球面中对准误差对拼接结果的影响,建立了基于对准误差修正的优化拼接模型;在非零位检测非球面对准误差模型的基础上,分析对准误差各误差分量的表现形式及影响规律,并建立了基于对准误差补偿的拼接检测非球面的数学模型,实现子孔径的高精度拼接合成。实验表明,该方法可以有效地提高拼接测量精度,经过对准误差校正的拼接测量结果的PV值精度可达0.03λ。     

高精度近红外光斑位置检测模型研究

为了提高1550 nm近红外波段光斑位置的检测精度,提出了一种改进的积分无穷解算模型。以高斯光斑为入射光模型,深入分析了InGaAs四象限探测器（Quadrant Detector, QD）输出信号与光斑实际位置之间的关系,考虑探测器直径及沟道的影响,通过引入误差补偿因子,利用最小二乘拟合的方法得到有效光斑半径,从而获得新解算模型的解析表达式,最后在搭建的InGaAs QD光斑位置检测系统上对提出模型进行实验验证。仿真和实验结果表明:新模型可有效降低不同半径光斑下的位置检测误差;入射光总能量约为10 W,光斑半径0.75 mm时,在[-0.75～0.75 mm]检测范围内,新模型均方根误差为0.003 mm,最大误差为0.009 mm,较原有模型分别降低了78.6%和52.6%。新模型在激光通信和激光雷达等工程实际中具有较好的应用前景。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.