沉积气压对氮化钒(VN)涂层微结构及其性能的影响*

为研究沉积气压对VN涂层力学性能和摩擦性能的影响,采用离子镀制备VN涂层,利用X射线衍射仪、扫描电子显微镜等设备检测VN涂层的物相结构、表面形貌,采用划痕仪测试基体与涂层的膜基结合力,采用摩擦磨损试验机测试涂层的摩擦因数。结果表明:随着沉积氮气气压的升高,VN衍射峰强度逐渐增强,具有(200)晶面择优取向,表面平整度高;随着沉积氮气气压变化,涂层显微硬度和膜基结合力呈抛物线变化趋势,在氮气气压为1.0 Pa时,涂层硬度最高为HV2284,结合力最大为45 N,并具有稳定的摩擦因数,平均摩擦因数为0.85。通过调控沉积气压,多弧离子镀技术可以制备出性能更优越的VN涂层。     

含无机类富勒烯(IF)过渡族金属硫化物纳米复合涂层的环境摩擦磨损特性

采用固-气相反应、反应沉淀和溶剂热诱导法实现了IF-MoS2、IF-WS2纳米粉体的宏观量制备.分别用化学共沉积方法在硬铝基体上制备Ni-P-(IF-WS2)复合镀层,磁控溅射和激光溅射技术在硬铝合金和钛合金基体上制各(Ni,Mo)/IF-(Mo,W)S2梯度纳米复合涂层和IF-(Mo,W)S2/(Ni,Mo)-IF-(Mo,W)S2多层纳米复合涂层.用划痕仪、球-盘式摩擦仪评估纳米涂层的结合力及其在真空(10-2 Pa)和大气中的摩擦磨损性能.Ni-P-(IF-MoS2)化学复合镀层的硬度、摩擦因数和磨损率明显低于Ni-P化学镀层.梯度和多层复合结构有利于涂层与合金基体结合力的提高.(Ni,Mo)/IF-(Mo,W)S2纳米梯度复合涂层和(Ni,Mo)-IF-(Mo,W)S2/IF-(Mo,W)S2纳米多层复合涂层在不同环境下都有低的摩擦因数和磨损率.含无机类富勒烯(IF-)WS2或MoS2的纳米复合涂层具有优良的环境稳定性.     

掺杂钨类金刚石膜的显微结构与性能

利用非平衡磁控溅射与离子源复合沉积技术,以高纯甲烷和氮气作反应气体,钨为溅射靶,在40Cr、Si(100)基片和不锈钢基体上分别制备了厚度约为2μm的掺杂钨类金刚石膜,并在类金刚石膜与基体间沉积了过渡层;应用X射线衍射、拉曼光谱、俄歇电子能谱等手段分析了掺杂钨类金刚石膜的显微结构和表面成分;应用球盘摩擦磨损试验机以及纳米硬度计等测试了膜的硬度、摩擦性能及结合强度。结果表明:所制备的膜表面均匀、致密、光滑,具有典型的类金刚石结构特征;掺杂的钨弥散分布在无定型的碳中,一部分形成W2C微晶相;当膜中钨原子分数约为20%时,膜的硬度最高,摩擦因数也相对较小,膜基结合力在70 N以上。     

W-C-S-Mo复合薄膜的制备及力学和摩擦学性能

利用磁控溅射与磁过滤阴极真空电弧（MS/FCVA）复合沉积法，在不同偏压下在单晶Si基体上制备W-C-S-Mo四元复合薄膜；分析沉积偏压对薄膜纳米硬度、弹性模量和膜基结合力等力学性能的影响；在潮湿大气、真空环境下研究偏压对薄膜摩擦学性能的影响。结果表明，薄膜硬度、弹性模量和附着力随着沉积负偏压的增大呈现先增大后减小的趋势，在偏压-100 V时薄膜力学性能最好；负偏压-100 V下制备的W-C-S-Mo四元复合薄膜样品在潮湿大气和真空环境下均具有较好的摩擦学性能，拉曼测试发现，W-C-S-Mo复合薄膜在潮湿大气环境中的润滑作用主要由DLC提供，而在真空环境中薄膜中的软质相MoS2晶粒起润滑作用。     

氮化硅陶瓷表面DLC膜的制备及摩擦性能研究

利用等离子体基离子注入与沉积技术,在氮化硅陶瓷片表面制备200～400nm的类金刚石碳膜。测试薄膜的厚度、表面形貌、结构、膜基结合力,利用球盘试验机考察DLC膜的摩擦性能。结果表明:沉积薄膜均匀光滑;薄膜的硬度和弹性模量与基体差异较小,膜基结合力强;DLC膜具有较低的摩擦因数,抗磨性能优异。     

不同溅射气压制备W/Si多层膜的实时应力研究

研究了不同溅射气压条件下磁控溅射制备W/Si多层膜过程中的应力变化,使用X射线衍射仪测量了多层膜的结构,使用实时应力测量装置研究W/Si多层膜沉积过程中的应力演变。结果表明,在溅射气压从0.05Pa增加到1.10Pa的过程中,薄膜沉积过程中产生的压应力不断减小并最终过渡为张应力,应力值在溅射气压为0.60Pa时最小,研究结果对减小膜层应力具有指导意义。     

TiSiN/AlCrN纳米多层涂层高温热稳定性及摩擦学特性研究

采用电弧离子镀技术于硬质合金基体上沉积TiSiN/AlCrN纳米多层涂层,利用扫描电子显微镜(Scanning electron microscope,SEM)、透射电子显微镜(Transmission electron microscope,TEM)、X射线衍射仪(X-ray diffraction,XRD)、能谱仪(Energy dispersive spectrometer,EDS)、纳米硬度计、划痕仪以及摩擦磨损试验机对TiSiN/AlCrN涂层的结构、高温热稳定性能和高温摩擦磨损性能进行研究。结果表明,TiSiN/AlCrN涂层呈现出纳米多层结构,由c-Cr(Al)N与c-Ti(Si)N相构成,涂层硬度为49.7 GPa±0.83 GPa,结合力达到83 N。经800℃和950℃真空退火后涂层微观结构变得更加致密,缺陷密度下降,而涂层硬度和结合力没有明显变化,TiSiN/AlCrN纳米多层涂层经950℃真空退火处理后未发生相变。摩擦磨损测试结果表明,随着温度由室温增加至400℃,涂层摩擦因数急剧升高,继续增加温度至600~800℃,涂层摩擦因数降低,然而涂层磨损率随着测试温度的升高先降低后增加。在室温摩擦磨损测试中TiSiN/AlCrN涂层磨损机制主要以磨粒磨损、塑性磨损为主,400℃时涂层处于二体摩擦转三体摩擦的过渡阶段,主要磨损机制为磨粒磨损和粘着磨损,600~800℃下涂层磨损机制主要为粘着磨损以及氧化磨损。     

Ti/TiN复合膜工艺优化及性能研究

利用正交试验和极差分析方法，分析了多弧离子镀Ti／TiN复合膜中工艺参数（弧电流、氮气分压、基体负偏压、钛过渡层厚度）对Ti／TiN复合膜的纳米硬度和膜与基体的结合力的影响及主次关系，并通过正交试验对工艺参数进行了优化。研究表明，氮气分压和弧电流是影响Ti／TiN复合膜纳米硬度的2个最主要因素，膜层与基体的结合力随着弧电流的增加而下降；升高基体负偏压，虽然可以提高Ti／TiN复合膜纳米硬度和膜与基体的结合力，但是高负偏压将急剧升高基体温度，可能导致基体退火；沉积一定厚度的钛过渡层可以显著提高TiN膜层与基体的结合力。     

硅基底上喷射电沉积铜/钴多层膜的结合力

在硅基底上利用喷射电沉积法制备铜/钴多层膜和单层纯铜膜,研究了多层膜的形貌、多层膜和单层铜膜与基体的结合力以及划痕方向对膜基结合力的影响。结果表明:对硅基底进行抛光处理可使膜基结合力减小,粗化处理可在一定程度上提高膜基结合力;多层膜与基底的结合力大于单层铜膜与基底的结合力;当划痕方向平行于工件运动方向时,膜层中的内应力变化不均匀,很容易造成应力累积而使得临界载荷减小,从而使得膜基结合力明显小于划痕方向垂直于工件运动方向时的膜基结合力。     

多弧离子镀制备多层TiAlCrN涂层的性能研究

利用多弧离子镀技术,采用TiAl和AlCr合金靶材在硬质合金基体上交替沉积制备TiAlCrN纳米多层涂层,同时采用TiAlCr合金靶制备了单层TiAlCrN涂层进行性能对比。借助扫描电子显微镜(SEM)、透射电镜(TEM)和X射线能谱分析法(EDS)分析了涂层的微观结构及成分,利用划痕法和纳米压痕法测试了涂层的结合力与纳米硬度,最后搭配硬质合金铣刀片测试了两种涂层在模具钢铣削上的性能表现。结果表明,TiAlCrN纳米多层涂层结构致密,多层层间界面清晰平整,涂层结合力优异,涂层硬度高达33.1GPa。在铣削合金钢方面,TiAlCrN纳米多层涂层的切削寿命较TiAlCrN单层涂层提升40%以上,铣削性能优异。     

Effect of deposition pressure on microstructure and tribological behavior of MoS<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>/MoS<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>-Mo nanoscale multi-layer films

MoS _x /MoS _x -Mo multi-layer films consisted of several bilayers and a surface layer on steel substrate were deposited by d.c. magnetron sputtering at different deposition pressures. Each bilayer contained a MoS _x layer with 80 nm in thickness and a MoS _x -Mo composite layer with 20 nm in thickness. With the increase of deposition pressure, the perpendicular orientation of the basal plane prevailed while the parallel orientation decreased. The tribological properties of the multi-layer films were investigated by using a ball-on-disk tribometer both in vacuum and in humid air. The multi-layer film deposited at 0.24 Pa had a compact, consistent layered structure with high intensity of (002) plane and low S content compared to the others deposited at 0.32 and 0.40 Pa, and showed the lowest friction coefficient and wear rate in humid air.     

Structural modification and tribological behavior improvement of solid lubricating WSe x coatings during pulsed laser deposition in buffer He-Gas

Thin film, solid lubricating WSe _x coatings were deposited at room temperature on a steel substrate with a titanium underlayer by pulsed laser deposition (PLD). Two modes of PLD were investigated, i.e., the PLD under vacuum conditions and the PLD in a buffer gas (helium) at a pressure of 2–10 Pa. Gas was used to slow down the laser-induced atomic flux and to modify thus the conditions of the coatings growth. At a pressure ～8 Pa, gas reduced the effectiveness of Se preferential sputtering by atomic flux, which resulted in the formation of coatings with a stoichiometric composition (x ≈ 2). The structure of the coatings was characterized by a greater degree of the perfect organization of atoms in the nanophase laminar packaging and reduced internal stresses. Studies by the ball-on-disk tests in humid air showed that the modification of the structure and the chemical composition of the coatings had a significant effect on their tribological behavior. Vacuum-deposited coatings fractured relatively quickly due to the cracking and delamination from the substrate surface along the sliding track. When the coatings deposited in helium were tested, wear by layer-by-layer removal was dominant, so the adhesive fracture was only observed in the local parts of the track. The simulation of the laser vapor deposition in the vacuum and in the buffer gas was performed. Likely factors that improve the tribological properties of the coating during deposition in the buffer gas were disclosed.     

大气环境下Au/TiN复合薄膜的滑动摩擦磨损性能

以30CrMnSi钢为基体,用磁控溅射法制备出Au/TiN复合薄膜材料,研究了薄膜在大气环境中的滑动摩擦磨损性能。结果表明:该复合薄膜材料与9Cr18钢球构成的滑动摩擦副,在接触压力不大于1.0GPa条件下,摩擦系数小于0.15,摩擦次数超过3×105;在较宽的温度、湿度和磁场范围内,薄膜的摩擦磨损性能保持稳定。当接触压力增大至3.0GPa时,薄膜的摩擦系数增大,耐磨寿命减小。该薄膜可用于大气环境下长寿命低载荷精密摩擦副的润滑。     

20CrNiMo钢表面磁控溅射制备TiN/ZrN多层薄膜的形貌及摩擦学性能

利用非对称双极脉冲磁控溅射技术在20CrNiMo钢表面制备了TiN/ZrN多层薄膜,利用扫描电子显微镜和原子力显微镜观察了薄膜的截面和表面形貌,用划痕仪测试了薄膜与基体的结合力,通过球-盘摩擦磨损试验机对薄膜的摩擦学性能进行了研究。结果表明:制备的TiN/ZrN多层薄膜厚度约为2.1μm,薄膜均匀且致密,表面粗糙度为13.63nm;薄膜与基体结合较牢固,临界载荷达到51.0N;薄膜具有优良的减摩性,摩擦因数为0.16,较基体20CrNiMo钢的0.33明显减小,使该钢的耐磨性能得到提高。     

Mechanical and tribological properties of amorphous carbon films

The mechanical and tribological properties of amorphous carbon films have been studied in more detail in recent years because these films (a) can be deposited near room temperature, thus allowing film deposition on common engineering alloys (i.e., aluminum and steel) without altering their mechanical properties, and (b) are smooth and conform to surface roughness of the substrate, thus requiring no post deposition processing. In addition, amorphous carbon films exhibit low unlubricated sliding friction in contact with steel and ceramics which is comparable to that of steel against steel in a lubricated contact. The wear resistance of these films is also better than Ti‐based hard coatings. Further improvement in film tribological properties can be achieved by modifying film chemical composition. Because of these attractive features, amorphous carbon films have been evaluated in several applications including automotive, electronic and biomedical engineering. However, environmental factors such as oxygen and humidity have been found to influence tribological properties significantly. This paper reviews the current understanding of the tribological properties of both hydrogenated and non‐hydrogenated amorphous carbon films, the mechanisms responsible for low friction coefficient and identifies areas that require further research. This revised version was published online in June 2006 with corrections to the Cover Date.     

Tribological studies of thin diamond-like films synthesized using high-speed plasma jet

In this paper, the tribological studies of diamond-like films under slip friction conditions are described. The films have been deposited from various materials (steel, aluminum, copper, and others). These films are deposited by the chemical vapor deposition method using a supersonic high-temperature plasma jet generated by a high-enthalpy plasmatron with a sectionalized interelectrode insert and a cold gas curtain for the walls of the discharge chamber. Tribological studies of the deposited films are performed using the friction simulator in the disc–ring system at rotational reverse motion. As a lubricant, 2% carboxymethylcellulose solution is used. Considerable differences in the tribological behavior depending on the substrate material, where the film has been deposited, are noted.     

Microstructure Evolution and Enhanced Tribological Properties of Cu-Doped WS2 Films

To improve the tribological properties of WS₂ film both in vacuum and in humid air conditions, its microstructure was optimized by doping different concentrations of Cu via radio frequency co-sputtering method. The film microstructure and composition were investigated by field emission scanning electron microscopy, energy-dispersive X-ray spectroscopy, X-ray photoelectron spectroscopy, Raman spectroscopy, grazing incidence X-ray diffraction and high-resolution transmission electron microscopy. It was verified that Cu was presented in amorphous phase in the WS₂ matrix and could also induce amorphization and densification of the composite films gradually. The film microstructure changed from coarse columnar platelet structure at low Cu content (0–5.8 at.%) to transition structure with two separate layers at increased Cu content (11.5–16.2 at.%) and to a featureless structure at high Cu content (above 24.4 at.%). The mechanical and tribological properties of films were evaluated using the scratch tester and ball-on-disk tribometer, respectively. It was found that the incorporation of a suitable content of Cu dopant could significantly improve the film toughness, but excess amount of Cu dopant lead to high brittleness. All the composite films exhibited much lower wear rate and longer wear life than those of pure WS₂ film both in vacuum and in humid air conditions. The wear mechanisms were proposed after correlating the mechanical performance with film microstructure.     

沉积温度对脉冲真空弧源沉积类金刚石薄膜性能的影响

利用脉冲真空弧源沉积技术在Cr17Ni14Cu4不锈钢和Si(100)基体上制备了类金刚石(DLC)薄膜,研究了基体沉积温度对DLC薄膜的性能和结构的影响。研究表明,随着沉积温度由100 ℃提高到400 ℃,DLC薄膜中sp3 键质量分数减少,sp2键质量分数增多,薄膜复合硬度逐渐降低。当DLC薄膜沉积温度达到400 ℃时,薄膜中C原子主要以sp2键形式存在,与沉积温度为100 ℃时制备的DLC薄膜相比,薄膜复合硬度降低50%。DLC薄膜具有优异的耐磨性,摩擦因数低,随着沉积温度由100 ℃提高到400 ℃,Cr17Ni14Cu4不锈钢表面沉积的DLC薄膜耐磨性降低。沉积温度为100 ℃时,Cr17Ni14Cu4不锈钢表面沉积的DLC薄膜后,耐磨性大幅度提高。DLC薄膜与不锈钢基体结合牢固。     

Nano/Microtribological Properties of Ultrathin Functionalized Imidazolium Wear-Resistant Ionic Liquid Films on Single Crystal Silicon

Ionic liquids (ILs) are considered as a new kind of lubricant for micro/nanoelectromechanical system (M/NEMS) due to their excellent thermal and electrical conductivity. However, so far, only few reports have investigated the tribological behavior of molecular thin films of various ILs. Evaluating the nanoscale tribological performance of ILs when applied as a few nanometers-thick film on a substrate is a critical step for their application in MEMS/NEMS devices. To this end, four kinds of ionic liquid carrying methyl, hydroxyl, nitrile, and carboxyl group were synthesized and these molecular thin films were prepared on single crystal silicon wafer by dip-coating method. Film thickness was determined by ellipsometric method. The chemical composition and morphology were characterized by the means of multi-technique X-ray photoelectron spectrometric analysis, and atomic force microscopic (AFM) analysis, respectively. The nano- and microtribological properties of the ionic liquid films were investigated. The morphologies of wear tracks of IL films were examined using a 3D non-contact interferometric microscope. The influence of temperature on friction and adhesion behavior at nanoscale, and the effect of sliding frequency and load on friction coefficient, load bearing capacity, and anti-wear durability at microscale were studied. Corresponding tribological mechanisms of IL films were investigated by AFM and ball-on-plane microtribotester. Friction reduction, adhesion resistance, and durability of IL films were dependent on their cation chemical structures, wettability, and ambient environment.