一种基于有序二元决策图和布尔函数性质计算网络可靠性的算法

有序二元决策图(OBDD)被广泛用到网络可靠度的计算中,在基于OBDD计算网络可靠度时,其计算时间主要取决于参与操作的OBDD的大小,而OBDD的大小严重依赖于OBDD的变量序。该文根据布尔函数的性质和OBDD原理提出一种优化计算网络可靠性的算法(BF-OBDD),提高计算网络可靠性的效率。实验结果表明改进的算法有较少的 OBDD节点数量,在计算网络可靠性时,花费的时间较少。     

二元判决图应用中的变量编序算法

本文对当今的二元判决图的变量编序算法进行了综述。在充分阐述静态变量编序算法和动态变量编序算法的原理和实现方法的基础上,对它们进行比较,得出了结论:随着二元判决图在计算机辅助设计的许多领域中的应用愈来愈复杂,动态变量编序算法是必不可少的。     

基于遗传算法的TBDD排序方法

带时间参数的二叉判决图（ＴＢＤＤ）在电路的时滞故障测试中有着重要的应用价值，但其变量排序是用常规方法无法解决的一个优化问题。本文提出一种基于遗传算法的ＴＢＤＤ排序算法。用快速衡量值和ＴＢＤＤ节点数来计算个体的适应度。针对变量排序的特定问题，提出一种模板保序交叉方法。采用知适应的变异概率计算方法，并提出一个适合于ＴＢＤＤ排序问题的变异算法。实验结果表明较好地解决了ＴＢＤＤ的排序问题。     

数字电路设计中的符号模型检验技术

符号模型检验把有序二叉判定图OBDD技术引入到模型检验中，有效地缓解了状态组合爆炸问题。文章主要介绍了CTL模型检验基本概念和原理，给出了符号模型检验算法，验证了模4计数器的某些特性。     

利用Hestenes SVD及其修正算法实现阵列超分辨处理

本文将Hestenes奇异值分解（SVD：SingularValueDecomposition）算法推广到复域，并提出一种可以直接获得有序排列奇异值的修正Hestenes算法，研究了它们分别在线性Systolic阵列处理和SIMD（SingleInstructionMultipleData）阵列处理中的实现原理．作为一个应用实例，我们讨论了通过SVD实现阵列信号超分辨的原理。计算机模拟实验证明了算法的正确性。     

二元判翊图应用中的变量编序算法

本文对当今的二元判决图的变量编序算法进行了综述。     

T′算法在域GF(2)上的性能研究

代数攻击算法XSL是域GF(2)上求解大规模的多元多项式方程组的有效算法,分析发现XSL中的T′算法不能达到其希望的结束条件Free=T或Free=T-1。给出T′算法的一个真实结束条件和2个变量选择原则,并在原T′算法的基础上增加概率算法和以较大概率估计变量取值。结果表明改进后的T′算法可以简化方程组求解。     

FFT或FHT的一种改进的整序算法

本文提出了一种适于基－２ＦＥＴ或ＦＨＴ的更为高效的整序算法，使以往算法的运算量，算法结构等性能都有明显改善，尤其当Ｎ较大时有很大优势，可以进一步提高ＦＥＴ和ＦＨＴ的运算效率。     

强噪音情况下的多种端点检测方法研究

在强噪音的情况下，语音信号的端点检测是一个难题。以前用过的传统算法在这时都失去作用，因此需要寻找端点检测的新方法。文中提出了一种基于LPC距离的端点检测算法，根据含噪语音每帧确定的模型和给定模型的距离来进行端点检测，可以解决强噪音情况下的端点检测问题。     

基于不变量的机器学习算法分析

随着机器学习算法在人工智能各领域的广泛应用,人们开始关注机器学习算法的质量分析.由于机器学习算法中缺少测试语言,对学习算法进行质量分析是很困难的,基于此,本文提出了基于不变量的机器学习算法分析方法,对5种机器学习算法进行不同参数下的不变量生成,得到不变量集合.通过动态筛选机制和函数调用图,对不变量集合进行筛选和提取,得到机器学习算法的关键变量.实验结果表明,当机器学习算法的质量随着参数的改变越来越好时,关键变量也呈现逐渐减小的趋势,从而可以对机器学习算法进行质量分析.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.