一种高精度CMOS带隙基准电压源设计

介绍了带隙基准电压源的基本原理,设计了一种高精度带隙基准电压源电路.该电路采用中芯国际半导体制造公司0.18 μm CMOS工艺.Hspice仿真表明,基准输出电压在温度为-10～120 ℃时,温度系数为6.3×10-6/℃,在电源电压为3.0～3.6 V内,电源抑制比为69 dB.该电压基准在相变存储器芯片电路中,用于运放偏置和读出/写驱动电路中所需的高精度电流源电路.     

一种用于AC/DC控制器中电压基准源的设计

提出了一种新颖的可用于AC/DC控制芯片中的基准电压源电路。此电路以PTAT（proportional to absolutetemperature）电流为偏置电流,利用二极管连接的MOS晶体管迁移率和阈值电压的温度系数可相互补偿的特性,产生与温度无关的栅源电压。该电路结构简单,既无启动电路也无运放,避免了运放失调对基准源的影响,设计采用CSMC0.5μm BCD工艺。仿真结果表明,该基准电压源具有较低的温度系数和高电源电压抑制比,可作为AC/DC控制芯片中迟滞比较器的参考源。     

一种无运放的高电源抑制比基准电压源设计

设计了一种基准电压源电路。在分析传统带隙基准结构的基础上,该电路不采用运放结构,避免了运放失调电压对基准源的影响,并加入内部正、负反馈回路,对基准绝对数值进行补偿。仿真结果表明,当温度在-40 ℃~140 ℃之间变化时,该电路输出电压的温度系数小于1.622×10-5 /℃,电源抑制比高达98 dB,符合设计要求。     

一种新型无运放CMOS带隙基准电路

介绍了带隙基准原理和常规的带隙基准电路,设计了一种新型无运放带隙基准电路。该电路利用MOS电流镜和负反馈箝位技术,避免了运放的使用,从而消除了运放带隙基准电路中运放的失调电压和电源抑制比等对基准源精度的影响。该新型电路比传统无运放带隙基准电路具有更高的精度和电源抑制比。基于0.18μm标准CMOS工艺,在Cadence Spectre环境下仿真。采用2.5V电源电压,在-40℃～125℃温度范围的温度系数为6.73×10-6/℃,电源抑制比为54.8dB,功耗仅有0.25mW。     

一种新型CMOS带隙基准电压源

传统带隙基准源电路采用PNP型三极管来产生ΔVbe,此结构使运放输入失调电压直接影响输出电压的精度。文章在对传统CMOS带隙电压基准源电路原理的分析基础上,提出了一种综合了一阶温度补偿和双极型带隙基准电路结构优点的高性能带隙基准电压源。采用NPN型三极管产生ΔVbe,消除了运放失调电压影响。该电路结构简洁,电源抑制比高。整个电路采用SMIC 0.18μmCMOS工艺实现。通过Cadence模拟软件进行仿真,带隙基准的输出电压为1.24V,在-40℃~120℃温度范围内其温度系数为30×10-6/℃,电源抑制比(PSRR)为-88 dB,电压拉偏特性为31.2×10-6/V。     

一种低功耗无运放的带隙基准电压源设计

设计了一种新型无运放带隙基准源。该电路使用负反馈的方法,避免了运放的使用,从而消除了运放带隙基准电路中运放的失调电压对基准源精度的影响,同时还提升了电源抑制比,且降低了功耗。该新型电路比传统无运放带隙基准电路具有更高的精度和电源抑制比。该设计基于SMIC 0.35μm标准CMOS工艺在Candence Specture环境下进行仿真,电源电压采用3.3 V,温度范围为-55~125℃,电源抑制比为82 d B,功耗仅有0.06 m W。     

一种高电源抑制比曲率补偿带隙基准电压源

在对传统典型CMOS带隙电压基准源电路分析基础上提出了一种高精度、高电源抑制带隙电压基准源。采用二阶曲率补偿技术,电路采用预电压调整电路,为基准电路提供稳定的电源,提高了电源抑制比,在提高精度的同时兼顾了电源抑制比,整个电路采用了CSMC0.5μm标准CMOS工艺实现,采用spectre进行进行仿真,仿真结果显示当温度为-40℃~80℃,输出基准电压变化小于1mV,温度系数为3.29×10-6℃,低频时(1kHz)的电源抑制比达到75dB,基准电路在高于3.3V电源电压下可以稳定工作,具有较好的性能。     

一种采用斩波技术的CMOS带隙基准电压源

设计了一种较高PSRR和较低温度系数的带隙基准电压源.运用斩波调制技术和动态元件匹配技术,有效减小了运放失调电压引起的温度漂移.基于CSMC 0.5 μm CMOS工艺,使用Hspice工具对电路进行仿真.斩波频率为1.5 MHz时,基准输出电压约为1.235 V.在室温25℃时,该带隙基准电源电压范围为3.3 V到5.5 V.电源电压为3.3 V时,在-40℃～85℃温度范围内,温度系数为5.19×10-6,测得PSRR大于70 dB@1 kHz.     

两种新型CMOS带隙基准电路

文章介绍了两种CMOS带隙基准电路.它们在传统带隙基准电路的基础上,采用了低压共源共栅电流镜提供偏置电流,降低了功耗,减小了沟道长度调制效应带来的误差并使电路可以工作在较低的电源电压下;采用运放的输出作为共源共栅电流镜的偏置电压,使基准电压不受电源电压变化的影响.其中一种电路,还通过两个串联二极管的原理提高△VBE,从而减小了运放失调的影响.仿真结果表明,在工艺偏差、电源电压变化±10%以及温度在-20至125℃范围内变化的情况下,两种CMOS带隙基准的输出电压分别是1.228+0.003V和1.215±0.003V,温度系数仅为33.7ppm/℃和34.1ppm/℃;在电源电压分别大于2V和2.8V时,电源电压的变化对这两种基准的输出电压几乎没有影响;在33v电源电压下两个电路的功耗分别小于0.1mW和0.34mW.     

一种用于A/D转换器的低电压CMOS带隙电压基准源

设计了一种在1V电压下正常工作的用于A/D转换器的低功耗高精度的CMOS带隙电压基准.电路主要包括了一个带隙基准和一个运放电路,而且软启动电路不消耗静态电流.电路采用0.18μm CMOS工艺设计.仿真结果显示,温度从-40~125°C,温度系数约为1.93ppm/°C,同时电源抑制比在10kHz时为38.18dB.电源电压从0.9V到3.4V变化时,输出电压波动保持在0.17%以内;电路消耗总电流为5.18μA.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.