铽镓石榴石晶体多晶合成与单晶生长研究

以(99.99%)Ga2O3和Tb4O7为原料,按照化学计量比并适当富镓配料,采用固相反应法(分段升温工艺)合成高纯、单相的铽镓石榴石(Tb3Ga5O12,简称TGG)多晶料。使用提拉法(CZ)成功生长出44mm×70mm,外观完整无开裂、无螺旋的TGG晶体。经X线衍射分析、密度测试、晶体成分测试表明,生长的晶体结构完整,结晶性好;晶体的密度为7.14g/cm3,与理论值接近;晶体中Tb与Ga摩尔比为66%,可能存在少量Ga空位。     

大尺寸LGT、LGN晶体生长及性能研究

报道了La_3Ga_(5.5)Ta_(0.5)O_(14)(LGT)和La_3Ga_(5.5)Nb_(0.5)O_(14)(LGN)压电晶体的生长及其性能研究。采用提拉法成功生长了?80mm×90mm的晶体。采用LCR电桥、谐振-反谐振法测量了晶体的相对介电常数和压电应变常数,并测试了电阻率随温度的变化。测试结果表明晶体存在良好的压电性能,在高温传感器领域具有巨大的应用价值。     

大尺寸LGT、LGN晶体生长及性能研究

报道了La3Ga5.5Ta0.5O14(LGT)和La3Ga5.5Nb0.5O14(LGN)压电晶体的生长及其性能研究。采用提拉法成功生长了80 mm×90 mm的晶体。采用LCR电桥、谐振 反谐振法测量了晶体的相对介电常数和压电应变常数,并测试了电阻率随温度的变化。测试结果表明晶体存在良好的压电性能,在高温传感器领域具有巨大的应用价值。     

铌酸镓镧压电晶体生长及性能研究

该文报道了La3Ga5.5Nb0.5O14压电晶体的生长及其压电性能。采用提拉法成功生长了55 mm×150mm的晶体,晶体透明、无包裹体。采用LCR电桥、谐振-反谐振法测量了晶体的相对介电常数和压电应变常数,并研究了头尾之间性能差异性。测试结果表明头尾之间的差异性在3%以内,表明晶体存在良好的性能均匀性。     

大尺寸TGG晶体生长与性能研究

铽镓石榴石(Tb_3Ga_5O_(12),TGG)晶体具有大的Verdet常数、低的透射损耗、高的热导率及高的激光损伤阈值,是制作高功率全固态激光器中法拉第隔离器的最佳磁光材料。采用自主研发的JGD-800型上称重自动提拉炉,成功生长出φ53mm×80mm,外观完整,无开裂、无螺旋的TGG晶体。加工了用于高功率隔离器、尺寸为φ40mm×30mm的TGG样品,通过可见及近红外分光光度计测试,晶体透过率约为80.6%;测试晶体的室温热导率为4.566 W/(m·K),其热导率随温度升高而下降。热膨胀测试结果表明,在26.5~200℃时,热膨胀系数为-2.682 0×10-6 K~(-1);在200~500℃时,热膨胀系数为15.090 4×10~(-6) K~(-1)。通过正交消光法测试1 064nm波长晶体的Verdet常数为39.9rad/(mT);经ZYGO干涉仪测试晶体的光学均匀性为4.3×10~(-6),透射波前为λ/5(波长λ=632.8nm);采用波长1 064nm,10Hz、9ns激光测试晶体的激光损伤阈值为3.5GW/cm~2。结果表明,本实验方法生长的大尺寸TGG晶体质量较好,在高功率全固态激光器领域中具有广泛的应用前景。     

La3Ga5.5Ta0. 5O14晶体的生长及性能研究

采用提拉法生长出了直径为φ54 mm的La3Ga5.5Ta0.5O14晶体,晶体透明,无气泡,无包裹体,无条纹.同时对晶体的压电常数、介电常数、透光光谱及其声表面波器件性能进行了测试,并绘制了晶体的极图.实验结果表明La3Ga5.5Ta0.5O14晶体具有优异的压电性能.     

Pb(Mg_(1/3)Nb_(2/3))O_3弛豫铁电晶体的生长形貌和生长机理

以PbO作助熔剂采用高温溶液法生长出Pb(Mg1/3Nb2/3)O3弛豫铁电晶体,利用X线衍射仪(XRD)和扫描电子显微镜(SEM)分析了晶体相结构和生长形貌。研究结果表明,采用高温溶液法生长出纯钙钛矿相结构的Pb(Mg1/3Nb2/3)O3弛豫铁电晶体,晶体多为淡黄色,较小的呈赝立方形态,较大晶体逐渐趋于不规则形态,最大尺寸达4mm×4mm×3mm。晶体中存在位错蚀坑和PbO包裹等生长缺陷,生长过程中的温度波动和成分起伏等因素导致这些缺陷的出现。晶体{100}面生长速率最慢能成为热力学上稳定存在的自然显露晶面,晶体的生长机制为二维成核层状生长。     

硅基镓浓度对GaN晶体膜质量的影响

采用射频磁控溅射工艺在扩镓硅基上溅射Ga2O3薄膜，再氮化反应组装GaN晶体膜，并对其生长条件进行了研究。用傅里叶红外谱仪(FTIR)、X射线衍射(XRD)、扫描电镜(SEM)、选区电子衍射(SAED)和光致发光(PL)谱对样品进行结构、形貌和发光特性的分析。测试结果表明，采用此方法可得到六方纤锌矿结构的GaN晶体膜。镓浓度在影响膜层质量方面起着不可忽视的作用，随着扩镓浓度的增加，薄膜的晶化程度和发光特性明显提高。     

La3Ga5SiO14晶体生长研究

报道了用直接法生长新型压电材料La3Ga5SiO14晶体的研究结果。采用化学计量比La3Ga5SiO14多晶料,铂丝引出晶种,中频感应加热生长晶体。对晶体生长的温场及其相应的拉速和转速进行了研究,生长出 50mm×140mm的La3Ga5SiO14晶体,并测试了部分压电性能。     

优质大尺寸金绿宝石(Cr3+:BeAl2O4)可调谐激光晶体的生长

应用改进工艺的提拉(CZ)法技术,采用合适的化学组分配比和二次化料过程,选用约60℃的固液界面温度梯度与1mm/h生长速度等工艺参量,成功地生长出了Cr3 离子掺杂、无气泡、无云层和核心、长度与厚度约110×25mm的紫翠色Cr3 :BeAl2O4晶体。测定了晶体的吸收光谱,根据获得的吸收光谱与晶体分裂场理论,计算了Cr3 的八面体晶格场参数Dq=1764cm-1以及Racah参数B=608cm-1。晶体样品加工成6(60、80)mm的激光棒,并实现了激光的输出。     

Morphology and crystalline property of an AIN single crystal grown on AIN seed

AIN single crystal grown by physical vapor transport (PVT) using homogeneous seed is considered as the most promising approach to obtain high-quality AIN boule.In this work,the morphology of AIN single crystals grown under different modes (3D islands and single spiral center) were investigated.It is proved that,within an optimized thermal distribution chamber system,the surface temperature of AIN seed plays an important role in crystal growth,revealing a direct relationship between growth mode and growth condition.Notably,a high-quality AIN crystal,with (002) and (102) reflection peaks of 65 and 36 arcsec at full width at half maximum (FWHM),was obtained grown under a single spiral center mode.And on which,a high-quality AlxGa1-xN epitaxial layer with high Al content (x =0.54) was also obtained.The FWHMs of (002) and (102) reflection of AlxGa1-xN were 202 and 496 arcsec,respectively,which shows superiority over their counterpart grown on SiC or a sapphire substrate.     

过渡层对Ge衬底GaAs外延层晶体质量的影响

利用低压金属有机化学汽相淀积(MOCVD)设备在Ge衬底上生长GaAs外延层.通过改变GaAs过渡层的生长温度对GaAs外延层进行了表征,利用扫描电镜(SEM)和X射线衍射仪研究了表面形貌和晶体质量,优化出满足高效太阳能电池要求的高质量GaAs单晶层生长条件.     

成核层形貌对AlGaN/GaN异质结晶体质量，表面形貌以及电学特性的影响

Nucleation layer formation is a key factor for high quality gallium nitride（GaN）growth on a sapphire substrate.We found that the growth rate substantially affected the nucleation layer morphology,thereby having a great impact on the crystal quality,surface morphology and electrical properties of AlGaN/GaN heterostructures on sapphire substrates.A nucleation layer with a low growth rate of 2.5 nm/min is larger and has better coalescence than one grown at a high growth rate of 5 nm/min.AlGaN/GaN heterostructures on a nucleation layer with low growth rate have better crystal quality,surface morphology and electrical properties.     

Effect of nucleation layer morphology on crystal quality, surface morphology and electrical properties of AlGaN/GaN heterostructures

Nucleation layer formation is a key factor for high quality gallium nitride (GaN) growth on a sapphire substrate. We found that the growth rate substantially affected the nucleation layer morphology, thereby having a great impact on the crystal quality, surface morphology and electrical properties of AIGaN/GaN heterostructures on sapphire substrates. A nucleation layer with a low growth rate of 2.5 nm/min is larger and has better coalescence than one grown at a high growth rate of 5 nm/min. AIGaN/GaN heterostructures on a nucleation layer with low growth rate have better crystal quality, surface morphology and electrical properties.     

有机非线性光学晶体DAST籽晶表面研究

采用籽晶法可获得大尺寸、高质量的4-N,N-二甲胺基-4’-N’-甲基-氮杂芪的对甲苯磺酸盐(DAST)晶体,而DAST籽晶的表面质量直接影响晶体质量。采用自制DAST源粉,通过溶液降温法自发成核生长DAST籽晶,并对其表面进行了研究。采用红外光谱对DAST源粉进行测试发现,DAST晶体有一定的吸水性。微分干涉显微镜及原子力显微镜(AFM)检测DAST籽晶表面形貌,结果表明,DAST籽晶表面存在凹坑、生长台阶等缺陷。     

The Effect of AlN Nucleation Temperature on the Growth of AlN Films via Metalorganic Chemical Vapor Deposition

AlN epilayers were grown directly on sapphire (0001) substrates using a combined growth scheme, consisting of a low-temperature nucleation layer and a second layer grown by high-temperature pulsed atomic layer epitaxy via metalorganic chemical vapor deposition. With an emphasis on the nucleation layer, its growth temperature was varied from 470°C to 870°C, and obvious differences in the surface morphology, crystal quality, and strain states of the overall AlN epilayers were observed. Based on atomic force microscopy, x-ray diffraction, and Raman spectroscopy results, these differences are ascribed to the nucleation sites and the subsequent grain size. Due to the enhanced mobility of Al adatoms with increasing temperature, the nucleation sites decrease and the subsequent grain size increases, leading to the achievement of atomically flat AlN epilayers with good crystal quality for the nucleation layer grown at 570°C. However, at higher nucleation layer growth temperature, the properties of the AlN epilayers deteriorate due to the possible appearance of misaligned AlN grains. A model is also developed according to all observations.     

Effects of Si-doping on structural and electrical characteristics of polar,semi-polar,and non-polar AlGaN epi-layers

The effects of Si-doping on the structural and electrical properties of the wurtzite AlGaN epi-layers grown on polar, semi-polar, and non-polar sapphire substrates by metal organic chemical vapor deposition (MOCVD) were studied with X-ray diffraction, scanning electron microscopy, and hall effect measurement. The characterization results showed that both the surface morphology and the crystal quality of the polar AlGaN samples grown on a-plane sapphire substrates was improved with increasing Si concentration due to the Si-induced increase in dislocation movement. It was also found that the folds on the surfaces of the semi-polar and non-polar AlGaN samples grown on m- and r-plane sapphire substrates, respectively were significantly reduced in consequence of the growth suppression along c direction by Si-doping. Moreover, owing to the enhanced crystal quality, an increase in both the mobility and the carrier density for the polar AlGaN samples grown on a-plane sapphire substrates was achieved as the Si-doping level was increased. In addition, a relatively high electron concentration was obtained from the undoped semi-polar AlGaN samples grown on m-plane sapphire substrate, which is helpful to fabricate high quality semi-polar AlGaN-based ultra-violet light emitting diodes (UV-LEDs).     

厚度对Si衬底上生长的ZnO薄膜性能的影响

采用金属有机化学气相沉积方法,在Si(100)衬底上生长出具有高度C轴择优取向的ZnO薄膜.通过X射线衍射、原子力显微镜和室温光致发光谱研究了厚度对ZnO薄膜的结构、表面和光学性能的影响.X射线衍射图显示ZnO薄膜只有单一的(0002)峰,具有高度择优取向.AFM和PL测试表明,在取样薄膜厚度范围内,薄膜的表面质量和发光性能没有随着薄膜厚度的增加而提高.这是因为薄膜在厚度增加的生长过程中,生长模型变化且晶粒增大.     

Effect of shroud flow on high quality InxGa1−xN deposition in a production scale multi-wafer-rotating-disc reactor

High quality InGaN thin films and InGaN/GaN double heterojunction (DH) structures have been epitaxially grown on c-sapphire substrates by MOCVD in a production scale multi-wafer-rotating-disc reactor between 770 to 840°C. We observed that shroud flow (majority carrier gas in the reaction chamber) is the key to obtaining high quality InGaN thin films. High purity H₂ as the shroud flow results in poor crystal quality and surface morphology but strong photolumines-cence (PL) at room temperature. However, pure N₂ as the shroud flow results in high crystal quality InGaN with an x-ray full width at half maximum (FWHM)_InGaN(0002) of 7.5 min and a strong room temperature PL peaking at 400 nm. In addition, InGaN/GaN single heterojunction (SH) and DH structures both have excellent surface morphology and sharp interfaces. The full width at half maximum of PL at 300K from an InGaN/GaN DH structure is about 100 meV which is the best reported to date. A high indium mole fraction in InGaN of 60% and high quality zinc doped InGaN depositions were also achieved.     

SnO2纳米棒阵列的制备及光学、场发射性能研究

采用简单的一步水热法直接在不锈钢基底上制备了不同形貌的SnO2纳米棒阵列。利用X射线衍射（XRD）,扫描电镜（SEM）、透射电镜（TEM）、 分光光度计、场发射装置对材料的结构、形貌、光致发光谱和场发射特性进行了表征。XRD结果表明不锈钢基底上制备的样品为四方晶系金红石结构。SEM和TEM结果表明不同的反应条件下都能够在基底上大面积的垂直生长单晶SnO2纳米棒阵列,但是形貌和尺寸发生了改变（A:针尖状,B:铅笔状）。室温下的光致发光光谱（PL）表明两种样品在367、392、419 nm处分别存在较强的发射峰,并且紫外光峰强与可见光峰强比值较大,说明样品的结晶质量较好。场发射测试结果表明:两种样品的场发射都是通过电子隧道效应进行的,且样品A的场发射性能优于样品B。