1V电源非线性补偿的高温度稳定性电压带隙基准源

阐述了电源电压为1V的非线性补偿CMOS电压带隙基准源,该基准源具有很高的温度稳定性.基准源电路中运用了rail-to-rail运算放大器(OPA).根据测试结果,室温下的输出电压为351.9mV,当温度在15～100℃变化时,输出电压在351.5～352.0mV之间变化,温度系数约为16.7ppm/℃.电路的功耗为0.16mW,芯片面积是0.18mm2.     

一种1.5 V 8.3×10-6/℃数字控制型CMOS带隙基准电压源

提出了一种新颖的带有数字控制的带隙基准电压源,此带隙基准电压源通过控制PNP晶体管的导通来实现可调的输出参考电压和可调的温度系数.此电路通过数字信号控制获得了一组不同的温度曲线,从这组温度曲线中,可以得到精确的输出参考电压和非常好的温度特性曲线.数字控制型带隙基准电压源的输出电压误差可以控制在±4 mV以内,最好的温度系数可以达到8.3×10-6/℃(温度从-40～80℃变化时),在电源电压从1.5～3.3 V变化时输出参考电压仅变化1 mV.所设计的带隙基准电压源,采用SMIC 0.18 μm CMOS工艺流片实现,面积为0.09 mm2.     

一种无电阻高电源抑制比的CMOS带隙基准源

提出一种输出低于1V的、无电阻高电源抑制比的CMOS带隙基准源(BGR).该电路适用于片上电源转换器.用HJTC0.18μm CMOS工艺设计并流片实现了该带隙基准源,芯片面积(不包括pad和静电保护电路)为0.031mm2.测试结果表明,采用前调制器结构,带隙基准源电路的输出在100Hz与lkHz处分别获得了-70与-62dB的高电源抑制比.电路输出一个0.5582V的稳定参考电压,当温度在0～85℃范围内变化时,输出电压的变化仅为1.5mV.电源电压VDD在2.4～4V范围内变化时,带隙基准输出电压的变化不超过2mV.     

一种无电阻高电源抑制比的CMOS带隙基准源

提出一种输出低于1V的、无电阻高电源抑制比的CMOS带隙基准源(BGR).该电路适用于片上电源转换器.用HJTC0.18μm CMOS工艺设计并流片实现了该带隙基准源,芯片面积(不包括pad和静电保护电路)为0.031mm2.测试结果表明,采用前调制器结构,带隙基准源电路的输出在100Hz与lkHz处分别获得了-70与-62dB的高电源抑制比.电路输出一个0.5582V的稳定参考电压,当温度在0～85℃范围内变化时,输出电压的变化仅为1.5mV.电源电压VDD在2.4～4V范围内变化时,带隙基准输出电压的变化不超过2mV.     

基于LED驱动芯片的低温漂CMOS基准电压源

设计了一种低温漂CMOS基准电压源,应用于LED驱动芯片中.采用基本的带隙基准电压源原理,并对结构进行了改进,减小了失调电压对输出的影响,同时可以提供多路输出,满足LED驱动芯片中多个基准电压的需求.基于CSMC 0.5μm CMOS工艺对所设计电路进行了模拟仿真.常温(25℃)下,电源电压为4V时电路具有稳定的三路输出:200mV、600mV和1V,温度在-45～85℃变化时,温度系数为16.9ppm/℃,PSRR大于-70dB@1kHz.     

一种采用斩波调制的高精度带隙基准源的设计

为了抑制运算放大器的输入失调电压对带隙基准源的影响,提高输出电压的精度,基于斩波调制技术,设计了一种高精度带隙基准源电路.通过0.25 μm BiCMOS工艺模型仿真验证,结果表明,运算放大器的差分输入对管的失配为±2％时,该基准源的输出电压波动峰峰值为0.38 mV,与传统带隙基准源相比,相对精度提高了113倍.当电源电压在2.5～6.0V内,基准电压源的波动小于0.085 mV,温度为-40～125℃时,电路的温度系数为19ppm/℃.     

一种新型的无电阻实现的带隙电压基准源

设计了一种新的采用0.35μm全数字工艺实现的无电阻的带隙基准电压源.该电路结构引入了差分放大器,以此来产生正比于温度的电压量,同时放大器减小了电路中由电源电压及温度变化所产生的镜像电流的误差,进一步提高了电路电源抑制比,降低了无电阻基准电压源的温度系数.Spice仿真结果表明,该电路结构具有较高的电源抑制比和低的温度系数:在电源电压从2.4V变化到5.0V时,输出电压波动小于9mV;在-25℃~125℃温度变化范围内,电压输出的最大变化量为±5.5mV.     

一种CMOS工艺低电压带隙基准源

基于0.18μm CMOS工艺,设计了一种低电源电压的带隙基准源.该带隙基准源电路采用非线性温度补偿,具有很高的温度稳定性.Hspice仿真结果显示,电源电压最低为1.2V时,在-40～135℃的温度范围内,输出电压在556.03～556.26mV之间变化,平均温度系数约仅为2.36ppm/℃,电源电压抑制比可达到90dB.     

一种可编程电压基准源设计与实现

提出了一种新的基于改进的电流模式带隙基准源的可编程基准源的设计与实现方法.电路采用Chartered 0.35μm 工艺仿真并流片.测试结果表明,温度变化范围为0～100℃,温度系数为±36.3ppm/℃(VID=11110).电源电压变化范围为2.7～5V,其相对变化值为5mV.当VID0频率为125kHz时,瞬态响应最大毛刺幅度约为20mV.5位VID码不同的输入状态,输出基准电压从1.1变到1.85V,变化步长为25mV.     

一种可编程电压基准源设计与实现

提出了一种新的基于改进的电流模式带隙基准源的可编程基准源的设计与实现方法.电路采用Chartered 0.35μm 工艺仿真并流片.测试结果表明,温度变化范围为0～100℃,温度系数为±36.3ppm/℃(VID=11110).电源电压变化范围为2.7～5V,其相对变化值为5mV.当VID0频率为125kHz时,瞬态响应最大毛刺幅度约为20mV.5位VID码不同的输入状态,输出基准电压从1.1变到1.85V,变化步长为25mV.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.     

GaAsSb/InAlAs PA DHBTs Grown by Production MBE

The epi material growth of GaAsSb based DHBTs with InAlAs emitters are investigated using a 4 × 100mm multi-wafer production Riber 49 MBE reactor fully equipped with real-time in-situ sensors including an absorption band edge spectroscope and an optical-based flux monitor. The state-of-the-art hole mobilities are obtained from 100nm thick carbon-doped GaAsSb. A Sb composition variation of less than ± 0.1 atomic percent across a 4 × 100mm platen configuration has been achieved. The large area InAlAs/GaAsSb/InP DHBT device demonstrates excellent DC characteristics,such as BVCEO＞6V and a DC current gain of 45 at 1kA/cm2 for an emitter size of 50μm × 50μm. The devices have a 40nm thick GaAsSb base with p-doping of 4. 5 × 1019cm-3 . Devices with an emitter size of 4μm × 30μm have a current gain variation less than 2% across the fully processed 100mm wafer. ft and fmax are over 50GHz,with a power efficiency of 50% ,which are comparable to standard power GaAs HBT results. These results demonstrate the potential application of GaAsSb/InP DHBT for power amplifiers and the feasibility of multi-wafer MBE for mass production of GaAsSb-based HBTs.     

Technology innovation and process integrations for sub-100nm gate patterning

This paper presents a brief overview of the Applied Centura(R)DPS(R)system,configured with silicon etch DPS Ⅱ chamber, with emphasis on discussing tuning capability for CD uniformity control. It also presents the studies of etch process chemistry and film integration impact for an overall successful gate patterning development. Discussions will focus on resolutions to key issues, such as CD uniformity, line-edge roughness, and multilayer film etching integration.     

White organic light-emitting devices based on fac tris（2- phenylpyridine） iridium sensitized 5,6,11,12-tetraphenylnap -hthacene

We have fabricated the white organic light-emitting devices （WOLEDs） based on 4,4＇ -bis（2,2 -diphenyl vinyl）-1,1＇ - biphenyl （DPVBi） and phosphorescence sensitized 5,6,11,12,-tetraphenylnaphthacene （rubrene）. The device structure is ITO/2T-NATA （20 nm）/NPBX （20 nm）/CBP： x%Ir（ppy）3：0.5% rubrene （8 nm）/NPBX （5 nm）/DPVBi （30 nm）/Alq（30 nm）/LiF（0.5 nm）/A1. In the devices, DPVBi acts as a blue light-emitting layer, the rubrene is sensitized by a phosphorescent material, fac tris （2-phenylpyridine） iridium [Ir（ppy）3], acts as a yellow light-emitting layer, and N,N＇ -bis- （1-naphthyl）- N,N＇ -diphenyl -1, 1＇ -biphenyl-4,4＇ -diamine （NPBX） acts as a hole transporting and exciton blocker layer, respectively. When the concentration of Ir （PPY）3 is 6wt%, the maximum luminance is 24960 cd/m^2 at an applied voltage of 15 V, and the maximum luminous efficiency is 5.17 cd/A at an applied voltage of 8 V.     

Complete approach to automatic identification and subpixel center location for ellipse feature

To meet the need of automatic image features extraction with high precision in visual inspection, a complete approach to automatic identification and sub-pixel center location for similar-ellipse feature is proposed. In the method, the feature area is identified automatically based on the edge attribute, and the sub-pixel center location is accomplished with the leastsquare algorithm. It shows that the method is valid, practical, and has high precision by experiment. Meanwhile this method can meet the need of instrumentation of visual inspection because of easy realization and without man-machine interaction.     

小角度扩展相关性近似算法分析

本论文提出一种在多天线MIMO信道相关性建模中小角度扩展近似理论算法,并应用于分析MIMO系统性能。分析中分别对三种不同角能量分布情况下的空间相关性研发快速近似计算法,并同时提出双模(Bi-Modal)角能量分布情况下的近似运算。通过分析这些新方法的近似效率,可以得到计算简单、复杂度低、而且符合实际的MIMO相关信道矩阵,对系统级的快速高效计算法的研究和系统级的评估以及误差分析具有重要的意义。     

Noise character analysis and the restraint of self-pulsation laser diodes

We calculate the Langevin noise sources of self-pulsation laser diodes, analyze the effects of active region noise and saturable-absorption region noise on the power fluctuation as well as period fluctuation, and propose a novel method to restrain the noise effects. A visible SIMULINK model is established to simulate the system, The results indicate that the effects of noise in absorption region can be ignored; that with the increase of DC injecting current, the noise effects enhance power jitter, and nevertheless, the period jitter is decreased; and that with external sinusoidal current modulating the self-pulsation laser diode, the noise-induced power jitter and period jitter can be suppressed greatly. This work is valuable for clock recovery in all-optical network.