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1.
用一种新的方法制作出应用于光网络系统的电吸收调制器,应用应变InGaAs/InAlAs材料做多量子阱,实验测量的调制器调制性能显示出器件的偏振不相关性,以及其高消光比(>40dB)和低电容(<O.5pF),保证了器件可以应用于高速率的传输系统(>10GHz).  相似文献   

2.
高芯片偏振消光比铌酸锂多功能集成光学器件   总被引:1,自引:0,他引:1  
分析了铌酸锂多功能集成光学器件的偏振消光机理,设计和制作了高芯片偏振消光比的铌酸锂多功能集成光学器件。器件采用切断部分输入直波导后在切断端面选择性镀阻光膜的结构以截断射入衬底的辐射光,与芯片耦合后实现了高于85dB的芯片偏振消光比。制作的器件插入损耗小于3.5dB,分光比为48/52~52/48,半波电压Vπ小于3.5V,尾纤偏振串音小于-33dB;在-55~+85℃全温范围内,损耗变化量小于0.2dB,分光比变化小于1%,尾纤偏振串音小于-27dB,能够满足工程化应用需要。  相似文献   

3.
报道了用于10Gbit/s传输的DFB激光器和EA调制器对接集成器件的设计、制作和器件特性.工作主要集中于两个方面:提高激光器和调制器间的光学耦合;通过减小调制器电容提高调制带宽.集成器件显示出了良好的静态和高频特性:阈值电流典型值为15mA,最小值为8mA;100mA激光器偏置电流下,输出功率大于10mW;对消光比、电学回波损耗和调制带宽进行了测试,3dB带宽的测量值超过10GHz.  相似文献   

4.
研制了一种张应变准体InGaAs半导体放大器光开关.该结构具有显著的带填充效应,从而导致在80mA的注入电流下,器件的3dB光带宽大于85nm(1520~1609nm).该带宽几乎同时全部覆盖了C带(1525~1565nm)和L带(1570~1610nm).最为重要的是,在3dB光带范围内,光开关的偏振灵敏度小于0.7dB;光纤到光纤无损工作电流在70~90mA之间;消光比大于50dB.通过降低了载流子寿命,开关速度有所提高.在未来密集波分复用通信系统中,这种宽带偏振不灵敏半导体放大器光开关很有实用前景.  相似文献   

5.
利用同一外延层集成工艺方法制作了10Gb/s电吸收调制器/分布反馈(DFB)半导体激光器单片集成光发射模块.在器件中引入增益耦合机制以提高单模成品率,并采用感应耦合等离子体干法刻蚀技术以降低调制器电容.集成器件阈值电流为12mA,在-2V偏置时的消光比为15dB,器件的小信号调制带宽超过10GHz.在10Gb/s调制速率下经过35km单模光纤传输后,误码率为10-12时的功率代价小于1dB.  相似文献   

6.
高消光比偏振不灵敏电吸收调制器   总被引:1,自引:1,他引:0  
孙洋  王圩  陈娓兮  刘国利  周帆  朱洪亮 《半导体学报》2001,22(11):1374-1376
用一种新的方法制作出应用于光网络系统的电吸收调制器 ,应用应变 In Ga As/In Al As材料做多量子阱 ,实验测量的调制器调制性能显示出器件的偏振不相关性 ,以及其高消光比 (>40 d B)和低电容 (<0 .5 p F) ,保证了器件可以应用于高速率的传输系统 (>10 GHz)  相似文献   

7.
利用AlGaInAs-InP应变多量子阱(MQW)材料导带偏移量大的特点,制作了基于AlGaInAs-InP材料的无制冷脊波导分布反馈式(DFB)激光器.为提高器件调制速度,制作了2 μm宽的脊波导结构,并在脊波导两侧填充1.5 μm厚的SiO2层,从而有效降低器件寄生电容.室温条件下,DFB激光器典型阈值为15 mA,特征温度达88 K,边模抑制比大于50 dB,3 dB小信号调制响应带宽超过15 GHz.  相似文献   

8.
基于IME标准Ge-on-SOI工艺提出了一种全差分光电探测器结构,由定向耦合偏振分束器与锗垂直PIN光电探测器组成,可将一路由单模光纤输入的高速1550nm光信号转换为一对高速差分电信号.分析并设计了具体结构,进行了器件模拟,模拟得到定向耦合偏振分束器TE波与TM波的消光比分别为-16.7dB与-15.7dB,锗垂直PIN光电的响应度与带宽分别为0.42A/W与6.51GHz.  相似文献   

9.
提出了一种改进型的双有源层堆积方法制作单片集成电吸收调制的DFB激光器,报道了器件的制作过程和主要性能,初步结果为:阈值电流38mA,激光器在100mA下出光功率4.5mW左右,调制器消光比约9dB(从+0.5V到-3.0V).对比此前国外报道的具有常规双量子阱堆层结构的器件结果(出光功率仅1.5mW),我们制作的器件的出光功率有了明显的提高.  相似文献   

10.
文章提出了一种3-μm中红外波段偏振无关且CMOS兼容的石墨烯调制器,器件主要包括两部分:模式转换结构及石墨烯调制器。该调制器不仅满足于CMOS兼容的要求,而且能够实现基膜的偏振无关调制。仿真结果表明该调制器在2.95μm到3.05μm的中红外波段能够实现高于20 dB的消光比,TE和TM模式的插入损耗都低于1.3 dB,其偏振相关损耗低于1.09 dB。通过计算,当器件长度为420μm,能够获得高达9.47 GHz的3 dB带宽。  相似文献   

11.
The improved modulation properties of strain compensated InGaAs-InAlAs multiple quantum well (MQW) electroabsorption modulators and their modules have been demonstrated. Introduction of a 0.5% tensile strain in wells and a 0.5% compression in barriers provides highly efficient operation such as a low driving voltage (V/sub 20/ dB=1.6 V) and a large modulation bandwidth (f/sub 3/ dB>20 GHz). This is in addition to low polarization-dependence with an extinction ratio difference between TE and TM and polarization of less than 1 dB.  相似文献   

12.
A 10Gb/s transmitter module containing an electroabsorption modulator monolithically integrated with a distributed feedback (DFB) semiconductor laser is fabricated using the identical epitaxial layer scheme.Gain-coupling mechanism is employed to improve the single mode yield of the DFB laser,while inductively coupled plasma dry etching technique is utilized to reduce the modulator capacitance.The integrated device exhibits a threshold current as low as 12mA and an extinction ratio over 15dB at -2V bias.The small signal modulation bandwidth is measured to be over 10GHz.The transmission experiment at 10Gb/s indicates a power penalty less than 1dB at a bit-error-rate of 1e-12 after transmission through 35km single mode fiber.  相似文献   

13.
Bulk InGaAsP-InP electroabsorption optical modulators with high extinction ratio, low drive voltage, and high modulation bandwidth at λ=1.3 μm are reported. The devices have a tapered-fiber-to-modulator-to-tapered-fiber extinction ratio greater than 20 dB at a drive voltage of <5 V. Very low capacitance modulators (<0.2 pF) were fabricated using SiO2 bonding pad isolation, resulting in a measured electrical modulation bandwidth in excess of 20 GHz  相似文献   

14.
Electroabsorption modulators with traveling-wave electrodes have been designed and fabricated using MOCVD grown InGaAsP-InGaAsP quantum wells. A modulation bandwidth of 25 GHz is achieved for a 2 μm-wide 30 μm-long device. Driving voltage of 1.20 V is achieved for an extinction ratio of 20 dB for operation at 1.55 μm  相似文献   

15.
Lin  S.H. Wang  S.Y. Houng  Y.M. 《Electronics letters》1986,22(18):934-935
A GaAs PIN travelling-wave modulator operated at 1.3 ?m has been fabricated from material grown by organometallic vapour phase epitaxy (OMVPE) on an n+ (100) GaAs substrate. The device has a constant V? of 8 V from DC to 10 GHz and an optical extinction ratio of 13 dB. The optical insertion loss of the device is 3.5 dB, and the 3 dB frequency bandwidth is measured to be 4.1 GHz, which is limited by the microwave slowing induced by the n+ substrate.  相似文献   

16.
热光聚合物微环谐振腔滤波器的研究   总被引:5,自引:5,他引:0  
设计并制备了一种热光聚合物微环谐振腔滤波器。微谐振环采用跑道型结构,通过光束传播法(BPM)对其弯曲半径进行了设计和优化。采用传统的接触式光刻曝光工艺制备了微环谐振腔滤波器并对其进行了光谱测试,实验结果表明,所设计的器件在1 550nm附近的自由光谱范围(FSR)为112pm,消光比约为12.8dB,3dB带宽约为0.026nm,品质因子Q为5.96×104,调制效率是6.13pm/mW;同时测量了器件的响应时间,得到的响应时间约为1.5ms。  相似文献   

17.
We propose and demonstrate an electroabsorption modulator using a double-pass configuration that enabled us to overcome the tradeoff between expanding modulation bandwidth and increasing extinction efficiency. The 130-/spl mu/m device, which has a bulk absorption layer, demonstrated a 10 dB extinction ratio with an applied voltage ranging from 0 to -0.9 V and a modulation bandwidth exceeding 20 GHz corresponding to a 200% improvement in the bandwidth-to-drive-voltage over a conventional single-passing modulator.  相似文献   

18.
设计并制备了一种基于热光效应的集成可调谐氮化 硅(Si3N4)波导微环谐振腔滤波器,通过采用马赫-曾德干涉仪(MZI)构成的可调谐 耦合器控制耦合区耦合比,以实现滤波器消光比的调谐。设计并优化了微环谐振 腔的波导截面尺寸、弯曲半径和耦合区波导间隔等参数,并通过光刻、反应离子刻蚀(RIE )等工艺制备 了两种不同弯曲半径的Si3N4波导微环谐振腔。实验结果表明,本文器件在波长1550nm附近处的自由光谱 范围(FSR)为68pm,3dB带宽约为16pm,品质因子Q达到了9.68×10 4,消光比可调范围约为17dB。  相似文献   

19.
We have fabricated a multiple-quantum-well (MQW) waveguide optical modulator incorporating tensile strain and quantum well with mass-dependent width (QWMDW) for the first time. The structure was built on a strain relief InAlGaAs buffer layer grown on a GaAs substrate. Polarization-independent modulation with more than -10 dB extinction (at 8 V reverse voltage) was achieved over a very wide operating range, from 858 to 886 nm wavelength.  相似文献   

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