蓝光聚合物共混材料的发光特性

研究了不同组成PVK和P6共混材料薄膜的光吸收特性和光致发光特性．用不同比例PVK∶P6共混材料为发光层和Alq3为电子传输层合成双层结构的蓝光器件,测量器件的电致发光谱、电流-电压特性和亮度-电压特性．结果表明,共混材料的光致发光强度比PVK和P6都有明显的增强,且随PVK浓度的增加而增强;器件电致发光强度随PVK浓度的增加而增强;不同PVK掺杂浓度对电致发光器件的开启特性没有明显影响,发光亮度随PVK掺杂浓度的增加而增大．     

聚乙烯基咔唑对稀土络合物发光特性的影响

本文报导了稀土红色荧光络合物－Eu(TTA)m复合体系与聚乙烯基咔唑（PVK）共混体系的光致发光和电致发光性质。通过对吸收光谱和发射光谱的测量,可知在光致发光中存在PVK向Eu(TTA).复合体系的能量传递,但在较大的掺杂浓度下仍存在来自PVK的发光.在电场激发条件下,此共混体系的电致发光仅有稀土络合物的特征发光而很难看到PVK的特征发光.并且这种电致发光器件的稳定性明显改善,另外在器件结构中加入电子传输层可明显提高器件的发光效率.     

利用PtOEP掺杂改善Spiro发光器件的发光效率

为了利用有机三线态发光提高有机发光器件的发光效率,用磷光材料掺杂到聚合物主体中作为发光层,制备有机电致发光器件.在测量器件的电流-电压特性、发光亮度-电压特性和电致发光谱的基础上,计算了器件的外量子效率,研究了磷光材料的掺杂浓度对器件发光效率的影响.结果表明,对特定的材料体系,适当控制掺杂浓度,可以同时观察到荧光和磷光光谱,使掺杂器件的外量子效率在纯聚合物发光器件的基础上得到明显提高.     

利用PtOEP掺杂改善Spiro发光器件的发光效率

为了利用有机三线态发光提高有机发光器件的发光效率,用磷光材料掺杂到聚合物主体中作为发光层,制备有机电致发光器件.在测量器件的电流-电压特性、发光亮度-电压特性和电致发光谱的基础上,计算了器件的外量子效率,研究了磷光材料的掺杂浓度对器件发光效率的影响.结果表明,对特定的材料体系,适当控制掺杂浓度,可以同时观察到荧光和磷光光谱,使掺杂器件的外量子效率在纯聚合物发光器件的基础上得到明显提高.     

掺杂浓度对ZnS∶Er~(3+)EL器件发光特性的影响

研究了ZnS：Er3+薄膜电致发光（EL）器件中，不同Er3+掺杂浓度的发光特性。发现，随发光中心Er3+的浓度增加而红色发光峰相对两个绿色峰有所增强，而两个绿色峰的相对强度却不变，在器件结构相同的情况下，浓度低于5×10－3克分子浓度时发光随浓度的增加而增强，两个绿色峰的亮度没有红色峰的亮度增加幅度大。当浓度大于1×10－2克分子浓度时，绿色发光峰的强度开始下降，红色峰的强度明显增强。说明，发光器件中存在交叉弛豫现象。     

zns:Mn纳米颗粒在电致发光器件中应用的研究

将合成的ZnS:Mn纳米颗粒掺在有机大分子PVK中,共同作为发光层,制备了多层的电致发光器件。通过比较掺杂ZnS:Mn与未掺杂的OLED的电致发光光谱、电流密度-电压曲线、亮度-电压曲线等特性,研究了器件性能提高的机理。     

Tb(p-MBA)3phen与PVK混合体系发光性质研究

研究了铽配合物Tb(p-MBA)3phen与聚乙烯咔唑PVK共掺杂体系的电致发光(EL)和光致发光(PL)特性。结果发现,在EL中,PVK的发光完全被抑制,只能看到明显的Tb^3 绿光发射;而在PL中,除了Tb^3 发光外,还可以看到明显的PVK发光。这是由于两种发光机理不同造成的。通过测量材料的发射光谱和激发光谱,初步探讨了器件的发光机理,认为Tb^3 的发光可能来源于2个方面：1)PVK到稀土配合物的Foerester能量传递;2)PVK作为一种空穴传输材料,而稀土配合物作为电子陷阱,受激的空穴和电子直接被稀土配合物俘获,在稀土配合物上形成激子复合发光。所制作的单层器件的最大亮度达24．8cd／m^2。     

一种基于液晶性质的Pt配合物磷光材料电致发光器件

采用聚合物掺杂的方式,利用旋涂工艺制备了ITO/PVK:TOPPt/BCP(20 nm)/Mg:Ag(200 nm)结构的有机电致发光器件(OLED)。对掺杂浓度为2%(器件A)和4%(器件B)的磷光聚合物掺杂体系的光致发光(PL)和电致发光(EL)性质进行了分析研究,并对主体材料PVK到磷光客体材料TOPPPt的能量传递机制进行了讨论。实验表明,器件的EL谱谱峰位于625 nm,器件A在25 V时最大亮度为3037 cd/m2,最大电流效率为3.15cd/A。器件的EL谱不会随着偏置电压和掺杂浓度而改变,器件具有较好的稳定性。     

掺杂浓度对ZnS：Er^3＋EL器件发光特性的影响

研究了ＺｎＳ：Ｅｒ＾３＋薄膜电致发光（ＥＬ）器件中，不同Ｅｒ＾３＋拓杂浓度的发光特性，发现，随发光中心Ｅｒ＾３＋的浓度增加而红色发光峰相对两个绿色峰有所增强，而两个绿色峰的相对强度却不变，在器件结构相同的情况下，浓度低于５×１０＾－３克分子２时发光随浓度的增加而增强，两个绿色峰的亮度没有红色峰的亮度增加幅度大。当浓度大于１×１０＾－２克分子浓度时，绿色发光峰的强度开始下降，红色的强度明显增强，说明     

PVK:NPB复合空穴传输层对有机电致发光器件的影响

采用poly(N-vinylearbazole)(PVK):N,N'-bis-(1-naphthyl)-N,N'-bipheny-1,1'-biphenyl-4,4'-diamine(NPB)掺杂体系作为复合空穴传输层,通过调节该体系的组分,制备了结构为indium-tin oxide(ITO)/PVK:NPB/8-hydroxyquinoline aluminum(Alq3)/Mg:Ag的双层有机电致发光器件(OLED),研究了具有不同掺杂质量比的OLED器件的电致发光特性,并对掺杂薄膜的表面形貌进行了表征.结果表明,将NPB掺杂到PVK中会提高空穴传输能力,改善器件的发光亮度和效率,并调节载流子复合区域的位置,光谱谱峰从509 nm移动到530 mm;但随着NPB质量比例提高,掺杂薄膜表面的平均粗糙度由3 nm上升为10 mm,电流密度和亮度先升高后降低.当PVK和NPB的掺杂质量比为l:3时,器件具有最优性能,发光亮度达到7852 cd/m2,功率效率为1.75 lm/W.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.     

GaAsSb/InAlAs PA DHBTs Grown by Production MBE

The epi material growth of GaAsSb based DHBTs with InAlAs emitters are investigated using a 4 × 100mm multi-wafer production Riber 49 MBE reactor fully equipped with real-time in-situ sensors including an absorption band edge spectroscope and an optical-based flux monitor. The state-of-the-art hole mobilities are obtained from 100nm thick carbon-doped GaAsSb. A Sb composition variation of less than ± 0.1 atomic percent across a 4 × 100mm platen configuration has been achieved. The large area InAlAs/GaAsSb/InP DHBT device demonstrates excellent DC characteristics,such as BVCEO＞6V and a DC current gain of 45 at 1kA/cm2 for an emitter size of 50μm × 50μm. The devices have a 40nm thick GaAsSb base with p-doping of 4. 5 × 1019cm-3 . Devices with an emitter size of 4μm × 30μm have a current gain variation less than 2% across the fully processed 100mm wafer. ft and fmax are over 50GHz,with a power efficiency of 50% ,which are comparable to standard power GaAs HBT results. These results demonstrate the potential application of GaAsSb/InP DHBT for power amplifiers and the feasibility of multi-wafer MBE for mass production of GaAsSb-based HBTs.     

Technology innovation and process integrations for sub-100nm gate patterning

This paper presents a brief overview of the Applied Centura(R)DPS(R)system,configured with silicon etch DPS Ⅱ chamber, with emphasis on discussing tuning capability for CD uniformity control. It also presents the studies of etch process chemistry and film integration impact for an overall successful gate patterning development. Discussions will focus on resolutions to key issues, such as CD uniformity, line-edge roughness, and multilayer film etching integration.     

White organic light-emitting devices based on fac tris（2- phenylpyridine） iridium sensitized 5,6,11,12-tetraphenylnap -hthacene

We have fabricated the white organic light-emitting devices （WOLEDs） based on 4,4＇ -bis（2,2 -diphenyl vinyl）-1,1＇ - biphenyl （DPVBi） and phosphorescence sensitized 5,6,11,12,-tetraphenylnaphthacene （rubrene）. The device structure is ITO/2T-NATA （20 nm）/NPBX （20 nm）/CBP： x%Ir（ppy）3：0.5% rubrene （8 nm）/NPBX （5 nm）/DPVBi （30 nm）/Alq（30 nm）/LiF（0.5 nm）/A1. In the devices, DPVBi acts as a blue light-emitting layer, the rubrene is sensitized by a phosphorescent material, fac tris （2-phenylpyridine） iridium [Ir（ppy）3], acts as a yellow light-emitting layer, and N,N＇ -bis- （1-naphthyl）- N,N＇ -diphenyl -1, 1＇ -biphenyl-4,4＇ -diamine （NPBX） acts as a hole transporting and exciton blocker layer, respectively. When the concentration of Ir （PPY）3 is 6wt%, the maximum luminance is 24960 cd/m^2 at an applied voltage of 15 V, and the maximum luminous efficiency is 5.17 cd/A at an applied voltage of 8 V.     

Complete approach to automatic identification and subpixel center location for ellipse feature

To meet the need of automatic image features extraction with high precision in visual inspection, a complete approach to automatic identification and sub-pixel center location for similar-ellipse feature is proposed. In the method, the feature area is identified automatically based on the edge attribute, and the sub-pixel center location is accomplished with the leastsquare algorithm. It shows that the method is valid, practical, and has high precision by experiment. Meanwhile this method can meet the need of instrumentation of visual inspection because of easy realization and without man-machine interaction.     

小角度扩展相关性近似算法分析

本论文提出一种在多天线MIMO信道相关性建模中小角度扩展近似理论算法,并应用于分析MIMO系统性能。分析中分别对三种不同角能量分布情况下的空间相关性研发快速近似计算法,并同时提出双模(Bi-Modal)角能量分布情况下的近似运算。通过分析这些新方法的近似效率,可以得到计算简单、复杂度低、而且符合实际的MIMO相关信道矩阵,对系统级的快速高效计算法的研究和系统级的评估以及误差分析具有重要的意义。     

Noise character analysis and the restraint of self-pulsation laser diodes

We calculate the Langevin noise sources of self-pulsation laser diodes, analyze the effects of active region noise and saturable-absorption region noise on the power fluctuation as well as period fluctuation, and propose a novel method to restrain the noise effects. A visible SIMULINK model is established to simulate the system, The results indicate that the effects of noise in absorption region can be ignored; that with the increase of DC injecting current, the noise effects enhance power jitter, and nevertheless, the period jitter is decreased; and that with external sinusoidal current modulating the self-pulsation laser diode, the noise-induced power jitter and period jitter can be suppressed greatly. This work is valuable for clock recovery in all-optical network.