离子损伤对等离子体辅助分子束外延生长的 Ga NAs/ Ga As和Ga In NAs/ Ga As量子阱的影响

研究了离子损伤对等离子体辅助分子束外延生长的 Ga NAs/ Ga As和 Ga In NAs/ Ga As量子阱的影响 .研究表明离子损伤是影响 Ga NAs和 Ga In NAs量子阱质量的关键因素 .去离子磁场能有效地去除了等离子体活化产生的氮离子 .对于使用去离子磁场生长的 Ga NAs和 Ga In NAs量子阱样品 ,X射线衍射测量和 PL 谱测量都表明样品的质量被显著地提高 .Ga In As量子阱的 PL 强度已经提高到可以和同样条件下生长的 Ga In As量子阱相比较 .研究也表明使用的磁场强度越强 ,样品的光学质量提高越明显     

GaNAs／GaAs中的激子局域化和发光特性

通过多种光谱手段研究了GaNAs量子阱和体材料中的局域态和非局域态的不同光学特性．在超短激光脉冲激发下，第一次在GaNAs／GaAs量子阱发光光谱中，观察到非局域激子发光．选择激发光谱表明，局域中心主要聚集在GaNAs、GaAs异质结界面．在低N含量的GaNAs体材料发光光谱中，除了与N相关的局域态发光外，也发现发光特性完全不同的GaNAs合金态发光．这些结果为理解Ⅲ-Ⅴ-N族半导体的异常能带特性具有十分重要的意义．     

GaInAs/GaAs应变量子阱能带结构的计算

讨论了GaInAs/GaAs应变量子阱结构的应变效应 ,给出了量子阱层的临界厚度随In组份的变化关系。由克龙尼克 -潘纳模型计算了GaInAs/GaAs应变量子阱的量子化能级 ,给出了cl -hhl跃迁对应的发射波长随阱宽和In组份的变化关系曲线 ,并与实验测量的GaInAs/GaAs量子阱的发射波长进行了比较 ,基本一致。与此同时 ,对GaInAs/GaAs应变量子阱向长波长方向的发展也进行了计算分析 ,最后计算研究了应变量子阱中价带子能级及态密度的色散关系     

MOCVD生长1.06μm波段InGaAs/GaAs单量子阱材料的发光特性研究

利用金属有机化学气相沉积(MOCVD)技术,在不同偏向角的GaAs衬底上生长了InGaAs/GaAs单量子阱外延结构。通过对样品室温光致发光(PL)谱测试结果的分析,讨论了衬底偏向角、量子阱层生长温度以及V/III比对外延片发光波长、发光强度及PL谱半峰全宽(FWHM)的影响。发现在相同生长条件下,对于InGaAs/GaAs应变量子阱结构,在GaAs(100)偏111A晶向较小偏向角的衬底上生长的样品PL谱发光强度较大,半峰全宽较窄;量子阱层低温生长的样品发光强度更强;增大量子阱层V/III比可以提高样品的发光强度,同时PL谱峰值波长出现红移。     

MOCVD生长1．06μm InGaAs／GaAs量子阱LDs

用低压MOCVD生长应变InGaAs/GaAs量子阱,采用中断生长、应变缓冲层(SBL)、改变生长速度和调节Ⅴ/Ⅲ等方法改善InGaAs/GaAs量子阱的光致发光(PL)质量。PL结果表明,10s生长中断结合适当的SBL生长的量子阱PL谱较好。该量子阱应用于1.06μm激光器的制备,未镀膜的宽条激光器(100μm×1000μm)有低阈值电流密度(110A/cm2)和高的斜率效率(0.256W/A,per.facet)。     

GaAlAs/GaAs量子阱材料的光荧光谱研究

分子束外延生长GaAlAs／GaAs量子阱材料时，适当的衬底温度和Ⅴ／Ⅲ束流比是改善AlGaAs材料生长质量的重要因素。对GaAs、GaAlAs材料的生长条件进行优化，获得了高质量的量子阱材料，有源层分别为8nm、10nm、12nm时，10K下的PL谱半峰宽（FWHM）分别为6．42meⅤ、6．28meⅤ、6．28meⅤ。     

Design and Characteristics of InGaAs/GaAs MQW SEED Arrays Structure

讨论了谐振腔中的DBR对InGaAs／GaAs多量子阱SEED面阵光反射特性的影响．采用InGaAs／GaAs作为多量子阱SEED器件的有源区,从而获得了980nm工作波长．设计和分析了InGaAs／GaAs多量子阱SEED中的一种用于倒装焊的新型谐振腔结构．多量子阱材料是用MOCVD系统生长,利用微区光反射谱、PL谱以及X射线双晶衍射对多量子阱材料进行了测量和分析,测量结果表明多量子阱材料具有良好的质量,证明了器件结构的设计和分析是准确的．     

大应变In0.3Ga0.7As/GaAs量子阱激光器的生长和研究

金属有机物化学气相沉积(MOCVD)方法生长应变InGaAs／GaAs量子阱，应变缓冲层结合生长中断改善量子阱的PL谱特性．用该量子阱制备的激光器有很低的阈值电流密度(43A／cm^2)和较高的斜率效率(0．34W／A，per facet)．     

GaAs半导体表面的S-N混合等离子体钝化及在激光器工艺上的应用

利用射频(RF)等离子方法,对GaAs半导体表面进行 了S-N混合等离子体钝化实验,并对工作压强、RF 功率进行了优化。光致发光(PL)测试结果表明,经过S-N混合等离子体钝化的GaAs样品PL 强度提高135%。将本文 钝化方法应用到980nm波长InGaAs应变量子阱(QW)激光器的制备工艺 ,器件的COD阈值功率明显增加。     

InGaAs/GaAs量子阱中自组装InAs量子点的光学性质

在InGaAs/GaAs量子阱中生长了两组InAs量子点样品,用扫描电子显微镜(SEM)测量发现,量子点呈棱状结构,而不是通常的金字塔结构,这是由多层结构的应力传递及InGaAs应变层的各向异性引起的.采用变温光致发光谱(TDPL)和时间分辨谱(TRPL)研究了其光致发光稳态和瞬态特性.研究发现,InGaAs量子阱层可以有效地缓冲InAs量子点中的应变,提高量子点的生长质量,可以在室温下探测到较强的发光峰.在量子阱中生长量子点可以获得室温下1 318 nm的发光,并且使其PL谱的半高宽减小到25 meV.     

Effects of Rapid Thermal Annealing on Optical Properties of GaInNAs/GaAs Single Quantum Well Grown by Plasma-Assisted Molecular Beam Epitaxy

The effects of Rapid Thermal Annealing (RTA) on the optical properties of GaInNAs/GaAs Single Quantum Well (SQW) grown by plasma-assisted molecular beam epitaxy are investigated. Ion removal magnets were applied to reduce the ion damage during the growth process and the optical properties of GaInNAs/GaAs SQW are remarkably improved.RTA was carried out at 650℃ and its effect was studied by the comparising the roomtemperature PhotoLuminescence (PL) spectra for the non ion-removed (grown without magnets) sample with for the ion-removed (grown with magnets) one. The more significant improvement of PL characteristics for non ion-removed GaInNAs/GaAs SQW after annealing (compared with those for ion-removed) indicates that the nonradiative centers removed by RTA at 650℃ are mainly originated from ion damage. After annealing the PL blue shift for non ionremoved GaInNAs/GaAs SQW is much larger than those for InGaAs/GaAs and ion-removed GaInNAs/GaAs SQW. It is found that the larger PL blue shift of GaInNAs/GaAs SQW is due to the defect-assisted In-Ga interdiffusion rather than defect-assisted N-As interdiffusion.     

Multiple-quantum-well GaInNAs-GaNAs ridge-waveguide laser diodesoperating out to 1.4 μm

In this letter, results from a ridge waveguide laser diode (LD) structure, with three GaInNAs quantum wells (QWs) and GaNAs barriers, are presented. The sample was grown by solid source molecular beam epitaxy with an RF plasma nitrogen source. These devices differ from previously reported GaInNAs QWs LDs that used GaAs as the barrier material. The introduction of nitrogen into the barriers reduces the spectral blue shift caused by post-growth annealing. Long wavelength emission out to 1.405 μm was observed. The devices exhibited threshold current densities as low as 1.5 kA/cm², high differential efficiency of 0.67 W/A, and a maximum output power of 350 mW     

Room-temperature laser emission of GaInNAs-GaAs quantum wells grown on GaAs (111)B

In this work, we present room-temperature laser emission at 1.206 /spl mu/m from GaInNAs-GaAs quantum-well (QW) laser diodes (LDs) grown on misoriented GaAs (111)B substrates for the first time. Details of the structure and the molecular beam epitaxial growth of the lasers are discussed. We found that the postgrowth rapid thermal annealing increased the optimum emission, while the in situ self annealing effect in these QWs is almost negligible. The optimum annealing cycle (30 s at 850/spl deg/C) is comparable to that found for the cladding-free GaInNAs single QW samples grown on GaAs (111)B. Finally, the optical and electrical characterization of these LD devices is presented. The LDs show a room-temperature threshold current density of 2.15 kA/cm/sup 2/, with a differential quantum efficiency of 37%, under pulsed conditions.     

Patterning by rapid thermal annealing of GaAs layers grown on diluted nitride QWs

The structural characterization of hole patterns on GaAs cap layers grown on GaInNAs quantum wells (QWs) created by rapid thermal annealing is shown in this work. The effect of annealing temperature on the hole size, as well as the impact of the ion density present during the growth of the QW on the formation of this hole pattern, is presented. Structural (atomic force, scanning electron and transmission electron microscopy) and optical characterization (cathodoluminescence) of the samples is presented. The structure of the planes forming the walls and base of these holes is proposed.     

LP－MOCVD生长InGaAs／GaAs量子阱

用低压ＭＯＣＶＤ（ＬＰ－ＭＯＣＶＤ）生长三种不同的ＩｎＧａＡｓ／ＧａＡｓ应变层量子阱材料，其中两种含ＡｌＧａＡｓ限制层。结果表明，ＡｌＧａＡｓ限制层对量子阱的发光强度影响很大，与没有ＡｌＧａＡｓ限制层的结果相比，带ＡｌＧａＡｓ限制层的结构的发光强度要强一个数量级以上。在低温（１８Ｋ）ＰＬ光谱图中，我们看到，除了存在主峰以外，在主峰两侧还各有一个子峰，这些子峰可能与量子阱的质量有关。     

Effects of Growth Conditions on Optical Properties of GaInNAs/GaAs Quantum Well Grown by Molecular Beam Epitaxy

During the process of molecular beam epitaxy employing a DC plasma as N source,the effects of the growth temperature, growth rate and As4 pressure on the optical properties of GaInNAs Quantum Well(QW) are similar to those of InGaAs QW with the same In contents.In the range of 400 to 470℃, elevating growth temperature is beneficial to the improvement in the photoluminescence (PL) peak intensity of GaInNAs QW, but obviously broadens the fullwidth at half maximum PL peak. The improvement of optical properties and the reduction of N incorporation have been observed by increasing the growth rate. As4 pressure mainly affects the optical properties of GaInNAs QW rather than N incorporation does.     

An 850-nm InAlGaAs strained quantum-well vertical-cavitysurface-emitting laser grown on GaAs (311)B substrate withhigh-polarization stability

The polarization stability of 850-nm InAlGaAs strained quantum-well (QW) vertical-cavity surface-emitting laser (VCSEL) grown on GaAs (311)B substrate was investigated by comparing it with that of GaAs unstrained QW VCSEL grown on GaAs (311)B substrate. Photoluminescence measurement showed that strained QWs grown on GaAs (311)B substrate had larger anisotropy in optical gain than unstrained QWs. The VCSEL with strained QWs showed an orthogonal polarization suppression ratio (OPSR) as high as 21 dB under CW operation. Time-dependent OPSR measurement indicated that the strained QW VCSEL had higher polarization stability than the unstrained QW VCSEL under zero-bias modulation     

MOVPE grown 1360-nm GaInNAs quantum-well laser with multibarrier structures

We present a promising method to achieve a high-performance GaInNAs quantum-well (QW) laser emitting 1.36 /spl mu/m by metal-organic vapor phase epitaxy. It was found that the insertion of GaNAs-InGaAs layers to GaInNAs QW-GaAs barrier is very effective to control the emission wavelength and improve the optical property of QW. As the thickness of the GaNAs and InGaAs layers was decreased, the wavelength emitted from QW became longer. The optical efficiencies of the proposed QW structure were confirmed by the lasing performance in edge-emitting laser. The threshold current density and slope efficiency per facet of a 1360-nm laser diode are measured to be 892 A/cm/sup 2/ and 0.135 W/A, respectively.     

Growth optimization and optical properties of GaAs-(Ga,Al)As quantum well structures on UV-ozone prepared nominal (111)B GaAs surfaces

GaAs and (Ga,Al)As---GaAs quantum well (QW) structures have been grown by molecular beam epitaxy on nominal (111)B oriented GaAs substrates. The substrate preparation technique involving UV-ozone oxidation was observed to lead to a rough surface after oxide desorption. Mirror-like layer surfaces have nevertheless been achieved by applying a careful procedure during the first stages of growth in order to recover surface flatness. New evidence of planarization is presented, based on the frequency analysis of reflection high-energy electron diffraction (RHEED) intensity oscillations during growth. QWs grown at a moderate substrate temperature (about 610°C) have been obtained with sharp excitonic transitions whose photoluminescence (PL) emission linewidths are comparable to those obtained on misoriented (111)B substrates. In contrast, the use of higher substrate temperatures was found to provide rougher interfaces due to GaAs sublimation during growth interruption at each interface, as revealed by continuous wave and time-resolved PL measurements.