适用于GaN栅极驱动的自适应死区时间控制电路

设计了一种适用于GaN栅极驱动的自适应死区时间控制电路,该电路具有低延时、低功耗、高速、高开关频率的特点。电路通过单脉冲产生电路检测开关节点电压,以实现零静态功耗;加入互锁电路以防误触发,消除了由开关节点毛刺导致的上下管直通的现象。电路基于SMIC 0.18 μm BCD工艺设计,仿真结果表明,死区时间可随负载变化而自适应调整,且当最坏情况开关节点电压的dv/dt=48 V/ns时,电路高低侧死区时间误差仅为1.59 ns和2.69 ns。     

千兆比特数据率LVDS接口电路设计

设计了一个采用0.18μm1.8V/3.3V CMOS工艺制造的千兆比特数据率LVDS I/O接口电路。发送器电路采用内部参考电流源和片上匹配电阻,使工艺偏差、温度变化对输出信号幅度的影响减小50%;接收器电路采用一种改进的结构,通过检测输入共模电平,自适应调整预放大器偏置电压,保证跨导Gm在LVDS标准[1]要求的共模范围内恒定,因此芯片在接收端引入的抖动最小。芯片面积0.175mm2,3.3V电源电压下功耗为33mW,测试表明此接口传输速率达到1Gb/s。     

一种25 Gbit/s CMOS自适应判决反馈均衡器

基于65 nm CMOS工艺,设计了一种25 Gbit/s带有一个无限冲激响应抽头的自适应判决反馈均衡器。该均衡器中关键路径采用堆叠式选择器和锁存器组成的半速率预测式结构,以减小环路反馈延时。自适应模块采用改进的最小均方算法,以改善抽头系数的收敛性。输出缓冲采用改进的fT倍增结构,以提升带宽并具有预加重功能。仿真结果表明,当信号速率为25 Gbit/s时,该均衡器能够自适应地实现最高20 dB衰减量的补偿,输出抖动小于10 ps。1.2 V电源供电时,整体电路在不同工艺角下的平均功耗约为120.5 mW。     

一种用于ADC采样的高精度时钟占空比校正方法

本文提出一种高精度时钟信号占空比校正方法,采用环路负反馈的理论产生延时控制电压,并通过延时可控的占空比调整电路来产生高精度占空比的时钟信号。基于0.18μm工艺对所提出的校正方法进行了具体电路设计和PVT全面仿真验证,输入频率在100MHz占空比变化范围6%~97%时,该方法都可以动态精确的输出频率为100MHz占空比为50%的信号,最大误差小于0.28%,功耗仅为4.8mW,为高精度ADC采样和转换提供了高效的解决方案。     

基于运动估计算法的PE模块的低功耗设计

基于运动估计算法的PE模块的硬件结构设计,文中提出了集群式电压调节算法,给电路分配双电压供电,相较于使用单一电压的电路,功耗减少了45.3%.在此基础上,进一步采用门控时钟技术来对电路精细化管理,取得了63.2%的功耗节省.此外,针对多电压电路结构,提出了一种新的电平转化器以获得更小的功耗和延时.     

一种低功耗高鲁棒性老化预测传感器

为了降低电路老化对数字集成电路性能的影响,提出了一种通过对比输入信号与其反向延迟信号对电路老化进行预测的传感器结构.提出的传感器结构预测部分可对组合逻辑电路进行数据失效前的老化预测,当检测到电路已发生老化致数据失效时,容错部分可对错误信号进行矫正.该结构特殊的设计减小了面积开销和功耗.采用HSPICE软件对传感器功能进行模拟仿真,实验结果验证了传感器可在不同环境下正确地预测电路的老化情况,并对已发生错误的信号进行矫正,与其他功能相同的传感器相比,该传感器的面积及功耗分别降低了30.91％和41.3％.     

基于0.18μm CMOS工艺的低温漂低功耗延时电路

基于0.18μm CMOS工艺设计了一款低温漂延时电路,适用于不能使用锁相环电路又对信号传输精度有要求的低功耗传感检测应用。采用正温度系数的偏置电压,通过电流镜为延时电路提供一个正温度系数的偏置电流,利用偏置电流约束电路的延时温漂,实现温漂粗调。采用数字时间转换器,通过外部输入配置,对粗调后的延时进行动态细调,使得延时电路具有更高的动态稳定性和更低的温漂特性。电路测试结果表明,在3.3 V的电源电压下,-55～125℃内延时电路的温度系数为125×10^-6/℃,静态功耗仅为0.72 mW。     

工艺偏差下基于功耗与延时的硬件木马检测有效性分析

首先简述了硬件木马以及现有的硬件木马检测方法,之后考虑了工艺偏差对硬件木马检测的影响;工艺偏差的存在对电路功耗和延时等都会造成一定的影响,从而在一定程度上掩盖了硬件木马电路引起的功耗和延时特征变化.实验中针对AES加密核心S-box电路设计植入了一种基于组合电路的功能型硬件木马电路,并在40 nm工艺下利用HSPICE模拟不同大小硬件木马电路下S-box电路功耗轨迹和延时数据,在不同工艺模式下分析基于功耗与延时检测木马的有效性.结果显示,基于延时的硬件木马检测方法在木马规模较小时更能有效实现硬件木马检测.当木马规模增大时,基于功耗的检测方法的优势更明显,其抗工艺偏差干扰的能力会更强.     

一种用于峰值电流模式的锁存比较器设计

设计了一种宽输入共模范围的比较器,用以处理高端电流检测中大共模信号的问题。通过采用预放大器和锁存器结构,优化了传输延时,提高了电路的分辨率及工作速度。基于0.5μm工艺,采用Cadence软件对电路进行仿真。结果表明,该电路可以处理轨到轨的共模输入电平,其最大可处理共模输入电平可跟随输入电压变化。当开关电源频率为1 MHz时,比较器电路的分辨率达到0.1 mV。     

基于SOI CMOS工艺的LVDS驱动器设计

基于绝缘体硅(SOI)0.35μm工艺实现了一款满足IEEE 1596.3和ANSI/TIA/EIA-644工业标准的低压差分信号(LVDS)驱动器芯片。全芯片分为预驱动模块、输出驱动模块、共模反馈模块、使能模块和偏置模块。提出了一种具有低输入电容输出驱动模块电路结构,经仿真验证可有效降低LVDS预驱动模块30%的功耗,同时降低29%的信号延时。芯片利用共模反馈机制控制输出信号的共模电平范围,通过环路补偿保证共模反馈电路的环路稳定性。芯片使用3.3 V供电电压,经Spice仿真并流片测试,输出信号共模电平1.23 V,差分输出电压347 mV,在400 Mbit/s数据传输速率下单路动态功耗为22 mW。     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.     

GaAsSb/InAlAs PA DHBTs Grown by Production MBE

The epi material growth of GaAsSb based DHBTs with InAlAs emitters are investigated using a 4 × 100mm multi-wafer production Riber 49 MBE reactor fully equipped with real-time in-situ sensors including an absorption band edge spectroscope and an optical-based flux monitor. The state-of-the-art hole mobilities are obtained from 100nm thick carbon-doped GaAsSb. A Sb composition variation of less than ± 0.1 atomic percent across a 4 × 100mm platen configuration has been achieved. The large area InAlAs/GaAsSb/InP DHBT device demonstrates excellent DC characteristics,such as BVCEO＞6V and a DC current gain of 45 at 1kA/cm2 for an emitter size of 50μm × 50μm. The devices have a 40nm thick GaAsSb base with p-doping of 4. 5 × 1019cm-3 . Devices with an emitter size of 4μm × 30μm have a current gain variation less than 2% across the fully processed 100mm wafer. ft and fmax are over 50GHz,with a power efficiency of 50% ,which are comparable to standard power GaAs HBT results. These results demonstrate the potential application of GaAsSb/InP DHBT for power amplifiers and the feasibility of multi-wafer MBE for mass production of GaAsSb-based HBTs.     

Technology innovation and process integrations for sub-100nm gate patterning

This paper presents a brief overview of the Applied Centura(R)DPS(R)system,configured with silicon etch DPS Ⅱ chamber, with emphasis on discussing tuning capability for CD uniformity control. It also presents the studies of etch process chemistry and film integration impact for an overall successful gate patterning development. Discussions will focus on resolutions to key issues, such as CD uniformity, line-edge roughness, and multilayer film etching integration.     

White organic light-emitting devices based on fac tris（2- phenylpyridine） iridium sensitized 5,6,11,12-tetraphenylnap -hthacene

We have fabricated the white organic light-emitting devices （WOLEDs） based on 4,4＇ -bis（2,2 -diphenyl vinyl）-1,1＇ - biphenyl （DPVBi） and phosphorescence sensitized 5,6,11,12,-tetraphenylnaphthacene （rubrene）. The device structure is ITO/2T-NATA （20 nm）/NPBX （20 nm）/CBP： x%Ir（ppy）3：0.5% rubrene （8 nm）/NPBX （5 nm）/DPVBi （30 nm）/Alq（30 nm）/LiF（0.5 nm）/A1. In the devices, DPVBi acts as a blue light-emitting layer, the rubrene is sensitized by a phosphorescent material, fac tris （2-phenylpyridine） iridium [Ir（ppy）3], acts as a yellow light-emitting layer, and N,N＇ -bis- （1-naphthyl）- N,N＇ -diphenyl -1, 1＇ -biphenyl-4,4＇ -diamine （NPBX） acts as a hole transporting and exciton blocker layer, respectively. When the concentration of Ir （PPY）3 is 6wt%, the maximum luminance is 24960 cd/m^2 at an applied voltage of 15 V, and the maximum luminous efficiency is 5.17 cd/A at an applied voltage of 8 V.     

Complete approach to automatic identification and subpixel center location for ellipse feature

To meet the need of automatic image features extraction with high precision in visual inspection, a complete approach to automatic identification and sub-pixel center location for similar-ellipse feature is proposed. In the method, the feature area is identified automatically based on the edge attribute, and the sub-pixel center location is accomplished with the leastsquare algorithm. It shows that the method is valid, practical, and has high precision by experiment. Meanwhile this method can meet the need of instrumentation of visual inspection because of easy realization and without man-machine interaction.     

小角度扩展相关性近似算法分析

本论文提出一种在多天线MIMO信道相关性建模中小角度扩展近似理论算法,并应用于分析MIMO系统性能。分析中分别对三种不同角能量分布情况下的空间相关性研发快速近似计算法,并同时提出双模(Bi-Modal)角能量分布情况下的近似运算。通过分析这些新方法的近似效率,可以得到计算简单、复杂度低、而且符合实际的MIMO相关信道矩阵,对系统级的快速高效计算法的研究和系统级的评估以及误差分析具有重要的意义。     

Noise character analysis and the restraint of self-pulsation laser diodes

We calculate the Langevin noise sources of self-pulsation laser diodes, analyze the effects of active region noise and saturable-absorption region noise on the power fluctuation as well as period fluctuation, and propose a novel method to restrain the noise effects. A visible SIMULINK model is established to simulate the system, The results indicate that the effects of noise in absorption region can be ignored; that with the increase of DC injecting current, the noise effects enhance power jitter, and nevertheless, the period jitter is decreased; and that with external sinusoidal current modulating the self-pulsation laser diode, the noise-induced power jitter and period jitter can be suppressed greatly. This work is valuable for clock recovery in all-optical network.