含钨类金刚石薄膜的制备与性能研究

为了满足制备较厚低摩擦系数类金刚石薄膜（DLC）耐磨镀层的实际需求，对在等离子增强化学气相沉积的类金刚石薄膜（W—DLC）中掺钨进行了系统研究。研究结果表明，类金刚石薄膜掺入钨，在较宽的工艺条件范围内，都可以沉积厚度超过5μm的薄膜而不发生剥落。适当控制工艺条件和膜中钨的含量可以提高薄膜的硬度，降低磨损率，且保持低的摩擦系数和较高的沉积速率。     

PECVD法制备类金刚石薄膜的摩擦学性能

采用射频等离子体增强化学气相沉积法(rf-PECVD),在45钢表面沉积了类金刚石(DLC)薄膜,借助激光拉曼光谱仪(Raman)、X射线光电子能谱(XPS)、扫描电子显微镜(SEM)和原子力显微镜(AFM),分析了DLC膜的键结构、表面形貌和结构特征,用原位纳米力学测试系统测定了薄膜的硬度.以GCr15钢为摩擦副材料...     

等离子体化学气相沉积类金刚石碳膜的特性及应用

类金刚石（DLC）膜是含有sp^3杂化态的亚稳态非晶碳膜，是具有极高的硬度、化学稳定性和光学透明性的半导体材料。这篇综述介绍了用等离子体化学气相沉积DLC膜的沉积方法、所制备薄膜的特性及应用，最后展望了DLC膜的发展趋势。     

离子束增强沉积制备TiB_2薄膜及其性能研究

用离子束增强沉积法（IBED）在硅及铜基体上沉积了TiB2薄膜，研究了轰击离子束能量和束流对薄膜的微结构及力学性能的影响。用俄歇电子谱（AES）分析了膜的成分及其界面状况，用X射线衍射（XRD）研究了膜的微结构，并测定了膜的硬度及进行了膜的高温氧化试验。结果指出：（1）离子束轰击使薄膜晶化，从而影响到膜的硬度及抗高温氧化性能；（2）离子束增强沉积的二硼化钛薄膜是一种耐高温氧化的高硬膜。     

类金刚石薄膜作为阴极阵列的场发射显示器研制

采用真空磁过滤弧沉积（FAD）的方法制备的金刚石（DLC）薄膜具有良好的场发射性能。通过离子束技术和微细加工技术可以实现DLC薄膜的图形化并能大大提高薄膜的场发射性能。测试表明，DLC薄膜孔洞阵列具有很好的电子场发射性能，阈值电场达到了2.1V/μm，当场强为14.3V/μm时，电流密度达到了1.23mA/cm^2。利用图形化的DLC薄膜作为阴极，设计和制作了矩阵选址单色场发射显示器（FED）样管。     

SiC/DLC过渡层对类金刚石薄膜力学性能的影响

采用等离子体浸没离子注入及沉积技术在钛合金(Ti6Al4V)表面制备了类金刚石薄膜和含有SiC/DLC过渡层的类金刚石薄膜。采用拉曼光谱及扫描电子显微镜分析了薄膜的成分和结构,并利用超显微硬度计、薄膜结合力测试仪和往复式摩擦实验机研究了薄膜的硬度、韧性、膜/基结合力和耐磨性。研究结果表明,SiC/DLC过渡层可以提高钛合金(Ti6Al4V)表面类金刚石薄膜的韧性及膜/基结合力,与未制备过渡层的类金刚石薄膜相比,含有SiC/DLC过渡层的类金刚石薄膜的耐磨性明显提高。     

PBII制备TiNx/DLC多层膜的结构及摩擦学性能

采用等离子体基离子注入技术在30CrMnSi钢上制备了TiNx/DLC多层膜，通过X射线光电子谱和激光喇曼光谱测试分析了膜的结构特征，TiNx/DLC膜大气下的摩擦性能和在球盘式摩擦磨损试验机上进行。结果表明：DLC膜的结构强烈依赖于基权脉冲偏压，－5kV制得的DLC膜具有较多的C－H键结构，因而硬度最低，仅有8.3GPa；而-15kV的DLC膜由于含有较多的sp^3键，获得了最高的显微努氏硬度（23.6GPa)。DLC膜与GCr15钢球大气下的摩擦因数为0.17左右，其磨损性能由于TiNx，过渡层引入而显著提高。     

轰击能量对离子束增强沉积Cr-N薄膜微观结构和硬度的影响

采用离子束增强沉积（IBED）技术，在不同能量氮离子的辅助轰击下制备了Cr－N薄膜；通过SEM观察、XRD分析和显微硬度测定，发现离子轰击能量对Cr－N薄膜的表面形貌、相组成和硬度有显著的影响：随着能量的升高，膜表面形貌由岛形颗粒状转变成蜂窝状；一定能量轰击下获得的Cr2N和CrN混相结构有最高的薄膜硬度；高达16keV的氮离子轰击可诱发非晶化的出现，并对膜有一定的强化作用。在此基础上探讨了离子轰击能量对合成Cr－N薄膜结构与性能的影响效应。     

离子束增强沉积制备TiB2薄膜及其性能研究

用离子束增强沉积法（ＩＢＥＤ）在硅及铜基体上沉积了ＴｉＢ２薄膜，研究了轰击离子束能量和束流对薄膜的微结构及力学性能的影响。用俄歇电子谱（ＡＥＳ）分析了膜的成分及其界面状况，用Ｘ射线衍（ＸＲＤ）研究了膜的微结构，并测定了膜的硬度及进行膜的高温氧化试验。结果指出：（１）离子束轰击使薄膜晶化，从而影响到膜的硬度及抗高温氧化性能；（２）离子呸增强的二硼化钛薄膜是一种耐高温氧化的高硬膜。     

轰击能量对离子束增强沉积Cr—N薄膜微观结构和硬度的影响

采用离子束增强沉积（ＩＢＥＤ）技术，在不同能量氮离子的轴助轰击下制备了Ｃｒ－Ｎ薄膜，通过ＳＥＭ观察、ＸＲＤ分析和显微硬度测定，发现离子轰击能量对Ｃｒ－Ｎ薄膜的表面形貌、相组成和硬度有显著的影响；随着能量的升高，膜表明形貌由岛形颗粒状转变成蜂窝状；一定能量轰击下获得的Ｃｒ２Ｎ和ＣｒＮ混相结合有最高的薄膜硬度；高达１６ｋｅＶ的氮离子轰击可诱发非晶化的出现，并对膜有一定的强化作用。在此基础上探讨了离子轰     

Precursor gas effect on the mechanical and optical properties of ion beam deposited diamond-like carbon films

The effect of precursor gases on the diamond-like carbon (DLC) film deposition was investigated by the direct ion beam deposition method. DLC films were deposited using methane and benzene as the precursor gases. Ion energies for the deposition range from 100 to 700 eV were achieved by adjusting the beam voltage. The residual stresses, refractive indices and optical band gaps were compared at the same ion energy. We observed significant differences in residual stress and optical properties between these films. As in r.f. plasma-assisted CVD, the residual stresses of the films deposited from benzene show a characteristic behaviour of lower ion energy deposition than those deposited from methane. The present observations are discussed in terms of the difference in ion energy per carbon atom at the growth surface. We also observed that the Ar addition effect on the residual stress is strongly dependent on the precursor gases.     

Ion beam energy effects on structure and properties of diamond like carbon films deposited by closed drift ion source

In the present study DLC films deposited from acetylene gas by a closed drift ion source were investigated. Ion beam energy effects on structure as well as optical and electrical properties of the synthesized films were studied. Non-monotonic dependence of structure of the DLC films on ion beam energy was observed. The highest sp³/sp² ratio as well as highest optical transparency was observed in the case of the films synthesized by 500 eV energy ion beam. However, the bandgap of the DLC films synthesized by 500 eV energy ion beam was the lowest between all investigated samples, while resistivity non-monotonically decreased with increase of the ion beam energy. These results were explained by changes of the sp³/sp² ratio, structure of sp² bonded clusters as well as hydrogen content in the film due to the competition between the increased (decreased) ion beam energy and decreased (increased) ion/neutral ratio.     

Analysis on Structure and Properties of Diamondlike Carbon Films from Ion Beam Deposition

Diamondlike carbon (DLC) films from a primary ion beam deposition system, were examined using nanoindentation, SEM, AES, XPS, and Raman Spectroscopy. The films have hardness values ranging from 21 to 29 GPa. The results of SEM and AES show that the films are predominantly carbon without any crystalline features, and that nitrogen is incorporated as nitrogen is used as the ion beam source. XPS, and Raman Spectroscopy confirm that the films are amorphous carbon with a combination of sp³ with sp² bonding. It is concluded that DLC films can be directly deposited on steel using a single ion beam to sputter the solid target, and the structure and properties of DLC largely depend on ion beam source.     

端部霍尔等离子体源沉积类金刚石膜的研究

本文通过对端部霍尔离子源特性的研究 ,采用自行研制的用于离子束辅助沉积的端部霍尔离子源成功镀制了类金刚石膜 ,并对采用该离子源制备类金刚石膜的工艺进行了研究和分析。实验结果表明 ,采用端部霍尔离子源镀制类金刚石膜不仅操作简单、可实现大面积沉积 ,而且类金刚石膜的沉积速率较大 ,最大可达 0 .8nm s,其折射率依不同工艺在 1.8～ 2 .2之间可调。并对不同工艺条件下制备的类金刚石膜的硬度进行了测试和分析。     

Deposition of diamond like carbon (DLC) and C-N films using ion beam assisted deposition (IBAD) technique and evaluation of their properties

Diamond like carbon films and C-N films were prepared using ion beam assisted deposition technique (IBAD). Tribological properties were studied by subjecting DLC coated films to the accelerated wear tests. These tests indicated a significant improvement in the mechanical surface properties of glass by DLC coating. Better wear features were obtained for thinner DLC coating as compared to the thicker ones. We also studied the optical properties and obtained a band gap of 1·4 eV for these films. An attempt was made to prepare C₃N₄ films by using IBAD. We observed variation in the nitrogen incorporation in the film with the substrate temperature.     

Improvement of adhesion of DLC coating on nitinol substrate by hybrid ion beam deposition technique

Diamond-like carbon (DLC) films were prepared for a protective coating on nitinol substrate by hybrid ion beam deposition technique with an acetelene as a source of hydrocarbon ions. An amorphous silicon (a-Si) interlayer was deposited on the substrates to ensure better adhesion of the DLC films followed by Ar ion beam treatment. The film thickness increased with increase in ion gun anode voltage. The residual stresses in the DLC films decreased with increase in ion gun anode voltage and film thickness, while the stress values were independent of the radio frequency (RF) bias voltage. The adhesion of the DLC film was improved by surface treatment with argon ion beam for longer time and by increasing the thickness of a-Si interlayer.     

离子辅助轰击能量对类金刚石薄膜性能的影响

研究了利用ＩＢＡＤ方法沉积类金刚石薄膜时,离子的辅助轰击能量对薄的微观结构、表面粗糙度,弹性、硬度以及摩擦系数的影响,获得了机械和摩擦性能优异的类金刚石薄膜。讨论了薄膜微观结构和性能之间的关系。分析了不同硬度测试方法的差异。     

类金刚石膜的性能及应用研究

研究了利用低能离子束技术，在单晶硅片等多种基体表面形成类金刚石薄膜（ＤＬＣ膜）的工艺，测试了其物理化学力学性能，在硅片，硅太阳电池和半导体等表面进行了形成类金刚石膜的应用研究。     

Characterization of ion-beam-deposited diamond-like carbon films

Diamond-like carbon (DLC) films are excellent prospects for a wide range of high-technology applications but their precise structure and properties are not well understood. The purpose of the present work was to use several complementary techniques to characterize the nature, structure and microstructure of DLC films. Thin DLC films were deposited on various substrates in the presence of a Si interlayer (500 Å thick) using CH₄ ion-beam deposition at an acceleration energy of 750 eV and a current density of about 2.5 mA cm⁻². The Si interlayer was deposited by either e-beam evaporation or Si evaporation enhanced by Ar⁺ beam bombardment (1 keV). The produced DLC films were featureless, very smooth and of high hardness (2900–3300 kg mm⁻²). Auger electron spectroscopy and electron diffraction showed that the films were mainly amorphous. Their microstracture was characterized by a three-dimensional network structure with a medium-range order of about 25 nm. Fourier transform infrared and Raman spectroscopies showed that the films were mainly composed of sp³ and sp² carbon-bonded hydrogen. The sp³/sp² ratio varied from 3.2 to 4.1 and was found to depend on the nature of the Si bond layer. The results showed that the nucleation of the diamondlike structure was promoted on the Si interlayer that was deposited under Ar⁺ beam bombardment. This effect can be explained by the higher surface roughness produced in this interlayer as suggested by the reflectivity measurements. Spectroscopic ellipsometry revealed that the films had an optical band gap between 1.56–1.64 eV. The present results are consistent with previous proposals suggesting that the DLC structure is composed of small graphitelike clusters (involving fused six-fold rings) that are interconnected by sp³-bonded carbon.     

Nanoelectromechanical device fabrications by 3-D nanotechnology using focused-ion beams

Nanoelectromechanical devices, which can be used as nanotools in nanofactories, were fabricated by focused ion beam chemical vapor deposition (FIB-CVD). The devices are made of diamond-like carbon (DLC), deposited on a Si substrate using gasified phenanthrene (C₁₄H₁₀) as a carbon source. The Young modulus and density of the deposited DLC were measured as 190 GPa and 3.8 g cm⁻³, respectively. The work function was smaller for DLC (2.9 eV) than for W (4.7 eV) and Fe (5.2 eV) deposited by FIB-CVD. A nanomanipulator was manufactured by FIB-CVD and used for actual manipulations. A glass capillary based local field emitter was developed and produced as a tool for spot deposition, and its electron field emission was confirmed. FIB-CVD is proven as an efficient fabrication technology of novel nanoelectromechanical devices.