预沉积ZnO薄膜对ZnO−MoS2/ZnO复合涂层结构与性能影响

目的 通过优化原子层沉积工艺获取不同厚度ZnO薄膜,研究ZnO薄膜晶体取向对ZnO?MoS2涂层生长结构的影响,获得具有优异摩擦学性能的ZnO?MoS2/ZnO复合涂层。方法 采用原子层沉积法在不锈钢基体上预沉积不同厚度的ZnO薄膜,再用射频磁控溅射技术继续沉积ZnO?MoS2涂层,制备ZnO?MoS2/ZnO固体润滑复合涂层。结果 X射线衍射分析发现,预沉积ZnO薄膜有诱导后续ZnO?MoS2涂层沉积生长的作用,预沉积100 nm厚ZnO薄膜的ZnO?MoS2/ZnO复合涂层显示出宽化的MoS2 (002)馒头峰,其截面形貌显示为致密的体型结构,获得的摩擦因数最低(0.08),纳米硬度最高(2.33 GPa),硬度/模量比显示该复合涂层的耐磨损性能得到提升;X射线光电子能谱分析结果表明,复合涂层表面游离S与空气中水发生反应程度大约为原子数分数5%,显示复合涂层耐湿性能较好;基于原子层沉积ZnO薄膜生长及其对后续ZnO?MoS2涂层生长的影响分析,提出了ZnO?MoS2/ZnO复合涂层磨损模型,阐明了ZnO薄膜对复合涂层结构及摩擦学性能的影响,并以该模型解释了200 nm厚 ZnO薄膜上沉积ZnO?MoS2涂层出现的摩擦因数由高到低的变化趋势及最终磨损失效现象。结论 合适的原子层沉积制备的ZnO薄膜有利于MoS2 (002)取向生长,可有效提升ZnO?MoS2/ZnO复合涂层的摩擦学性能;控制ZnO薄膜厚度,可实现ZnO薄膜与基底及ZnO?MoS2层间界面之间的优化结合,以制得具有较好摩擦学性能及使用寿命的ZnO?MoS2/ZnO复合涂层。     

高功率脉冲磁控溅射制备非晶碳薄膜研究进展

非晶碳薄膜主要由sp3碳原子和sp2碳原子相互混杂的三维网络构成,具有高硬度、低摩擦系数、耐磨损、耐腐蚀以及化学稳定性等优异性能。然而传统制备方法难以实现薄膜结构及其性能的综合调控,高功率脉冲磁控溅射因其离子沉积特性受到领域内专家学者的关注。总结了近年来关于高功率脉冲磁控溅射制备非晶碳薄膜材料的研究进展。重点介绍了高功率脉冲磁控溅射石墨靶的放电特性,指出了其在沉积非晶碳薄膜过程中获得高碳原子离化率的条件。针对离化率和沉积速率低,主要从提高碳原子离化率和碳离子传输效率等角度,介绍了几种改进的高功率脉冲磁控溅射方法。并对比了不同高功率脉冲磁控溅射方法中的碳原子离化特征、薄膜沉积速率、结构和力学性能。进一步地,探讨了高功率脉冲磁控溅射在制备含氢非晶碳薄膜和金属掺杂非晶碳薄膜中的优势及其在燃料电池、生物、传感等前沿领域的应用。最后,对高功率脉冲磁控溅射石墨靶的离子沉积特性、非晶碳薄膜制备及其应用研究趋势进行了展望。     

柔性硬质纳米复合涂层

研究了利用磁控溅射方法制备的柔性硬质纳米复合涂层。结果表明柔性硬质纳米复合涂层具有以下优异性能:是一类具有高硬度、高韧性以及抗裂纹性能的新型涂层;具有较高的硬度模量比(H/E*≥0.1,E*=E/(1-ν~2))、弹性恢复系数(We≥60%)、压应力(σ0)L,且少缺陷的微观结构;生长处于Thornton结构区域相图的T区。磁控溅射非常适合制备纳米复合涂层,文中将对其制备柔性纳米复合薄膜的机理做深入阐述。涂层生长主要受以下3个参数影响:涂层生长过程中吸收的能量Ep,其包含沉积原子携带的能量E_(ca)和轰击离子携带等能量E_(bi)(E_p=E_(ca)+E_(bi)),基体温度Ts和涂层材料的熔点T_m。柔性硬质涂层具有广泛的应用前景,如柔性保护涂层、柔性功能涂层、防脆性涂层开裂的柔性保护涂层以及柔性多层涂层。文中还将详细阐述低温磁控溅射制备柔性纳米复合涂层的原理,并阐述纳米复合涂层及其性能的发展趋势。     

多元等离子体浸没离子注入与沉积和磁控溅射技术制备TiAlSiN/WS_2多层薄膜的力学性能和腐蚀行为(英文)

为了降低超硬TiAlSiN复合涂层的摩擦因数,采用多元等离子体浸没离子注入与沉积和射频(RF)磁控溅射技术制备TiAlSiN/WS2多层薄膜,利用XRD、SEM、Raman光谱、纳米探针、摩擦和电化学试验对薄膜的微结构、力学性能和腐蚀行为进行测试与分析。SEM结果表明:TiAlSiN/WS2多层薄膜具有清晰的调制周期。纳米硬度结果表明,TiAlSiN/WS2多层薄膜硬度介于TiAlSiN和WS2涂层硬度之间。摩擦实验结果证实TiAlSiN/WS2多层薄膜的摩擦因数低于TiAlSiN涂层的,且摩擦过程平稳。此外,TiAlSiN/WS2多层薄膜表现出良好的抗腐蚀能力,在相对较小的调制周期内,其腐蚀电流密度显著降低。     

钼薄膜制备技术研究

具有体密度的高表面质量金属钼薄膜对材料高压状态方程研究具有十分重要的意义。本文介绍了制备钼薄膜的几种方法,包括:机械轧制、机械研磨抛光、化学气相沉积、电子束蒸发、脉冲激光沉积和磁控溅射。综合比较后认为,采用磁控溅射法制备的钼膜可以基本满足状态方程靶用钼(Mo)薄膜的需要。通过磁控溅射沉积方法可以制备出表面质量高,厚度可达几微米的金属Mo薄膜,其组织结构和密度接近块材而且薄膜表面不易出现硬化、沾污等问题。     

铜-钨(钼)薄膜制备及应用的研究进展

介绍了近年来铜-钨（钼）薄膜涂层的制备方法,包括溅射沉积法、离子束辅助沉积法、离子束混合法、电子束蒸发法。重点介绍了溅射法中的磁控溅射法和离子束溅射沉积法,分析了薄膜的结构特征及其在固体润滑剂、电子设备、表面修饰材料等领域的应用,并展望了未来的研究方向和应用前景,指出制备散热材料是未来铜-钨（钼）薄膜研究的主流方向。     

直流、射频磁控溅射制备钌薄膜的微观结构及电学性能分析

为了探索直流和射频磁控溅射制备钌薄膜的微观结构及性能差异,进而指导薄膜制备工艺优化。采用直流和射频磁控溅射法在SiO2/Si(100)衬底上沉积不同时间和温度的钌薄膜;通过高分辨场发射扫描电镜、X射线衍射仪、原子力显微镜、四探针等方法研究不同溅射电源下制备的钌薄膜的微观结构和电学性能。结果表明,在相同溅射条件下,DC-Ru薄膜的结晶性优于RF-Ru薄膜;其厚度大于RF-Ru薄膜,满足tDC≈2tRF;其沉积速率高于RF-Ru薄膜,满足vDC≈2vRF。然而,其电阻率却高于RF-Ru薄膜,这主要得益于RF-Ru薄膜的致密度较高,从而降低了电子对缺陷的散射效应。     

2021高功率脉冲磁控溅射技术与应用专题会议通知（第一轮）

正以高功率脉冲磁控溅射技术(HiPIMS)为代表的高离化磁控溅射技术作为一种新的物理气相沉积技术,可以明显提高薄膜结构可控性,进而获得优异的薄膜性能,在国内外研究领域和工业界受到了广泛关注和重视。为推动该技术的进步,国际上已经形成了HiPIMSToday等一系列的国际会议对该技术放电机理、脉冲形式、等离子体输运与诊断、以及薄膜/涂层沉积与应用等多个方面进行专题研讨,为其发展与应用带来了蓬勃动力!中国机械工程学会表面工程分会作为全国性的学术组织,     

ZnO的电化学制备及银修饰对其光催化的影响

目的优化ZnO电化学制备工艺,使用银修饰提高薄膜的光催化性能。方法采用单因素实验,对薄膜的活性和稳定性进行评价,研究电化学和光催化沉积银的氧化锌薄膜的光催化活性和稳定性,研究空穴剂、光催化时间、硝酸银的浓度对氧化锌薄膜的影响。使用扫描电子显微镜(SEM)、X射线衍射仪(XRD)对膜层进行表征。结果电流密度为3.33 m A/cm2,电解10 min时,制备的纯氧化锌薄膜金橙II脱色率最好,且脱色时间与脱色率成正相关。电化学沉积银的薄膜有严重的脱落现象,误差较大。加入0.05 mol/m L的硝酸银,光催化10 min的光催化沉积氧化锌薄膜的稳定性、去除率较好,脱色率最小。选取的空穴清除剂中,加入0.05 mol/m L乙醇时,薄膜没有脱落现象,脱色率较低。光催化沉积银的氧化锌薄膜在2θ=30.92°和26.3°处有ZnO的最强峰,在2θ=37.9°处有Ag的最强峰。结论电流强度为20 m A,电解时间为10 min,硝酸锌浓度为0.5 mol/m L,硝酸银浓度为0.05 mol/m L,空穴清除剂乙醇浓度为0.05 mol/m L,光催化时间为10 min时,制备的薄膜最适宜。经过银修饰的氧化锌薄膜明显比纯氧化锌薄膜光催化效果好。在制备银修饰氧化锌薄膜时加入空穴清除剂,其光催化效果明显又比不加空穴清除剂的光催化效果好。     

涂层和薄膜态准晶材料的研究现状及展望

准晶材料兼具硬度高、摩擦系数小、耐磨损、耐腐蚀、表面能低等特性,有着十分广阔的应用前景。但受限于本征脆性,准晶材料不能作为结构件单独使用,涂层和薄膜形态成为研究热点。综述了准晶涂层和薄膜的几种制备工艺,主要介绍了热喷涂技术、激光熔覆技术、电子束沉积技术、真空蒸镀技术、磁控溅射技术,并对这几种镀膜技术的特点进行了归纳、对比、总结。详细概述了制备过程中涂层和薄膜的生长过程、生长机理,为之后相关研究工作奠定了良好的基础。对结构和性能的研究现状及在界面结合、组织转变、后续热处理工艺中面临的问题进行了讨论,性能方面主要包括准晶涂层和薄膜优良的抗氧化、耐腐蚀、耐磨损性能及其优异的不粘性,并对存在的相关问题提出了一些可能的解决方案。最后对准晶涂层和薄膜更先进的制备方法以及准晶材料在热障涂层、不粘涂层和固体润滑剂等方面的应用前景进行了展望。     

Comparative study of the morphological degradation in nickel thin films exposed to H<Subscript>2</Subscript>S media and deposited by magnetron sputtering and electrolytic process

Nickel thin films with regular configuration and similar thickness were deposited on steel AISI 1018 (UNSG 10180) by two different techniques: magnetron sputtering and electrolytic process. The main aim of this work is to compare the surfaces deposited films made by the two techniques using the scanning electronic microscopy and to identify their morphological differences and imperfections. We evaluate the protective coatings properties when the films are in contact with an acid medium. We also study the thin films coatings by the spectroscopy impedance technique. We obtain that the sputtering deposits present a homogeneous thin film coating that is better than the one obtained by the electrolytic technique. It is expected that the thin film coatings made in this work can protect the steel against corrosion when it is in contact with an acid environment.     

TiAlN硬质薄膜/涂层材料的研究进展

概述了TiAlN硬质薄膜/涂层材料的基本性质、应用及制备技术的发展。介绍了国内外利用磁控溅射法(MS)、空心阴极离子镀(HCD)、多弧离子镀等镀膜工艺制备TiAlN硬质薄膜材料的最新研究进展。TiAlN薄膜应用于切削加工、航空、航天和模具中的优良性能。     

Tarnishing resistance of silver–palladium thin films

Ag–Pd decorative coatings are supposed to provide better tarnishing resistance as compared to pure Ag, while keeping good optical (brightness) and mechanical properties (ductility). Palladium has a similar optical appearance as silver, and forms a thin protective oxide surface layer. Thus, a small incorporation of Pd in Ag could improve its tarnishing resistance.

Thin Ag–Pd films were deposited by magnetron co-sputtering from Pd and Ag targets. The Ar gas pressure, target power and substrate temperature were varied to modify the chemical composition of the films and optimise their properties.

The optical properties of the films were evaluated by spectroscopic ellipsometry and colorimetry. Increasing Ar gas pressure and substrate temperature results in a drastic decrease of the specular reflectivity of the films. At constant deposition conditions the reflectivity of the Ag–Pd films decreases with increasing Pd content.

The film hardness, evaluated by nanoindentation, increases with Pd content.

The tarnishing resistance of the films was evaluated by sulphidation tests. The colour change of the films due to the sulphidation was measured by colorimetry. The nature of chemical bonds of the tarnished products was evidenced by XPS. The results suggest an improvement of tarnishing resistance of the Ag–Pd films with increasing Pd content.     

The wet corrosion of molybdenum thin film – Part III: The effect of Ti and Nb

Magnetron sputtering has become the process of choice for the deposition of a wide range of industrially important coatings. Over the last decade, interest in molybdenum thin films prepared by magnetron sputtering has been increasing; however, little research has been done on molybdenum‐titanium and molybdenum‐niobium alloy thin films. During the current study, electrochemical impedance spectroscopy (EIS) was employed to investigate the effect on the corrosion resistance in basic chloride environments of adding titanium and niobium species to molybdenum thin films deposited by physical vapor deposition. The results indicate that the MoTi alloy thin films exhibit better protective properties than either the molybdenum‐niobium alloy or unalloyed molybdenum thin films.     

Microstructure and mechanical properties of pulsed DC magnetron sputtered nanocomposite Cr-Cu-N thin films

The nanocomposite Cr-Cu-N thin films have been deposited at a substrate temperature of 250 °C by a bipolar asymmetric pulsed DC reactive magnetron sputtering process. Different Cu contents ranging from 0.4 to 14.9 at.% were achieved. The structures of Cr-Cu-N thin films were analyzed by XRD. The surface and cross sectional morphologies of thin films were examined by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The nanoindentation and scratch tests were adopted to evaluate the mechanical and tribological properties of Cr-Cu-N coatings. The influences of Cu content on the structure, mechanical and tribological properties of Cr-Cu-N coatings were explored. It is observed that the columnar structure no longer exists when the Cu content exceeds 10.9 at.%. The stability of CrN phase in the coating is influenced by the Cu content. The scratching coefficient of thin films decreases with increasing Cu content. Sufficient adhesion and tribological properties of Cr-Cu-N coatings are achieved. The maximum average hardness around 20 GPa and scratching coefficient around 0.1 are found in the coatings with around 2.1 to 2.6 at.% Cu in this work.     

N2流量对室温磁控溅射制备Ti-N薄膜太阳能光谱吸收特性的影响

利用非平衡磁控溅射技术,在室温条件下制备了一系列不同N2流量的Ti-N薄膜,研究了N2流量对薄膜微观形貌和光学性能的影响。根据分析结果设计并制备了四层结构的Ti-N太阳能选择性吸收薄膜,通过软件对薄膜进行了优化设计并进行了实验验证。结果表明,随着N2流量的增加,薄膜的微观形貌发生变化,逐渐出现气泡状沉积物及气泡破裂状形貌,直至变为无定型态。通过紫外-可见-近红外光谱分析可知,选用合适的工艺可有效提高太阳能吸收薄膜光学性能,利用软件对薄膜进行优化设计可使薄膜光学性能获得进一步改进,经过优化的薄膜吸收率达0.9048,可用作太阳能光谱选择性吸收薄膜。     

Recent advances in modulated pulsed power magnetron sputtering for surface engineering

Over the past 10 years, the development of high-power pulsed magnetron sputtering (HPPMS) has shown considerable potential in improving the quality of sputtered films by generating a high degree of ionization of the sputtered species to achieve high plasma density by using pulsed, high peak target power for a short period of time. However, the early HPPMS technique showed a significantly decreased deposition rate as compared to traditional magnetron sputtering. Recently, an alternative HPPMS deposition technique known as modulated pulsed power (MPP) magnetron sputtering has been developed. This new sputtering technique is capable of producing a high ionization fraction of sputter target species and while at the same time achieving a high deposition rate. This paper is aimed at giving a review of recent advances in the MPP technique in terms of the plasma properties, the improvements in the structure and properties of the thin films, and the important advances in the high rate deposition of high quality thick coatings on the order of 20–100 μm in thickness.     

Influence of bilayer period and thickness ratio on the mechanical and tribological properties of CrSiN/TiAlN multilayer coatings

Nanostructured CrSiN/TiAlN multilayer coatings were deposited by a bipolar asymmetric reactive pulsed DC magnetron sputtering system. The thickness ratio of CrSiN to TiAlN layers was fixed at 1:1. The bilayer periods of the coatings were controlled to be from 6 to 40 nm. Furthermore, two CrSiN/TiAlN multilayer coatings with the same bilayer period (20 nm) but different CrSiN/TiAlN thickness ratios (2:8 and 8:2) were also deposited to explore the influence of thickness ratio on the mechanical properties of the multilayer coatings. The crystalline structures of the coatings were determined by a glancing angle X-ray diffractometer. The microstructures of thin films were examined by a scanning electron microscopy and a transmission electron microscopy, respectively. A nanoindenter, a micro Vickers hardness tester, and a pin-on-disk wear tester were used to evaluate the hardness, the toughness and the tribological properties of the thin films, respectively. The maximum hardness of the multilayers was obtained when the bilayer period was at 10 nm for the coating with the same thickness ratio of CrSiN to TiAlN layers (1:1). Meanwhile, the thickness ratio of CrSiN to TiAlN layer had great influence on the hardness and the toughness properties of the multilayer coatings. The hardness and the toughness of the CrSiN/TiAlN multilayer coatings increased as the individual TiAlN layer thickness increased.