预处理和溅射工艺参数对锆合金表面TiN涂层膜/基结合强度的影响

为获得高结合强度锆合金表面涂层的制备技术，采用磁控溅射法制备了TiN涂层、划痕法测试了膜/基结合强度，研究了基体预处理表面粗糙度、溅射功率、基体加热温度和基体偏压对锆合金表面TiN涂层膜/基结合强度的影响。实验制备的TiN涂层厚度在5～15 μm范围内、基体预处理表面粗糙度在（0.20±0.03） μm范围内时，溅射功率为500 W及基体加热至300 ℃时涂层均有较好的结合强度。基体偏压为-100 V时涂层在所讨论的4种基体偏压中具有最好的结合强度。结果表明，溅射工艺参数对涂层膜/基结合强度有显著影响，其中影响显著性从大到小依次为基体加热温度、基体偏压、溅射功率、基体预处理表面粗糙度。     

铀表面纳米铌镀层的组织结构与界面特性

采用磁控溅射离子镀技术在贫铀表面以不同偏压制备了铌镀层,利用X射线衍射仪和扫描电镜对镀层的组织结构进行了表征,利用扫描电镜与俄歇电子能谱仪对镀层与基体的界面特性进行了研究。结果表明：铌镀层平整致密,但存在靶材飞溅颗粒形成的镀层缺陷,铌镀层为体心立方结构,存在择优取向、内应力以及晶粒细化等特性且为纳米镀层;铌镀层沿基体表面的法线方向生长且为典型的柱状结构,其表面为均匀的条状颗粒组织;铌镀层与铀基体结合紧密,且存在“伪扩散层”。     

铀表面脉冲偏压MSIP铝镀层的电化学腐蚀行为

采用脉冲偏压磁控溅射离子镀（MSIP）技术在贫铀表面制备铝镀层，利用电化学测试技术、扫描电镜（SEM）及X射线能谱（EDS）对铝镀层在50μg/gCl－水溶液中的电化学腐蚀行为进行研究。结果表明：铝镀层的腐蚀电位－534.8mV高于贫铀的腐蚀电位－641.2mV，它对贫铀是一种阴极性镀层；镀铝贫铀样品的极化电阻和电化学阻抗幅值远大于贫铀，腐蚀电流远小于贫铀，铝镀层对贫铀基体具有良好的防腐蚀性能；镀铝贫铀样品的腐蚀特征为局部腐蚀，并出现镀层破裂、剥落，抗腐蚀性能变差；铝/铀界面伪扩散层具有一定的抗腐蚀能力。     

偏压对铀表面多弧离子镀Ti/TiN多层膜的结构及抗腐蚀性能影响研究

在不同偏压下,利用多弧离子镀技术在U和Si基体上制备了Ti/TiN多层薄膜。利用X射线衍射仪和扫描电镜对多层膜的组织结构和薄膜界面形貌进行了分析。研究表明：脉冲偏压不但影响多层膜物相各衍射峰的强度,还诱导新相Ti₂N的出现。制备的多层膜呈“犬牙”交错的层状、柱状结构生长。随脉冲偏压的增加,柱状晶结构细化,薄膜变得更加致密。通过50μg/gCl^－溶液腐蚀研究表明：Ti/TiN多层膜提高抗腐蚀性能源于层状失效,使得腐蚀介质到达基体更加困难,抗腐蚀性能优良。     

偏压对铀上磁控溅射铝镀层微结构及残余应力的影响

分别用扫描电镜、X射线衍射仪和应力分析仪研究了5种不同偏压的施加对铀上磁控溅射铝镀层微结构和残余应力的影响.结果表明,偏压强烈影响镀层的组织.-300V下的组织致密性最差,低偏压下的优于未加偏压(0 V)的;偏压在-200 V及以下时的铝镀层择优取向于(111)低能晶面,高于-200 V时,择优取向由(111)转变为(200)晶面.不同偏压条件下制备的铝镀层的残余应力均较小,为数十MPa量级,但随着偏压的逐渐增加,残余应力由拉应力向压应力转变.     

U表面Al及Ti/Al双重镀层的电化学腐蚀行为

采用动电位极化技术和扫描电镜(SEM)对U表面Al及Ti/Al双重镀层在含50μg/gCl^－的KCl溶液中的电化学腐蚀行为进行研究。研究结果表明：U表面Al镀层和Ti/Al双重镀层的腐蚀为局部腐蚀，其腐蚀速度明显低于裸体U，能够对U表面提供较好的保护。Al镀层相对U基体为阳极性镀层，能对U基体提供牺牲性保护；Ti镀层相对U基体为阴极性镀层，对U基体的保护是基于镀层对腐蚀介质的物理屏障作用。     

热管堆堆芯基体结构高温力学行为分析

为研究热管堆堆芯基体结构高温下的热应力失效行为，以简化的多孔基体结构为研究对象，结合Megapower 5 MW（热功率）热管堆的设计参数，制定了正常工况和异常工况2种工况下的高温试验方案，其中异常工况考虑了单根热管失效。宏观检测结果显示基体结构未发生明显的变形与失效，结合数值分析方法获得了基体结构在2种工况条件下的温度分布和应力-应变响应，进一步说明了在试验条件下基体结构并不会发生静强度失效和塑性垮塌失效。本研究为明确热管堆堆芯基体结构的强度设计准则奠定了基础。     

贫铀表面脉冲电镀镍层的腐蚀机理研究

利用扫描电镜、X射线能谱仪及电化学测试技术对贫铀表面脉冲电镀镍层的腐蚀机理进行了研究。结果表明：在含50μg／g Cl^-的KCl溶液中，首先，在铀表面镍镀层的孔隙处发生腐蚀并逐渐扩展到铀／镍界面；腐蚀产物在界面的积累导致镍镀层开裂；镍对铀是一种阴极性镀层，铀镍接触发生电偶腐蚀，镍对铀的保护作用基于镍镀层对腐蚀介质的物理屏障，提高镀层的致密性可改善镍镀层对铀基体的抗腐蚀能力。     

脉冲负偏压对沉积类金刚石薄膜结构和摩擦性能的影响

在不同的基台脉冲负偏压下,利用微波-ECR等离子体化学气相沉积技术在单晶硅表面制备了类金刚石薄膜,利用傅立叶变换红外吸收光谱和原子力显微镜对薄膜的结构和形貌进行了表征,最后对薄膜的摩擦系数进行了测试.结果表明:制备的薄膜具有典型的含H类金刚石结构特征,薄膜致密均匀,表面粗糙度很小.随着负偏压的增大,红外光谱中2800-3000 cm-1波段的C-H伸缩振动吸收峰的强度先升高后降低,并在负偏压为200 V时达到最大;薄膜的摩擦系数而是先降低再升高,在负偏压为200 V时达到最小.     

用离子束技术制备的铝和铝—镁镀层在水溶液中的腐蚀研究

用拉力实验检验Ａｌ和Ａｌ－Ｍｇ镀层在基体金属ＥＮ８钢上的附着力；在ＰＨ＝５．６的醋酸缓蚀液中测量样品的腐蚀电位和进行浸泡实验。结果表明，镀层中的镁元素能有效地对样品进行阴极保护，提出了样品的耐腐蚀性能。     

Simulation of thermal stress in Er2O3 and Al2O3 tritium penetration barriers by finite-element analysis

The physical vapor deposition method is an effective way to deposit Al2O3 and Er2O3 on 316L stainless steel substrates acting as tritium permeation barriers in a fusion reactor.The distribution of residual thermal stress is calculated both in Al2O3 and Er2O3 coating systems with planar and rough substrates using finite element analysis.The parameters influencing the thermal stress in the sputter process are analyzed,such as coating and substrate properties,temperature and Young's modulus.This work shows that the thermal stress in Al2O3 and Er2O3 coating systems exhibit a linear relationship with substrate thickness,temperature and Young's modulus.However,this relationship is inversed with coating thickness.In addition,the rough substrate surface can increase the thermal stress in the process of coating deposition.The adhesive strength between the coating and the substrate is evaluated by the shear stress.Due to the higher compressive shear stress,the Al2O3 coating has a better adhesive strength with a 316L stainless steel substrate than the Er2O3 coating.Furthermore,the analysis shows that it is a useful way to improve adhesive strength with increasing interface roughness.     

316L不锈钢基材功能梯度Al涂层残余热应力分析

涂层材料的功能性和可靠性在很大程度上受残余热应力的影响,为降低残余热应力防止涂层开裂以及提高其热机械性能,利用有限元方法对Al/316L系梯度功能材料在制备过程中产生的残余热应力分布进行分析,详细讨论了成分分布指数、涂层厚度和梯度层数目对应力大小和分布的影响.分析结果表明成分分布指数的增大不但影响涂层和基体界面的应力大小,还影响涂层中热应力峰值所处位置;涂层残余应力随着梯度层厚度的增加而减小;梯度层数的增多,有利于涂层中残余热应力的缓和,但当梯度层数达到9时,缓和效果并不明显.     

磁控溅射制备金属铀膜

研究了通过磁控溅射方法制备高纯金属铀膜的可行性。采用X射线衍射（XRD）、俄歇电子能谱（AES）、扫描电镜（SEM）、表面轮廓仪分析了沉积在单晶硅或金基材上铀薄膜的微观结构、成分、界面结构及厚度、表面形貌和表面粗糙度。分析结果表明：磁控溅射制备的铀薄膜为纯金属态,氧含量和其它杂质含量均低于俄歇电子能谱仪的探测下限;溅射沉积的铀镀层与铝镀层之间存在界面作用,两者相互扩散并形成合金相,扩散层厚度约为10nm。铀薄膜厚度可达微米级,表面光洁,均方根（RMS）粗糙度优于15nm。     

Properties of Electrodeposited Tungsten Coatings on Graphite Substrates for Plasma Facing Components

Tungsten coating on graphite substrate is considered as one of promising candidate materials of plasma facing components. In this study, tungsten coatings on graphite substrate were successfully prepared by direct current (DC) and pulse current (PC) electrodeposition methods in Na₂WO₄–WO₃ molten salt under the air atmosphere. Pores were found on the surfaces of the tungsten coatings produced by DC electrodeposition method. For the coatings fabricated by PC method, compact and smooth tungsten coatings were successfully obtained. The crystal structure, morphology, density, microhardness, adhesive strength, oxygen content and the thermal conductivity of the coatings fabricated by PC method were investigated. The obtained tungsten coatings had a body centered cubic structure. After electro-deposition for 100 h, the thickness of the tungsten coating reached 810.02 ± 10.40 μm and the oxygen content was 0.03 wt%. The thermal conductivity of the tungsten coating was 134.29 W m^?1 K^?1. The density of the tungsten coating was 18.83 g cm^?3. The hardness of the coating was 492.0 ± 7.8 HV. After deuterium plasma irradiation, the tungsten coatings were prone to blistering.     

Structure and Tribological Properties of CrTiAlN Coatings Deposited by Multi-Arc Ion Plating

CrTiAlN coatings were prepared by using a home-made industrial scale multi-arc ion plating system. The coatings were found to be composites of face-center-cubic CrN and TiN. The surface roughness, microhardness, and tribological properties of the films were significantly affected by the nitrogen pressure and dc-pulsed bias voltage applied to the substrate. The CrTiAlN coatings with the smoothest surfaces were obtained at optimum conditions of nitrogen pressure of 5.0 Pa and bias voltage of -200 V. The samples were found to exhibit a hardness of 2900 HV0.05 with an average friction coefficient of 0.16 and wear rate of 1.5×10-16 m3/N?m against cemented carbide.     

Phase and microstructure of tungsten coating on C/C composite prepared by double-glow plasma

W-coated C/C composite is the most interesting as the ITER plasma facing components. In this paper, a dense W-modified layer was prepared on the C/C composite substrate by double-glow plasma method using pure W as target. Argon was input into the chamber as the plasma and the reactive gas. Phase and microstructure of as-prepared coating were examined by the X-ray diffraction and scanning electron microscopy, respectively. The results indicated that the dense W-modified layer could be successfully coated on the surface of the C/C composite substrate by double-glow plasma method. The W-modified layer was made of many columnar grains extending perpendicularly outward from the C/C composite substrate. There was a transition layer honeycomb-like between W coating and the C/C composite substrate. The adhesive force of the W coating and C/C substrate was about 21 N.