蓝湿皮酶软化的特性研究

以自行研制的一种复合酶为软化剂 ,研究了 p H值、反应温度、反应时间、酶用量以及铬含量对猪蓝湿皮软化效果的影响 ,其软化效果以软化液中羟脯氨酸的浓度增量来表征。研究结果表明 :通过蓝湿皮软化来改善成品革的质量是可行的 ,而且有明显的效果 ;以软化液中羟脯氨酸的浓度来表征软化效果是一个有效的方法 ;当用该复合酶软化猪蓝湿皮时 ,最适 p H值范围为 6 .0 - 6 .5 ;反应温度在 4 0 - 6 5℃之间时 ,软化效果随温度的升高而增大 ;在 5 5℃条件下 ,该酶有很好的热稳定性 ,能长时间保持活力不衰减 ;最适酶用量为 30 0 U/ g试样 ;蓝湿皮的铬含量对软化效果有影响 ,用该方法处理的蓝湿皮 ,其铬离子质量含量一般应≤ 2 .5 %。     

Luminescent Properties of Nanometer Si with Embedded Structure

Blue luminescence at about 431nm is obtained from epitaxial silicon after C^ implantation,annealing in hydrogen ambience and chemical etching sequentially. When annealed in nitrogen ambience and etched accordingly, there is a much narrower peak at about 430nm. During C^ implantation,C=O compounds are introduced into and embedded in the surface of nanometer Si formed during annealing,at last, nanometer silicon with embedded structure is formed,which contributes to the blue emission.     

Inductively coupled plasma etching of InGaP, AllnP, and AlGaP in Cl2 and BCl3 chemistries

Dry etching of InGaP, AlInP, and AlGaP in inductively coupled plasmas (ICP) is reported as a function of plasma chemistry (BCl₃ or Cl₂, with additives of Ar, N₂, or H₂), source power, radio frequency chuck power, and pressure. Smooth anisotropic pattern transfer at peak etch rates of 1000–2000Å·min^?1 is obtained at low DC self-biases (?100V dc) and pressures (2 mTorr). The etch mechanism is characterized by a trade-off between supplying sufficient active chloride species to the surface to produce a strong chemical enhancement of the etch rate, and the efficient removal of the chlorinated etch products before a thick selvedge layer is formed. Cl₂ produces smooth surfaces over a wider range of conditions than does BCl₃.     

红外焦平面用面阵微透镜的氩离子束刻蚀制作

讨论了制作大面阵矩底拱面状微透镜阵列的工艺条件，给出了氩离子束刻蚀制作红外焦平面用面阵微透镜的离子束刻蚀速率的经验关系式，通过实验获得了光电材料几种常用的氩离子束刻蚀速率与氩离子束能量之间的关系曲线，用扫描电子显微镜测量了所制微透镜阵列的微结构形貌特征。     

国外离子束系统（IBS）发展概况

综述了国外离子束刻蚀和沉积系统的研究进展，指出了离子束系统在半导体技术研究，开发和生产中的重要性。     

低压铝箔交流腐蚀研究

在３０Ｈｚ频率下，通过铝箔在ＨＣｌ＋Ｈ２ＳＯ４＋ＨＮＯ３＋Ｈ３ＰＯ４体系中的交流腐蚀，研究腐蚀液组成中腐蚀主体及缓蚀剂对铝箔腐蚀的作用，探讨腐蚀过程中电源频率、腐蚀液温度、电流密度及腐蚀时间对铝箔腐蚀的影响。腐蚀液组成的配比恰当，有利于比容的提高。在特定的频率下采用合适的腐蚀液温度、适宜的电流密度和腐蚀时间可以提高铝箔的静电容量。     

湿法停炉保护优点多 建议采用YZ—101防腐阻垢剂作为湿法炉保护剂

介绍了湿法炉保护的作用原理,YZ—101防腐阻垢剂的使用方法、注意事项以及使用后所带来的经济效益。     

Irradiation of large area Mylar membrane and characterization of nuclear track filter

Ion irradiation of Si⁸⁺ ion beam of 100 MeV was scattered by a gold foil on a Mylar membrane of 25 Μm thickness in the form of film roll (width, 12.5 cm and length, 400 cm) at the Nuclear Science Centre, New Delhi. The characterization of etched nuclear tracks was carried out by gas permeation measurements. The samples cut from the film roll of required size for permeability measurements were etched in a controlled manner in a constant temperature bath of 6N NaOH solution. The opening of the conical etched tracks was characterized by hydrogen gas permeation.     

硫酸/盐酸比例和Al~(3+)含量对铝箔隧道孔生长的影响

研究了硫酸/盐酸比例、温度和Al3+含量对高纯铝箔隧道孔生长的影响,发现随着硫酸浓度增加,温度对隧道孔极限长度和孔径的影响减小,在本文条件下隧道孔生长的临界温度最低可降低到35℃。在电解液中一定含量的Al3+可以避免铝箔表面形成大孔,从而改善隧道孔分布均匀性。     

硫氰酸钠湿纺腈纶设备的孔蚀与防护

本文重点讨论了硫氰酸钠湿纺腈纶设备因钝化膜缺陷和Cl-侵入而产生孔蚀的机理及环境因素对孔蚀的影响,并针对产生孔蚀的主要原因提出了防护措施。