Neural approach for temperature‐dependent modeling of GaN HEMTs

Gallium nitride high electron‐mobility transistors have gained much interest for high‐power and high‐temperature applications at high frequencies. Therefore, there is a need to have the dependence on the temperature included in their models. To meet this challenge, the present study presents a neural approach for extracting a multi‐bias model of a gallium nitride high electron‐mobility transistors including the dependence on the ambient temperature. Accuracy of the developed model is verified by comparing modeling results with measurements. Copyright © 2014 John Wiley & Sons, Ltd.     

Atomic-layer-deposited Al2O3 and HfO2 on GaN: A comparative study on interfaces and electrical characteristics

Al₂O₃, HfO₂, and composite HfO₂/Al₂O₃ films were deposited on n-type GaN using atomic layer deposition (ALD). The interfacial layer of GaON and HfON was observed between HfO₂ and GaN, whereas the absence of an interfacial layer at Al₂O₃/GaN was confirmed using X-ray photoelectron spectroscopy and transmission electron microscopy. The dielectric constants of Al₂O₃, HfO₂, and composite HfO₂/Al₂O₃ calculated from the C-V measurement are 9, 16.5, and 13.8, respectively. The Al₂O₃ employed as a template in the composite structure has suppressed the interfacial layer formation during the subsequent ALD-HfO₂ and effectively reduced the gate leakage current. While the dielectric constant of the composite HfO₂/Al₂O₃ film is lower than that of HfO₂, the composite structure provides sharp oxide/GaN interface without interfacial layer, leading to better electrical properties.     

The effects of gate length variation and trapping effects on the transient response of AlGaN/GaN HEMT’s on SiC substrates

In AlGaN/GaN heterostructure field-effect transistors, the surface defects and dislocations may serve as trapping centers and affect the device performance via leakage current. In this paper we report results of our investigation of the trapping characteristics of Al_0.25Ga_0.75N/GaN HEMT using the Conductance Deep Level Transient Spectroscopy (CDLTS). Two deep level electronic defects were observed labeled E₁ and HL₁, with activation energies E_a1 = 1.36 eV and E_a2 = 0.63 eV. The hole-trap HL₁ is characterized for the first time in our studies. We identified the characteristics of the traps at the AlGaN/GaN interface adjoining the channel and the surface along the ungated region between the gate and the drain, as well as the effects of the surface traps.     

Temperature dependence of Al/Ti-based Ohmic contact to GaN devices: HEMT and MOSFET

In this paper two types of Al/Ti-based Ohmic contacts to Gallium Nitride (GaN) based devices are presented; ImplantedN⁺GaN (like the ones found in the Source/Drain of GaN Metal Oxide Semiconductor Field Effect Transistors-MOSFET) and heterojunction (HJ) AlGaN/GaN contacts (Source/Drain of High Electron Mobility Transistors-HEMT). Sheet resistance (R_sh) and contact resistance (R_c) have been investigated in the temperature (T) range of 25-250 °C. It was found that the R_sh (850/700 Ω□) (25/250 °C) and R_c (2.2/0.7 Ωmm) decrease with T for ImplantedN⁺GaN contact and R_sh (400/850 Ω□) and R_c (0.2/0.4 Ωmm) (weakly for R_c) increase with T for HJAlGaN/GaN contact. Numerical computation based models are used to determine the theoretical R_sh and R_c behavior with T and to fit the experimental values.     

GaN发光二极管的老化数学模型及寿命测试方法

GaN发光二极管因其寿命、效率和环保等优点得到了广泛的应用。寿命问题一直是限制GaN发光二极管应用的核心问题。为了研究GaN发光二极管的老化过程,计算了GaN发光二极管物理参数,分析了GaN发光二极管的深能级缺陷和非辐射复合中心增加的老化原理,并且针对该原理的老化过程进行物理原理的分析推导,进而建立了老化数学模型。同时,利用一组实际的GaN发光二极管大应力老化实验的数据进行计算,提出了利用该数学模型的GaN发光二极管寿命的测试方法和数学计算方法,并计算出实验GaN发光二极管的寿命数值。提出的GaN发光二极管老化数学模型对比传统的阿伦纽斯模型具有针对性强、物理意义明显和寿命预测准等优点,具有很好的实际应用价值。     

Tuning the spectrometric properties of white light by surface plasmon effect using Ag nanoparticles in a colour converting light-emitting diode

We report on the spectral tunability of white light by localized surface plasmon (LSP) effect in a colour converting hybrid device made of CdSe/ZnS quantum dots (QDs) integrated on InGaN/GaN blue light-emitting diodes (LEDs). Silver (Ag) nanoparticles (NPs) are mixed with QDs for generating LSP effect. When the plasmon absorption of Ag NPs is synchronized to the QW emission at 448 nm, the NPs selectively absorb the blue light and subsequently enhance the QD emission. Using this energy transfer scheme, the (x, y) chromaticity coordinates of the hybrid white LED was tuned from (0.32, 0.17) to (0.43, 0.26), and thereby generated warm white light emission with correlated colour temperature (CCT) around 1800 K. Moreover, a 47% enhancement in the external quantum efficiency (EQE) was realized.     

Efficiency droop behavior of GaN-based light emitting diodes under reverse-current and high-temperature stress

The efficiency droop behavior of GaN-based light emitting diodes (LEDs) is studied when the LEDs are under reverse-current and high-temperature stress tests respectively. It is found that reverse-current stress mainly induces additional non-radiative recombination centers within the active region of InGaN/GaN multiple quantum wells, which degrade the overall efficiency of the GaN LED under test but push the peak-efficiency-current towards higher magnitude. The up-shift of peak-efficiency-current can be explained by a rate-equation model in which the newly-created defects by reverse-current stress enlarge the dominant low-current region of non-radiative recombinations. Comparatively, high-temperature stress mainly increases the series resistance of the LED under test. Although the overall efficiency of the GaN LED also drops, there is no shift of peak-efficiency-current induced by the high-temperature stress.     

梯度掺杂结构GaN光电阴极的激活工艺研究

利用自行研制的光电阴极多信息量测试评估系统,在线测试了梯度掺杂结构GaN光电阴极在激活过程中的光电流、Cs源电流和O源电流。根据激活后的阴极光谱响应曲线和量子产额曲线,分析了超高真空室真空度、激活前的阴极表面净化程度、激活中首次进Cs量、激活中的Cs/O比以及Cs/O源在激活中的供给方式等对阴极激活的影响,提出了梯度掺...     

不同形状InN/GaN量子点应变场的有限元分析

量子点中的应变场分布对量子点的力学稳定性、压电性能以及光电性能有着重要的影响。基于有限元方法,并考虑了InN/GaN材料的六方纤锌矿结构特性,分别对透镜形、平顶六角金字塔形和六角金字塔形量子点的应变分布进行了比较,结果表明应变主要集中在浸润层和量子点内,在讨论量子点中电子能级时必须考虑浸润层的影响。量子点内的应变分布及静水应变和双轴应变受几何形状的影响明显。此外还计算了三种形状量子点的总能量,六角金字塔形量子点总能量最小,而透镜形量子点总能量最大,因此六角金字塔形是最稳定的结构,而透镜形是最不稳定的结构。     

LED用非极性GaN外延膜的制备技术进展

GaN是实现白光LED的关键材料。GaN外延膜通常沿极性c轴生长,基于极性GaN的LED有源层量子阱中由于强内建电场的存在而导致器件发光效率降低,而沿非极性面生长的GaN外延膜可以改善或消除极化效应导致的辐射复合效率降低和发光波长蓝移等问题。文章总结了非极性GaN外延膜的制备技术及研究进展,包括平面外延技术和横向外延过生长技术,指出开发非极性GaN自支撑衬底、发展非极性GaN的横向外延生长技术是制备低位错密度非极性GaN的研究方向。