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A ferroelectric memory diode that consisted of Au/PZT/BIT/p-Si multilayer configuration was fabricated by pulsed laser deposition (PLD) technique. The reliability issues (I-V characteristics, capacitance retention, fatigue and imprint) were investigated. The I-V curve showed the conventional Schottky diode characteristics with a small current density of - 5.3×10 -10 A/cm2 at a voltage of - 4 V and 6.7×10-8 A/cm2 at a voltage of + 4V, and this characteristic can be maintained below 50℃. The capacitance variety of the ferroelectric diode was only 5 % in 10 hours after withdrawing the applied bias of + 5 V or - 5 V, indicating the diode had good capacitance retention. By applying 100 kHz bipolar pulses of 5 V amplitude, the decay in remanent polarization was only 10% after 109 switching cycles, and meanwhile the increase in coercive field was 12%. After being irradiated for 20 min with a 200 W ultraviolet ray lamp, the remanent polarization and coercive field had both varied, and a voltage shift was obse 相似文献
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研究了热分解气氛对溶胶-凝胶法制备在Pt/Ti/SiO2/Si衬底上的Bi3.25La0.75Ti3O12 (BLT)薄膜铁电性能的影响.在400℃时空气或氧气气氛下热分解20min,接着在700℃时氧气气氛下退火30min.氧气气氛下的热分解能充分分解掉薄膜中的有机成分,而空气气氛下的热分解使炭、氢有机成分部分残留在薄膜中.有机成分的不完全分解影响了退火过程中BLT薄膜晶化时晶粒的生长.表现出生长取向和晶粒尺寸对BLT薄膜铁电性能的影响.氧气和空气气氛下热分解的薄膜的剩余极化(Pr)和矫顽电场(Ec)分别为18.85μC/cm2,119.7kV/cm和12.56μC/cm2、112.5kV/cm.氧气气氛下热分解的薄膜的剩余极化值显著提高.所以热分解是控制铁电性能的重要步骤. 相似文献
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按照铁电储存器的破坏性读出和非破坏性读出的这两种基本工作模式及其所对应的铁电随机存取存储器FRAM和铁电场效应晶体管肿FFBT两种结构形式的分类,分别介绍了1T/1C,2T/2C结构和铁电场效应晶体管金属-铁电-半导体(MFS)结构的基本铁电存储单元的结构及其工作模式。 相似文献
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采用溶胶-凝胶(Sol-Gel)法在Pt/Ti/SiO2/Si衬底上制备了Bi4Ti3O12(BTO)铁电薄膜,利用X-射线衍射仪(XRD)和原子力显微镜(AFM)对其晶格结构和表面形貌进行了表征,制备的BTO薄膜具有单一的钙钛矿晶格结构和表面平整致密。对700℃退火的BTO薄膜进行了铁电性能和疲劳特性测试,在测试电压为6 V时,剩余极化值2Pr约为12.5μC/cm2,矫顽电场2Ec约为116.7 kV/cm;经1×109次极化反转后,剩余极化值下降了24%,对其疲劳机理进行了探讨。 相似文献
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