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A ferroelectric memory diode consisting of Au/PZT/BIT/p-Si multilayer configuration has been fabricated by pulsed laser deposition (PLD) technique. The ferroelectric properties and the memory characteristics are investigated. The P-E curve of the PZT/BIT/p-Si films system had an asymmetry saturated hysteresis loop with P, = 15 μC/cm2 and Ec = 48 kV/cm, and the decay in remanent polarization was only 10% after 109 switching cycles, meanwhile the increase in coercive field was 12% . The C-V hysteresis loop and the I-V curve showed a memory effect derived from the ferroelectric polarization of PZT/BIT films, and the current density was 6.7 × 10-8 A/cm2 at a voltage of + 4V. Our diode had nonvolatile and nondestructive memory readout operation. There was a read current disparity of 0.05 μA for logic "1" and logic "0" at a read voltage of + 2V, and the stored logical value ("1" or "0") could be read out in 30 min. 相似文献
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用固相反应法制备了Ba_(0.7)Sr_(0.3)TiO_3及其含Pb钛酸锶钡(BPST)陶瓷,运用修正的Smolenski的成分起伏理论和居里外斯定律,结合介电常数温度谱,研究了钙钛矿结构的BST及铅取代的钛酸锶铅钡(BPST)的弥散相,对其相变行为进行了分析,得出了的一些铁电模型参数.结果表明,该系列样品在弥散相变区的弥散指数α为1.29~1.88,相变区间为13.4~22.8℃;在顺电相其居里常量为1.25×10~5~1.47×10~5K数量级.当Pb含量为0.1(即Ba_(0.6)Pb_(0.1)TiO_3)时,居里峰较宽,弥散相明显,故具有较高的调谐温度稳定性.另外铅的加入提高了铁电体的相变温度,从44℃上升到175℃. 相似文献
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采用准分子脉冲激光沉积 (PL D)工艺 ,制备了 Au/ PZT/ p- Si结构铁电存储二极管 .在氧气氛 35 0℃低温沉积、原位 5 30℃快速退火工艺条件下 ,获得了多晶纯钙钛矿结构的 Pb (Zr0 .5 2 Ti0 .48) O3(PZT)铁电薄膜 . PZT薄膜的铁电性能测试显示较饱和的、不对称的电滞回线 ,其剩余极化和矫顽场分别为 13μC/ cm2和 48k V/ cm.从C- V和 I- V特性曲线观察到源于铁电极化的回滞现象 ,记忆窗口约 1.1V,+4 V偏压下电流密度为 3.9× 10 - 6 A/cm2 . 相似文献
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采用脉冲激光沉积方法(PLD)制备了Au/PZT/BIT/p-Si多层结构铁电存储二极管.对铁电存储二极管的P-E电滞回线、I-V特性曲线分别进行了测试与分析,并对其导电行为及基于I-V特性回滞现象的存储机理进行了讨论.实验表明,所制备的多层铁电薄膜具有较高的剩余极化(27μC/cm2)和较低的矫顽场(48kV/cm),BIT铁电层有助于缓解PZT与Si衬底之间的界面反应和互扩散,减少界面态,与Au/PZT/p-Si结构相比,漏电流密度降低近两个数量级,I-V特性曲线回滞窗口明显增大. 相似文献
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For Fe-doped T1-1223 phase,the excess oxygen defects induced by Fe dopants are studied by means of Hall coefficient,thermogravimetric measurements,Mossbauer spectroscopy,and the model calculation of the effective bond valence.The extra oxygen defects have effects on carrier density and microstructure of the superconductors.In the light doping level of Fe (x=0-0.05),the superconducting transition and carrier density have significant corresponding relation--the zero resistance temperature Tco and carrier densities decrease linearly with Fe dopants increasing.The thermogravimetric measurements show that the Fe3+ ions' substituting for Cu2+ ions can bring the extra oxygen into the lattice to form extra oxygen defects.The calculation of the effective bond valence shows that the decrease of carrier density originates the strongly localized binding of the extra oxygen defects.The distortion of Cu-O layer induced by the extra oxygen defects decreases the superconductive transition temperature.The microstructure 相似文献
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