Nano-SiO_2/ACR共混物改性PP研究

通过两种不同的混合方法制备了纳米二氧化硅/丙烯酸树脂/聚丙烯(Nano-SiO2/ACR/PP)复合材料。利用共凝聚法制备具有沙袋结构的Nano-SiO2/ACR共混物,其增韧增强改性PP明显效果优于直接加入Nano-SiO2和ACR。当NanoSiO2/ACR/PP/PP-MAH重量比为5/10/80/5时,Nano-SiO2/ACR/PP复合材料拉伸强度、冲击强度及杨氏模量为28.9 MPa、19.1 kJ/m2和1.20 GPa,与基体树脂相比,分别提高了40%、23%和13%。     

硅粉的活性及参考标准

简述了硅粉在甲基氯硅烷合成中的应用,提出了测定硅粉反应活性的参考标准。     

常化温度对2.5%Si无取向硅钢第二相析出行为的影响

采用扫描电镜、透射电镜和双束扫描电镜对不同常化温度2.5%Si无取向硅钢中不同类型第二相析出物的析出行为和演化规律进行了研究。结果表明,常化温度从850℃升高至1100℃,微米级大尺度第二相粒子呈一次长大-析出-二次长大-回溶的变化规律;当常化温度<920℃时,析出相以AlN+MnS复合长大为主;随后小尺寸的MnS、AlN及其复合析出物数量迅速增多,并在950℃时达到峰值;随着常化温度的进一步升高,第二相粒子析出数量快速减少,然后缓慢增长至趋于平衡,大尺寸析出物出现部分回溶。纳米级析出物则以Cu₂S和Cu₂S+MnS复合析出为主。并且950℃常化时,2.5%Si无取向硅钢的铁损最低。     

高磁感取向硅钢27QG090的常化退火工艺

采用中试试验平台完成高磁感取向硅钢27QG090实验室常化退火工艺过程,利用光学显微镜、X射线衍射仪、透射电镜和能谱仪分析常化退火处理后试样的显微组织和宏观织构。结果表明,高磁感取向硅钢27QG090常化退火后的显微组织为铁素体,宏观织构主要是以α织构、α^*织构、铜型织构为主,兼有微弱的高斯织构,常化退火后的析出物主要是AlN,其平均尺寸约为40 nm。综合分析得出最优的常化退火工艺为1120℃×3 min+920℃×3 min, 100℃水淬。     

工业硅生产过程中还原剂研究进展

在工业硅的生产中主要用碳质还原剂。主要的碳质还原剂包括木炭、石油焦、烟煤和蓝炭,通过对各种还原剂的介绍,可以找到各种还原剂的优缺点,主要集中在原料的来源、对生产条件的要求以及对环境的保护,还有找出未来的发展方向。     

Monitoring of degradation of porous silicon photonic crystals using digital photography

We report the monitoring of porous silicon (pSi) degradation in aqueous solutions using a consumer-grade digital camera. To facilitate optical monitoring, the pSi samples were prepared as one-dimensional photonic crystals (rugate filters) by electrochemical etching of highly doped p-type Si wafers using a periodic etch waveform. Two pSi formulations, representing chemistries relevant for self-reporting drug delivery applications, were tested: freshly etched pSi (fpSi) and fpSi coated with the biodegradable polymer chitosan (pSi-ch). Accelerated degradation of the samples in an ethanol-containing pH 10 aqueous basic buffer was monitored in situ by digital imaging with a consumer-grade digital camera with simultaneous optical reflectance spectrophotometric point measurements. As the nanostructured porous silicon matrix dissolved, a hypsochromic shift in the wavelength of the rugate reflectance peak resulted in visible color changes from red to green. While the H coordinate in the hue, saturation, and value (HSV) color space calculated using the as-acquired photographs was a good monitor of degradation at short times (t < 100 min), it was not a useful monitor of sample degradation at longer times since it was influenced by reflections of the broad spectral output of the lamp as well as from the narrow rugate reflectance band. A monotonic relationship was observed between the wavelength of the rugate reflectance peak and an H parameter value calculated from the average red-green-blue (RGB) values of each image by first independently normalizing each channel (R, G, and B) using their maximum and minimum value over the time course of the degradation process. Spectrophotometric measurements and digital image analysis using this H parameter gave consistent relative stabilities of the samples as fpSi > pSi-ch.     

Macroporous silicon for high-capacitance devices using metal electrodes

In this paper, high-capacity energy storage devices based on macroporous silicon are demonstrated. Small footprint devices with large specific capacitances up to 100 nF/mm², and an absolute capacitance above 15 μF, have been successfully fabricated using standard microelectronics and MEMS techniques. The fabricated devices are suitable for high-density system integration. The use of 3-D silicon structures allows achieving a large surface to volume ratio. The macroporous silicon structures are fabricated by electrochemical etching of silicon. This technique allows creating large structures of tubes with either straight or modulated radial profiles in depth. Furthermore, a very large aspect ratio is possible with this fabrication method. Macroporous silicon grown this way permits well-controlled structure definition with excellent repeatability and surface quality. Additionally, structure geometry can be accurately controlled to meet designer specifications. Macroporous silicon is used as one of the electrodes over which a silicon dioxide insulating layer is grown. Several insulator thicknesses have been tested. The second capacitor electrode is a solid nickel filling of the pores prepared by electroplating in a low-temperature industry standard process. The use of high-conductivity materials allows reaching small equivalent series resistance near 1 Ω. Thanks to these improvements, the presented devices are capable of operating up to 10 kHz.

PACS

84.32.Tt; 81.15.Pq; 81.05.Rm     

A New SiF–Dipropargyl Glycerol Scaffold as a Versatile Prosthetic Group to Design Dimeric Radioligands: Synthesis of the [18F]BMPPSiF Tracer to Image Serotonin Receptors

A novel SiX–dipropargyl glycerol scaffold (X: H, F, or ¹⁸F) was developed as a versatile prosthetic group that provides technical advantages for the preparation of dimeric radioligands based on silicon fluoride acceptor pre‐ or post‐labeling with fluorine‐18. Rapid conjugation with the prosthetic group takes place in microwave‐assisted click conjugation under mild conditions. Thus, a bivalent homodimeric SiX–dipropargyl glycerol derivatized radioligand, [¹⁸F]BMPPSiF, with enhanced affinity was developed by using click conjugation. High uptake of the radioligand was demonstrated in 5‐HT_1A receptor‐rich regions in the brain with positron emission tomography. Molecular docking studies (rigid protein–flexible ligand) of BMPPSiF and known antagonists (WAY‐100635, MPPF, and MefWAY) with monomeric, dimeric, and multimeric 5‐HT_1A receptor models were performed, with the highest G score obtained for docked BMPPSiF: ?6.766 as compared with all three antagonists on the monomeric model. Multimeric induced‐fit docking was also performed to visualize the comparable mode of binding under in vivo conditions, and a notably improved G score of ?8.455 was observed for BMPPSiF. These data directly correlate the high binding potential of BMPPSiF with the bivalent binding mode obtained in the biological studies. The present study warrants wide application of the SiX–dipropargyl glycerol prosthetic group in the development of ligands for imaging with enhanced affinity markers for specific targeting based on peptides, nucleosides, and lipids.     

Nanostructured copper/porous silicon hybrid systems as efficient sound-emitting devices

In the present work, the photo-acoustic emission from nanostructured copper/porous silicon hybrid systems was studied. Copper nanoparticles were grown by photo-assisted electroless deposition on crystalline silicon and nanostructured porous silicon (nanoPS). Both the optical and photo-acoustic responses from these systems were determined. The experimental results show a remarkable increase in the photo-acoustic intensity when copper nanoparticles are incorporated to the porous structure. The results thus suggest that the Cu/nanoPS hybrid systems are suitable candidates for several applications in the field of thermoplasmonics, including the development of sound-emitting devices of great efficiency.     

催化剂浓度对6H-SiC晶片Si面化学机械抛光性能的影响

目的提高6H-SiC晶片Si面化学机械抛光(CMP)的材料去除率(MRR),改善其抛光表面质量。方法使用含有不同Cu~(2+)浓度和甘氨酸形成的配合物作为催化剂、H2O2作为氧化剂的抛光液,对6H-SiC晶片Si面进行CMP。使用精密天平称量SiC晶片抛光前后的质量,计算其MRR。使用AFM观测Si C晶圆表面,测其表面粗糙度(Ra)。使用Zeta电位仪测量在不同Cu~(2+)浓度下纳米氧化硅磨粒的Zeta电势和粒径分布。使用摩擦磨损试验机测量不同Cu~(2+)浓度时Si C晶圆的摩擦系数。对比不同压力和转速在CMP中对Si C的MRR和Ra的影响。结果随着Cu~(2+)浓度的增大,MRR先增大后减小,在Cu~(2+)体积浓度为300μmol/L时,MRR有最大值,为82 nm/h,此时,Ra为0.156 nm;相比之下,不加入Cu~(2+)-甘氨酸配合物的MRR为62 nm/h,Ra为0.280 nm。同时,随着Cu~(2+)浓度的增大,一方面,溶液中磨粒的Zeta电势绝对值不断减小,但高于不加入Cu~(2+)-甘氨酸配合物时的Zeta电势绝对值;另一方面,其平均粒径逐渐增大,但低于不加入Cu~(2+)-甘氨酸配合物时的平均粒径(104.0nm)。另外,随着Cu~(2+)浓度的增大,Si C晶圆的摩擦系数先增大后减小,在300μmol/L时达到最大,为0.6137。最后,随着压力的增大,MRR不断增加,但压力过大,使得Ra增大。随着抛光盘转速的增大,MRR先增大后减小,Ra无明显变化,在120 r/min时,MRR有最大值,为96 nm/h,Ra为0.161nm。结论 Cu~(2+)-甘氨酸配合物作为催化剂能够加快Si C化学机械抛光中的化学氧化速率,从而提高MRR,并且能够提高抛光液分散稳定性,改善Si C晶圆表面质量。另外,增大抛光压力可以增强机械磨削作用,提高MRR,但压力过大,会损伤晶片表面。抛光盘转速的增大也可以提高MRR,但其过大则会使抛光液外溅,降低化学作用,导致MRR降低。