钽阳极氧化膜生成机理的探讨

用交流阻抗法对钽阳极氧化膜生成机理进行了研究。提出了钽的氧化反应式及反应控制步骤;得出其氧化膜电容量随着氧化电位的增加而减少,阻抗与阳极化行为存在相关关系。     

CA30型非固体钽电解电容器的可靠性

改善 CA30型非固体钽电解电容器结构的密封性、介质氧化膜的质量及工作电解液温度特性是提高产品质量的稳定性、可靠性及使用寿命的三个关键因素。将半密封结构改为全密封结构 ,产品质量可显著提高。     

Thermal Conductivity of Saturated Liquid Toluene by Use of Anodized Tantalum Hot Wires at High Temperatures

Absolute measurements of the thermal conductivity of a distilled and dried sample of toluene near saturation are reported. The transient hot-wire technique with an anodized tantalum hot wire was used. The thermal conductivities were measured at temperatures from 300 K to 550 K at different applied power levels to assess the uncertainty with which it is possible to measure liquid thermal conductivity over wide temperature ranges with an anodized tantalum wire. The wire resistance versus temperature was monitored throughout the measurements to study the stability of the wire calibration. The relative expanded uncertainty of the resulting data at the level of 2 standard deviations (coverage factor k = 2) is 0.5 % up to 480 K and 1.5 % between 480 K and 550 K, and is limited by drift in the wire calibration at temperatures above 450 K. Significant thermal-radiation effects are observed at the highest temperatures. The radiation-corrected results agree well with data from transient hot-wire measurements with bare platinum hot wires as well as with data derived from thermal diffusivities obtained using light-scattering techniques.     

钽、铌电解电容器工艺研究进展(续)

结合对钽、铌电解电容器性能特点的介绍，综述了近年来国内外钽、铌电解电容器研究、生产方面的进展以及市场动态。     

退火处理对TiNi合金钽镀层微观组织结构的影响

采用多弧离子镀的方法在TiNi形状记忆合金表面镀覆了厚度为3μm的钽镀层,并对其进行了不同温度的真空退火处理.通过X射线衍射(XRD)研究发现,未经退火的镀层是由不稳定的β-Ta组成,分别经过700, 800, 900℃,1h退火后转变为α-Ta.透射电子显微镜(TEM)的观察发现,采用多弧离子镀的方法可以在TiNi合金表面得到纳米尺寸的β-Ta镀层.在700℃退火时可以得到由40 nm左右的微晶和150 nm左右的较大晶粒混合而成的α-Ta.当退火温度为900℃时,镀层主要由尺寸较大而且均匀的α-Ta组成.     

钽铌湿法冶金中的环境污染与治理措施

分析论述了钽铌冶金过程中的污染来源、污染形式、特点及危害，指出含氟化物、放射性、有机萃取剂的废渣、废水、废气是其主要污染物，并针对性地介绍了对这些污染物的治理措施。     

Effect of Auxiliary Gas Flow Parameters on Microstructure and Properties of Ta Coatings Prepared by Three-Cathode Atmosphere Plasma Spraying

Based on the three-cathode plasma spraying system, tantalum (Ta) coatings were prepared on the substrate of CuCrZr alloy. The effects of different auxiliary gas (helium) flow rates on the microstructure, phase composition, mechanical and wear resistance properties of Ta coatings were studied. The results showed that the oxidation degree of the coatings decreases first and then increases with the increase of the auxiliary gas flow. When the auxiliary gas flow rate is 70 L·min–1, the oxidation degree of the coating is the lowest, minimum value of the porosity is 0.21%, and the bonding strength reaches the maximum, 59.3 MPa. At this time, the coating wear rate is 0.0012 mm3·N–1·m–1 with the best wear resistance. This indicates that the auxiliary gas flow has an important influence on the quality and surface mechanical properties of tantalum coating.     

等离子体对钽表面渗氮处理的影响

采用SEM,XRD等手段对钽在氢与氮等离子体中形成的表面层进行了分析,试验表明,在外界参数相同的情况下,H N等离子体的存在改变了Ta表面在H-O-N气氛中的反应路径,使反应产物由无等离子体时的Ta2O5变成了Ta6N2.57,因此处理后的表面粗糙度比无等离子体时下降了一个数量级;对等离子体的作用机理进行了探讨,认为是等离子体的存在改变了介质成分和Ta表面附近的“阴极鞘层”与Ta表面相互作用抑制了粗糙的Ta2O5形成。     

钽表面离子渗氮工艺研究

采用组合的二次回归正交设计方法,针对表面硬度、表面粗糙度,对钽表面离子渗氮工艺参数（气体压力、温度、氢气摩尔分数）进行了优化。根据回归结果和统计分析给出了回归方程。