Enhanced photoelectric properties of PbSnSe thin films via quick oxygen ion-implantation sensitization

Journal of Materials Science - Although chalcogenide materials continue to generate considerable interest due to great potentials for various optoelectronic devices, annealing for a long time in...     

CO2 Hydrogenation over Ru-NPs Supported Amine-Functionalized SBA-15 Catalyst: Structure–Reactivity Relationship Study

Catalysis Letters - We gave an effective protocol to support Ru NPs on amine-functionalized SBA-15 mesoporous silica to catalyze the CO2 hydrogenation reaction. The amine groups present in the...     

Detection of crowdedness in bus compartments based on ResNet algorithm and video images

Multimedia Tools and Applications - The crowding in bus is an important factor affecting passenger satisfaction and bus dispatching level. However, how to use video images to detect crowding...     

用于射频滤波器的LN单晶薄膜XBAR的性能研究

基于铌酸锂(LN)薄膜的横向激发体声波谐振器(XBAR)能够兼具大机电耦合系数(K²)和高谐振频率(f)特性，有望满足5G应用的频段要求。然而，常规LN薄膜单层XBAR结构的温度稳定性较差，频率温度系数(TCF)较低。该文提出一种具有SiO₂温度补偿层的SiO₂/LN双层结构XBAR，并建立了精确分析层状结构XBAR的有限元模型。理论分析表明，该双层结构XBAR上激励的主模式是一阶反对称(A1)兰姆波。通过合理优化结构参数配置，能够获得高谐振频率(f~4.75 GHz)和大机电耦合系数(K²~8%)，同时其温度稳定性也得到显著改善(TCF~-36.1×10^-6/℃)，相较于单层XBAR结构提高了近70×10^-6/℃，这为研制温补型高频、大带宽声学滤波器提供了理论基础。     

VO2/GaAs异质结的制备及其光电特性研究

采用直流磁控溅射和后退火氧化工艺在p型GaAs单晶衬底上成功制备了n-VO_2/pGaAs异质结,研究了不同退火温度和退火时间对VO_2/GaAs异质结性能的影响,并分析其结晶取向、化学组分、膜层质量以及光电特性。结果表明,在退火时间2 h和退火温度693 K下能得到相变性能最佳的VO_2薄膜,相变前后电阻变化约2个数量级。VO_2/GaAs异质结在308 K、318 K和328 K温度下具有较好的整流特性,对应温度下的阈值跳变电压分别为6.9 V、6.6 V和6.2 V,该结果为基于VO_2相变特性的异质结光电器件的设计与应用提供了可行性。