Effect of Co,Pd and Pt ultra-thin films on the Ni-silicide formation: investigating the sandwich configuration

The effect of Co, Pd and Pt ultrathin films on the kinetics of the formation of Ni-silicide by reactive diffusion is investigated. 50 nm Ni/1 nm X/ 50 nm Ni (X?=?Co, Pd, Pt) deposited on Si(100) substrates are studied using in-situ and ex-situ measurements by X-ray diffraction (XRD). The presence of Co, Pd or Pt thin films in between the Ni layers delays the formation of the metal rich phase compared to the pure Ni/Si system and thus these films act as diffusion barriers. A simultaneous silicide formation (δ-Ni₂Si and NiSi phases) different from the classic sequential formation is found during the consumption of the top Ni layer for which Ni has to diffuse through the barrier. A model for the simultaneous growth in the presence of a barrier is developed, and simulation of the kinetics measured by XRD is used to determine the permeability of the different barriers. Atom probe tomography (APT) of the Ni/Pd/Ni system shows that the Pd layer is located between the Ni top layer and δ-Ni₂Si during the silicide growth, in accordance with a silicide formation controlled by Ni diffusion through the Pd layer. The effect of the barrier on the silicide formation and properties is discussed.

     

Dynamic voltage scaling based energy-minimized partial task offloading in fog networks

Wireless Networks - With the dynamic voltage scaling (DVS) technology, the terminal node (TN) can dynamically adjust its computational speed, thus providing a new way to save energy during task...     

Multi-UAV Collaborative Wireless Communication Networks for Single Cell Edge Users

Mobile Networks and Applications - Due to fast deployment, strong survivability and flexible scheduling, multiple unmanned aerial vehicles (UAV) can synergistically optimize the trajectory and...     

Graph-Theoretic Method on Topology Identification of Stochastic Multi-weighted Complex Networks with Time-Varying Delayed Coupling Based on Adaptive Synchronization

Neural Processing Letters - This paper is concerned with topology identification of stochastic multi-weighted complex networks based on adaptive synchronization. Different from previous work,...     

Effects of structural parameters on water film properties of transpiring wall reactor

Corrosion and salt deposition problems severely restrict the industrialization of supercritical water oxidation. Transpiring wall reactor can effectively weaken these two problems by a protective water film. In this work, methanol was selected as organic matter, and the influences of vital structural parameters on water film properties and organic matter removal were studied via numerical simulation. The results indicate that higher than 99% of methanol conversion could be obtained and hardly affected by transpiration water layer, transpiring wall porosity and inner diameter. Increasing layer and porosity reduced reactor center temperature, but inner diameter's influence was lower relatively. Water film temperature reduced but coverage rate raised as layer, porosity, and inner diameter increased. Notably, the whole reactor was in supercritical state and coverage rate was only approximately 85% in the case of one layer. Increasing reactor length affected slightly the volume of the upper supercritical zone but enlarged the subcritical zone.