用于便携式GPS接收机中的5.4mW低噪声高增益CMOS射频前端电路设计

设计了应用于便携式GPS接收机射频前端中的CMOS低噪声放大器和正交混频器.该电路中的低噪声放大器采用带源端电感负反馈的输入级,并引入功耗约束下的噪声和输入同时匹配技术.正交混频器基于吉尔伯特单元.电路采用TSMC 0.18μm RFCMOS工艺实现,总的电压转换增益为35dB,级联噪声系数为2.4dB,输入ldB压缩点为-22dBm,输入匹配良好,输入回损为-22.3dB,在1.8V电压供电下,整个全差分电路功耗为5.4mW.     

应用于SC-UWB收发机的CMOS射频接收前端电路设计

设计了应用于单载波超宽带（SC-UWB）无线收发机中的CMOS射频接收前端电路. 该前端电路采用直接变频结构,包含一个差分低噪声放大器（LNA）、一个正交混频器和两个中频放大器。其中,LNA采用源级电感负反馈结构.首先给出了该类型LNA中输入匹配带宽关于栅源电容、工作频率及匹配目标值的表达式 然后考虑到栅极片上电感、键合电感及其精度,提出了在增益和功耗约束下的噪声因子优化策略。该LNA利用两级放大级的不同谐振点实现了7.1~8.1GHz频段上的平坦增益,并具有两种增益模式来改善接收机动态范围. 正交混频器采用折叠式双平衡吉尔伯特结构. 该射频前端电路采用TSMC0.18um RF CMOS工艺设计,芯片面积为1.43 mm2. 在高、低增益模式下,测得的最大转换增益分别为42dB和22dB,输入1dB压缩点为-40dBm和-20dBm,S11低于-18dB和-14.5dB,中频3dB带宽大于500MHz. 高增益模式下双边带噪声因子为4.7dB. 整个电路在1.8V供电电压下功耗为65mW。     

433MHz ASK接收机射频前端电路设计

设计了一款应用在433MHz ASK接收机中的射频前端电路。在考虑了封装以及ESD保护电路的寄生效应的同时,从噪声、匹配、增益和线性度等方面详细讨论了低噪声放大器和下混频器的电路设计。采用0.18μm CMOS工艺,在1.8V的电源电压下射频前端电路消耗电流10.09 mA。主要的测试结果如下:低噪声放大器的噪声系数、增益、输入P1dB压缩点分别为1.35 dB、17.43 dB、-8.90dBm;下混频器的噪声系数、电压增益、输入P1dB压缩点分别为7.57dB、10.35dB、-4.83dBm。     

低噪声和高增益CMOS下变频混频器设计

设计并实现了一个用于GPS接收机射频前端的CMOS下变频混频器.基于对有源混频器的噪声机制的物理理解,电路中采用了噪声消除技术,以减少Gilbert型混频器中开关管的闪烁噪声,并引入一个额外的电感与开关对共源节点的寄生电容谐振,改善整个电路的噪声系数和转换增益等关键性能指标.电路采用TSMC 0.25 μm RF CMOS工艺实现,SSB噪声系数为7 dB,电压转换增益为10.4 dB,输入1 dB压缩点为-22 dBm,且输入阻抗匹配良好,输入反射系数为-17.8 dB.全差分电路在2.5 V供电电压下的功耗为10 mW,可满足GPS接收机射频前端对低噪声、高增益的要求.     

4·2GHz CMOS射频前端电路设计

设计并实现了一个工作在4.2 GHz的全集成CMOS射频前端电路,包括可实现单端输入到差分输出变换的低噪声放大器和电流注入型Gilbert有源双平衡混频器.电路采用SMIC 0.18 μm RF工艺.测试结果表明,在1.8 V电源电压下,电路的功率增益可达到26 dB,1 dB压缩点为-27 dBm,电路总功耗 (含Buffer) 为21 mA.     

一种K波段高增益低噪声折叠式双平衡混频器

基于130 nm RF CMOS工艺,设计了一种适用于K波段的高增益低噪声折叠式下变频混频器。采用折叠式双平衡电路结构,混频器的跨导级和开关级可以在不同的偏置条件下工作,为优化两级的噪声提供了极大的自由度。采用电流复用技术,混频器的转换增益和噪声系数得以显著改善。后仿真结果表明,该混频器在本振功率为-3 dBm时,实现了27.8 dB的转换增益和7.36 dB的噪声系数。在射频信号为24 GHz处的输入1 dB压缩点P1dB为-18.8 dBm,本振端口对射频端口的隔离度大于60.2 dB。该电路工作于1.5 V的电源电压,总直流电流为12 mA,功耗为18 mW。该混频器以适中的功耗获得了极高的整体性能,适用于低功耗、低噪声24 GHz雷达接收机。     

C波段CMOS射频前端电路设计与实现

设计了一款工作在C波段(4.2 GHz)的CMOS射频前端电路,电路包括低噪声放大器和Gilbert型有源双平衡混频器.其中低噪声放大器采用共源和共栅放大器方式,实现了单端输入到差分输出的变换;而混频器的输出端采用电感负载形式.电路采用SMIC 0.18μmRF工艺实现,测试结果表明,混频器的输出频率约为700 MHz,电路的功率增益为24 dB,单边带噪声指数为8 dB,在1.8 V工作电压下,电路总功耗为36 mW.     

一种全集成CMOS数字电视调谐器射频前端

设计了一种全集成CMOS数字电视调谐器(DTV tuner)射频前端电路.该电路采用二次变频低中频结构,集成了低噪声放大器、上变频混频器、下变频混频器等模块.芯片采用0.18μm CMOS工艺实现,测试结果表明,在50～860MHz频率范围内,射频前端能够实现很好的输入阻抗匹配,并且总的增益变化范围达到20dB.其中,在最大增益模式下,电压增益为 33dB,单边带噪声系数(SSB NF)为9.6dB,输入参考三阶交调点(ⅡP3)为-11Bm;在最小增益模式下,电压增益为 14dB,单边带噪声系数为28dB,输入参考三阶交调点为 8dBm.射频前端电路面积为1.04mm×0.98mm,工作电压为1.8V,消耗电流为30mA.     

一种全集成CMOS数字电视调谐器射频前端

设计了一种全集成CMOS数字电视调谐器(DTV tuner)射频前端电路.该电路采用二次变频低中频结构,集成了低噪声放大器、上变频混频器、下变频混频器等模块.芯片采用0.18μm CMOS工艺实现,测试结果表明,在50～860MHz频率范围内,射频前端能够实现很好的输入阻抗匹配,并且总的增益变化范围达到20dB.其中,在最大增益模式下,电压增益为+33dB,单边带噪声系数(SSB NF)为9.6dB,输入参考三阶交调点(ⅡP3)为-11Bm;在最小增益模式下,电压增益为+14dB,单边带噪声系数为28dB,输入参考三阶交调点为+8dBm.射频前端电路面积为1.04mm×0.98mm,工作电压为1.8V,消耗电流为30mA.     

CMOS低功耗窄带低噪声放大器优化设计

阐述了一个采用Chartered 0.35 μm CMOS工艺实现的应用于315 MHz幅度键控接收芯片的低功耗窄带低噪声放大器.该电路主要采用限定功耗下同时优化噪声性能和输入匹配的技术进行设计,并且采取了其他一些措施来进一步改善电路的性能.采用一个并-串谐振网络,提供镜像抑制.实验测试表明,该低噪声放大器的噪声系数为1.47 dB,功率增益为19.97 dB,输入三阶截断点为-15.53 dBm,镜像抑制为42.4 dB,功耗为1.4 mW.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.     

Theoretical analysis of the relationship between the Brillouin gain coefficient and the strain in the optical-fiber sensors

The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.     

Novel fiber-optical interferometer with miniaturized probe for in-hole measurements

Today, micro-system technology and the development of new MEMS （Micro-Electro-Mechanical Systems） are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.     

Study of waveguide coupling efficiency in hybrid silicon lasers

This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel＇s.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.