940 nm高功率半导体激光器研究

报道了一种采用大光学腔结构的InGaAs/GaAs/AlGaAs应变量子阱高功率半导体激光器。在量子阱能级本征值方程的数值求解基础上 ,优化了InGaAs阱层材料的In组份含量 ;采用大光学腔结构以有效降低垂直于结平面方向的光束发散角及腔面的光功率密度 ,实现器件的高功率、低发散角光。设计的激光器外延结构采用分子束外延 (MBE)方法生长 ,成功获得具有较低激射阈值的 94 0nm波长激光器外延片。对 10 0 μm条形 ,10 0 0 μm腔长的制备器件测试表明 ,器件的最大连续输出功率达到 2W ,峰值波长为 939.4nm ,远场水平发散角为 10° ,垂直发散角为 30°。器件的阈值电流为 30 0mA。     

单模小发散角免键合激光器芯片的研制

传统激光器由于封装键合工艺的要求,需要较大的芯片电极面积,限制了器件尺寸进一步小型化。量子尺寸的衍射效应使量子阱半导体激光器的垂直结平面发散角较大,不利于光束整形,限制了半导体激光器的直接应用。为解决这些问题,采用加入模式扩展层的光波导结构,将垂直发散角由40°减小到22°左右;采用p与n电极同面的脊波导结构,可将激光器同载体直接烧结,无需键合工艺,减小了电极面积,进而缩小了芯片尺寸。25℃,60mA注入电流下进行测试,阈值电流Ith≤10mA,输出功率P约为55mW。     

MBE生长高光功率转换效率InGaAs/GaAs/AlGaAs应变量子阱激光器

本文从理论上分析了实现InGaAs/GaAs/AlGaAs应变量子阱激光器高光功率转换效率、高输出功率的有效途径,并优化了器件结构,可以同时获得低的腔面光功率密度和小的垂直于结平面远场发散角.利用分子束外延生长构成了高质量InGaAs/GaAs/AlGaAs应变量子阱激光器,其最高光功率转换效率为53%、最大输出功率为3.7W,垂直于结平面方向远场发散角为30°     

小发散角量子阱激光器研究

使用三层平板波导理论分析了半导体量子阱激光器远场分布。针对大功率激光器讨论了极窄和模式扩展波导结构方法减小垂直方向远场发散角,得到了极窄波导结构量子阱激光器远场分布的简化模型,获得了垂直发散角的理论值,垂直方向远场发散角减小为28.6°;使用传输矩阵方法模拟了模式扩展波导结构量子阱激光器的近场光斑及远场分布,垂直方向远场发散角减小为16°。实验测试了极窄和模式扩展波导结构量子阱激光器的垂直发散角,理论结果与实验测试获得的发散角基本一致,实现了降低发散角的要求,获得了小发散角量子阱激光器。     

隧道级联半导体激光器的光束质量因子

运用波导模式理论和光束传输的非傍轴矢量矩理论,对隧道级联InGaAs/GaAs/AlGaAs半导体激光器的光束质量进行了理论研究.分析了隧道级联半导体激光器内限制层厚度和垂直方向光束质量因子的关系.结果表明,在隧道结耦合距离内,隧道结不仅起到了再生载流子的作用,也作为无源波导拓展了光场,减小了垂直发散角,降低了光束质量因子.根据模拟结果设计并制备了高光束质量,小垂直发散角的隧道级联耦合大光腔半导体激光器,其阈值电流密度为271A/cm2,斜率效率为1.49W/A,垂直发散角为17.4°,光束质量因子为1.11的半导体激光器     

隧道级联半导体激光器的光束质量因子

运用波导模式理论和光束传输的非傍轴矢量矩理论,对隧道级联InGaAs/GaAs/AlGaAs半导体激光器的光束质量进行了理论研究.分析了隧道级联半导体激光器内限制层厚度和垂直方向光束质量因子的关系.结果表明,在隧道结耦合距离内,隧道结不仅起到了再生载流子的作用,也作为无源波导拓展了光场,减小了垂直发散角,降低了光束质量因子.根据模拟结果设计并制备了高光束质量,小垂直发散角的隧道级联耦合大光腔半导体激光器,其阈值电流密度为271A/cm2,斜率效率为1.49W/A,垂直发散角为17.4°,光束质量因子为1.11的半导体激光器.     

窄发散角量子阱激光器的结构设计与分析

本文对ＧａＡｓ／ＡｌＧａＡｓ量子阱结构激光器中重要的结构参数与远场垂直发散角的关系作了系统的理论计算与分析，提出了实现２０°～３０°垂直发散角的有效途径，并同时研究了对激光器的光功率限制因子、阈值电流密度等重要参数的影响．     

新型隧道带间级联双波长半导体激光器

提出了通过隧道带间级联实现半导体激光器有多个激射波长的新型物理思想 ,并以GaAs为隧道结 ,InGaAs应变量子阱为有源区 ,利用金属有机物化学气相沉积 (MOCVD)生长了含有两个有源区的双波长半导体激光器。制备了 90 μm条宽的脊型波导器件结构 ,测试得到了能同时激射 95 1nm和 986nm两个波长的双波长半导体激光器 ,腔面未镀膜时的斜率效率达到了 1 12W A ,垂直远场为基模 ,水平方向发散角为 10° ,垂直方向发散角为 36°。     

半导体激光器准直透镜系统

发明的详细说明本发明是用于录相磁盘、数字音响磁盘光源半导体激光器的发散性激光束准直透镜系统。半导体激光器的激光光束通常是垂直方向为40°,水平方向为10°左右发散角的发散性光束。为了使其实用,要校成平行光束或接近平行光束。半导体激光准直透镜系统用于录相磁盘、数字音响磁盘时,要求NA为0.2左右,因为波面的混乱将导致光学系统整体性能的恶     

低垂直发散角高亮度光子晶体半导体激光器

针对现有边发射半导体激光器远场发散角大、光束质量差等问题,引入光子晶体人工微结构实现模式扩展和模场分离,改善了单芯片半导体激光器的性能,实现了高亮度高光束质量的激光输出。理论分析并模拟了光子晶体半导体激光器对光场的调控机制,并介绍了几种典型的光子晶体半导体激光器。在光子晶体激光器实现低垂直发散角的基础上,设计了不同的结构实现了大功率、单模、高亮度等特性的输出。实验验证了光子晶体能带效应在提高半导体激光光束质量、提高亮度等方面的调控作用,其能够突破普通半导体激光器面临的限制,有助于半导体激光更有效地应用在光纤激光器抽运和激光加工等领域,为半导体激光的直接应用奠定了基础。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.