碲镉汞长波探测器暗电流优化模拟

报道了利用Silvaco软件对Hg1-x Cd x Te(x=0.22)n-on-p型长波探测器的模拟仿真结果。采用二维简化pn结模型,以品质因子R0A为标准,模拟计算了载流子寿命、缺陷密度、表面态、p区受主浓度、p区厚度、n区厚度宽度对暗电流的影响,得出在良好的品质因子范围内各个参量可以接受的范围。并针对重要参量利用软件对其复合速率,电流分布,载流子浓度等进行了详细模拟分析,为探测器设计制备提供了参考。     

瞬态光响应法测试中波碲镉汞器件少子寿命的新方法

在测试中波碲镉汞光伏器件的瞬态响应时,当激光光斑照射器件表面位置距离光敏面较远时,器件表现为特殊的双峰脉冲响应现象,分析表明出现这种异常双脉冲现象的原因是光敏区内的少子漂移和光敏区外侧向收集的少子扩散有时间上的差异。通过对器件施加反向偏压,脉冲响应随反向偏压的增大由双峰变成单峰的实验结果,验证了少子侧向收集是导致器件形成双峰的主要原因。对第二个峰拟合得到p区的少数载流子寿命。将瞬态响应获得的少子寿命与该p型中波碲镉汞材料的理论计算和光电导衰退法得到的少子寿命相对比,发现三种方式得到的少子寿命随温度的变化趋势基本一致,这说明了可以通过瞬态光响应得到中波碲镉汞器件的少子寿命。     

快速软恢复SiGe功率开关二极管的结构设计与特性分析

为了进一步提高SiGe/Si异质结功率开关二极管的性能,提出了一种SiGe功率开关二极管的新结构,用交替的p 、n 区形成的mosaic结构来代替原常规的n 区,关断时可同时为电子和空穴的抽取提供通道使阴极具有理想欧姆接触.该结构可大大提高开关速度,并获得很软的反向恢复特性及很低的漏电流.与常规p (SiGe)-n--n 功率开关二极管相比,反向恢复时间缩短了近2/3,反向峰值电流降低了约1/2,漏电流降低了约1个数量级.另外,嵌镶结构中p 区的厚度对器件性能有很大影响,调整p 区的厚度可实现器件的反向耐压能力和反向恢复特性之间很好的折衷.这种性能的改进无需采用少子寿命控制技术因而很容易集成于功率IC中.     

重掺杂P型Si1-xGex层中少数载流子浓度的低温特性

考虑了重掺杂引起的禁带变窄效应,建立起少数载流子室温和低温模型,并进行了定量的计算。研究发现,p-Si1-xGex中的少子浓度(电子)随x的增加而增加。在重掺杂条件下,常温时,少子浓度随杂质浓度的上升而下降;而低温时,少子浓度却随杂质浓度的上升而上升。     

脉冲恢复技术测量有限宽基区HgCdTe光电二极管少子寿命

利用脉冲恢复技术测量了有限宽基区n+-on-p光电二极管中的少子寿命.实验发现,反向恢复时间同正、反向电流的大小有关.从恢复时间ts与IF/IR函数关系提取的少子寿命随着基区厚度与少子扩散长度比值降低而明显增大.在77 K时,采用传统方法脉冲回复技术提取的少子寿命为28 ns,而当考虑短基区效应时,所提取的少子寿命为51 ns.这表明HgCdTe光电二极管的基区厚度与少子扩散长度比值是采用脉冲恢复技术测量少子寿命技术中的一个重要参数.只有当基区厚度大于三倍少子扩散长度时,传统方法中无限基区厚度的假设条件才成立.     

PCB镀通孔疲劳寿命对设计参数的灵敏度分析

在PCB镀通孔疲劳寿命评估IPC模型的改进模型基础上,分析了镀通孔疲劳寿命对基板厚度与孔径之比(即厚径比l/r0)、基板厚度与镀层厚度之比(l/t)以及基板作用半径与孔半径之比(R/r0)的灵敏度。结果表明,镀通孔疲劳寿命对(l/r0)的灵敏度随(l/t)增大而减小;对(l/t)的灵敏度随(l/r0)增大而减小;而对(R/r0)的灵敏度则随(l/r0)增大而增大、随(l/t)增大而减小。最后,利用IPC的试验研究结果数据进行了验证。     

条形半导体激光器中电过程和光波导过程的精确理论

提出条形半导体激光器中稳态电过程和光波导过程及其相互作用的精确模型,并从电极电压算起得出阈值以上的电压电流分布和基模光场分布的相互影响和变化的计算机结果.指出简单的p-n结注入公式和任何固定形式的结电流分布假设对分析条形半导体激光器中的电过程和光波导过程都不适用,本文还探讨了光功率-注入电流特性出现扭折的机制和条件.     

GaP∶N 绿色 LED n2层载流子浓度的优化

在已报道的p-n2-n1结的势垒分布计算的基础上,对该结构的浓度分布进行了计算.对于正偏情形,计入了n2区产生的压降.考虑到GaP∶N LED发光区主要在p区,注入效率γ=jn/(jn+jp),jn和jp分别为电子电流和空穴电流.p区内的少子扩散可视为向无限远处的一维扩散;n2区内外加正向偏压时电场不能忽略,空穴又被n2-n1 结势垒阻挡(设被完全阻挡),则问题归结为求解有限厚度层中空穴的扩散和复合方程, 由边界条件求出空穴扩散电流.将求出的电子扩散电流和空穴扩散电流代入注入效率的表达式即可求得γ.对在合理的参数值范围内的计算结果进行了讨论.分析表明:当n2值在1015～1016cm-3范围内时,注入效率较高,与实验结果基本相符.     

变磁场I-V法对碲镉汞光伏器件少子扩散特性的研究

零偏压电阻-面积乘积(R0A)和反向饱和电流密度J0是决定光电二极管性能的重要参数．提出了一种对碲镉汞(Hg1-xCdxTe)光伏器件的少子扩散特性进行研究的有效方法．利用变磁场下的电流-电压(I-V)测试,得到了组分x在0．5与0．6之间的器件R0A和J0随磁场强度B变化的函数关系．由实验结果估算得到了室温工作的短波红外(SWIR)碲镉汞光伏器件的少子扩散长度．其数值与用激光诱导电流(LBIC)方法得到的相一致．     

环孔p-n结理论分析

在对环孔p-n结作近似假设的基础上，忽略了产生－复合电流、隧穿电流和表面复合电流的影响，假设在低温下扩散电流起主要作用，并认为电极与结区之间的接触为欧姆接触，建立了环孔p-n结的电流模型。根据此模型得出了环孔p-n结的电流密度方程和ROA的计算表达式，由于n区空穴的电流密度相对p区要小得多，在简化的表达式中忽略了n区电流密度的影响。最后对上述结果进行了数值分析和计算，分别做出了RoA在中波和长波波段随温度和截止波长变化曲线。从曲线可以得出：当截止波长在中波波段3－5μm时，77－150K的温度范围都可以使用，但只有在130K或更低的温度下才有较好的性能。目前在中波段的R0A值已经达到10^9Ωcm^2，比理论值要低2－3个数量级；对于8－10．4μm波段，120K以下都有性能，而10－14μm波段，要工作在100K温度之下。     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.     

Theoretical analysis of the relationship between the Brillouin gain coefficient and the strain in the optical-fiber sensors

The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.     

Novel fiber-optical interferometer with miniaturized probe for in-hole measurements

Today, micro-system technology and the development of new MEMS （Micro-Electro-Mechanical Systems） are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.     

Study of waveguide coupling efficiency in hybrid silicon lasers

This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel＇s.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.