溶胶–凝胶法制备ATO-SiO2抗静电复合薄膜的特性研究

采用两步溶胶–凝胶法制备出ATO(掺锑氧化锡)-SiO2复合抗静电薄膜.通过DTA-TG、XRD、SEM对薄膜的结构和形貌进行了表征,结果表明:抗静电复合薄膜表面均匀致密.薄膜中SiO2为无定形结构,ATO的衍射峰与SnO2一致.研究了SnO2的含量对薄膜导电性能、结合强度和透过率的影响,发现随SnO2含量增加γ(SnO2/ SiO2)从5至12.5,薄膜的表面电阻降低(从1010Ω/□降低到108Ω/□),薄膜的结合强度下降,薄膜的透过率降低(从89.0%降至84.2%),结合三方面性能,得出最佳SnO2的配比为:γ(SnO2/ SiO2)=10.     

SnO2∶Sb薄膜的制备和光致发光性质

用射频磁控溅射法在玻璃衬底上制备出SnO2∶Sb薄膜．制备样品为多晶薄膜，具有纯氧化锡的四方金红石结构和(110)择优取向，Sb离子以替位式掺杂的形式存在于SnO2晶格中．室温条件下对样品进行光致发光测量，在392nm附近观测到强的紫外-紫光发射，发射强度随制备功率的增加而增强，且样品退火后发射强度也明显增强．紫外-紫光发射的起源被归于由Sb形成的施主能级和受主能级之间的电子跃迁．     

有机衬底SnO2：Sb透明导电膜的研究

采用射频磁控溅射法在有机薄膜衬底上制备出SnO2∶Sb透明导电膜,并对薄膜的结构和光电特性以及制备参数对薄膜性能的影响进行了研究.制备的样品为多晶薄膜,并且保持了纯二氧化锡的金红石结构.SnO2∶Sb薄膜中Sb2O3的最佳掺杂比例为6%.适当调节制备参数,可以获得在可见光范围内平均透过率大于85%的有机衬底SnO2∶Sb透明导电薄膜,其电阻率～3.7×10-3Ω·cm,载流子浓度～1.55×1020cm-3,霍耳迁移率～13cm2·V-1·s-1.     

有机衬底SnO2∶Sb透明导电膜的研究

采用射频磁控溅射法在有机薄膜衬底上制备出SnO2∶Sb透明导电膜,并对薄膜的结构和光电特性以及制备参数对薄膜性能的影响进行了研究.制备的样品为多晶薄膜,并且保持了纯二氧化锡的金红石结构.SnO2∶Sb薄膜中Sb2O3的最佳掺杂比例为6%.适当调节制备参数,可以获得在可见光范围内平均透过率大于85%的有机衬底SnO2∶Sb透明导电薄膜,其电阻率～3.7×10-3Ω·cm,载流子浓度～1.55×1020cm-3,霍耳迁移率～13cm2·V-1·s-1.     

有机衬底SnO_2∶Sb透明导电膜的研究

采用射频磁控溅射法在有机薄膜衬底上制备出 Sn O2 ∶ Sb透明导电膜 ,并对薄膜的结构和光电特性以及制备参数对薄膜性能的影响进行了研究 .制备的样品为多晶薄膜 ,并且保持了纯二氧化锡的金红石结构 .Sn O2 ∶ Sb薄膜中 Sb2 O3的最佳掺杂比例为 6 % .适当调节制备参数 ,可以获得在可见光范围内平均透过率大于 85 %的有机衬底 Sn O2 ∶ Sb透明导电薄膜 ,其电阻率～ 3.7e- 3Ω· cm ,载流子浓度～ 1.5 5e2 0 cm- 3,霍耳迁移率～ 13cm2 /( V · s )     

掺锑二氧化锡薄膜的喷雾热解法制备与热处理

以SnCl4·5H2O和SbCl3为原料,采用喷雾热解法在玻璃基片上制备了掺锑二氧化锡(SnO2∶Sb)透明导电薄膜.用X光电子能谱分析仪(XPS)、X射线衍射仪(XRD)和紫外-可见光吸收谱仪分别对样品进行了表征,且对其结构、电学和光学特性作了研究.实验结果表明:薄膜仍为金红石型结构,在Sb的掺杂量为(1.0～1.5)wt%(质量百分比)和基片温度为500℃时,薄膜方阻为0.8～3.5Ω/□,可见光透过率达80%,红外光反射率达到80%.样品在O2,N2中进行热处理,其电导率呈有规律的变化趋势,热处理温度为550℃时,两种样品的电导率变化曲线上同时出现拐点.     

SnO2:Sb薄膜的制备和光致发光性质

用射频磁控溅射法在玻璃衬底上制备出SnO2:Sb薄膜.制备样品为多晶薄膜,具有纯氧化锡的四方金红石结构和(110)择优取向,Sb离子以替位式掺杂的形式存在于SnO2晶格中.室温条件下对样品进行光致发光测量,在392nm附近观测到强的紫外-紫光发射,发射强度随制备功率的增加而增强,且样品退火后发射强度也明显增强.紫外-紫光发射的起源被归于由Sb形成的施主能级和受主能级之间的电子跃迁.     

Sb∶SnO2/SiO2纳米复合薄膜的光学及气敏特性

采用溶胶 凝胶 (sol gel)工艺制备了Sb∶SnO2 /SiO2 复合膜。通过原子力显微镜 (AFM )观察了薄膜样品的表面形貌 ,利用紫外 可见光谱 ,p 偏振光反射比角谱研究了复合薄膜的光学特性。结果表明 ,薄膜中的晶粒具有纳米尺寸 (～ 35nm)的大小 ,比表面积大 ,孔隙率高 ;薄膜的透光率高 ,可见光波段近 95 % ;其光学禁带宽度约 3 6 7eV。因此Sb∶SnO2 /SiO2 纳米复合膜可作为气敏薄膜的理想选择。通过对三种不同的气体C3 H8,C2 H5OH及NH3气敏特性的测试表明 ,Sb掺杂大大提高了SnO2 薄膜对C2 H5OH的灵敏度 ,纳米Sb∶SnO2 /SiO2 复合膜的气敏灵敏度高于纯SnO2 薄膜及Sb掺杂的SnO2 薄膜     

聚酰亚胺衬底掺Sb的SnO_2透明导电膜的制备

用射频磁控溅射法在聚酰亚胺衬底上制备出了相对透过率为80%左右、最小电阻率为3.710-3 W·cm、附着良好的SnO2∶Sb透明导电膜。 靶材中Sb2O3的最佳掺杂量为6%(质量分数),最佳溅射压强为1 Pa(90%Ar+10%O2)。制备的样品为多晶薄膜,并且保持了二氧化锡的金红石结构,具有明显的[110]的趋向。并讨论了薄膜的结构和光电特性随衬底温度的变化。     

一般性问题

TN042005040001溶胶–凝胶法制备ATO-SiO2抗静电复合薄膜的特性研究/吴春春,杨辉,冯博,陆文伟(浙江大学材料系)//电子元件与材料.―2004,23(7).―22～24.采用两步溶胶–凝胶法制备出ATO(掺锑氧化锡)-SiO2复合抗静电薄膜.通过DTA-TG、XRD、SEM对薄膜的结构和形貌进行了表征,结果表明:抗静电复合薄膜表面均匀致密.薄膜中SiO2为无定形结构,ATO的衍射峰与SnO2一致.研究了SnO2的含量对薄膜导电性能、结合强度和透过率的影响,发现随SnO2含量增加γ(SnO2/SiO2)从5至12.5,薄膜的表面电阻降低(从1010Ω/□降低到108Ω/□),薄膜的结合…     

Sb掺杂SnO2/SiO2纳米光学气敏薄膜的制备及其性质

采用溶胶凝胶(sol-gel)工艺制备了Sb掺杂SnO2/SiO2复合膜。通过X射线衍射(XRD)、傅立叶变换红外谱(FT-IR)及原子力显微镜(AFM)表征了薄膜样品的物相结构与表面形貌,利用紫外-可见光谱研究了复合薄膜光学特性．利用p-偏振光双面反射法对薄膜的气敏特性进行了测试。实验结果表明,薄膜中的晶粒具有纳米尺寸(～35nm)的大小．比表面积大,孔隙率高;薄膜的透光率高,可见光波段近95％;纳米Sb：SnO2：SiO2复合膜的气敏灵敏度高于纯SnO2薄膜及Sb掺杂的SnO2薄膜。     

Physical properties of sprayed antimony doped tin oxide thin films:The role of thickness

Transparent conducting antimony doped tin oxide（Sb:SnO₂） thin films have been deposited onto preheated glass substrates using a spray pyrolysis technique by varying the quantity of spraying solution.The structural, morphological,X-ray photoelectron spectroscopy,optical,photoluminescence and electrical properties of these films have been studied.It is found that the films are polycrystalline in nature with a tetragonal crystal structure having orientation along the（211） and（112） planes.Polyhedrons like grains appear in the FE-SEM images. The average grain size increases with increasing spraying quantity.The compositional analysis and electronic behaviour of Sb:SnO₂ thin films were studied using X-ray photoelectron spectroscopy.The binding energy of Sn3d_5/2 for all samples shows the Sn⁴⁺ bonding state from SnO₂.An intensive violet luminescence peak near 395 nm is observed at room temperature due to oxygen vacancies or donor levels formed by Sb⁵⁺ ions.The film deposited with 20 cc solution shows 70%transmittance at 550 nm leading to the highest figure of merit(2.11×10^-3Ω^-1). The resistivity and carrier concentration vary over 1.22×10^-3 to 0.89×10^-3Ω·cm and 5.19×10²⁰ to 8.52×10²⁰ cm^-3,respectively.     

Structural and optoelectronic properties of sprayed Sb:SnO_2 thin films:Effects of substrate temperature and nozzle-to-substrate distance

The influence of substrate temperature and nozzle-to-substrate distance（NSD） on the structural,morphological, optical and electrical properties of Sb:SnO₂ thin films prepared by chemical spray pyrolysis has been analyzed.The structural,morphological,optical and electrical properties were characterized by using XRD,SEM, UV-visible spectrophotometry and Hall effect measurement techniques.It was seen that the films are polycrystalline, having a tetragonal crystal structure with strong orientation along the（200） reflection.The pyramidal crystallites formed due to coalescence were observed from SEM images.The values of highest conductivity,optical transmittance and figure of merit of about 1449（Ω·cm）^-1,70%and 5.2×10^-3□/Ω,respectively,were observed for a typical film deposited using optimal conditions（substrate temperature = 500℃and NSD = 30 cm）.     

温度控制对ATO纳米分散液水热生长的影响

以SnCl4·5H2O和SbCl3的共沉淀氢氧化物为原料,在水热过程中采用温度控制、分段加热的方法,制备了单分散的ATO纳米分散液。用XRD、TEM、X射线能量散射谱(EDS)和压片测电阻等方法,对ATO纳米粉进行了表征。结果表明:温度控制、分段加热的水热法,可以一步合成粒径为10~15nm,高比表面积、分散性好的ATO纳米晶导电粉体,在低温短时的条件下,同时实现了氧化物的掺杂和分散。并对生长机理做了初步探讨。     

Cu/Sb掺杂SnO_2纳米晶薄膜的H_2S气敏特性

以SnCl2·2H2O、CuCl2·2H2O、SbCl3和无水乙醇为原料,采用sol-gel浸渍提拉法(sol-geldip-coatingmethod,SGDC)制备了纳米晶气敏薄膜。在多个工作温度和气体浓度下测试了薄膜对H2S的气敏特性。结果表明:r(Cu:Sb:Sn)为1:5:100,工作温度为140℃时,薄膜对H2S有很好的灵敏度和选择性,敏感浓度下限可达0.7×10–6。     

Sn掺杂量对Sn-Al共掺ZnO薄膜光学性能的影响

利用溶胶-凝胶(sol-gel)法在玻璃和硅衬底上制备了不同Sn掺杂量的Sn-Al共掺的ZnO薄膜。采用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、紫外可见分光光度计(UV-Vis)、光致发光谱(PL)等测试手段,对薄膜的结构、形貌和光学性能进行了表征。结果表明:所制备的样品晶粒均沿(002)方向择优生长,且随着Sn元素掺杂量的增加,择优取向性先增强后减弱,同时薄膜的半高宽先减小后增大,半高宽最小时,薄膜的结晶质量最好。与只掺Al元素的ZnO薄膜相比,共掺后的薄膜近紫外发光峰的强度明显降低,出现了轻微的蓝移,且在600 nm处的缺陷发光强度明显增强;随着Sn掺杂量的增加薄膜的透过率先增加后减小。与AZO薄膜相比,当Sn的掺杂量为0.020时,薄膜的结晶质量更好,缺陷发光更强,光透过率更高。     

制备工艺对ZnO薄膜的结构与光学性质的影响

利用射频磁控反应溅射技术生长出具有高度晶面(0002)取向的ZnO外延薄膜。通过AFM、XRD、吸收光谱和荧光光谱等测试手段,分别研究分析了不同衬底、不同溅射气氛和退火对ZnO薄膜结构及光学性质的影响。研究表明,在200℃低温生长的硅基ZnO薄膜具有几百纳米的氧化锌准六角结构外形;当氧氩比为4:1(质量流量比)时,吸收谱激子峰最佳;退火后,激子峰(363 nm)加强,同时出现了402 nm的本征氧空位紫光发射。     

Sputter-Deposited AlTiO Thin Films for Semi-Transparent Silicon Thin Film Solar Cells

This paper reports on sputter-deposited AlTiO (ATO) thin films and their effects on the performance of semi-transparent silicon thin film solar cells. The electrical resistivity and the transparency of the ATO films depend significantly on the flow ratio of oxygen to argon during the reactive sputtering process. With highly transparent ATO films, transmittances of over 80% were obtained by increasing this flow ratio. When the ATO films were used on silicon substrates, they exhibited an anti-reflection property, where the minimum reflectance at visible light wavelength was decreased to 1.2%. The introduction of ATO thin film layers into solar cells resulted in a 24% increase in transmittance at wavelengths of around 700 nm, due to the film’s anti-reflection characteristic. In addition, the color of the cells changed from green to bright red as the ATO layers were adopted. These beneficial effects of the sputter-deposited ATO films suggest an effective pathway towards the semi-transparent silicon thin film solar cells for building-integrated photovoltaic system applications.     

溶胶–凝胶法制备ATO-SiO_2抗静电复合薄膜的特性研究

采用两步溶胶–凝胶法制备出 ATO(掺锑氧化锡)-SiO_2复合抗静电薄膜。通过 DTA-TG、XRD、SEM 对 薄膜的结构和形貌进行了表征,结果表明:抗静电复合薄膜表面均匀致密。薄膜中 SiO_2为无定形结构,ATO 的衍射峰 与 SnO_2一致。研究了 SnO_2的含量对薄膜导电性能、结合强度和透过率的影响,发现随 SnO_2含量增加 ?(SnO_2/ SiO_2)从 5 至 12.5,薄膜的表面电阻降低(从 1010ù/□降低到 108ù/□),薄膜的结合强度下降,薄膜的透过率降低(从 89.0%降至 84.2%),结合三方面性能,得出最佳 SnO_2的配比为:?(SnO_2/ SiO_2)=10。     

Effects of Sb-doping on the grain growth of CIGS thin films fabricated by electrodeposition

Cu(InGa)Se2 (CIGS) solar cells become one of the most important thin film photovoltaic devices thus far. The doping of Sb has improved the grain size of CIGS thin film and therefore led to the enhancement of solar cell efficiency. Various approaches have been used for the Sb doping. Not many reports of electrodeposition of In, Ga and Sb alloy have been reported. In this work, the Sb thin film was coated over Cu film surface prior to the In and Ga deposition in order to form a Cu/Sb/In/Ga metal precursor. After selenization, the Sb doped CIGS film was prepared. The structure and morphology of Sb doped CIGS films were investigated compared with the undoped CIGS reference samples. A modified selenization method was proposed, which improved the grain size. Finally, the conversion efficiency of Sb doped CIGS based solar cells has been improved by 1.02%.