10 Gb/s 带有直流漂移校正的dB线性、无电感宽带可变增益放大器

本文介绍了一款带有直流漂移校正的dB线性、无电感宽带可变增益放大器。该可变增益放大器包含一个可变增益模块,一个带有共模电压调整的直流漂移校正模块,以及一个带宽拓展模块。为了放大器带宽同时节约芯片面积,本设计中带宽拓展模块采用了一种无电感设计的有源反馈技术,通过该模块在高频增益过冲来补偿可变增益模块和直流漂移校正模块在高频处的增益下降,从而达到拓展带宽、提高增益的效果。该可变增益放大器采用0.13mm SiGe BiCMOS工艺。测试结果表明,该款放大器3 dB带宽达到7.5 GHz,可变增益范围为40 dB (-10 dB-30 dB)。在10 Gb/s伪随机测试码输入的情况下,测试输出信号峰峰抖动小于30 ps_pp,功耗为50 mW。由于无电感设计,该芯片的面积仅为0.53*0.27 mm₂。     

带直流漂移校正的低功耗可编程增益放大器

设计了一种应用于无线传感器网络RF射频前端芯片的可编程增益放大器(PGA).该放大器由三级增益单元级联构成,每级单元均带直流漂移校正功能,7位数字端控制增益变化,且可灵活切断单级电源,降低PGA整体功耗.设计基于SMIC 0.18μm 1.8V 1P6M CMOS工艺.流片测试结果表明,该放大器工作性能良好,动态范围为...     

一种高增益带宽CMOS全差分运算放大器的设计

介绍了一种采用折叠式共源共栅结构的高增益带宽全差分运算放大器的设计和实现,详细讨论了折叠式共源共栅放大器的电路结构、共源共栅偏置电路,以及开关电容共模反馈电路(SCCMFB).电路的设计基于CSMC 0.5μm DPTM 5V混合信号工艺.仿真结果表明,该电路在5V电源电压下具有64 dB直流开环增益、155 MHz单位增益带宽.通过在一款ADC电路中流片验证,该放大器达到设计指标要求.     

应用于多模接收机的低功耗可编程增益放大器

针对多模接收机的应用,提出了引入一条闭环伪通路技术结构的可编程增益放大器,在保持一定的线性度及噪声性能的基础上,以较低的功耗实现较大的带宽.该电路增益步长为2 dB,增益变化范围1～39 dB.电路中内嵌了直流失调消除模块防止直流漂移引起的阻塞.芯片采用SMIC 0.13 μm 1P8M RF CMOS工艺实现.测试结...     

增益可控低噪声前置放大器设计

设计一种具有温度补偿、增益可控的低噪声前置放大器。该放大器采用级联放大,每一级通过继电器改变信号通路,从而达到控制增益的目的。在放大器的设计中采用噪声抑制和温度补偿技术,并对原电路使用闭环控制进行优化,既实现了增益可调,增益控制范围为10~60 dB,又保证了良好的增益平坦度和优秀的噪声抑制能力。通过仿真和实际电路波形测试,表明该放大器仅有9μV/℃温度漂移和10 nV/Hz~(1/2)等效输入噪声电压,总谐波失真小于1.2%,能放大μV级DC~50 MHz带宽信号。     

一种用于大规模无线传感网RF前端电路的dB线性可编程增益放大器

设计了一种应用于大规模无线传感网RF前端芯片的数字控制CMOS可编程增益放大器(PGA).该放大器采用五级增益单元级联结构,每个增益单元采用了固定增益放大器加可编程衰减器的结构,且具有直流漂移抑制功能.增益的变化通过两步完成,R-2R梯形电阻网络实现6dB增益步进,而0.75dB步进由串行电阻网络来完成.后仿真结果表明,放大器的动态范围为10～88dB,0.75dB步进,增益精确度为0.7mdB,最大增益下输出三阶交调点为16.1dBm.可编程增益放大器采用SMIC 0.18μm 1P6M混合信号CMOS工艺实现,核面积约为0.08mm2.     

一种用于低中频GPS接收机的CMOS可编程放大器

介绍了一种应用于低中频GPS接收机的CMOS可编程放大器.该放大器通过采用基于差分对简并电路的线性化技术,实现了以6dB为步长的96dB数控增益范围,同时利用工作在亚域值区工作的晶体管代替电阻用于直流偏移校正模块当中有效地节约了芯片面积,仿真结果表明其带宽为300MHz,最大增益时其噪声指数为23.7dB,ⅡP3在最低增益时达到-5dBm,全局增益误差为0.03dB.设计采用了0.18μmCMOS数模混合工艺库实现,面积约为0.097mm2,在1.8V供电电压下,功耗为6.3mW.     

宽带直流放大器

针对小信号的幅度小、干扰大,线性放大难和提取难度大等问题,设计一种宽带直流放大器.是以单片机AT89C55WD和FPGA为控制核心,由可变增益放大嚣AD603为核心的放大电路、前级信号调理电路、后级功率放大电路和滤波电路组成.该放大器具有高增益且增益连续可调、输出波形无明显失真、有效抑制零点漂移和噪声、可输出大功率等特性,且在0～10 MHz的频带内信号可放大0～75 dB,带宽设置为5 MHz或10 MHz两种,输出信号峰峰值高达20 V.     

一种增益可控音频前置放大器电路的设计

设计了一种基于0.5μm CMOS工艺的增益可控音频前置放大器电路。该电路采用直流音量控制方式控制前置放大器的增益,进而实现整体音频放大器的音量控制。外部输入的直流模拟电压经过片内模数转换器转换成数字控制信号,控制前置放大器的输入电阻与反馈电阻的比值,从而实现前置放大器的增益控制。该放大器能够实现32档的音量控制范围,增益从-50 dB变化到25 dB,电路版图面积为1.2 mm×0.8 mm。     

一种可植于软件无线电的低功耗可编程增益放大器

本文提出了一种新的技术,用于优化可编程增益放大器的带宽和功耗的关系。这个可编程增益放大器由三级级联的放大器组成,每一级放大器包括可变增益放大器和直流失调电压消除电路。在消除直流失调的电路中,高通的截止频率可从4 kHz到80 kHz变化。可编程增益放大器芯片使用0.13微米的工艺加工,测试结果表明增益可以从-5dB到60dB连续可调。在 60dB增益模式下,当带宽可从1MHz到10MHz变换,电路消耗的功耗为0.85mA到3.2mA,电源电压为1.2V。它的带内OIP3值为14dBm。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.