红外目标隐身效果评价仿真软件设计

根据红外目标设计过程中对红外隐身效果评价的需求,设计开发了基于探测概率的红外目标隐身效果评价仿真软件。使用较为成熟的FLIR92模型,对红外目标设计过程中生成的三维目标热模型数据进行了等效温差处理,再利用二代焦平面热成像系统静态性能模型,仿真了不同系统参数下热成像系统的静态性能,结合探测概率模型估算出不同方向上目标被该红外成像系统发现、定向、识别、认清的距离,从目标探测的角度实现了对不同红外目标设计参数下红外隐身效果的评价。     

运动平台红外凝视场景的仿真

对空间运动载体平台上的红外凝视探测器成像仿真是深空探测红外图像信息处理算法研究的基础性工作.在传统的场景仿真中,成像弥散、相机与目标的运动对图像的影响往往被忽略,为了对红外凝视成像系统所成场景进行合理仿真,在对红外凝视成像原理和探测器自身运动、探测目标运动的动力学方程进行分析后,分别对影响红外凝视成像效果的红外成像探测器探测距离、弥散现象、成像面积、自身运动和目标运动等因素进行推导和建模,得到了红外凝视成像系统目标作用距离、弥散圆能量分布,目标成像面积以及相机运动耦合的理论表达式以解决成像平台运动时目标成像高逼真度仿真的问题.最后进行了目标运动与探测器运动条件下的场景仿真.仿真图像表明了模型的有效性.     

面源红外诱饵对抗成像制导导弹的仿真研究

面源红外诱饵是一种有效对抗红外成像制导导弹的干扰装备.它能模拟被保护目标的红外特征,达到干扰红外成像制导导弹的目的.首先,分析面源红外诱饵对抗红外成像制导导弹的干扰机理.其次,建立面源红外诱饵的辐射模型和运动模型.然后,分析面源红外诱饵红外图像的位置、面积和灰度的变化规律,仿真生成面源红外诱饵红外图像.最后,以干扰成功率作为面源红外诱饵干扰效果评估准则,计算不同距离和不同投放数量下面源红外诱饵干扰成功概率,并对仿真结果进行分析.仿真结果表明:面源红外诱饵能够逼真地模拟目标飞机的光谱辐射分布特性,有效干扰红外成像制导导弹,显著提高目标飞机的战场生存力.     

论红外成像系统的最大作用距离

作用距离是描述军用红外成像系统整机性能的一个重要参数。作用距离可以分为探测距离、识别距离和确认距离,其中以探测距离最大。根据红外成像系统、地球曲面和目标之间的几何关系,介绍了一种基于MATLAB的对地观察红外成像系统的最大作用距离计算方法。该值取决于整机所在高度、地球半径和目标高度。整机的实际探测距离或者对待研整机提出的作用距离指标不应该大于此值。     

多传感器战场监控系统仿真设计与实现

利用多传感器实施战场监控是当前各国军事采用的先进手段之一,文中首先分析了美国最新的联合监视目标攻击雷达系统,然后详细论述了多传感器战场监控仿真系统体系结构,并设计实施了集合成孔径雷达、动目标显示雷达处理模块、红外探测模块为一体的仿真软件.通过对合成孔径雷达成像结果、空时自适应数据分析、红外探测数据的输入进行数据融合处理,进而获得较好的战场监控与目标识别效果,为现代化战场信息监控提供关键技术支持.     

红外成像反舰导弹干扰物布放研究

通过对红外成像导引头目标识别和跟踪算法的分析,提出了一种反舰红外成像导弹干扰算法。对干扰物的面积、布放高度、布放距离、持续时间、辐射强度和干扰波段进行了详细研究,并建立红外成像导引头对抗仿真模型,验证了该算法的有效性。     

烟幕对光电制导目标识别能力干扰效果研究

光电制导武器对目标的战场生存造成了巨大威胁,烟幕是对其有效干扰的一种重要手段。通过分析烟幕对可见光和红外辐射的作用原理,搭建了烟幕干扰实验平台,获得了烟幕对红外成像制导和景象匹配制导的干扰数据。对实验数据分析处理后的结果表明:烟幕能够有效降低红外成像制导系统的作用距离和目标识别能力,严重影响景象匹配制导算法的性能,甚至使其完全失效。     

基于JRM的战场环境红外图像实时生成

为了满足新一代红外成像目标仿真系统的性能需求,生成逼真的战场环境红外图像供红外成像制导武器进行半实物仿真试验,研究了一种基于JRM的战场环境红外图像生成方法。首先利用3DSMAX建立目标的三维模型,并从导引头视场需求出发,结合目标地区的卫星影像数据与高程数据建立背景区域的三维模型;然后利用JRM的GenesisMC工具、SigSim工具和SenSim工具分别对物理材质特性及目标热源、场景红外特性、传感器特性进行建模;最后使用OSV工具实时渲染生成红外图像。实验结果表明,该方法可满足红外成像目标仿真系统的红外图像实时生成要求,具有灵活性强,效果良好等优点。     

空空导弹红外成像探测技术发展分析

隐身飞机与新型红外干扰技术的发展,对空空导弹的红外探测与抗干扰能力都提出了更高的要求。红外成像探测系统是实现红外空空导弹远距离探测目标的关键,其所提供的目标、背景和干扰信息是红外空空导弹实现目标识别和抗人工与背景干扰的基础,因此,红外探测技术的发展是影响红外空空导弹未来发展方向的关键之一。本文首先介绍了空空导弹红外成像探测技术的现状与特点,最后分析了空空导弹红外成像探测系统的关键技术和发展方向。     

机载激光雷达的背景辐射抑制技术研究

机栽激光成像雷达在执行非合作目标识别/分类、精确成像制导、战场侦察和打击效果评估等方面有潜在的应用前景.在系统分析非相干探测激光雷达噪声特性的基础上,采用LOWTRAN7软件对激光雷达接收到的背景光功率进行了数值仿真.仿真结果表明,采用视场法、光谱分辨法和视频带宽法可以有效地抑制背景噪声,大幅度地提高激光雷达的探测距离,以满足机载火控系统对小目标远距离精确识别的作战使用要求.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.