用于图像传感器的自调节加速补偿锁相环设计

设计了一款用于高速图像传感器的可自调节、加速补偿CMOS电荷泵锁相环电路,通过在传统锁相环电路拓扑中,附加"双模式"逻辑时控的、低功耗加速充电补偿模块,实现了锁定时间与功耗的双重优化.基于180 nm/1.8 V CMOS工艺完成锁相环的电路设计和性能仿真,结果表明,基于所提出的加速补偿方案,改进后的锁相环可有效满足图像传感器对低功耗、高速、高频和低噪声输出特性的需求.在输入频率为1 GHz的参考信号时,压控振荡器可达到0.55～2.82 GHz,即2.27 GHz的频率范围,相位噪声为-98.149 dBc/Hz@1 MHz,锁定时间缩短至5.2μs,整体功耗仅为1.98 mW,同时输出的抖动噪声可低至2.81 μV/√Hz@1 MHz,多个性能指标优于所对比的同类锁相环电路.     

一种低抖动电荷泵锁相环的设计

采用动态鉴频鉴相器、基于常数跨导轨到轨运算放大器的电荷泵、差分型环形压控振荡器,设计了一种低抖动的电荷泵锁相环。基于SMIC 0.18-μm CMOS工艺,利用Cadence软件完成了电路的设计与仿真。结果表明,动态的鉴频鉴相器,有效消除了死区。新型的电荷泵结构,在输出电压为0.5 V~1.5 V时将电流失配减小到了2%以下。压控振荡器在频率为1 MHz时输出的相位噪声为-94.87 dB在1 MHz,调谐范围为0.8 GHz~1.8 GHz。锁相环锁定后输出电压波动为2.45 mV,输出时钟的峰峰值抖动为12.5 ps。     

2.125～3.125GHz高速CMOS锁相环电路设计

针对数模混合结构的电荷泵锁相环电路,建立了系统的数学模型,确定了电荷泵锁相环的系统参数,提出一种能够有效消除时钟馈通、电荷注入等非理想特性影响,并具有良好电流匹配特性的电荷泵电路,以及一种中心频率可调的压控振荡器电路。电路采用SMIC 0.18μm CMOS工艺模型,使用Spectre进行仿真。结果显示,整个锁相环系统的功耗约为40 mW,输出时钟信号峰-峰值抖动为21 ps@2.5 GHz,单边带相位噪声在5 MHz频偏处为-105 dBc/Hz。     

DC-DC变换器中CMOS电荷泵锁相环的设计

针对电荷泵锁相环的抖动问题,对CMOS电荷泵锁相环的压控振荡器电路进行改进;设计了一种采用增益补偿技术的压控振荡器,实现了可用于DC-DC变换器中与外部时钟同步的电荷泵锁相环.电路设计基于TSMC 0.18 μm CMOS工艺,采用HSPICE软件仿真验证.仿真结果表明,在3.3 V电源电压、-40 ℃～85 ℃温度范围内,该电荷泵锁相环能够与外部时钟同步于1.5 ～3.5 MHz的频率范围,锁定时间小于72 μs,功耗小于1.3 mW.     

一种低功耗快速锁定简易锁相式频率合成器

采用0.5 μm CMOS工艺,设计了一种简易锁相式频率合成器。采用“类锁相环”结构,在传统锁相环频率合成器的基础上,去除了电荷泵和低通滤波器。利用鉴频鉴相器的输出结果作为开关信号,控制压控振荡器的工作状态,使压控振荡器的输出信号在第N个周期返回鉴频鉴相器后立即被关断,直到下一个参考时钟周期来临。分析了电路的结构和工作原理,并对每个模块进行了理论分析。该频率合成器能够快速地产生固定的时钟频率,具有结构简单、功耗低、锁定时间短等优点。仿真结果表明,输入参考时钟为4 MHz时,该频率合成器的输出频率为15.96 MHz,功耗为2.96 mW,锁定时间小于1 μs。     

基于CMOS工艺的622 MHz电荷泵锁相环设计

设计了由饱和区MOS电容调谐的环形压控振荡器(RVCO),并将其用于电荷泵锁相环(CPPLL)电路,其中电荷泵部分采用了能消除过冲注入电流的新型电荷泵电路,并采用SmartSpice软件和0.6μm混合信号的CMOS工艺参数进行了仿真。仿真结果表明,此锁相环的锁定时间为5.2μs,锁定范围约为100 MHz,输出中心频率622 MHz的最大周对周抖动为71ps,功耗为198 mW。此电荷泵锁相环电路可以应用于STM 1和STM 4两个速率级别的同步数字体系(SDH)系统。     

射频锁相环型频率合成器的CMOS实现

本论文实现了一个射频锁相环型频率合成器,它集成了压控振荡器、双模预分频器、鉴频鉴相器、电荷泵、各种数字计数器、数字寄存器和控制电路以及与基带电路的串行接口.它的鉴频鉴相频率、输出频率和电荷泵的电流大小都可以通过串行接口进行控制,还实现了内部压控振荡器和外部压控振荡器选择、功耗控制等功能,这些都使得该频率合成器具有极大的适应性,可以应用于多种通信系统中.该锁相环型频率合成器已经采用0.25μm CMOS工艺实现,测试结果表明,该频率合成器使用内部压控振荡器时的锁定范围为1.82GHz~1.96GHz,在偏离中心频率25MHz处的相位噪声可以达到-119.25dBc/Hz.该频率合成器的模拟部分采用2.7V的电源电压,消耗的电流约为48mA.     

基于电感电容振荡器的电荷泵锁相环的设计

设计并实现了一种采用电感电容振荡器的电荷泵锁相环,分析了锁相环中鉴频/鉴相器(PFD)、电荷泵(CP)、环路滤波器(LP)、电感电容压控振荡器(VCO)的电路结构和设计考虑。锁相环芯片采用0.13μm MS&RF CMOS工艺制造。测试结果表明,锁相环锁定的频率为5.6～6.9 GHz。在6.25 GHz时,参考杂散为-51.57 dBc;1 MHz频偏处相位噪声为-98.35 dBc/Hz;10 MHz频偏处相位噪声为-120.3 dBc/Hz;在1.2 V/3.3 V电源电压下,锁相环的功耗为51.6 mW。芯片总面积为1.334 mm2。     

基于40 nm CMOS工艺的电荷泵锁相环设计

本文基于SMIC40nmCMOS工艺,设计了一款输入频率范围25～20MHz,输出频率范围2.4～4GHz的电荷泵锁相环(CPPLL).介绍了电荷泵锁相环的整体电路框架,叙述了各子模块电路的设计、仿真验证与整体电路的设计与仿真验证,重点介绍压控振荡器的设计与仿真优化.版图后仿真结果表明,电荷泵电流失配在直流情况下达到0.3％@0.4-1.3 V;压控振荡器的输出频率范围为0.3～4 GHz、在输出频率1 MHz时相位噪声为-93.4 dB@1MHz、锁定时间为1 μs、绝对抖动为1 ps、典型值时的功耗为30 mW、面积为300×300 μm.     

一种用于时钟产生的低功耗电荷泵锁相环设计

设计了一种用于时钟产生的电荷泵锁相环(CPPLL),其压控振荡器(VCO)采用了新颖的带电流补偿的电流减法器结构。采用Charted2.5V、0.25μmCMOS工艺,整个芯片的面积为300μm×400μm,VCO输出频率范围为55MHz～322MHz。整个电路功耗低,VCO输出频率为240MHz时,功耗为6mW。Hspice仿真结果表明,VCO输出时钟为96MHz时,峰峰值抖动为320ps。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.