一种欠采样应用的高精度低功耗采样/保持电路

设计了一种可用于欠采样情况的高精度、低功耗采样/保持电路。在40 MHz时钟频率下,采样90 MHz输入信号时可达11位以上精度。采用电容翻转结构的采样/保持电路,以消除电容失配的影响;使用栅压自举开关,以提高线性度,实现欠采样输入;并设计了一种高增益、大带宽、低功耗的增益自举套筒式共源共栅(telescopic cascode)运算放大器。电路采用SMIC 0.35μmCMOS工艺实现,电源电压为3.3 V,功耗仅为7.6 mW。     

一种12位100MSPS采样保持电路的设计

基于0.13μm/3.3V CMOS工艺,设计了一种用于12bit 100MSPS Pipeline AIC的采样保持(S/H)电路.采用具有高线性度双边对称的无馈通自举采样开关,获得高增益、宽带宽的跨导前馈补偿共源共栅两级全差分跨导放大器,以及能显著降低增益误差的相关双采样S/H拓扑结构来搭建S/H电路.仿真结果表明:当在11.27MHz的输入信号,111MHz的采样信号下,该S/H电路无杂散动态范围(SFDR)86.4dB,功耗为32mW.     

一种14位125MHz采样/保持电路的设计

设计了一种高性能采样/保持(S/H)电路,采用全差分电容翻转型的主体结构,有效减小了噪声和功耗.在电路设计中,采用栅压自举开关,极大地减小了非线性失真,同时,有效地抑制了输入信号的直流偏移.采样/保持放大器电路采用折叠共源共栅结构,由于深亚微米工艺中器件本征增益减小,S/H电路为达到更高增益,采用增益提升技术.设计的采样/保持电路采用0.18μm1P5M工艺实现,在1.8V电源电压、125 MHz采样速率下,输出差动摆幅达到2 V(VP-P),输入信号到奈奎斯特频率时仍能达到98 dB以上的无杂散动态范围(SFDR),其性能满足14位精度、125MHz转换速率的流水线ADC要求.     

基于0.35 μm GeSi-BiCMOS工艺的1 GSPS采样保持电路

介绍了一种基于0.35μmGeSi-BiCMOS工艺的1GSPS采样/保持电路。该电路采用全差分开环结构,使用局部反馈提高开环缓冲放大器的线性度;采用增益、失调数字校正电路补偿高频输入信号衰减和工艺匹配误差造成的失调。在1GS/s采样率、484.375MHz输入信号频率、3.3V电源电压下进行仿真。结果显示,电路的SFDR达到75.6dB,THD为-74.9dB,功耗87mW。将该采样/保持电路用于一个8位1GSPSA/D转换器。流片测试结果表明,在1GSPS采样率,240.123MHz和5.123MHz输入信号下,8位A/D转换器的SNR为41.39dB和43.19dB。     

一种高速高增益CMOS运算放大器的设计

设计了一种应用于采样保持电路中高速高增益运算放大器。该运放采用全差分增益提高型共源共栅结构。在输入信号通路上加入适当的补偿电容,消除了零极点对对运放建立时间的影响,同时对主运放的次极点进行了优化,改进了相位裕度。采用0.35μmCMOS工艺仿真,结果表明,运放的开环直流增益达到106dB,单位带宽为831MHz（负载电容8pF）,相位裕度为60.5°,压摆率为586V/μs,满足12位50MS/s流水线ADC中采样保持电路性能要求。     

用于CMOS图像传感器内置流水线ADC的采样/保持电路

设计了用于CMOS图像传感器内置流水线ADC的采样/保持电路,该电路具有10位采样精度和50 MHz采样速率,采用开关电容电荷重分布式结构,加入图像传感器的黑光校准功能。放大器采用全差分套筒式共源共栅增益增强型结构,保证了所需的增益和带宽。电路采用0.18μmCMOS工艺实现。HSPICE仿真结果表明,电路可在5 ns内达到0.05%的精度;对于24.0218 MHz、±0.5 V摆幅的正弦输入信号,SNDR和SFDR分别达到62.47 dB和63.73 dB,满足系统要求。     

一种10位80 MS/s低功耗采样保持电路的设计

给出了一种基于开关电容(SC)电路的10位80 MHz采样频率低功耗采样保持电路。它是为一个10位80 MS/s流水线结构A/D转换器的前端采样模块设计的。在TSMC 0.25μmCMOS工艺,2.5 V电源电压下,该电路的采样频率为80 MHz;在奈奎斯特频率采样时,无杂散动态范围(SFDR)为75.4 dB,SNDR为71.8 dB,ENOB为11.6,输入信号范围可达160 MHz(两倍采样频率),此时SFDR仍大于70 dB。该电路功耗为16.8 mW。     

一种10位50MHz流水线模数转换器的设计

采用每级1.5 bit和每级2.5 bit相结合的方法设计了一种10位50 MHz流水线模数转换器。通过采用自举开关和增益自举技术的折叠式共源共栅运算放大器,保证了采样保持电路和级电路的性能。该电路采用华润上华(CSMC)0.5μm 5 V CMOS工艺进行版图设计和流片验证,芯片面积为5.5 mm2。测试结果表明:该模数转换器在采样频率为50 MHz,输入信号频率为30 kHz时,信号加谐波失真比(SNDR)为56.5 dB,无杂散动态范围(SFDR)为73.9 dB。输入频率为20 MHz时,信号加谐波失真比为52.1 dB,无杂散动态范围为65.7 dB。     

一个用于14位采样保持电路的全差分增益增强放大器的分析和设计

介绍了一种全差分增益增强CMOS运算放大器的设计和实现。该放大器用于14位20 MHz采样频率的流水线模/数转换器(A/D)的采样保持电路。为了实现大的输入共模范围,采用折叠式共源共栅放大器。主放大器采用开关电容共模反馈电路在获得大输出摆幅的同时降低了功耗。辅助放大器则采用简单的连续时间共模反馈电路。该放大器采用UMC Logic 0.25μm工艺,电源电压为2.5 V。Hspice仿真结果显示,在负载为15 pF的情况下,其增益为104 dB,单位增益带宽为166 MHz。     

一个高性能低功耗10位30MS/s流水线A/D转换器

介绍了一个10位30M采样率流水线A/D转换器，通过采用运放共享技术和动态比较器，大大降低了电路的功耗. 在采样保持电路中使用一种新颖的自举（bootstrap）开关，减小了失真，使得电路在输入信号频率很高时仍具有很好的动态性能. 还提出了一种新的偏置电路结构，为增益提高运放提供了一个稳定且精确的偏置，使得增益提高运放具有较大的电压摆幅. 在30MHz采样时钟，29MHz输入信号下测试，可以得到9.16bit有效位的输出，在输入信号为70MHz时，仍然有8.75bit有效位. 电路积分非线性的最大值为0.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.     

Theoretical analysis of the relationship between the Brillouin gain coefficient and the strain in the optical-fiber sensors

The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.     

Novel fiber-optical interferometer with miniaturized probe for in-hole measurements

Today, micro-system technology and the development of new MEMS （Micro-Electro-Mechanical Systems） are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.     

Study of waveguide coupling efficiency in hybrid silicon lasers

This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel＇s.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.