铁氧体隔离器薄膜电路制备工艺研究

文中采用磁控溅射方式在铁氧体基片上制备了微带隔离器的多层膜结构。通过带金属掩模版溅射电阻层,避免了对薄膜电阻的光刻和刻蚀;通过使用铜靶和湿法刻蚀,克服了对溅射用金靶、反应离子刻蚀等工艺技术和设备的依赖。该新型工艺方法简化了镍铬薄膜电阻的制作,降低了薄膜电路的制造成本,可应用于集成电阻的薄膜电路基板的研制。     

4000TPI光刻面伺服系统的高速寻道机理

光刻伺服盘是一种新的磁头伺服定位技术［１］，通过对４０００ＴＰＩ光刻面伺服系统的光刻伺服图形结构的分析，本文提出了一种简单可靠的磁头过道脉冲检测方式，可显著提高磁头寻道速度，保证磁头在高道密度下高速寻道。     

离子束溅射刻蚀

离子束溅射刻蚀、离子刻蚀、离子铣以及离子磨削等实属同一概念。离子束能刻蚀任何材料并能加工精细的几何图形。其刻蚀精度仅取决于光刻的水平及其掩膜的性质。目前,离子束溅射刻蚀已能加工出80埃的线条,而化学腐蚀所能达到的极限则为2微米线宽,且有边界轮廓模糊不清、钻蚀、沾污等缺点。离子束溅射刻蚀最突出的优点是窗壁的角度可以控制。这是通过选择入射角度和旋转靶子来完成的,这对金属化覆盖台阶来说极为重要。例如,对镍铁合金,当离子束以0～15度的入射角射到旋转着的靶板时可刻蚀出近于垂直的壁,而其它相关的刻蚀工艺都不能控制窗壁的角度。     

集成电路制造中的三束技术

集成电路制造工艺技术种类繁多,包括光刻、刻蚀、氧化、扩散、溅射、封装等。作为代表性的先进工艺技术是电子束、离子束和光子束加工技术,俗称三束技术。对三束技术做了介绍。     

4000TPI光刻伺服盘的工艺实践

利用光刻技术成功地制作了4000TPI(Tracks Per Inch)伺服盘.通过扫描电镜、振动样品测试仪及干涉仪检测结果证明,所研制了光刻伺服盘达到了设计要求.     

一种新型大容量磁盘驱动器研究

一种容量达1250MB的磁盘驱动器正在研究中，其关键是利用电子束曝光及半导体工艺技术，本文对高速、大容量磁盘驱动器进行了探索，利用电子速及离子束技术完成了伺服盘的刻蚀工作，伺服盘道密度近2000TPI。     

基因芯片中的微电子刻蚀技术

基因芯片是运用微电子加工技术以及基因分子的自组装技术在微小芯片上组装成千上万个不同的DNA微阵列，实现以基因为主的生命信息的大规模检测。本文利用氧化、光刻、蒸发、溅射等一系列集成电路刻蚀技术，研究了适于电化学检测的基因芯片微阵列的制备，并提出了这种芯片中微流路的制备工艺方案。     

用于微细圆弧加工的激光刻录机

声盘、视及光的亚微米圆弧线一般通过激光刻录机光刻制造，本文结合我国开发的用于磁盘伺服图形录写的激光刻录机，从机械结构、光路系统及计算机控制系统等方面，对其进行了研究分析。     

点阵全息图中的光斑整形与加密

在点阵光刻系统中引入光斑整形技术,依据成像系统的成像原理,将制作在透明掩膜版的任意形状物体成像在光刻面,以实现点阵刻蚀光斑的整形。实验结果表明,通过光斑整形后的图像刻蚀光栅亮度明显优于普通点阵刻蚀系统,光斑的任意整形也可对刻蚀图像进行某些特定的加密。     

用于光刻胶刻蚀过程模拟的二维动态CA模型

针对光刻工艺模拟,首次建立了光刻胶刻蚀过程模拟的2-D动态元胞自动机(CA)模型,通过制定规则来确定模拟过程中不断更新的表面元胞,使得模拟只需要计算表面元胞的刻蚀过程.模型既有稳定性好的优点,又有运算速度快的优点.采用一些公认的光刻速率分布测试函数非常有效地模拟了光刻过程,模型在刻蚀速率变化非常大的区域也非常稳定.     

光刻伺服盘磁头读出信噪比分析

本文叙述了光刻伺服盘采用分离磁道刻写方法对信噪比的影响，该方法在磁盘记录区采用导磁材料，非记录区采用非导磁材料。这样一种非连续的记录磁介质，有利于道密度的提高，增大了磁盘信息存储容量，减少了道间串扰，提高了磁头读出的信噪比［以Ｓ／Ｎ表示］。     

利用锁相环跟踪马达转速在微硬盘伺服写入中的应用

在众多与硬盘相关的技术中,硬盘伺服信息写入技术非常重要。在硬盘伺服信息写入的过程中要求磁碟转速要非常稳定。通过对硬盘主轴马达的反电动势与马达转速之间关系的分析,提出一种利用马达的反电动势信号跟踪马达转动速度变化,产生系统伺服写入时钟信号的方法。在此基础上建立适合的锁相环模型,根据实际情况选择参数并进行计算仿真。     

小型光盘调焦系统

介绍了一套用于光盘存储的小型调焦伺服系统,调焦误差校正比优于70 dB。     

Customizable coherent servo demodulation for disk drives

This paper describes a servo demodulator which provides greatly improved performance over the currently used servo demodulation methods for disk drives. The demodulation algorithm proposed here makes better use of knowledge about the readback signal coming from the disk to provide better noise immunity and more immunity to other nonidealities in the magnetic head response. The net result is a demodulated position error signal which has a much cleaner response     

Controller optimization for minimum position error signals of harddisk drives

In order to reduce the position error signal (PES) and track misregistration (TMR) of disk drives, it is generally believed that the bandwidth of a disk drive servo system has to be increased. However, increase of the bandwidth is limited by available sampling frequency and mechanical resonances of a head-disk assembly. Hence, for a given servo-mechanical system, optimization of a servo controller is a crucial and economical way to get the best TMR performance. In this paper, optimization of a servo controller that yields minimum PES is presented. The equivalent position-mode disturbance is estimated by the error transfer function inversion method. The estimated disturbance is injected into the servo system to evaluate PES. The optimization process will select the best controller that minimizes PES under the specified constraints. It has been demonstrated that the minimization has been achieved by shaping the error transfer function rather than increase of the servo bandwidth, PES reduction has been confirmed by simulation and experiments     

A general simulator for VLSI lithography and etching processes: Part II—Application to deposition and etching

The extension of the general process simulator SAMPLE to plasma etching and metallization is described. The etching algorithm is divided into isotropic, anisotropic, and direct milling components and is suitable for modeling wet etching, plasma etching, reactive ion etching, and ion milling. Separate deposition algorithms are used for CVD, sputtering, and planetary deposition. With the extension, it is possible to use a simple keyword repertoire to simulate a sequence of photolithography, etching, and deposition steps to obtain device cross sections at each stage of fabrication.     

Pt电极的磁增强反应离子刻蚀的研究

以SF6/O2作为刻蚀气体,用磁增强反应离子刻蚀(MERIE)技术,对磁控溅射法制备的Pt电极进行了刻蚀。结果表明:Pt的刻蚀速率与刻蚀气体的混合比率以及刻蚀功率都有一定关系。在相同功率下,R[O2∶(SF6+O2)]=2/6,刻蚀速率达到极大值,功率为120W时,刻蚀速率极大值为12.4nm/min。AFM分析表明,薄膜表面的粗糙度随刻蚀功率增加而变大,均方根粗糙度从120W时的0.164nm增加到160W时的0.285nm。经优化工艺参数刻蚀后的Pt电极图形结构平整,边缘整齐。     

Robust tracking servo system considering force disturbance for the optical disk recording system

This paper proposes a new robust tracking servo system for the optical disk recording system with feedforward controller based on the prediction of the tracking error. In optical recording systems, the feedback servo system must suppress the influence of force disturbance and parameter variation. To overcome this problem, this paper designs the robust feedback control system by using coprime factorization and disturbance observer. The detecting signal of the optical disk recording system is only a tracking error. Hence, the feedforward controller of the proposed tracking control system is constructed based on both the "zero-phase-error tracking" control theory and the prediction of the tracking error. The experimental results point out that the proposed tracking servo system has a quick and precise tracking response and keeps the residual tracking error below its tolerance.