横向抗弥散多光谱TDI CCD图像传感器

时间延迟积分电荷耦合器件(TDI CCD)主要应用于弱光信号探测,其在强光应用场合容易出现弥散现象。针对该问题,研制了横向抗弥散多光谱TDI CCD图像传感器。该器件包含四个多光谱段(B1～B4区),有效像元数为3 072元,像元尺寸为28μm×28μm。大像元可以在弱光环境下提供良好的光谱区分能力,通过滤光片可获得蓝光、绿光、红光和近红外波段的图像。为了减小抗弥散对器件满阱电子数的不利影响,采用了紧凑的抗弥散结构,仅占像元面积的7.1%。器件满阱电子数为500ke-,抗弥散能力为100倍,读出噪声小于等于70e-,动态范围大于等于7143∶1。     

长线列CMOS图像传感器的性能优化设计

设计了一种基于电容反馈跨阻放大器(CTIA)的长线列CMOS图像传感器。为减小器件功耗和面积,采用基于单端四管共源共栅运算放大器。为提高信号读出速率,采用没有体效应的PMOS源跟随器,同时减小PMOS管的宽长比,有效减小了输出总线寄生电容的影响。在版图设计上,采用顶层金属走线,降低寄生电阻和电容,提高了长线列CMOS图像传感器的读出速率和输出线性范围。采用0.35μm 3.3V标准CMOS工艺对传感器进行流片,得到器件像元阵列为5×1 030,像元尺寸为20μm×20μm。测试结果表明:该传感器在积分时间为1ms、读出速率为4MHz的情况下工作稳定,其线性度达到98%,线性动态范围为76dB。     

一种大视场TDICCD相机的多传感器图像配准方法

某大视场TDICCD相机采用多片TDICCD拼接,多通道输出全色和多光谱遥感图像,为了获得良好的融合和拼接效果,本文提出了一种基于双线性插值的空域互相关配准方法。首先,应用双线性插值算法对多光谱各谱段图像进行放大,得到和全色图像相同大小的多光谱图像。然后,采用空域互相关配准方法对多光谱各谱段图像和全色图像进行配准,并对有重叠像元的两通道图像进行拼接。实验结果表明,本文方法快速,抗噪性和鲁棒性较高,使大视场TDICCD相机多通道遥感图像配准取得了良好的效果。     

高帧频高灵敏度线列PIN-CMOS图像传感器研究

设计了一款高帧频高灵敏度双通道16元线列PIN-CMOS图像传感器。相对于传统的pn结光电二极管,PIN光电二极管具有结电容小和量子效率高的优点,可以降低CTIA像素电路的噪声,提高信噪比;同时采用一种新型的相关双采样电路结构,可以在边积分边读出的模式下实现相关双采样,抑制像素复位带来的KTC噪声。基于0.35μm PIN-CMOS工艺进行了线列CMOS图像传感器流片,并对器件的光电性能进行了测试。测试结果表明:在像元尺寸为90μm×90μm,700nm波长下,器件灵敏度达3000V/(lx·s),量子效率为96%;在40kHz高帧频、0.05lx光照条件下器件信噪比为7,适于弱信号下的高速探测。     

多光谱TDI-CMOS图像传感器读出电路设计

针对3D集成式多光谱TDI-CMOS图像传感器的数字化处理和高速读出需求,为了解决与TDICCD探测器的整体布局、物理尺寸和接口的匹配性和一致性问题,研制了适用于五谱段TDICCD的CMOS读出电路芯片。该读出电路芯片创新地设计了一种使用多相位ADC时钟、支持相关多次采样的新型列级单斜ADC电路结构,实现了TDICCD信号的数字化和高速输出,有效提升了探测器的动态范围和噪声指标。流片测试结果表明：读出电路芯片的功能正常,集成式TDICCD的成像效果良好,新型列级ADC工作正常,读出电路以最小9.5μs的行周期输出14 bit数据,相关多次采样具备降低输出信号噪声的作用,实现了TDICCD信号的高精度数字化处理和高速输出,满足3D集成式TDI-CMOS图像传感器的研制要求。     

256×256元IRCCD的设计及灵敏度改善

叙述了256×256元PtSi肖特基势垒红外焦平面的工作原理和设计考虑。器件采用四相ITCCD结构。像元尺寸和填充系数分别为60×50(μm~2)和35％。采用薄金属膜和光腔结构改善了器件的灵敏度。势垒高度为0.22ev,相应的截止波长为5.6μm。在室温目标下,用该器件摄得了较好的红外图像。     

一种遥感相机的CCD交错拼接方法研究

随着技术的不断进步,遥感相机也向着宽谱段、大覆盖范围的方向发展.由于现有CCD的像元数有限,不能满足覆盖大视场的要求,需要对其进行拼接.通过分析现有拼接技术的优缺点,本文设计了一种不同于传统机械拼接与光学拼接的交错式机械拼接方法,并针对某可见、近红外宽谱段相机采用两片TDICCD进行了交错式机械拼接实验.实验结果表明,该方法的搭接误差小于2μm,平行误差小于3μm,共面误差小于6μm,满足相机的成像要求,并可在相机焦平面拼接的研究与实践中推广使用.     

1024×1024全帧CCD器件

采用2μm设计规则,在2μm工艺线上,成功研制了1 024×1 024全帧CCD器件。该1 024×1 024全帧CCD器件的有效像元数为1 024×1 024,像元尺寸为11μm×11μm,有效光敏面积为11.3mm×11.3mm,光响应波长范围为400～1 100nm。成像区域横向分为2个区,纵向分为2个区,可由1路、2路和4路输出,有9种读出模式。该器件具有2×2的像元合并功能,能作为512×512（像元尺寸为22μm×22μm）和规格的器件使用。该器件数据速率为4×40M,数据速率高。器件采用MPP工作模式,暗电流低;采用薄栅氧化,具有100krad（Si）抗辐照能力;适合在高温、辐照环境和微光环境下成像应用。     

InSb面阵探测器铟柱缺陷成因与特征研究

通过基于正性光刻胶的不同像元尺寸铟柱阵列及器件制备,研究In Sb面阵探测器铟柱缺陷成因与特征.分别研制了像元尺寸为50μm×50μm、30μm×30μm、15μm×15μm的面阵探测器的铟柱阵列,并制备出In Sb面阵探测器,利用高倍光学显微镜和焦平面测试系统对制备的芯片表面形貌、器件连通性及性能进行了检测与分析.研究结果表明:当像元尺寸为50μm×50μm时,芯片表面形貌和器件连通性测试结果较好;随着像元尺寸减小,芯片表面会出现铟柱相连或铟柱缺失缺陷,器件连通性测试结果与表面形貌相吻合.铟柱相连缺陷是由光刻剥离时残留铟渣引起的铟相连造成;铟柱缺失缺陷是由光刻时残留光刻胶底膜引起的铟柱缺失造成.器件相连缺陷元的响应电压与正常元基本相同,缺失缺陷元的响应电压基本为0,其周围最相邻探测单元响应电压相比正常元增加了约25%.器件缺陷元的研究结果,对通过优化探测器制作水平提升其性能具有重要参考意义.     

包含交流耦合CTIA与数字CDS的CMOS图像传感器设计

设计了一种带隔直电容的交流耦合CTIA像元电路与数字相关双采样（DCDS）结构的CMOS图像传感器系统。在传统的CTIA像元电路中增加隔直电容,通过控制光电二极管的偏压,达到减小光电二极管暗电流的目的;同时采用片外数字CDS结构,通过在片外实现复位信号与像元积分信号的量化结果在数字域的减法,可以减小图像传感器像元的复位噪声和固定图案噪声（FPN）。基于0.35 m标准CMOS工艺对此CMOS图像传感器进行流片,像元阵列为256256,像元尺寸为16 m16 m。测试结果表明交流耦合CTIA像元电路可以将光电二极管的偏压控制在零偏点附近,此时其暗电流最小;采用了数字CDS结构后,图像传感器像元的时域噪声及固定图案噪声均有不同程度降低。     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.     

GaAsSb/InAlAs PA DHBTs Grown by Production MBE

The epi material growth of GaAsSb based DHBTs with InAlAs emitters are investigated using a 4 × 100mm multi-wafer production Riber 49 MBE reactor fully equipped with real-time in-situ sensors including an absorption band edge spectroscope and an optical-based flux monitor. The state-of-the-art hole mobilities are obtained from 100nm thick carbon-doped GaAsSb. A Sb composition variation of less than ± 0.1 atomic percent across a 4 × 100mm platen configuration has been achieved. The large area InAlAs/GaAsSb/InP DHBT device demonstrates excellent DC characteristics,such as BVCEO＞6V and a DC current gain of 45 at 1kA/cm2 for an emitter size of 50μm × 50μm. The devices have a 40nm thick GaAsSb base with p-doping of 4. 5 × 1019cm-3 . Devices with an emitter size of 4μm × 30μm have a current gain variation less than 2% across the fully processed 100mm wafer. ft and fmax are over 50GHz,with a power efficiency of 50% ,which are comparable to standard power GaAs HBT results. These results demonstrate the potential application of GaAsSb/InP DHBT for power amplifiers and the feasibility of multi-wafer MBE for mass production of GaAsSb-based HBTs.     

Technology innovation and process integrations for sub-100nm gate patterning

This paper presents a brief overview of the Applied Centura(R)DPS(R)system,configured with silicon etch DPS Ⅱ chamber, with emphasis on discussing tuning capability for CD uniformity control. It also presents the studies of etch process chemistry and film integration impact for an overall successful gate patterning development. Discussions will focus on resolutions to key issues, such as CD uniformity, line-edge roughness, and multilayer film etching integration.     

White organic light-emitting devices based on fac tris（2- phenylpyridine） iridium sensitized 5,6,11,12-tetraphenylnap -hthacene

We have fabricated the white organic light-emitting devices （WOLEDs） based on 4,4＇ -bis（2,2 -diphenyl vinyl）-1,1＇ - biphenyl （DPVBi） and phosphorescence sensitized 5,6,11,12,-tetraphenylnaphthacene （rubrene）. The device structure is ITO/2T-NATA （20 nm）/NPBX （20 nm）/CBP： x%Ir（ppy）3：0.5% rubrene （8 nm）/NPBX （5 nm）/DPVBi （30 nm）/Alq（30 nm）/LiF（0.5 nm）/A1. In the devices, DPVBi acts as a blue light-emitting layer, the rubrene is sensitized by a phosphorescent material, fac tris （2-phenylpyridine） iridium [Ir（ppy）3], acts as a yellow light-emitting layer, and N,N＇ -bis- （1-naphthyl）- N,N＇ -diphenyl -1, 1＇ -biphenyl-4,4＇ -diamine （NPBX） acts as a hole transporting and exciton blocker layer, respectively. When the concentration of Ir （PPY）3 is 6wt%, the maximum luminance is 24960 cd/m^2 at an applied voltage of 15 V, and the maximum luminous efficiency is 5.17 cd/A at an applied voltage of 8 V.     

Complete approach to automatic identification and subpixel center location for ellipse feature

To meet the need of automatic image features extraction with high precision in visual inspection, a complete approach to automatic identification and sub-pixel center location for similar-ellipse feature is proposed. In the method, the feature area is identified automatically based on the edge attribute, and the sub-pixel center location is accomplished with the leastsquare algorithm. It shows that the method is valid, practical, and has high precision by experiment. Meanwhile this method can meet the need of instrumentation of visual inspection because of easy realization and without man-machine interaction.     

小角度扩展相关性近似算法分析

本论文提出一种在多天线MIMO信道相关性建模中小角度扩展近似理论算法,并应用于分析MIMO系统性能。分析中分别对三种不同角能量分布情况下的空间相关性研发快速近似计算法,并同时提出双模(Bi-Modal)角能量分布情况下的近似运算。通过分析这些新方法的近似效率,可以得到计算简单、复杂度低、而且符合实际的MIMO相关信道矩阵,对系统级的快速高效计算法的研究和系统级的评估以及误差分析具有重要的意义。     

Noise character analysis and the restraint of self-pulsation laser diodes

We calculate the Langevin noise sources of self-pulsation laser diodes, analyze the effects of active region noise and saturable-absorption region noise on the power fluctuation as well as period fluctuation, and propose a novel method to restrain the noise effects. A visible SIMULINK model is established to simulate the system, The results indicate that the effects of noise in absorption region can be ignored; that with the increase of DC injecting current, the noise effects enhance power jitter, and nevertheless, the period jitter is decreased; and that with external sinusoidal current modulating the self-pulsation laser diode, the noise-induced power jitter and period jitter can be suppressed greatly. This work is valuable for clock recovery in all-optical network.