量子阱红外探测器及相关量子器件的研究进展

本文紧扣量子阱中电子跃迁特点,围绕量子阱红外探测器(QWIP)的器件物理和器件应用的研究,分析QWIP的主要物理性质和器件性能,阐述QWIP及QWIP相关器件国内外研究动态,判断其发展趋势和研究方向。     

320×256 GaAs/AlGaAs长波红外量子阱焦平面探测器

量子阱红外探测器(Quantum well infrared photodetector, QWIP)已经经历了20多年的深入研究,各种QWIP器件,包括量子阱红外探测器焦平面阵列(FPA)的研制也已经相当成熟。但是在国内,受制于整体工业水平, QWIP焦平面阵列器件的研制仍然处于起步阶段。研制了基于GaAs/ AlxGa1-xAs 材料、峰值响应波长为9.9 m的长波320256 n型QWIP焦平面阵列器件,其像元中心距25 m, 光敏元面积为22 m22 m。GaAs衬底减薄后的QWIP焦平面阵列,与Si基CMOS读出电路(ROIC)通过铟柱倒焊互连,并且在65 K工作温度下进行了室温环境目标成像。该焦平面器件的规模和成像质量相比之前国内报道的结果都有较大提高。焦平面平均峰值探测率达1.51010 cmHz1/2/W。     

多色量子阱红外探测器的发展

军用红外探测器需要使用工作在各种红外波段的大规格、高均匀性多色焦平面阵列器件.满足这些要求的一个候选者就是量子阱红外（光电）探测器（Quantum Well Infrared Photodetector,QWIP）.作为新一代红外探测器,QWIP基于极薄半导体异质结构中的载流子束缚效应. GaAs/AlGaAs/QWIP的主要优点包括标准的Ⅲ-Ⅴ族衬底材料和技术、良好的热稳定性、大面积、低研发成本以及抗辐射性.QWIP的另一个重要优点是具有带隙工程能力.可以通过调节量子阱宽度和势垒组分设计出满足特殊要求（例如多色焦平面列阵应用）的器件结构.介绍了对QWIP探测物理机制的理解以及近年来多色QWIP技术的发展状况.     

多色量子阱红外探测器的发展（上）

军用红外探测器需要使用工作在各种红外波段的大规格,高均匀性多色焦平面阵列器件。满足这些要求的一个候选者就是量子阱红外（光电）探测器（QuantumWell Infrared Photodetector,QWIP）。作为新一代红外探测器,QWIP基于极薄半导体异质结构中的载流子束缚效应。GaAs／A1GaAs／QWIP的主要优点包括标准的III—V族衬底材料和技术、良好的热稳定性、大面积、低研发成本以及抗辐射性。QWIP的另一个重要优点是具有带隙工程能力。可以通过调节量子阱宽度和势垒组分设计出满足特殊要求（例如多色焦平面列阵应用）的器件结构。介绍了对QwIP探测物理机制的理解以及近年来多色QwIP技术的发展状况。     

时域有限差分法模拟量子阱红外探测器光栅的光耦合

由于量子选择定则的限制，对于量子阱红外探测器(QWIP)，必须利用衍射光栅增强其光学偶合效率，本文给出了一种基于时域有限差分法(FDTD)的数值方法，计算制备在QWIP器件上的金属光栅的衍射效应，模拟计算的结罘表明，FDTD方法是解析这种复杂结构内电磁场问题的有效手段．可以计算QWIP器件内各点电磁场所有分量的详细分布，进而可以估算衍射光栅的偶合效率，以及优化QWIP结构设计。     

红外焦平面成像器件发展现状

红外焦平面列阵成像技术已经进入了成熟期。本文对几种红外焦平面列阵器件如MCT、InSb和QWIP的最新进展作一评述,简要介绍其器件发展水平、技术路线和关键工艺。简要提及一种新颖的非制冷焦平面成像技术：光学读出微光机红外接收器。     

中波-长波双色量子阱红外探测器

采用n型掺杂的AlGaAs/GaAs和AlGaAs/InGaA多量子阱材料,基于MOCVD外延生长技术,利用成熟的GaAs集成电路加工工艺,设计并制作了不同结构的中波-长波双色量子阱红外探测器(QWIP)器件,器件采用正面入射二维光栅耦合,光栅周期设计为4μm,宽度2μm;对制作的500μm×500μm大面积双色QWIP单元器件暗电流、响应光谱、探测率进行了测试和分析。在-3V偏压、77K温度和300K背景温度下长波(LWIR)和中波(MWIR)QWIP的暗电流密度分别为0.6、0.02mA/cm2;-3V偏压、80K温度下MWIR和LWIR QWIP的响应光谱峰值波长分别为5.2、7.8μm;在2V偏压、65K温度下,LWIR和MWIR QWIP的峰值探测率分别为1.4×1011、6×1010cm.Hz1/2/W。     

中波-长波红外双色QWIP探测器设计

双色QWIP是一类重要的第三代红外探测器,但很少有研究报道对其有源区结构以及耦合光栅参数进行系统的计算分析和优化设计。文中基于包络函数近似、传输矩阵模型、经典光学原理等理论对中波-长波红外双色QWIP探测器的多周期有源区以及二维耦合光栅进行了较为详细的优化设计。长波红外(LWIR)有源区采用GaAs/AlGaAs准匹配体系的多量子阱结构,峰值响应波长为8.5 m;中波红外(MWIR)有源区采用InGaAs/GaAs/AlGaAs应变体系的微带超晶格结构,峰值响应波长为4.5 m;子带间跃迁类型均设计为束缚态-准束缚态(B-QB)以降低暗电流,提高探测率。此外,通过折衷优化设计,采用单周期二维光栅以有效实现LWIR与MWIR的双色耦合。上述设计对双色QWIP器件的研制具有较好的实际指导意义。     

低噪声GaAs/A1GaAs多量子阱红外探测器

提出了一种新结构的多量子阱红外探测器（QWIP）。在常规多量子阱结构的基础上加入P型欧姆接触层,实现以小的隧道电流代替原有的大的补偿电流,从而减小器件的暗电流实现低噪声器件。对器件暗电流的理论计算与实验曲线符合的很好。制备了新结构器件,其噪声只是同结构的常规QWIP的1／3。     

Ⅲ-Ⅴ族半导体全（多）光谱焦平面探测器新进展

近年来,经济社会和武器装备的信息化对半导体光电子学器件提出了更高的要求,无论是国防还是民用工程都需要有自己的关键器件。光电探测器组件作为关键器件之一,世界各国都给予了高度重视,也取得了很大的进展。文中主要介绍了Ⅲ-Ⅴ族半导体全(多)光谱焦平面探测器的研究进展情况,包括量子阱红外探测器(QWIP)、AlGaN紫外焦平面探测器、InGaAs近红外室温焦平面探测器和Sb化物焦平面探测器等。     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.     

GaAsSb/InAlAs PA DHBTs Grown by Production MBE

The epi material growth of GaAsSb based DHBTs with InAlAs emitters are investigated using a 4 × 100mm multi-wafer production Riber 49 MBE reactor fully equipped with real-time in-situ sensors including an absorption band edge spectroscope and an optical-based flux monitor. The state-of-the-art hole mobilities are obtained from 100nm thick carbon-doped GaAsSb. A Sb composition variation of less than ± 0.1 atomic percent across a 4 × 100mm platen configuration has been achieved. The large area InAlAs/GaAsSb/InP DHBT device demonstrates excellent DC characteristics,such as BVCEO＞6V and a DC current gain of 45 at 1kA/cm2 for an emitter size of 50μm × 50μm. The devices have a 40nm thick GaAsSb base with p-doping of 4. 5 × 1019cm-3 . Devices with an emitter size of 4μm × 30μm have a current gain variation less than 2% across the fully processed 100mm wafer. ft and fmax are over 50GHz,with a power efficiency of 50% ,which are comparable to standard power GaAs HBT results. These results demonstrate the potential application of GaAsSb/InP DHBT for power amplifiers and the feasibility of multi-wafer MBE for mass production of GaAsSb-based HBTs.     

Technology innovation and process integrations for sub-100nm gate patterning

This paper presents a brief overview of the Applied Centura(R)DPS(R)system,configured with silicon etch DPS Ⅱ chamber, with emphasis on discussing tuning capability for CD uniformity control. It also presents the studies of etch process chemistry and film integration impact for an overall successful gate patterning development. Discussions will focus on resolutions to key issues, such as CD uniformity, line-edge roughness, and multilayer film etching integration.     

White organic light-emitting devices based on fac tris（2- phenylpyridine） iridium sensitized 5,6,11,12-tetraphenylnap -hthacene

We have fabricated the white organic light-emitting devices （WOLEDs） based on 4,4＇ -bis（2,2 -diphenyl vinyl）-1,1＇ - biphenyl （DPVBi） and phosphorescence sensitized 5,6,11,12,-tetraphenylnaphthacene （rubrene）. The device structure is ITO/2T-NATA （20 nm）/NPBX （20 nm）/CBP： x%Ir（ppy）3：0.5% rubrene （8 nm）/NPBX （5 nm）/DPVBi （30 nm）/Alq（30 nm）/LiF（0.5 nm）/A1. In the devices, DPVBi acts as a blue light-emitting layer, the rubrene is sensitized by a phosphorescent material, fac tris （2-phenylpyridine） iridium [Ir（ppy）3], acts as a yellow light-emitting layer, and N,N＇ -bis- （1-naphthyl）- N,N＇ -diphenyl -1, 1＇ -biphenyl-4,4＇ -diamine （NPBX） acts as a hole transporting and exciton blocker layer, respectively. When the concentration of Ir （PPY）3 is 6wt%, the maximum luminance is 24960 cd/m^2 at an applied voltage of 15 V, and the maximum luminous efficiency is 5.17 cd/A at an applied voltage of 8 V.     

Complete approach to automatic identification and subpixel center location for ellipse feature

To meet the need of automatic image features extraction with high precision in visual inspection, a complete approach to automatic identification and sub-pixel center location for similar-ellipse feature is proposed. In the method, the feature area is identified automatically based on the edge attribute, and the sub-pixel center location is accomplished with the leastsquare algorithm. It shows that the method is valid, practical, and has high precision by experiment. Meanwhile this method can meet the need of instrumentation of visual inspection because of easy realization and without man-machine interaction.     

小角度扩展相关性近似算法分析

本论文提出一种在多天线MIMO信道相关性建模中小角度扩展近似理论算法,并应用于分析MIMO系统性能。分析中分别对三种不同角能量分布情况下的空间相关性研发快速近似计算法,并同时提出双模(Bi-Modal)角能量分布情况下的近似运算。通过分析这些新方法的近似效率,可以得到计算简单、复杂度低、而且符合实际的MIMO相关信道矩阵,对系统级的快速高效计算法的研究和系统级的评估以及误差分析具有重要的意义。     

Noise character analysis and the restraint of self-pulsation laser diodes

We calculate the Langevin noise sources of self-pulsation laser diodes, analyze the effects of active region noise and saturable-absorption region noise on the power fluctuation as well as period fluctuation, and propose a novel method to restrain the noise effects. A visible SIMULINK model is established to simulate the system, The results indicate that the effects of noise in absorption region can be ignored; that with the increase of DC injecting current, the noise effects enhance power jitter, and nevertheless, the period jitter is decreased; and that with external sinusoidal current modulating the self-pulsation laser diode, the noise-induced power jitter and period jitter can be suppressed greatly. This work is valuable for clock recovery in all-optical network.