用0．8μm工艺技术设计的65—kb BiCMOS SRAM

设计了一种65-kb BiCMOS静态随机存取存储器(SRAM)的存储单元及其外围电路，提出了采用先进的0．8μm BiCMOS工艺，制作所设计SRAM的一些技术要点。实验结果表明，所设计的BiCMOS SRAM，其电源电压可低于3V，它既保留了CMOS SRAM低功耗、高集成密度的长处，又获得了双极型(Bipo1ar)电路快速、大电流驱动能力的优点，因此，特别适用于高速缓冲静态存储系统和便携式数字电子设备中。     

新型4T SRAM的读辅助电路设计

SoC芯片的很大一部分面积被存储器占据,而静态随机存储器SRAM为主要部分,因此高密度的SRAM研究引起更多重视。随着半导体工艺的不断发展,SRAM存储器的读写性能愈发重要。研究和分析了两种高密度、低功耗、高速的SRAM读辅助电路,即降低字线电压电路和增大供电电压电路。针对存储密度提升的4T SRAM,通过使用读辅助电路,增强了数据读取的稳定性,同时可以保证SRAM的数据写能力。在55 nm CMOS工艺条件下,相对传统6T SRAM,4T存储单元的面积减小20%。仿真结果表明,通过在外围电路中设计辅助电路,4T SRAM的读稳定性改善了134%。     

用0.8μm工艺技术设计的65-kb BiCMOS SRAM

设计了一种65-kb BiCMOS静态随机存取存储器(SRAM)的存储单元及其外围电路,提出了采用先进的0.8mm BiCMOS工艺,制作所设计SRAM的一些技术要点。实验结果表明,所设计的BiCMOSSRAM,其电源电压可低于3V,它既保留了CMOS SRAM低功耗、高集成密度的长处,又获得了双极型(Bipolar)电路快速、大电流驱动能力的优点,因此,特别适用于高速缓冲静态存储系统和便携式数字电子设备中。     

用O.8μm工艺技术设计的65-kb BiCMOS SRAM

设计了一种65-kb BiCMOS静态随机存取存储器(SRAM)的存储单元及其外围电路,提出了采用先进的0.8μm BiCMOS工艺,制作所设计SRAM的一些技术要点.实验结果表明,所设计的BiCMOSSRAM,其电源电压可低于3V,它既保留了CMOS SRAM低功耗、高集成密度的长处,又获得了双极型(BiDolar)电路快速、大电流驱动能力的优点,因此,特别适用于高速缓冲静态存储系统和便携式数字电子设备中.     

SRAM静态低功耗设计

在标准的Fabless CMOS工艺线上,由于没有对静态存储器生产进行过专门的工艺优化,在有大规模SRAM嵌入设计的ASIC与SoC电路中,静态电流较大。文章讨论了静态存储器单元静态漏电模式,采用了国内某标准CMOS工艺线提供的0.25μm SPICE模型,使用HSPICE软件对六管静态存储器单元的静态漏电进行了模拟,介绍了一种高可靠、基于0．25μm标准CMOS工艺的低功耗静态存储器设计的解决方案,适用于要求低待机功耗的标准静态存储器、嵌入式静态存储器电路设计。     

一种新的基于SRAM的快速综合技术

对静态随机存储器(SRAM)全定制设计过程中的版图设计工作量大、重复性强的问题进行了分析,并在此基础上提出了一种新的应用于SRAM设计的快速综合技术。这种技术充分利用SRAM电路重复单元多的特点,在设计过程中尽可能把电路版图的硬件设计转换为使用软件来实现,节省了大量的版图设计和验证的时间,从而提高了工作效率。这种技术在龙芯Ⅱ号CPU的SRAM设计中得到了应用;芯片采用的是中芯国际0.18μm CM O S工艺。流片验证表明,该技术对于大容量的SRAM设计是较为准确而且有效的。     

IDT70V9289型高速同步双口SRAM的原理及应用

IDT70V9289是IDT公司新推出的一款高速同步双口静态存储器（SRAM），可实现不同传输方式的双路高速数据流的无损传输。文中详细介绍该电路的结构和原理．给出IDT70V9289的典型应用电路及设计时应注意的问题。     

SRAM灵敏放大器的设计改进及其Hspice仿真分析

静态随机存取存储器（SRAM）由于其自身的低功耗和高速的优势而成为半导体存储器中不可或缺的重要产品。提高和改善静态存储器的性能依然是集成电路设计领域的重要课题。从降低静态存储器功耗的角度出发，重点研究了静态存储器的关键模块——灵敏放大器的工作机理和结构，设计了一种改进型的锁存型灵敏放大器，Hspice的仿真表明，该放大器的功耗大大低于传统的静态存储器的灵敏放大器模块的功耗。     

基于补偿电路的SRAM读操作跟踪电路设计

在传统静态随机存储器（SRAM）读操作跟踪电路中,生产工艺和温度的偏差会直接影响到对SRAM中存储数据的正确读取。因此,在本文中,我们采用工艺拐点补偿和温度补偿的方法,设计出了新型SRAM读操作跟踪电路。所设计跟踪电路,通过在不同工艺拐点和不同温度的情况下,对时序追踪字线DBL补偿不同大小的电流,从而减小灵敏放大器输入位线电压差对工艺拐点和温度的敏感度。有效减小了工艺拐点和温度对于SRAM读操作的影响,提高了SRAM的良率。基于SMIC 40nm CMOS工艺,对上述读操作跟踪电路进行了仿真,并且分别对补偿前后进行了10000次蒙特卡罗仿真与比较,仿真结果验证了所设计电路的可靠性和有效性。     

基于伪静态存储器的设计

伪静态（Pseudostatic）存储器的设计是用于直接替代静态随机存储器（SRAM）,即使内部存储器的操作并非静态。商业化的两种伪静态存储器分别是伪静态随机存储器（PSRAM）及铁电随机存储器（F—RAM）。PSRAM针对慢速SRAM应用;当纯粹计算每个位的成本时具有竞争优势。F-RAM针对电池后备SRAM（即BBSRAM）应用,在系统成本及产品供应方面具有竞争力。F-RAM还有一个目标用途是用于非易失性数据获得,在这种应用中可以提供卓越的性能。本文将解释这两种伪静态存储器如何实现其功能及有助于简化系统设计人员的工作。     

Technology innovation and process integrations for sub-100nm gate patterning

This paper presents a brief overview of the Applied Centura(R)DPS(R)system,configured with silicon etch DPS Ⅱ chamber, with emphasis on discussing tuning capability for CD uniformity control. It also presents the studies of etch process chemistry and film integration impact for an overall successful gate patterning development. Discussions will focus on resolutions to key issues, such as CD uniformity, line-edge roughness, and multilayer film etching integration.     

White organic light-emitting devices based on fac tris（2- phenylpyridine） iridium sensitized 5,6,11,12-tetraphenylnap -hthacene

We have fabricated the white organic light-emitting devices （WOLEDs） based on 4,4＇ -bis（2,2 -diphenyl vinyl）-1,1＇ - biphenyl （DPVBi） and phosphorescence sensitized 5,6,11,12,-tetraphenylnaphthacene （rubrene）. The device structure is ITO/2T-NATA （20 nm）/NPBX （20 nm）/CBP： x%Ir（ppy）3：0.5% rubrene （8 nm）/NPBX （5 nm）/DPVBi （30 nm）/Alq（30 nm）/LiF（0.5 nm）/A1. In the devices, DPVBi acts as a blue light-emitting layer, the rubrene is sensitized by a phosphorescent material, fac tris （2-phenylpyridine） iridium [Ir（ppy）3], acts as a yellow light-emitting layer, and N,N＇ -bis- （1-naphthyl）- N,N＇ -diphenyl -1, 1＇ -biphenyl-4,4＇ -diamine （NPBX） acts as a hole transporting and exciton blocker layer, respectively. When the concentration of Ir （PPY）3 is 6wt%, the maximum luminance is 24960 cd/m^2 at an applied voltage of 15 V, and the maximum luminous efficiency is 5.17 cd/A at an applied voltage of 8 V.     

Complete approach to automatic identification and subpixel center location for ellipse feature

To meet the need of automatic image features extraction with high precision in visual inspection, a complete approach to automatic identification and sub-pixel center location for similar-ellipse feature is proposed. In the method, the feature area is identified automatically based on the edge attribute, and the sub-pixel center location is accomplished with the leastsquare algorithm. It shows that the method is valid, practical, and has high precision by experiment. Meanwhile this method can meet the need of instrumentation of visual inspection because of easy realization and without man-machine interaction.     

小角度扩展相关性近似算法分析

本论文提出一种在多天线MIMO信道相关性建模中小角度扩展近似理论算法,并应用于分析MIMO系统性能。分析中分别对三种不同角能量分布情况下的空间相关性研发快速近似计算法,并同时提出双模(Bi-Modal)角能量分布情况下的近似运算。通过分析这些新方法的近似效率,可以得到计算简单、复杂度低、而且符合实际的MIMO相关信道矩阵,对系统级的快速高效计算法的研究和系统级的评估以及误差分析具有重要的意义。     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

A Versatile Mixed-Signal Pin Approach for Cost-Effective Test of Automotive ICs

Integrated circuits (ICs) intended for increasingly sophisticated automotive applications bring unique test demands. Advanced ICs for applications such as highly integrated automatic braking system (ABS) and airbag controllers combine high voltage digital channels, significant VI demands and precise timing capability. Along with continued missioncritical reliability concerns, the trend toward higher voltage operation and increased device integration requires specialized test capabilities able to extend across the wide operating ranges found in automotive applications. Among these capabilities, automotive test requirements increasingly dictate a need for a cost-effective versatile mixed-signal pin electronics with very high data rates reaching up to 50MHz with a voltage swing of-2 V to +28 V.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.     

Optical vibration and deviation measurement of rotating machine parts

It is of interest to get appropriate information about the dynamic behaviour of rotating machinery parts in service. This paper presents an approach of optical vibration and deviation measurement of such parts. Essential of this method is an image derotator combined with a high speed camera or a laser doppler vibrometer （LDV）.