2～4GHz MMIC低噪声放大器

采用中国电子科技集团公司第十三研究所的GaAs PHEMT低噪声工艺,设计了一款2~4 GHz微波单片集成电路低噪声放大器(MMIC LNA)。该低噪声放大器采用两级级联的电路结构,第一级折中考虑了低噪声放大器的最佳噪声和最大增益,采用源极串联负反馈和输入匹配电路,实现噪声匹配和输入匹配。第二级采用串联、并联负反馈,提高电路的增益平坦度和稳定性。每一级采用自偏电路设计,实现单电源供电。MMIC芯片测试结果为:工作频率为2~4 GHz,噪声系数小于1.0 dB,增益大于27.5 dB,1 dB压缩点输出功率大于18 dBm,输入、输出回波损耗小于-10 dB,芯片面积为2.2 mm×1.2 mm。     

5～13 GHz GaAs限幅低噪声放大器MMIC

基于0.15 μm GaAs pin二极管和GaAs PHEMT工艺,设计并实现了一款5～13 GHz限幅低噪声放大器(LNA)单片微波集成电路(MMIC).该MMIC中限幅器采用三级反向并联二极管结构,优化了插入损耗和耐功率性能;LNA采用两级级联设计,利用负反馈和源电感匹配,在宽带下实现平坦的增益和较小的噪声;限幅器和LNA进行一体化设计,实现了宽带耐功率和低噪声目标.测试结果表明,在5～13GHz内,该MMIC的小信号增益大于20 dB,噪声系数小于1.8 dB,耐功率大于46 dBm(2 ms脉宽,30％占空比),总功耗小于190 mW,芯片尺寸为3.3 mm×1.2 mm.限幅LNA MMIC芯片的尺寸较小,降低了组件成本,同时降低了组件装配难度,提高通道之间的一致性.     

S波段平衡式限幅放大器设计

采用混合集成电路工艺,设计了一款小尺寸限幅低噪声放大器(LNA)。优化了限幅电路设计,明显缩小了电路体积。低噪声放大器采用负反馈结构,以改善增益平坦度。采用平衡式结构,提高限幅器的功率容量和放大器的1 dB压缩点输出功率(P-1 dB)。设计制作了Lange电桥,作为平衡式限幅放大器的输出电桥。该放大器工作电压5 V,电流151 mA,测试结果显示,在频带2.7~3.0 GHz内,噪声系数小于1.5 dB,小信号功率增益大于36 dB,增益平坦度小于0.6 dB,输入输出驻波比小于1.3,P-1 dB大于13 dBm。该限幅放大器能够承受脉冲功率300 W、脉宽300μs和占空比为30%的信号,外形尺寸为27 mm×18 mm×5 mm。     

X波段GaN MMIC低噪声放大器设计

采用SiC衬底0.25 μm AlGaN/GaN高电子迁移率晶体管(HEMT)工艺,研制了一款X波段GaN单片微波集成电路(MMIC)低噪声放大器(LNA).放大器采用三级级联拓扑,第一级采用源极电感匹配,在确保良好的输入回波损耗的同时优化放大器噪声系数;第三级采用电阻电容串联负反馈匹配,在尽量降低噪声系数的前提下,保证良好的增益平坦度、输出端口回波损耗以及输出功率.在片测试表明,在10 V漏级电压、-2 V栅极电压偏置下,放大器静态电流为60 mA,8～12 GHz内增益为22.5 dB,增益平坦度为±1.2 dB,输入输出回波损耗均优于-11 dB,噪声系数小于1.55 dB,1 dB增益压缩点输出功率大于11.9 dBm,其芯片尺寸为2.2 mm×1.1 mm.装配测试表明,噪声系数典型值小于1.6 dB,可承受33 dBm连续波输入功率.该X波段GaN低噪声放大器与高功率放大器工艺兼容,可以实现多功能集成,具有广阔的工程应用前景.     

X波段平衡式限幅低噪声放大器MMIC

为满足接收机的小型化需求，基于GaAs赝配高电子迁移率晶体管(PHEMT)工艺设计了一款用于8～12 GHz的平衡式限幅低噪声放大器(LNA)单片微波集成电路(MMIC)。将Lange电桥、限幅器、LNA集成在同一衬底上，Lange电桥采用异形设计，芯片比传统尺寸降低30%以上；限幅器级间采用电感匹配结构，提升MMIC的工作带宽；LNA采用并联负反馈、源极电感负反馈以及电流复用拓扑结构，实现超低功耗和良好的稳定性。芯片采用整体最优化设计，在片测试结果表明，在工作频带内，限幅LNA MMIC芯片的增益为(25±0.2)dB(去除1 dB斜率),噪声系数小于1.6 dB,总功耗小于100 mW,耐功率大于46 dBm,该芯片尺寸为2.8 mm×2.4 mm,充分体现了集成工艺的性能和尺寸优势。     

宽带低噪声放大器单片微波集成电路

从行波放大器设计理论出发,研制了一款基于低噪声GaAs赝配高电子迁移率晶体管(PHEMT)工艺设计的2~20 GHz单片微波集成电路(MMIC)宽带低噪声放大器。该款放大器由九级电路构成。为了进一步提高放大器的增益,采用了一个共源场效应管和一个共栅场效应管级联的拓扑结构,每级放大器采用自偏压技术实现单电源供电。测试结果表明,本款低噪声放大器在外加+5 V工作电压下,能够在2~20 GHz频率内实现小信号增益大于16 dB,增益平坦度小于±0.5 dB,输出P-1 dB大于14 dBm,噪声系数典型值为2.5 dB,输入和输出回波损耗均小于-15 dB,工作电流仅为63 mA,低噪声放大器芯片面积为3.1 mm×1.3 mm。     

一种S波段平衡式限幅低噪声放大器的设计

介绍了一种小型化平衡式限幅低噪声放大器。该放大器采用Lange桥平衡结构,在实现低噪声的同时,保证了小电压驻波比;在3.0～3.5GHz频带内,噪声系数小于1.3dB,输入输出驻波系数小于1.3,增益大于27dB,平坦度±0.6dB以内,输出1dB压缩点大于12dBm。该放大器能够承受最大5W的连续波功率输入,且大功率输入时的驻波系数小于1.3。     

1.1 dB噪声系数的单片微波集成低噪声放大器

设计与实现了一款两级赝配高电子迁移率晶体管(PHEMT)单片微波集成电路(MMIC)低噪声放大器(LNA)。考虑到实际片上无源电感的性能(低Q值),最优噪声匹配往往不能获得最好的噪声性能,相反因为输入电感的存在会增加芯片的面积。设计旨在选择合适的输入晶体管,以免除输入电感的使用,减小芯片的面积。经过优化设计,芯片尺寸为0.8 mm×0.8 mm。测试结果表明,放大器在3.4~3.6 GHz频段内实现了1.1 dB的噪声系数以及25.8 dB的小信号增益,带内回波损耗最大值为-16.5 dB。在回波损耗小于-10 dB的范围内,电路带宽拓展到2.8~4.7 GHz,此时增益最小值为20 dB,噪声最大值为1.3 dB。     

2～18 GHz GaAs超宽带低噪声放大器MMIC

基于90 nm GaAs赝配高电子迁移率晶体管(PHEMT)工艺设计并制备了一款2～18 GHz的超宽带低噪声放大器(LNA)单片微波集成电路(MMIC)。该款放大器具有两级共源共栅级联结构，通过负反馈实现了超宽带内的增益平坦设计。在共栅晶体管的栅极增加接地电容，提高了放大器的高频输出阻抗，进而拓宽了带宽，提高了高频增益，并降低了噪声。在片测试结果表明，在5 V单电源电压下，在2～18 GHz内该低噪声放大器小信号增益约为26.5 dB,增益平坦度小于±1 dB,1 dB压缩点输出功率大于13.5 dBm,噪声系数小于1.5 dB,输入、输出回波损耗均小于-10 dB,工作电流为100 mA,芯片面积为2 mm×1 mm。该超宽带低噪声放大器可应用于雷达接收机系统中，有利于接收机带宽、噪声系数和体积等的优化。     

6～18 GHz GaAs射频前端多功能MMIC

基于GaAs单片微波集成电路(MMIC)工艺设计并制备了一款宽带射频前端多功能电路芯片,其包含功率放大器、限幅低噪声放大器(LNA)和收发开关.功率放大器采用平衡式结构同时选择合适的匹配网络实现宽带匹配;限幅器第一级采用功分结构提高耐功率能力;LNA前三级采用电流复用拓扑结构实现低功耗,最后一级采用自偏置结构增加动态范围;天线端的开关具有较高的功率容量,保证信号经过开关后不会压缩而导致发射支路输出功率不足.测试结果显示,电路在6～ 18 GHz频带内,接收支路噪声系数典型值为3.7 dB,增益约为27 dB,1 dB压缩点输出功率典型值大于7 dBm,功耗约为140 mW,能耐受1W的连续波输入功率;发射支路饱和输出功率大于30 dBm,功率附加效率典型值为26％.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.     

GaAsSb/InAlAs PA DHBTs Grown by Production MBE

The epi material growth of GaAsSb based DHBTs with InAlAs emitters are investigated using a 4 × 100mm multi-wafer production Riber 49 MBE reactor fully equipped with real-time in-situ sensors including an absorption band edge spectroscope and an optical-based flux monitor. The state-of-the-art hole mobilities are obtained from 100nm thick carbon-doped GaAsSb. A Sb composition variation of less than ± 0.1 atomic percent across a 4 × 100mm platen configuration has been achieved. The large area InAlAs/GaAsSb/InP DHBT device demonstrates excellent DC characteristics,such as BVCEO＞6V and a DC current gain of 45 at 1kA/cm2 for an emitter size of 50μm × 50μm. The devices have a 40nm thick GaAsSb base with p-doping of 4. 5 × 1019cm-3 . Devices with an emitter size of 4μm × 30μm have a current gain variation less than 2% across the fully processed 100mm wafer. ft and fmax are over 50GHz,with a power efficiency of 50% ,which are comparable to standard power GaAs HBT results. These results demonstrate the potential application of GaAsSb/InP DHBT for power amplifiers and the feasibility of multi-wafer MBE for mass production of GaAsSb-based HBTs.     

Technology innovation and process integrations for sub-100nm gate patterning

This paper presents a brief overview of the Applied Centura(R)DPS(R)system,configured with silicon etch DPS Ⅱ chamber, with emphasis on discussing tuning capability for CD uniformity control. It also presents the studies of etch process chemistry and film integration impact for an overall successful gate patterning development. Discussions will focus on resolutions to key issues, such as CD uniformity, line-edge roughness, and multilayer film etching integration.     

White organic light-emitting devices based on fac tris（2- phenylpyridine） iridium sensitized 5,6,11,12-tetraphenylnap -hthacene

We have fabricated the white organic light-emitting devices （WOLEDs） based on 4,4＇ -bis（2,2 -diphenyl vinyl）-1,1＇ - biphenyl （DPVBi） and phosphorescence sensitized 5,6,11,12,-tetraphenylnaphthacene （rubrene）. The device structure is ITO/2T-NATA （20 nm）/NPBX （20 nm）/CBP： x%Ir（ppy）3：0.5% rubrene （8 nm）/NPBX （5 nm）/DPVBi （30 nm）/Alq（30 nm）/LiF（0.5 nm）/A1. In the devices, DPVBi acts as a blue light-emitting layer, the rubrene is sensitized by a phosphorescent material, fac tris （2-phenylpyridine） iridium [Ir（ppy）3], acts as a yellow light-emitting layer, and N,N＇ -bis- （1-naphthyl）- N,N＇ -diphenyl -1, 1＇ -biphenyl-4,4＇ -diamine （NPBX） acts as a hole transporting and exciton blocker layer, respectively. When the concentration of Ir （PPY）3 is 6wt%, the maximum luminance is 24960 cd/m^2 at an applied voltage of 15 V, and the maximum luminous efficiency is 5.17 cd/A at an applied voltage of 8 V.     

Complete approach to automatic identification and subpixel center location for ellipse feature

To meet the need of automatic image features extraction with high precision in visual inspection, a complete approach to automatic identification and sub-pixel center location for similar-ellipse feature is proposed. In the method, the feature area is identified automatically based on the edge attribute, and the sub-pixel center location is accomplished with the leastsquare algorithm. It shows that the method is valid, practical, and has high precision by experiment. Meanwhile this method can meet the need of instrumentation of visual inspection because of easy realization and without man-machine interaction.     

小角度扩展相关性近似算法分析

本论文提出一种在多天线MIMO信道相关性建模中小角度扩展近似理论算法,并应用于分析MIMO系统性能。分析中分别对三种不同角能量分布情况下的空间相关性研发快速近似计算法,并同时提出双模(Bi-Modal)角能量分布情况下的近似运算。通过分析这些新方法的近似效率,可以得到计算简单、复杂度低、而且符合实际的MIMO相关信道矩阵,对系统级的快速高效计算法的研究和系统级的评估以及误差分析具有重要的意义。     

Noise character analysis and the restraint of self-pulsation laser diodes

We calculate the Langevin noise sources of self-pulsation laser diodes, analyze the effects of active region noise and saturable-absorption region noise on the power fluctuation as well as period fluctuation, and propose a novel method to restrain the noise effects. A visible SIMULINK model is established to simulate the system, The results indicate that the effects of noise in absorption region can be ignored; that with the increase of DC injecting current, the noise effects enhance power jitter, and nevertheless, the period jitter is decreased; and that with external sinusoidal current modulating the self-pulsation laser diode, the noise-induced power jitter and period jitter can be suppressed greatly. This work is valuable for clock recovery in all-optical network.