Co2+与(Co2++Ni2+)摩尔浓度比对Ni-Co-P合金化学镀层组织与性能的影响

通过改变化学镀液中金属离子Co2+与(Co2++Ni2+)的摩尔浓度比获得了不同的Ni-Co-P合金化学镀层。研究了钴的引入对Ni-Co-P合金镀层的沉积速率及组织性能的影响。结果表明:随着Co2+与(Co2++Ni2+)摩尔浓度比的增加,镀层的沉积速率不断下降,镀层中P含量逐渐减小,镀层表面的胞状组织由大到小;镀层硬度随Co2+与(Co2++Ni2+)摩尔浓度比的增加先升高后降低,Co2+与(Co2++Ni2+)摩尔浓度比为0.4时,硬度最大达554.12HV,镀层具有优良的耐硫酸腐蚀性能,Co2+与(Co2++Ni2+)摩尔浓度比为0.6时,镀层耐蚀性最强。     

工艺条件对化学镀Ni-Co-P合金的影响

采用硼酸为缓冲剂 ,柠檬酸钠为络合剂化学镀Ni Co P合金。考察了镀液pH值、钴离子浓度和温度对化学镀Ni Co P沉积速度的影响 ;研究了钴离子浓度对镀层组成的影响 ,获得了化学镀Ni Co P合金的最佳工艺条件为 :镀液pH值为 7.0 ,操作温度 90℃ ,CoSO4 ·7H2 O浓度为 11g/L。此工艺下镀液稳定性好 ,镀层沉积速度快 ;所得镀层为非晶结构。     

镁合金表面化学镀Ni-Co-P合金的研究

通过优化正交试验法研究了镁合金表面化学镀Ni-Co-P合金工艺.讨论了几种因素对沉积速度的影响.采用显微硬度测试、扫描电镜(SEM)、X射线能谱分析手段比较研究了Ni-Co-P与Ni-P镀层性能及化学成分.结果表明,Co2 的加入有利于化学镀层的沉积,但使镀层硬度下降;配位剂采用30g/L柠檬酸钠时沉积速率最快;适量的香豆素可以提高镀速并使镀层更光亮.Ni-Co-P镀层表面较Ni-P镀层具有较好的耐腐蚀性能,结合力良好.     

化学镀Ni-Co-P合金工艺研究

为了改善化学镀Ni-Co-P合金工艺存在的镀速慢、镀层质量差等问题,研究了镀液组分、表面活性剂、pH值、稳定剂、配位剂对化学镀Ni-Co-P合金镀层沉积速度、耐蚀性、孔蚀率的影响,得出最佳镀液配方和工艺:26 g/L CoSO4,28 g/L NiSO4,22 g/L NaH2PO2,80 g/L Na3C6H5O7,69 g/L(NH4)2SO4,1 mg/L KI,50 mg/L十二烷基苯磺酸钠,pH=8,温度85℃.本研究结果为化学镀Ni-Co-P合金工艺提供了依据,较有实用价值.     

烧结NdFeB磁体MnCl2-AlCl3-BMIC离子液体电沉积Al-Mn合金层的防腐蚀性能

对烧结NdFeB磁体作Al-Mn合金镀可以提高其耐腐蚀性能,但这只能在无水体系中进行.以MnCl2-AlCl3-BMIC(氯化1-丁基-3-甲基咪唑)为离子液体(AlCl3与BMIC的摩尔比为2∶1),对NdFeB磁体电沉积Al-Mn合金.采用SEM扫描电镜观察了Al-Mn镀层的形貌,采用X射线衍射分析了相结构,采用3.5％NaCl溶液测试了耐腐蚀性能;探讨了离子液体中MnCl2浓度对Al-Mn合金镀层结构及性能的影响.结果表明:NdFeB磁体表面电沉积Al-Mn合金,当离子液体中MnCl2浓度为0.05～0.25 mol/L时,Al-Mn合金镀层的结构由晶态逐渐转变为非晶态,耐腐蚀性能显著提高,且优于铝镀层.     

铝合金上化学镀Ni-Co-P合金工艺及镀层性能的初步研究

研究了铝硅合金基体化学镀Ni-Co-P镀层的工艺对镀层性能的影响.通过正交试验,得出镀液pH值、硫酸镍、硫酸钴以及次磷酸钠的含量对镀层厚度、硬度和成分的影响规律,发现增大镀液pH值和增加硫酸镍含量、次磷酸钠含量适中、降低硫酸钴含量,有利于增加镀层膜厚;增大镀液pH值、硫酸镍和次磷酸钠含量适中、降低硫酸钴含量,有利于提高镀层硬度.     

化学沉积Ni-Mo-P合金工艺参数对性能的影响

研究了镀液pH值和温度等工艺参数对化学镀Ni Mo P合金镀层耐蚀性和硬度的影响。试验结果表明 ,镀液 pH值升高 ,镀层的沉积速度和硬度升高 ,而耐蚀性下降 ;镀液温度升高 ,镀层的沉积速度升高     

镍钴离子浓度比对化学镀Co-Ni-P合金工艺的影响

讨论了［Ni2＋］／［Co2＋］的比值、镀液组成和操作条件对化学镀Co－Ni－P合金沉积速度的影响。［Ni2＋］／［Co2＋］的比值越大，沉积速度越快。［Ni2＋］／［Co2＋］的比值对镀液组成和沉积速度之间的关系有明显的影响。当镀液的温度和pH值较低时，［Ni2＋］／［Co2＋］的比值对沉积速度的影响也较小。     

镀液pH值对镁合金Ni-P化学镀层的影响

为了提高镁合金耐腐蚀性能,在AZ61镁合金表面制备Ni-P化学镀层。采用磷酸酸洗对镁合金表面前处理后,在酸性镀液中制备了Ni-P化学镀层,通过SEM、EDAX、XRD及动电位极化曲线、交流阻抗等方法,分析了镀液p H值对Ni-P镀层形貌、成分、厚度、结合力、结构和耐蚀性的影响。试验结果表明:随着镀液p H值升高,组成镀层的细胞状物尺寸逐渐减小,镀层的沉积速度加快,镀层中的磷含量逐渐降低,镀层中的镍含量逐渐上升,镀层的晶化程度逐渐提高。镀层的耐蚀性能则随着镀液pH值的上升先升高,后下降。p H=6.0条件下制备的Ni-P镀层在质量分数为3.5%NaCl溶液中的交流阻抗膜值最高,且自腐蚀电流密度最低,耐蚀性能最好,并根据试验结果分析了镀液pH值对Ni-P镀层耐蚀性能的影响机制。     

化学镀Ni-Sn-P中锡的析出行为

化学镀Ni-Sn-P层锡的含量对其性能有较大的影响,过去对锡的析出研究不多.为此,利用电子能谙(EDS)等方法分析了化学镀液中锡含量对镀速和镀层中锡、磷含量的影响,用扫描电镜(SEM)、电子能谱(EDS)对施镀不同时间的镀层形貌、组成进行了分析.结果表明:沉积速度随镀液中锡含量的增加而减小,镀层中的锡含量随着镀液中锡含...     

NdFeB稀土永磁材料双层镀NiP/Cr

利用化学镀ＮｉＰ合金／电镀Ｃｒ双层镀工艺实现了对ＮｄＦｅＢ的抗腐蚀保护,并研究了镀层的组织结构,砚２性及其它性能,测试了镀层对磁性能的影响。结果表明,该镀层具有致密的组织结构和优异的耐蚀性能,对镀件磁性能无不良影响。     

Growth kinetics of electroless NixCo1 − x deposition

Various electroless Ni-Co-P films were deposited on silicon substrates in electroless baths using sodium hypophosphite as reducing agent and nickel and cobalt sulfates as ion source at pH value of 9 and temperature from 55 to 85 °C. The effect of the atomic ratio of Co to Ni + Co in baths on the growth behavior of the electroless Ni-Co-P films was studied. The various electroless Ni-Co-P films were characterized by scanning electron microscopy for the morphology, transmission electron microscopy for the microstructure and thickness, and energy dispersion spectroscopy for the composition. The results showed that the growth rate of the electroless Ni-Co-P films is generally increased with increase of the bath temperature and is decreased with atomic ratio of Co to Ni + Co in baths. The reduction of the Co²⁺ ion is easier than the Ni²⁺ ion in various baths, except for the bath with 0.9 atomic ratio of Co to Co + Ni.     

低含量钴对镍合金镀层结构和性能的影响

研究了低含量的钴对镍合金镀层结构和性能的影响,通过扫描电镜观察了镀层形貌、X射线衍射仪测量了镀层内应力,并用电化学极化曲线和腐蚀失重方法分析了镀层的耐蚀性.结果显示:镀液中硫酸钴的含量为0～4 g/L内时,随着钴盐的加入,镍合金镀层结晶细化、结构紧密、耐蚀性和硬度提高,内应力缓慢增长;硫酸钴含量超过5 g/L后,镍合金镀层结晶不再继续细化,但拉伸内应力明显变大,耐蚀性开始降低.     

Electroless Plating of Ni-Fe-P Alloy and Corrosion Resistance of the Deposit

Electroless Ni-Fe-P alloys in an alkaline bath were plated. The effects of deposition parameters on the plating rate and the coating composition were examined. The weight loss test and the anodic polarization measurement of the deposits in 3.5 wt pct NaCI solution (pH7.0) showed that the deposits with the mole ratio of NiS04/FeSO4 being 0.07:0.03, pH8.0 and 7.5 possess better corrosion resistance than that of the other deposits and the Ni-Fe-P deposits did not form passive films in this environment. In 5.0 wt pct NaOH solution, the Ni-Fe-P deposits have better corrosion resistance and formed passive films.     

钕铁硼永磁材料在不同体系化学镀液工艺中的腐蚀

NdFeB材料中钕的含量极高,极易被氧化而产生严重的腐蚀.为提高钕铁硼材料的耐蚀性,采用性能优良的化学镀方法寻找NdFeB永磁材料在不同化学镀液中的腐蚀规律.研究了NdFeB永磁材料在化学镀铜液、酸性化学镀镍磷液、中性化学镀镍磷液、碱性化学镀镍磷液、碱性除油液中的浸泡腐蚀试验,并测试了这些溶液的E-t曲线.结果表明,在NdFeB的化学镀中为减少对NdFeB基体的腐蚀应采用碱性化学镀铜液打底,碱性除油液对NdFeB材料基本无腐蚀.     

AZ31镁合金酸性化学镀Ni-Co-P层的耐腐蚀性能

为了提高镁合金的耐蚀性,以酸性化学镀的方法在AZ31镁合金表面制备了Ni-Co-P镀层。分别用XRD,SEM和EDS对镀层的结构、表面形貌和成分进行了分析,并用点滴试验和电化学方法测试了镀层的耐蚀性。结果表明:酸性化学镀Ni-Co-P层为非晶态胞状结构,镀层中P含量可高达9.41%,远高于碱性镀层;AZ31镁合金镀覆Ni-Co-P合金层后腐蚀电流比基体降低3个数量级,其耐蚀性能显著提高。     

镀镍液中铜的分光光度分析

镀镍溶液中的铜离子是一种有害的金属杂质,检测和控制其在镀镍液中的含量十分重要.用2,9-二甲基-4,7-二苯基-1,10-邻菲罗啉(向红亚铜灵)作显色剂,利用盐酸羟胺将铜离子还原为亚铜离子,并采用pH值为5的缓冲体系,在波长为475 nm处对3种镀液进行测定.结果表明,向红亚铜灵体系可不经分离等手段直接对镀镍溶液中的铜进行分光光度分析,测定过程快速、简便,常见其他成分无干扰,适合现场分析使用.     

Hardness and structural correlation for electroless Ni alloy deposits

Electroless nickel (EN) plating has received attention as a hard coating for industrial applications due to its high hardness, uniform thickness as well as excellent corrosion and wear resistance. The electroless Ni–P deposit is a supersaturated alloy in as-deposited state, and can be strengthened by precipitation of nickel phosphide crystallites with suitable heat treatments. However, the hardness of Ni–P films degrades with excessive annealing due to grain coarsening. This is the most severe barrier for electroless Ni–P deposition process from replacing chromium plating in industrial sectors. This problem is addressed in the paper by modifying the conventional electroless Ni–P bath to co-deposit tungsten to increase the hardness of the coating. Structural changes in the coating due to incorporation of tungsten are also highlighted. Deposition is done from an alkaline hypophosphite bath. Deposits with varying tungsten content are synthesized. Chemical analysis shows that tungsten incorporation reduces the phosphorus content in the deposit. Phosphorus content varied from 3 to 7 wt.% depending upon the tungsten incorporation in the deposit which in turn varied between 8 and 18 wt.%. Coatings with high tungsten content possess high hardness when compared to binary Ni–P as well as low tungsten ternary alloy deposits.     

Investigation of solar selective and microstructural properties of molybdenum black immersion coatings on cobalt substrates

Molybdenum black solar selective coatings have been produced on cobalt by immersion in a solution of ammonium paramolybdate and nickel sulphate. The cobalt was electroplated on nickel-plated copper prior to immersion in the paramolybdate solution. The maximum solar absorptance of the resulting molybdenum black coating was about 0.91. The minimum emittance was about 0.1 for coatings on cobalt deposited with an addition agent and about 0.23 for coatings on cobalt deposited without addition agent in the 60 °C plating solution. These differences have been related to the coating morphology determined by scanning electron microscopy. The emittance of coatings on cobalt deposited without addition agent decreases (or remains unchanged) during short-term heat treatment while that of coatings deposited on cobalt plated with addition agent increases somewhat. Reduction of the cobalt plating bath temperature to 45 °C can also lead to good initial coating properties but without the requirement for an addition agent in the cobalt plating bath. XPS studies show that the oxidation state of molybdenum in the coatings is approximately + 5 corresponding to Mo₄O₁₁. This reduces to + 4 after argon ion bombardment. Some cobalt may be present in the coatings in the form of CoO.