硅含量对SiO_x薄膜光学和电学性能的影响

利用射频磁控溅射法通过调节硅(Si)靶的溅射功率制备了不同的富硅氧化硅(SiOx,1相似文献   

反应蒸发制备nmSi—SiOx发光薄膜

报道了用真空反应蒸发制备ｎｍＳｉ／ＳｉＯｘ薄膜,制备出含有不同纳米尺寸硅颗粒的薄膜,研究了不同条件下得到的ｎｍＳｉ－ＳｉＯｘ薄膜的结构和组分,实验发现以ＳｉＯ为蒸发源制备的薄膜能够实现光致发光。初步分析ｎｍＳｉ－ＳｉＯｘ薄膜发光机制可能是由纳米硅最子效应引起的,界面效应和缺陷对薄膜ＰＬ可能没有贡献,解释了有纳米硅颗粒的存但观察了ＰＬ的原因。     

SiNx薄膜中硅纳米粒子的制备及表征

通过等离子增强化学气相沉积(PECVD)法, 以氨气和硅烷为反应气体, P型单晶硅和石英为衬底, 低温下(200℃)制备了含硅纳米粒子的非化学计量比氮化硅(SiN_x)薄膜. 经高温(范围500~950℃)退火处理优化了薄膜结构. 室温下测试了不同温度退火后含硅纳米粒子SiN_x薄膜的拉曼(Raman)光谱、光致发光(PL)光谱及傅立叶变换红外吸收(FTIR)光谱, 对薄膜材料的结构特性、发光特性及其键合特性进行了分析. Raman光谱表明. SiN_x薄膜内的硅纳米粒子为非晶结构. PL光谱显示两条与硅纳米粒子相关的光谱带, 随退火温度的升高此两光谱带峰位移动方向相同. 当退火温度低于800℃时, PL光谱峰位随退火温度的升高而蓝移. 当退火温度高于800℃时, PL光谱峰位随退火温度的升高而红移. 通过SiNx薄膜的三种光谱分析发现薄膜的光致发光源于硅纳米粒子的量子限制效应. 这些结果对硅纳米粒子制备工艺优化和硅纳米粒子光电器件的应用有重要意义.     

反应蒸发沉积的纳米硅氧化硅薄膜的发光及其氧的存在形态

通过改变蒸发源、衬底温度和氧的流量 ,用反应蒸发法制备了不同晶粒尺寸的Si/SiOx 薄膜。用X射线衍射、X光电子能谱和红外光谱分别测试了薄膜的结构、组分及氧在薄膜中的存在形态。实验发现氧的存在形态与蒸发条件密切相关 :对以硅为蒸发源的样品 ,衬底温度较低时 ,以间隙氧形态存在。随着衬底温度的升高 ,SiOx 量逐渐增多 ,间隙氧逐渐减少 ,72 0℃以上产生SiO2 。氧流量的增加有利于间隙氧的生成和氧含量的增加 ;对以SiO为蒸发源的样品 ,衬底温度较低时 ,主要以间隙氧的形态存在 ,同时存在SiO2 和SiOx。随着衬底温度的升高 ,有利于SiOx 和SiO2 的增加。 80 0℃退火后 ,SiOx 增多 ,同时产生大量SiO2 白硅石。荧光光谱表明 :薄膜的发光跟氧的存在形态密切相关 ,其可能原因是纳米硅被大量宽禁带的SiO2 或SiOx基体包裹所产生的量子效应。     

非晶SiOx:C薄膜的发光特性研究

采用双离子束溅射法制备了SiOx:C非晶薄膜,在室温下可观察到薄膜样品有强的420nm(紫光)、470nm(蓝绿光)的光致发光(PL).分别对样品在不同温度下退火后,PL测试显示随着退火温度的升高420nm处的峰带逐渐增强变为强的发光峰;470nm处的发光峰位来自于硅基薄膜中富硅引起的中性氧空位缺陷(O3≡Si-Si≡O3),是由与氧原子配位的二价硅的单态-单态之间的跃迁所致;420nm范围的峰带可能来自于薄膜中由C单质、以及Si、O、C三者组成的一个复杂结构.     

a-SiOx∶C薄膜的结构与发光特性研究

采用双离子束共溅射法制备了SiOx∶C薄膜.对样品的XRD和TEM测试结果表明薄膜为非晶结构;PL谱图显示有两个发光峰分别位于420 nm(紫光)、470 nm(蓝绿光)处;470 nm处的发光峰位来自于硅基薄膜中富硅引起的中性氧空位缺陷(O3Si-SiO3),是由与氧原子配位的二价硅的单态以及三态-单态之间的跃迁所致,而与掺碳无关.进一步的XPS测试分析表明,420 nm处的PL峰位可能来自于Si、C、O三者组成的复杂的结构.     

2A12铝合金纳米复合微弧氧化陶瓷层摩擦学性能研究

研究2A12铝合金表面制备含纳米Si（）2颗粒复合微弧氧化陶瓷层,主要考察了不同尺度、不同类型纳米颗粒对陶瓷层摩擦学性能的影响规律。采用扫描电镜观察涂层表面形貌,CETR微米摩擦磨损试验机和白光干涉仪考察复合陶瓷涂层的耐磨性。结果表明,与未添加纳米颗粒的普通微弧氧化层相比,添加20nmSi02、80nmSi02、800nmSiO2后所形成的陶瓷涂层孔隙尺寸和数量均明显减小,并具有较高的耐磨性。     

镶嵌纳米晶硅的氧化硅薄膜微观结构调整及其光吸收特性

采用等离子体化学气相沉积(PECVD)技术在不同N_2O流量条件下制备了镶嵌有纳米晶硅(nc-Si)的富硅氧化硅(SiOx)薄膜,利用透射电镜(TEM),X射线衍射分析(XRD),傅里叶变换红外(FTIR)和透射光谱技术研究了薄膜中的氢含量和氧含量变化及其对薄膜晶化度、薄膜键合结构和光吸收特性的影响。结果表明,薄膜由nc-Si粒子和非晶SiOx组成,为混合相结构。nc-Si的生长与氧化反应的竞争决定了薄膜微观结构、键合特性以及光吸收特性。随着N_2O流量的增加,薄膜的晶粒尺寸逐渐减小。晶界区过渡晶硅的比例减少,晶粒界面随之消失,带隙呈持续增加趋势。该实验结果为ncSi/SiOx薄膜在新型太阳电池中的应用提供了基础数据。     

铝掺杂对非晶SiOx薄膜电致发光的影响

为提高硅基薄膜（SiOx）发光材料的发光效率，采用双离子束溅射法制备了不同铝含量的Al—Si—SiOx薄膜。对所制备样品的电致发光（EL）测试表明：由于金属（Al）的掺入，使得在同样的电压下。薄膜中的电流随着铝含量的增加而增加；并且铝含量增大使得通过薄膜的电流增强，因而得到较高强度的电致发光。所以当硅基薄膜中掺入铝时，薄膜的发光效率得以提高；并且，随着铝含量的增加，薄膜的发光效率亦相应提高。     

SiOx薄膜的制备及发光特性研究

本论文采用双离子束溅射沉积技术制备了非晶的SiOx薄膜，XPS的测试表明Si是以单原子或低价氧化物的形态存在于薄膜内；在波长为240nm紫外光的激发下，室温及1000℃退火后SiOx薄膜的PL谱图显示样品中存在峰位分别处于320nm，410nm，560nm，630nm四个相互分离的峰，其发光机制分别为来自中性氧空位缺陷（≡Si—O—O—Si≡）、双配位硅悬挂键（O-Si-O）、非桥氧空位中心以及其他缺陷所形成的发光中心。     

平面光波导膜的ECR-PECVD制备及特性研究

采用微波电子回旋共振等离子体增强化学气相沉积技术 ,在单晶硅衬底上制备了用于平面光波导的SiO2 薄膜 ,研究了沉积速率与工艺参数之间的关系 ,并对射频偏置对成膜特性的影响作了初步实验研究。通过X射线光电子能谱、傅立叶变换红外光谱、扫描电镜、原子力显微镜、以及扫描隧道显微镜三维形貌和椭偏仪等测量手段 ,分析了样品的薄膜结构和光学特性等。结果表明 ,在较低温度下沉积出均匀致密、性能优良的SiO2 薄膜。此外 ,还成功制备出掺Ge的SiO2 薄膜 ,并可以精确控制掺杂浓度 ,以适应不同光波导芯的要求     

硅基GaN外延层的SIMS及XPS研究

采用真空反应法在硅基上制备出了GaN外延层。利用二次离子质谱和X射线光电子能谱对GaN外延层进行了深度剖析和表面分析。结果表明 ,外延层中Ga和N分布均匀 ;在表面处Ga发生了偏聚 ;外延层中还存在Si,O等杂质 ,但这些并未影响到GaN外延层的物相及发光性能。实验还表明 ,在外延生长前采用原位清洗可去除Si衬底表面的氧     

Spectroscopic analysis on metal-oxide-semiconductor light-emitting diodes with buried Si nanocrystals and nano-pyramids in SiO(x) film

The difference between the white and near-infrared electroluminescence of metal-oxide-semiconductor light-emitting diodes fabricated on 1,100 degrees C-annealed Si-rich SiO(x)/p-Si substrate with interfacial pyramidal Si dots (Si nano-pyramids) was characterized. By changing the substrate temperature and induced coupled plasma power during the plasma enhanced chemical vapor deposition of Si-rich SiO(x) films, the effects of the growth conditions on the defect- and Si nano-pyramid-related carrier transport and Si nanocrystal-related electroluminescence spectroscopy were also investigated. The annealed Si-rich SiO(x)/p-Si films grown at higher synthesized substrate temperate (350 degrees C) show the larger Si nano-pyramids precipitating near the Si/SiO2 interface. The indium tin oxide/Si-rich SiO(x)/p-Si/Al metal-oxide-semiconductor light-emitting diodes with Si-rich SiO(x) films exhibit different white-light electroluminescence spectra at wavelengths from 400 to 650 nm. The Si nanocrystal-related electroluminescence spectra at 650-850 nm are confirmed, whereas the electroluminescence spectra are shorter wavelengths is attributed to oxygen related defects. These defects become an electron-preferred transporting path within the Si-rich SiO(x) film, whose densities are decreased by increasing the substrate temperature or reducing the induced coupled plasma power. Defect-related white-light electroluminescence emits power for a relatively short lifetime. The lifetime can be lengthened and the electroluminescence power can be raised simultaneously by increasing deposition temperature to 350 degrees C and adjusting the induced coupled plasma power to a threshold of 30 W, which effectively increases the densities of Si nanocrystals and nano-pyramids in the Si-rich SiO(x) film with Si concentration of up to 40 at%. A nearly defect-free Si-rich SiO(x) sample can be grown under such conditions, which contributes to the most stable and largest near-infrared electroluminescence with the longest lifetime, although the power-current slope of purely Si nanopyramid related electroluminescence at near-infrared wavelengths is slightly lower.     

Temperature dependence of the photoluminescence from ensembles of amorphous silicon nanoparticles with various average sizes

Amorphous SiO(x) thin films with three different oxygen contents (x = 1.3, 1.5, and 1.7) have been deposited by thermal evaporation of SiO in vacuum. Partial phase separation in the films has been induced by annealing at 773 or 973 K in argon for 60 and 120 min and thus Si-SiO(x) composite films have been prepared containing amorphous Si nanoparticles of various sizes (< 3 nm). Photoluminescence from the films has been measured in the temperature range 20-296 K. The single Gauss band observed in the photoluminescence spectra of the samples with x = 1.3 and centered in the range 1.55-1.75 eV has been related to radiative recombination in Si nanoparticles. Two bands, a red-orange one (related to radiative recombination in Si nanoparticles) and a green band peaked at approximately 2.3 eV (related to radiative recombination via defects) have been resolved in the photoluminescence spectra of the films with x = 1.5 and 1.7. The band in the spectra of the x = 1.3 samples has shown a relative strong thermal quenching but it is significantly weaker than the photoluminescence quenching in bulk a-Si. Besides, the higher the initial oxygen content, the weaker is the photoluminescence thermal quenching. These observations have been related to carrier confinement which is stronger in smaller nanoparticles. The thermally induced photoluminescence decrease with increasing temperature in the samples with x = 1.3 obeys the relation that is characteristic for bulk a-Si:H while the photoluminescence decrease in x = 1.5 and 1.7 samples is of Arrhenius type. We suggest that in nanoparticles larger than 2 nm recombination via band tail states is the dominating photoluminescence mechanism while in smaller nanoparticles exciton-like recombination dominates.     

用乙硅烷及固态锗源外延生长应变GeSi／Si合金

采用气态源分子束外延（ＧＳＭＢＥ）法成功地生长出应变ＧｅｘＳｉ１－ｘ／Ｓｉ异质结合金，所使用的源分别是乙硅烷和固态锗。用固态锗取代气态锗烷，即保留了生长中由氢化物裂解产生的氢原子在生长表面上的活化作用（ｓｕｒｆａｃｔａｎｔ ｅｆｆｅｃｔ），又利用了固态源炉通过挡板能够迅速切断分子束流的优点。样品的Ｘ射线双晶衍射，透射电子显微镜及光荧光测量表明ＧｅｘＳｉ１－ｘ合金具有较好的晶格完整性及平坦的异质结界     

Si基n型GaN的欧姆接触研究

GaN材料在光电子器件领域的广泛应用前景使得金属与其欧姆接触的研究成为必然。本文对Si基n型GaN上的Al单层及Ti/Al双层电极进行了研究。通过对不同退火条件下的I U特性曲线 ,X射线衍射以及二次离子质谱分析 ,揭示了界面固相反应对欧姆接触的影响 ,提出了改善这两种电极欧姆接触的二次退火方法     

C离子注入对SiO2薄膜光致发光特性的影响

先用湿氧化法在单晶硅表面生长了非晶态SiO2薄膜,再用不同能量的C离子对薄膜进行注入,然后用荧光光谱分析了注入参数(注入能量、剂量)与发光特性改变的关联。研究发现,C离子注入能显著影响薄膜的发光特性,并且薄膜发光特性的改变强烈依赖于C离子的注入能量和注入剂量。对C离子注入SiO2薄膜引起发光特性改变的可能机理进行了简单讨论。     

不同氧氩比例对氧化硅(SiO2)薄膜的结构及性能的影响

在不同氧氩比例气氛下,采用反应直流磁控溅射方法制备了SiO2薄膜.利用X射线衍射（XRD）、X射线光电子能谱（XPS）、原子力显微镜（AFM）和紫外可见光谱（UV-Visible spectrum）等研究了氧氩比例的不同对SiO2薄膜的晶体结构、化学配比、表面形貌和光学性能的影响.结果显示：室温下,不同氧氩比例的SiO2薄膜都为非晶结构;随着氧分量的增加,Si2p与O1s向高结合能方向移动;在氧分量较大的气氛下,SiO2薄膜的化学失配度较小,薄膜均匀,致密,在400-1100nm有良好的光透过性.     

Characterization of silicon dioxide films on a 4H-SiC Si(0001) face by fourier transform infrared (FT-IR) spectroscopy and cathodoluminescence spectroscopy

We used Fourier transform infrared (FT-IR) spectroscopy to characterize silicon dioxide (SiO(2)) films on a 4H-SiC(0001) Si face. We found that the peak frequency of the transverse optical (TO) phonon in SiO(2) films grown on a 4H-SiC substrate agrees well with that in SiO(2) films grown on a Si substrate, whereas the peak frequency of the longitudinal optical (LO) phonon in SiO(2) films on a 4H-SiC substrate is red-shifted by approximately 50 cm(-1) relative to that in SiO(2) films on a Si substrate. We concluded that this red-shift of the LO phonon is mainly caused by a change in inhomogeneity due to a decrease in density in the SiO(2) films. Furthermore, cathodoluminescence (CL) spectroscopy results indicated that the channel mobility of the SiC metal-oxide-semiconductor field-effect transistor (MOSFET) decreases roughly in proportion to the increase in the intensity of the CL peak at 460 and 490 nm, which is attributed to the increase in the number of oxygen vacancy centers (OVCs). FT-IR and CL spectroscopies provide us with a large amount of data on OVCs in the SiO(2) films on a 4H-SiC substrate.