扭梁悬臂梁支撑的扭摆式MEMS永磁双稳态机构

在进行理论分析证实可行性和模拟仿真优化参数后,利用非硅表面微加工方法中的牺牲层工艺制备了一种扭梁悬臂梁支撑的扭摆式MEMS永磁双稳态机构.该双稳态结构尺寸为1.9mm×1.6mm×0.03mm,通过永磁力实现稳态姿态无功耗保持,通过对其单侧触点施加纵向驱动力使之达到30μm的纵向驱动位移,可以实现机构的双稳态姿态切换,可以通过控制永磁体磁片、悬臂梁和扭梁的尺寸来灵活调控稳态切换所需的驱动力矩.此双稳态机构可与电磁驱动、电热驱动和静电驱动等类型的微驱动器联用构成永磁双稳态MEMS微继电器.     

一种新型MEMS电磁继电器的研究

介绍了一种MEMS电磁驱动微继电器,这种继电器体积小、易于集成.它采用双层1 mm×1 mm平面线圈和吸合式坡莫合金悬臂梁结构,层间用聚酰亚胺作绝缘材料.文中介绍了器件的工作原理,建立了磁路的仿真模型,据此计算确定了气隙宽度和悬臂梁厚度.采用表面微加工和微电铸工艺制作了器件.     

电磁驱动推拉式射频MEMS开关的设计与制作

提出了一种新型电磁驱动推拉式射频MEMS开关。针对传统静电驱动单臂梁开关所需驱动电压大、恢复力不足等问题,设计了一种推拉式开关结构,降低了驱动电压(电流),提高了开关的隔离度,同时实现了单刀双掷的功能。单晶Si梁由于自身无应力,解决了悬臂梁残余应力引起的梁变形问题。通过理论计算和有限元分析,优化了开关设计尺寸,在外围永磁铁磁感应梯度dB/dz=100T/m,在线圈通入100mA电流的驱动下,单晶Si扭转梁末端可以获得约10μm的弯曲量,满足开关驱动要求。给出了开关的详细微细加工流程,对开关的传输参数进行了测试,在10GHz时隔离度为-40dB.     

基于UV-LIGA技术的新型RF MEMS开关

介绍了一种基于UV-LIGA加工技术的双稳态电磁型RF MEMS开关,该结构由于使用了永磁体单元而使得开关在维持“开”或“关”态时不需要功耗,利用牺牲层UV-LIGA技术实现了开关的微制作。非接触式Wyko NT1100光学轮廓仪的测试表明,制备的开关实现了双稳态驱动功能,驱动脉冲电流50 mA,驱动行程17μm,响应时间20μs;开关完成一次驱动姿态转换所需要的功耗不到3μJ。AGILENT 8722ES型S参数网络分析仪的测试表明,开关在12 GHz时的插入损耗为-0.25 dB,隔离度为-30 dB。     

脉冲驱动双稳态继电器ZS-12F1及其应用

<正> 脉冲驱动双稳态继电器ZS-12F1集脉冲驱动记忆自锁节能技术和中功率继电器技术于一体,具有任意极性脉冲电压驱动、静态不耗电、机械记忆锁存、双稳态输出、控制功率大等特点,可广泛用于过载、过流保护及大功率电器电源切换和遥控开关等电路中。 性能与参数 ZS-12F1的外形尺寸及引脚如图1所示。该器件顶部设     

微型电磁继电器的制作和仿真分析

介绍了一种基于MEMS技术的微型电磁继电器的制作过程和仿真分析.这种微继电器的大小约是4mm×4mm×0.5mm,主要采用普通的微加工技术来完成全部制作工艺.与传统继电器相比,这种继电器采用平面线圈来代替螺线管线圈,有利于MEMS工艺,并且提出了一种双支撑的悬臂梁结构做为活动电极,具有较高的灵敏性和稳定性.另外,还进行了一些有关线圈通过激励电流后对活动电极产生电磁力的理论计算和仿真分析,利用这些结果可以对这种电磁继电器的结构和参数进一步优化.     

微型电磁继电器的制作和仿真分析

介绍了一种基于MEMS技术的微型电磁继电器的制作过程和仿真分析.这种微继电器的大小约是4mm×4mm×0.5mm,主要采用普通的微加工技术来完成全部制作工艺.与传统继电器相比,这种继电器采用平面线圈来代替螺线管线圈,有利于MEMS工艺,并且提出了一种双支撑的悬臂梁结构做为活动电极,具有较高的灵敏性和稳定性.另外,还进行了一些有关线圈通过激励电流后对活动电极产生电磁力的理论计算和仿真分析,利用这些结果可以对这种电磁继电器的结构和参数进一步优化.     

MEMS技术检测痕量爆炸物微粒的原理与实验方法研究

提出一种基于MEMS技术、利用爆炸物微粒本身特性来检测爆炸物的新型微梁式爆炸物探测器,这种探测器利用不同爆炸物具有不同的熔点及蒸发点,并且在熔解过程中吸收热量的原理,使落在悬臂梁上的痕量爆炸物微粒在蒸发时的热量变化可以通过梁的弯曲变形反映出来,其中复合双金属悬臂梁是利用MEMS工艺制造的;还介绍了探测器的结构设计、悬臂梁弯曲变形的理论计算及技术实现方案探讨等前沿探索性研究工作。     

基于UV-LIGA技术的电磁型射频MEMS开关的集成制作

电磁型MEMS开关比静电式的结构复杂,一体化集成加工困难.对于新型电磁驱动双稳态RF MEMS开关进行了材料的选择,并对一些主要材料的电镀和悬空结构的制备与释放进行了工艺优化研究.经过工艺整合,实现了电磁型RF MEMS开关的多种非硅材料和多元结构形式的一体化集成加工.     

扭臂结构静电驱动式微驱动器动力学特性分析

基于扭转动力学原理,推导了用于分析静电微驱动器的驱动电压、响应时间和其它动力学参数的特性方程。对于忽略和考虑空气阻尼效应的2种情况,分别进行了详细的讨论,计算结果可以用于分析器件处于真空和空气条件下的工作状态。结果表明,当考虑空气阻尼时,悬臂梁的运动轨迹与忽略空气阻尼时相比较发生相当大的改变,从而吸合（pull—in）电压和响应时间等计算结果也发生改变。因此,对于微机电系统（MEMS）器件的设计和制作,空气阻尼效应是影响其性能和工作条件的重要因素。最后,介绍了一种光学测量方法,可用于器件的响应时间和悬臂梁扭转角度等参数的测试,得到的实验结果与理论分析结果有较好的吻合。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.