一种低相噪频率综合器设计

针对军事、工业、通信等许多领域对高精度、高分辨率、低相噪频率综合器的需求,分析了影响频率综合器相噪特性的主要因素,设计了一种窄带锁相环滤波器,用于两级小数分频锁相环级联组成的频率综合器之间进行降噪,使前级锁相环相噪特性对后级锁相环恶化相噪特性的影响得到很好的抑制,该窄带锁相环滤波器采用4个不同频率低相噪VCXO切换作为后级锁相环的鉴相频率,使频率综合器输出信号频率与整数边界的距离大于后级锁相环环路带宽且尽可能的远,有效抑制了频率综合器输出信号中整数边界杂散(IBS)功率,改善了频率综合器的相噪性能,对频率综合器输出622.08MHz(用于雷达)、1561.098MHz(用于北斗)信号的相位噪声分别为:-96dBc/Hz@100Hz,-105dBc/Hz@10kHz和-91dBc/Hz@100Hz,-100dBc/Hz@10kHz。     

基于谐波混频的微波低相噪锁相设计

该设计通过谐波混频的方式实现常规分频式锁相环所难以实现的低相噪指标。在理论分析的基础之上,提出微波低相噪锁相环设计方案,制定实际电路结构,通过对电路的调试达到在5.5GHz频点输出-111.30dBc/Hz@10kHz的相噪指标和-67.33dBc的杂散指标。验证了通过谐波混频的方式实现微波低相噪锁相的可行性。     

低相噪全相参毫米波频率合成源研究

研制出一种小步进全相参毫米波频率合成源.本振部分,对直接数字式合成频率、参考分频比和环路分频比进行三重调节,抑制了直接数字频率合成的杂散,提高了频率分辨率;发射部分,采用二次混频电路,避免了调谐电压预置,简化了电路,并保证了发射信号和本振信号相参.该系统输出在Ka频段,带宽400MHz,步进<1MHz.测试相噪<-90dBc/Hz@10kHz、-97dBc/Hz@100kHz,杂散为-60dBc,跳频时间<15us.     

一种电流失配自适应补偿宽带锁相环设计

针对宽带自偏置锁相环(PLL)中存在严重的电荷泵电流失配问题,提出了一种电流失配自适应补偿自偏置锁相环。锁相环通过放大并提取参考时钟与反馈时钟的锁定相位误差脉冲,利用误差脉冲作为误差判决电路的控制时钟,通过逐次逼近方法自适应控制补偿电流的大小,逐渐减小鉴相误差,从而减小了锁相环输出时钟信号抖动。锁相环基于40 nm CMOS工艺进行设计,后仿真结果表明,当输出时钟频率为5 GHz时,电荷泵输出噪声从-115.7 dBc/Hz@1 MHz降低至-117.7 dBc/Hz@1 MHz,均方根抖动从4.6 ps降低至1.6 ps,峰峰值抖动从10.3 ps降低至4.7 ps。锁相环输出时钟频率为2～5 GHz时,补偿电路具有良好的补偿效果。     

S频段小型化低相噪倍频器设计

本文利用阶跃恢复二极管的非线性特性设计了一款S频段低相噪高阶倍频器.倍频器输入频率100MHz,输出频率2GHz,输出功率0~5dBm,输出信号杂散10GHz内优于-90dBc,残留相位噪声指标优于-130dBc/Hz@1kHz.创新性地集成FBAR带通滤波器,电路尺寸小于24mm×14mm×5mm.     

低相位噪声和低参考杂散CMOS锁相环的优化设计与实现

基于Simulink建立的CMOS电荷泵锁相环的动态模型,对电荷泵锁相环的环路参数与环路稳定性的关系进行了仿真与分析,根据分析结果确定了4GHz锁相环的环路参数,并围绕低相位噪声和低参考杂散设计了锁相环各单元电路结构。该锁相环采用SMIC 0.18m CMOS工艺进行了流片,芯片面积为675μm×700μm。测试的VCO在控制电压为0.3~1.5V时,振荡频率为3.98~4.3GHz;当分频比为1036,参考信号频率为4MHz,锁定状态下锁相环的相位噪声测量值为-120.5dBc/Hz@100kHz及-127.5dBc/Hz@1MHz;电路参考杂散约为-70dB,整体性能优良。     

单片UHF RFID阅读器中频率综合器的研究

根据EPC global C1G2射频协议要求以及我国的射频识别协议草案,提出了一种应用于860～960 MHz UHF波段单片射频识别(RFID)阅读器的3阶Ⅱ型电荷泵锁相环(CPPLL)频率综合器,其输入参考频率为250 kHz.电路采用MOSlS IBM 0.18μm RF/MM CMOS工艺,仿真结果表明:锁相环输出频率范围为760 MHz～1.12 GHz,锁相环输出频率为900 MHz时,相位噪声为-113.1 dBc/Hz@250 kHz,-120.4 dBc/Hz@500 kHz.电源电压3.3 V,消耗总电流9.4 mA.     

CPT铷原子钟锁相环频率合成器设计和分析

基于CPT(相干布局囚禁)87铷原子钟设计出输出频率为3417 MHz的锁相环频率合成器,通过ADIsimPLL仿真出最佳环路带宽,环路滤波器参数以及相位噪声等,并通过STM32对锁相环芯片进行控制。对频率合成器进行了测试,电路尺寸为40 mm×40 mm,输出信号功率范围为-4 dBm^+5 dBm可调,输出信号噪声满足要求-88.65 dBc/Hz@1 kHz,-92.31 dBc/Hz@10 kHz,-104.63 dBc/Hz@100 kHz,杂散和谐波得到抑制,设计的频率合成器能很好的应用于原子钟的射频信号源。     

带有自适应频率校准单元的26~41 GHz锁相环

采用45 nm SOI CMOS工艺,设计了一种带有自适应频率校准单元的26~41 GHz 锁相环。该锁相环包括输入缓冲器、鉴频鉴相器、电荷泵、环路滤波器、压控振荡器、高速时钟选通器、分频器和频率数字校准单元。采用了基于双LC-VCO的整数分频锁相环,使用了自适应频率选择的数字校准算法,使得锁相环能在不同参考时钟下自适应地调整工作频率范围。仿真结果表明,该锁相环的输出频率能够连续覆盖26~41 GHz。输出频率为26 GHz时,相位噪声为-103 dBc/Hz@10 MHz,功耗为34.64 mW。输出频率为41 GHz时,相位噪声为-96 dBc/Hz@10 MHz,功耗为35.44 mW。     

PLL调频立体声接收机制作

锁相环(PLL)电路PLL(锁相环)电路的基本组成如图1。压控振荡器(VCO)是一种用电压控制振荡频率的电路。假定基准振荡器的频率为100kHz,若要构成一个700MHz 的PLL 路,VCO 的输出需经过分频系数 N=700的分频器。也得到一个100kHz 的信号,若两者完全相同,比较器输出的 VCO 的控制电压不变,就能得到稳定的70MHz 的输出。由于某种原因使频率发生变化,经比较器和 LPF 输出的电压产生高低变化,对 VCO 的振荡频率起到补偿作用,使振荡稳定。若频率增高,加在 VCO 上的电     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.