PIN结构自扫描光电二极管列阵

从自扫描光电二极管列阵（ＳＳＰＡ）的工作原理出发，提出采用外延、离子注入、推阱的技术，研究一种新颖的高响应度的ＰＩＮ结构的ＳＳＰＡ器件，详细的分析了工艺设计方案和实验方法，最后提供了样品的测试参数。     

光电二极管列阵在涂料电脑测色配色仪中的应用

论述了CCPD光电二极管列阵的性能、特点,列阵的控制电路,列阵光电信号计算机数据采集及其在涂料电脑测色配色仪中的应用。     

新型光电探测器列阵的实验研究

本文对一种适用于光互连网络的新型光电探测器件列阵进行了实验测试工作。设计了一个测试列阵器件的光互连系统,系统的时钟光点阵由二位相光栅产生,测试所需的信号光点阵由一个２×８的ＳＥＥＤ器件对时钟光进行调制产生。对一个２×８的探测器列阵进行了实验测试工作,该探测器列阵中的探测单元的工作频率可达１００Ｍｂｉｔ／ｓ。     

非晶硒化镉快速光电探测器瞬态光电导的测试研究

报道了淀积条件对非晶态硒化镉（α－ＣｄＳｅ）薄膜微区结构的影响，并对利用α－ＣｄＳｅ薄膜为光敏介质的快速光电探测器的瞬态光电导进行了比较深入的测试研究。     

40Gbit／s高速并行12信道光接收模块的研制

研究并制作了12信道并行光接收模块,单信道传输速率大于等于3．318Gbit／s,12信道并行总传输速率为40Gbit／s。模块采用工作波长在850nm的高速PIN型光电探测器（PD）列阵作为光接收器件,PD列阵与接收电路芯片直接用Au丝压焊连接,输入光信号直接由12信道的光纤阵列耦合进入PD列阵中。对光接收模块进行眼...     

SSPA周边杂散光对响应度不均匀性的影响

根据实验现象，用半导体光电效应的基本原理，定性分析了自扫描光电二极管列阵周边杂散光对响应度不均匀性的影响，从装置和列阵结构上提出了相应的改进措施，有效地解决了列阵首尾部分二极管响应度的不均匀性。     

CMOS成像器用深红外光电二极管

基于半导体的成像器有许多种类型,其中包括CCD、光电二极管列阵、电荷注入器件以及混成焦平面列阵。CCD常被用于图像获取,特别是小尺寸成像     

窄禁带半导体光电二极管的最新进展（上）

当前红外探测器的许多研究工作是致力于改进单元器件和大规模电子扫描列阵器件的性能,致力于获得较高的探测器工作温度。研究工作的另一个重要目标是促使这些红外探测器价格更便宜,使用更方便。本文提出了窄禁带半导体光电二极管性能的调研情况,讨论了各种红外光电二极管技术的最新进展,这些器件是：ＨgCdTe光电二极管、ＩnSb光电二极管、可替代ＨgCdTe的由Ⅲ－Ⅴ族和Ⅱ－Ⅵ族元素组成的三元合金光电二极管,以7及单片硫化铅一类的光电二极管。调查了这些光电二极管的性能,它们的工作波段包括：短波红外（ＳＷＩＲ）：１μm－３μm;长波红外（ＬＷＩＲ）：８μm－１４μm。与其它类型的光子探测器相比,ＨgCdTe探测器的工作温度较高,在中波红外区域,ＨgCdTe探测器使用热电致冷器工作,器件性能可能达到背景限水平,而长波ＨgCdTe红外探测器则需要工作在大约１００Ｋ的温度。与其它探测器比较焉,ＨgCdTe探测器的特点是吸收系数和量子效率较高,而热产生速率则相对较低。     

N型GaN的持续光电导

本文报道了金属有机物化学气相外延（ＭＯＶＰＥ）生长的未人为掺杂和掺Ｓｉｎ－ＧａＮ的持续光电导（ＰｅｒｓｉｓｔｅｎｔＰｈｏｔｏｃｏｎｄｕｃｔｉｖｉｔｙ——ＰＰＣ）．在不同温度下观察了光电导的产生和衰变行为．实验结果表明,未人为掺杂和掺Ｓｉｎ－ＧａＮ的持续光电导和黄光发射可能起源于深能级缺陷,这些缺陷可以是ＶＧａ空位、ＮＧａ反位或者ＶＧａ－ＳｉＧａ络合物．和未人为掺杂样品Ａ相比,样品Ｂ中因Ｓｉ的并入导致ＧａＮ中的深能级缺陷增加,提高了ＧａＮ中黄光发射,使持续光电导衰变减慢,但实验未发现黄光的加强和光电导衰变特     

1.52μm红外光电探测器

利用ＰｔＳｉ与Ｐ－Ｓｉ接触，研制成功肖特基势垒红对光电探测器（简称ＰｔＳｉ／Ｐ－ＳｉＩＲ－ＳＢＤ）。在液氮温度（７７Ｋ）下，对１．５２μｍ红外光，它的灵敏度为２．６９×１０－２Ａ／Ｗ，量子效率为２．４％，反偏４Ｖ时的漏电流为５×１０－５μＡ。此外，对ＰｔＳｉ／Ｐ－ＳｉＩＲ－ＳＢＤ的量子效率进行了计算机模拟计算。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.