适用于全差分运算放大器的两级共模反馈结构

针对两级全差分运算放大器对输入级和输出级不同的性能要求,设计了连续时间共模反馈电路和开关电容共模反馈电路,使运放在稳定电路直流工作点的同时提高输出摆幅.基于0.13μm CMOS混合信号工艺对电路进行仿真,结果表明,该运放两级共模反馈瞬态输出的波动范围分别为1.06 mV和2.21 mV,在2.5 V电源电压下具有91.6 dB直流开环增益,负载电容为1.5 pF 时单位增益带宽为1.163 GHz.     

一种高共模抑制比轨到轨全差分运算放大器

针对传统全差分运算放大器电路存在输入输出摆幅小和共模抑制比低的问题,提出了一种高共模抑制比轨到轨全差分运算放大器电路。电路的输入级采用基于电流补偿技术的互补差分输入对,实现较大的输入信号摆幅;中间级采用折叠式共源共栅结构,获得较大的增益和输出摆幅;输出级采用共模反馈环路控制的A类输出结构,同时对共模反馈环路进行密勒补偿,提高电路的共模抑制比和环路稳定性。提出的全差分运算放大器电路基于中芯国际(SMIC) 0.13μm CMOS工艺设计,结果表明,该电路在3.3 V供电电压下,负载电容为5 pF时,可实现轨到轨的输入输出信号摆幅;当输入共模电平为1.65 V时,直流增益为108.9 dB,相位裕度为77.5°,单位增益带宽为12.71 MHz;共模反馈环路增益为97.7 dB,相位裕度为71.3°;共模抑制比为237.7 dB,电源抑制比为209.6 dB,等效输入参考噪声为37.9 nV/Hz^1/2@100 kHz。     

一种用于采保电路的宽带高增益放大器的设计

分析了跨导运算放大器的电路结构,采用两级放大电路,考虑到全差分结构中要使用共模反馈,用共源共基和共源共栅电路来实现电路的设计.同时对部分性能指标进行了优化,其中包括增益非线性引入的误差和不完全建立误差.设计了一种宽带高增益跨导放大器,利用0.35 μm Bi CMOS工艺条件下,Spectre仿真得到运算放大器的开环增益大于60 dB,单位增益带宽可达2.1 GHz,输出摆幅能达到1.5 V.     

一种高线性宽带CMOS全差分放大器

设计了一种高线性度的宽带CMOS全差分放大器,输入级采用带有电阻共模负反馈的差分电路,输出级则由推挽跨导运算放大器及其反馈环路组成.采用输入级源退化电阻及输出级负反馈技术,使得差分输出峰峰值为1 V时三阶谐波失真达到-60 dB.同时利用反馈环路中反馈电容的欠阻尼滞后补偿作用,使放大器的带宽增大了15%.测试结果表明,在0.25 μmCMOS工艺下,该放大器-3 dB带宽达到150 MHz,噪声系数小于14 dB.     

基于前馈gmf的共模反馈稳定性增强电路

基于0.13 μm CMOS工艺,提出并设计了一种应用于三级全差分运算放大器中的新型共模反馈电路。将具有密勒补偿结构的典型两级全差分结构和源随器结构作为三级运算放大器的放大级,通过在共模反馈电路中引入前馈通路,产生的两个零点提高运放的稳定性,解决了传统共模反馈电路中多个极点难以补偿的问题。仿真结果表明,在1.2 V电源电压下,共模下增益为70.4 dB,单位增益带宽为56 MHz,相位裕度为85.5°。相比于传统无前馈电路,新型共模反馈电路的单位增益带宽和相位裕度分别提高了8.2 MHz和17.4°。具有这种共模反馈结构的运算放大器可以实现较低的电源电压和较好的相位裕度。     

低压低功耗CMOS电流反馈运算放大器的设计

通过在输出级采用电阻反馈,以增强负载驱动能力,采用隔离补偿电容,以消除低频零点等方式,设计了一种性能较高的CMOS电流反馈运算放大器。在1.5 V电源电压下,当偏置电流为1μA,负载电容为80 pF时,采用BSM3 0.5μm CMOS工艺进行HSPICE仿真。结果表明,该电路结构达到了76 dB的开环增益、312 MHz单位增益带宽、62°相位裕度,139 dB共模抑制比,功耗仅为0.73 mW。     

两级运放中共模反馈电路的分析与设计

在两级共源共栅CMOS运算放大器中,设计了一种新的共模反馈电路。这种电路克服了一般共模反馈电路存在的限制输出摆幅的缺点,在稳定电路直流工作点的同时,能有效提高电路的输出摆幅。通过对共模电路结构的分析,证明了其功能原理的正确性。基于0.18μm(3V)CMOS工艺库,用Hspice软件对电路结构进行了仿真验证。结果显示,电路低频增益达到120dB,功耗不到0.24mW。     

应用于神经信号再生系统的跨导放大器

采用华润上华0.6μm标准CMOS混合信号工艺设计了一种应用于植入式神经信号再生系统的跨导放大器.该放大器采用全差分结构以获得高输出摆幅,利用源反馈技术改善线性度,并设计了共模反馈电路以稳定共模输出电压.该跨导放大器工作在5V的电源电压下,具有0.55 S的跨导增益和100 kHz的3 dB带宽,可以满足系统的需要.     

一种全差分增益自举运算放大器的设计

设计实现了一种具有高增益大带宽的全差分增益自举运算放大器,适用于高速高精度流水线模数转换器采保电路的应用.增益自举放大器的主放大器和子放大器均采用折叠共源共栅式全差分结构,并且主放大器采用开关电容共模反馈来稳定输出电压.该放大器工作在3.0 V电源电压下,单端负载为2pF,采用0.18Wn CMOS工艺库对电路进行仿真,结果显示该放大器的直流增益可达到112dB,单位增益带宽为1.17GHz.     

一种高性能共模反馈CMOS运算放大器

介绍了一种具有高增益,高电源抑制比(CMRR)和大带宽的两级共源共栅运算放大器。此电路在两级共源共栅运算放大器的基础上增加共模反馈电路,以提高共模抑制比和增加电路的稳定性。电路采用0.35μm标准CMOS工艺库,在Cadence环境下进行仿真。结果显示,该放大器增益可达到101 dB,负载电容为10 pF时,单位增益带宽大约为163 MHz,共模抑制比可达101dB,电路功耗仅为0.5 mW。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.