首页 | 本学科首页   官方微博 | 高级检索  
相似文献
 共查询到20条相似文献,搜索用时 796 毫秒
1.
文中介绍了一个基于TSMC 0.18μm CMOS工艺,可应用于802.11a无线局域网标准的功率放大器设计。该电路采用三级全差分结构,驱动级采用电阻并联负反馈网络来保证稳定性。在3.3V电源电压下,增益为16dB,输出1dB压缩点为17dBm,电路功耗为0.8 W,效率为18.1%。芯片面积为1.2mm×1.1 mm。  相似文献   

2.
分析与设计了一种工作电源在0.6V~3.3V之间、超低功耗的跨导运算放大器(OTA)。整体电路基于工作在弱反型区的衬底驱动输入差分对和电平移位电路,且供电电压可低于晶体管PMOS的阈值电压。OTA电路采用HJTC0.35μm N阱CMOS工艺,Hspice仿真结果表明,在工作电压为0.6V时,功耗仅为326nW。  相似文献   

3.
基于连续时问的全差分电容结构,设计了一款电容式微加速度计模拟前端接口电路。该电路采用了斩波稳定技术,减小了运算放大器的直流偏差和闪烁噪声,同时,引入了一种周期复位的方法来稳定电压电容转换器输入端口求和节点的直流偏置,并实现了灵敏度可调的功能。该设计在TSMC0.35Hm工艺下流片,面积为3.4mm2。测试结果表明,在5V供电电压下,电路非线性度小于O.7%,功耗约9.4mW。  相似文献   

4.
10 Gb/ s 0. 18 􀀁m CMOS 激光二极管驱动器芯片   总被引:2,自引:0,他引:2       下载免费PDF全文
雷恺  冯军  王志功 《电子器件》2004,27(3):416-418
基于0.18μm CMOS工艺设计的10Gb/s激光二极管驱动器电路。核心单元为两级直接耦合的差分放大器,电路中采用了并联峰化技术和放大级直接耦合技术以扩展带宽,降低功耗。模拟结果表明,在1.8V电源电压作用下该电路可工作在10Gb/s速率上,输入单端峰峰值为0.3V的差分信号时,在单端50Ω负载上的输出电压摆幅可达到1.4V,电路功耗约为85mW。  相似文献   

5.
本文介绍了笔者使用cadence设计的0.35um CMOS高速8位流水线电流导引数模转换器。电路采用了高速解码电路、双路并行处理、流水线等技术,使系统处理速度从传统的500M采样/秒达到1.5G采样/秒,输出差分电压在2个50欧姆的电阻上达到3.1V,电压精度达到1.55*2^-1V。在国外同类设计中处于领先水平。  相似文献   

6.
基于0.2μm GaAs PHEMT工艺的压控振荡器IC设计   总被引:1,自引:1,他引:0  
孙玲  朱恩  孟凡生  吴春红  费瑞霞 《电子器件》2003,26(4):341-343,340
给出了一个采用0 2μmGaAsPHEMT工艺设计的全集成差分负阻式LC压控振荡器电路,芯片面积为0 52×0 7mm2。采用3 3V正电源供电,测得输出功率约-11 22dBm,频率调节范围6 058GHz~9 347GHz;在自由振荡频率7 2GHz处,测得的单边带相位噪声约为-82dBc/Hz@100kHz.  相似文献   

7.
设计了一种二极管型非制冷红外探测器的前端电路,该电路采用Gm-C-OP积分放大器的结构,将探测器输出的微弱电压信号经跨导放大器(OTA)转化为电流信号,再经电容反馈跨阻放大器(CTIA)积分转化为电压信号输出。该OTA采用电流反馈型结构,可以获得比传统OTA更高的线性度和跨导值。输入采用差分结构,可以有效地消除环境温度及制造工艺对探测器输出信号的影响。电路采用0.35 m CMOS工艺进行设计并流片,5 V电源电压供电。Gm-C-OP积分放大器总面积0.012 6 mm2,当输入差分电压为0~5 mV时,测试结果表明:OTA跨导值与仿真结果保持一致,Gm-C-OP积分放大器可实现对动态输入差分信号到输出电压的线性转化,线性度达97%,输出范围大于2 V。  相似文献   

8.
给出了一个适用于万兆以太网IEEE80 2 3ae 10GBASE -X的高线性度全集成单片环形压控振荡器电路。该压控振荡器采用TSMC 0 18μmCMOS混合信号工艺设计制造 ,由四级差分延时单元和输出驱动电路组成 ,芯片总面积为 0 3× 0 4mm2 。芯片采用 1 8V单电源供电 ,测得带直接耦合差分 5 0Ω负载时的总功耗为 78mW ,单端输出功率为 10 2dBm ,振荡频率在 2 8~ 4 0GHz有非常好的压控线性度 ,在振荡器中心频率为 3 12 5GHz时的单边带相位噪声为 - 96dBc/Hz@10MHz。  相似文献   

9.
锁相环中高性能电荷泵的设计   总被引:6,自引:4,他引:2  
设计了一种结构新颖的动态充放电电流匹配的电荷泵电路,该电路利用一种放电电流对充电电流的跟随技术,使充放电电流达到较好匹配,同时,在电荷泵中增加差分反相器,提高电荷泵的速度。采用Istsilicon 0.25μmCMOS工艺进行仿真,结果显示:输出电压在0.3—2.2V之间变化时,电荷泵的充放电电流处处相等。  相似文献   

10.
本文设计一种新型的全差分电荷泵,采用差分输入和差分输出。采用差分输出不但能够降低电荷泄漏所带来的电压噪声,而且能够提高电荷泵的上升和下降速度。上拉泵电路和下拉泵电路完全对称,能够消除电流失配所带来的噪声,并采用正反馈电路结构,以提高开启和关断速度,并降低功耗。电路在0.18μm工艺,BSIM 3V 3模型下,采用Cadence中的Spectre仿真工具进行仿真,当电源电压VDD=1.8V,f=100MH z时,电路输出的电压范围是0V~1.8V,功耗为0.01mW。  相似文献   

11.
DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.  相似文献   

12.
High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET > PDMAT > TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.  相似文献   

13.
In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal (200) (2d = 0.4027 nm) is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line(w), the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line(x), the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines(y), the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line(z) in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line(q) in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution(λ/△ 2) is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.  相似文献   

14.
From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.  相似文献   

15.
The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.  相似文献   

16.
The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.  相似文献   

17.
Today, micro-system technology and the development of new MEMS (Micro-Electro-Mechanical Systems) are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.  相似文献   

18.
This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel's.  相似文献   

19.
This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.  相似文献   

20.
An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.  相似文献   

设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号