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1.
基于0.35μm工艺,设计了应用于低光照环境下的低噪声、高灵敏度CMOS图像传感器。该图像传感器采用PPD 4T像素结构,像素阵列512×512,包含列级运放、水平移位寄存器、逻辑控制单元、单斜率模数转换器和偏置电路等模块。通过采用低噪声PPD 4T像素结构、低噪声列级放大器电路结构,以及对版图的优化设计等措施实现了低噪声、高灵敏度的CMOS图像传感器设计。  相似文献   

2.
本文结合用于CM0S图像传感器中的低噪声DPGA的性能特点,提出了一种优化电容阵列拓扑结构的方法,讨论了此种结构下由寄生电容引入的时钟馈通和电荷分配效应,并给出了仿真结果和按照0.35 μ m CMOS工艺进行流片的版图.测试结果表明,采用改进的电容阵列结构能把采样电容引入的噪声斜率从原来的0.15降低到0.01.  相似文献   

3.
罗磊  唐利斌  左文彬 《红外技术》2021,43(11):1023-1033
近年来图像传感器在紫外成像的应用越来越广泛,尤其是以CCD(charge coupled device)和CMOS(complementary metal oxide semiconductor)为主的紫外图像传感器受到了研究人员的广泛关注。半导体技术的进步和纳米材料的发展进一步推动了紫外图像传感器的研究。本文综述了国内外紫外增强图像传感器的研究进展,介绍了几种增强器件紫外响应的材料,另外还简要概述了紫外图像传感器在生化分析、大气监测、天文探测等方面的应用,并讨论了CCD/CMOS图像传感器在紫外探测方面所面临的挑战。  相似文献   

4.
在对低噪声CMOS图像传感器的研究中,除需关注其噪声外,目前数字化也是它的一个重要的研究和设计方向,设计了一种可用于低噪声CMOS图像传感器的12 bit,10 Msps的流水线型ADC,并基于0.5μm标准CMOS工艺进行了流片。最后,通过在PCB测试版上用本文设计的ADC实现了模拟输出的低噪声CMOS图像传感器的模数转换,并基于自主开发的成像测试系统进行了成像验证,结果表明,成像画面清晰,该ADC可作为低噪声CMOS图像传感器的芯片级模数转换器应用。  相似文献   

5.
李金洪  邹梅 《红外与激光工程》2018,47(7):720002-0720002(7)
设计了一种基于电容反馈跨阻放大器型(Capacitive Trans-impedance Amplifier,CTIA)像元电路与双采样(Delta Double Sampling,DDS)的低照度CMOS图像传感器系统。采用CTIA像元电路提供稳定的光电二极管偏置电压以及高注入效率,完成在低照度情况下对微弱信号的读取;同时采用数字DDS结构,通过在片外实现像元积分信号与复位信号的量化结果在数字域的减法,达到抑制CMOS图像传感器中固定图案噪声的目的,进一步提高低照度CIS的成像质量。基于0.35 m标准CMOS工艺对此基于CTIA像元电路的CMOS图像传感器芯片进行流片,像元阵列为256256,像元尺寸为16 m16 m。测试结果表明该低照度CMOS图像传感器系统可探测到0.05 lx光照条件下的信号。  相似文献   

6.
CMOS图像传感器   总被引:3,自引:0,他引:3  
<正> 图像传感器是传感技术中最主要的一个分支,是PC机多媒体大世界今后不可缺少的外设,也是保安监控产业中最核心的器件。在知识经济和信息社会已经到来的今天,它在我们的社会生活和个人生活中会有数不胜数的应用。 CMOS图像传感器和CCD摄像器件在20年前几乎是同时起步的。由于CCD器件有光照灵敏度高、噪音低、像素小等优点,所以在过去15年里它一直主宰着图像传感器市场。与之相反,CMOS图像传感器过去存在着像素大、信噪比小、分辨率低这些缺点,一直无法和CCD技术抗衡。但是随着大规模集成电路技术的不断发展,过去CMOS图像传感器制造工艺中不易解决的技术难关现已都能找到相应解决的途径,从而大大改善了CMOS图像传感器的图像质量。目前CMOS单元面积的像素数已可与CCD单元面积的像素数相  相似文献   

7.
医学技术一直是CCD(电荷耦合设备)图像传感器的重要应用领域之一。现在,CMOS传感器已进入高速发展时期。究其原因,首先,CMOS图像质量可与CCS图像相媲美。其次,利用标准半导体制造工艺,CMOS传感器在价格方面占据很大优势。第三,CMOS传感器在电路集成方面的无限潜力可以减少输入输出接口数量。  相似文献   

8.
设计了一种低功耗高动态范围的CMOS图像传感器16×16像素阵列电路,采用条件重置的方法,钟控比较器的低功耗设计及相关时序电路的优化,在扩展CMOS图像传感器的动态范围下,极大地降低了系统的功耗.实验表明,基于标准CSM 0.35μm 2P4M CMOS工艺,用HSPICE仿真,动态范围最大可以达到普通传感器的4倍,在3.3 V下每列功耗仅为6.6μW.  相似文献   

9.
匀光系统的均匀性是实现深紫外CMOS图像传感器参数测试的关键。根据傅里叶光学理论,结合ArF准分子激光输出光斑特点,设计了复眼阵列匀光系统的初始结构,并在ZEMAX非序列模式下建立了匀光系统模型。针对ZEMAX光源中光线采样随机性的特点及匀光系统均匀性的要求,对追迹光线数目及复眼阵列中透镜元个数进行了优化。在透镜元大小为1mm、采用1亿根光线并做30次平均后,在12mm×12mm光斑范围内获得了均匀性为0.986的均匀照明光斑,满足CMOS图像传感器测试对光斑均匀性优于0.97的要求。  相似文献   

10.
王旭  刘成 《中国集成电路》2008,17(11):39-46
近年来CMOS图像传感器在医疗和工业CT等领域中得到了越来越广泛的应用。作为CMOS图像传感器的前端处理电路,多通道积分器阵列的性能参数直接决定了传感器的成像质量并成为该领域的研究热点。本文的主要研究内容是低噪声探测器的研究。对芯片的测试结果表明,低噪声探测器的电路设计和版图设计均取得初步成功,基本达到预期的设计目标。  相似文献   

11.
This paper presents a brief overview of the Applied Centura(R)DPS(R)system,configured with silicon etch DPS Ⅱ chamber, with emphasis on discussing tuning capability for CD uniformity control. It also presents the studies of etch process chemistry and film integration impact for an overall successful gate patterning development. Discussions will focus on resolutions to key issues, such as CD uniformity, line-edge roughness, and multilayer film etching integration.  相似文献   

12.
We have fabricated the white organic light-emitting devices (WOLEDs) based on 4,4' -bis(2,2 -diphenyl vinyl)-1,1' - biphenyl (DPVBi) and phosphorescence sensitized 5,6,11,12,-tetraphenylnaphthacene (rubrene). The device structure is ITO/2T-NATA (20 nm)/NPBX (20 nm)/CBP: x%Ir(ppy)3:0.5% rubrene (8 nm)/NPBX (5 nm)/DPVBi (30 nm)/Alq(30 nm)/LiF(0.5 nm)/A1. In the devices, DPVBi acts as a blue light-emitting layer, the rubrene is sensitized by a phosphorescent material, fac tris (2-phenylpyridine) iridium [Ir(ppy)3], acts as a yellow light-emitting layer, and N,N' -bis- (1-naphthyl)- N,N' -diphenyl -1, 1' -biphenyl-4,4' -diamine (NPBX) acts as a hole transporting and exciton blocker layer, respectively. When the concentration of Ir (PPY)3 is 6wt%, the maximum luminance is 24960 cd/m^2 at an applied voltage of 15 V, and the maximum luminous efficiency is 5.17 cd/A at an applied voltage of 8 V.  相似文献   

13.
To meet the need of automatic image features extraction with high precision in visual inspection, a complete approach to automatic identification and sub-pixel center location for similar-ellipse feature is proposed. In the method, the feature area is identified automatically based on the edge attribute, and the sub-pixel center location is accomplished with the leastsquare algorithm. It shows that the method is valid, practical, and has high precision by experiment. Meanwhile this method can meet the need of instrumentation of visual inspection because of easy realization and without man-machine interaction.  相似文献   

14.
本论文提出一种在多天线MIMO信道相关性建模中小角度扩展近似理论算法,并应用于分析MIMO系统性能。分析中分别对三种不同角能量分布情况下的空间相关性研发快速近似计算法,并同时提出双模(Bi-Modal)角能量分布情况下的近似运算。通过分析这些新方法的近似效率,可以得到计算简单、复杂度低、而且符合实际的MIMO相关信道矩阵,对系统级的快速高效计算法的研究和系统级的评估以及误差分析具有重要的意义。  相似文献   

15.
In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal (200) (2d = 0.4027 nm) is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line(w), the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line(x), the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines(y), the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line(z) in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line(q) in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution(λ/△ 2) is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.  相似文献   

16.
High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET > PDMAT > TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.  相似文献   

17.
Integrated circuits (ICs) intended for increasingly sophisticated automotive applications bring unique test demands. Advanced ICs for applications such as highly integrated automatic braking system (ABS) and airbag controllers combine high voltage digital channels, significant VI demands and precise timing capability. Along with continued missioncritical reliability concerns, the trend toward higher voltage operation and increased device integration requires specialized test capabilities able to extend across the wide operating ranges found in automotive applications. Among these capabilities, automotive test requirements increasingly dictate a need for a cost-effective versatile mixed-signal pin electronics with very high data rates reaching up to 50MHz with a voltage swing of-2 V to +28 V.  相似文献   

18.
This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.  相似文献   

19.
An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.  相似文献   

20.
It is of interest to get appropriate information about the dynamic behaviour of rotating machinery parts in service. This paper presents an approach of optical vibration and deviation measurement of such parts. Essential of this method is an image derotator combined with a high speed camera or a laser doppler vibrometer (LDV).  相似文献   

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