分等级ZnO超长微米线的制备及自供电传感特性

由于材料尺度的限制,微纳器件的制作工艺一般较为复杂。以ZnO,SnO2和石墨粉为原料,采用化学气相沉积(CVD)法成功制备出长度达厘米级别的分等级结构ZnO微米线。分别通过立体显微镜、场发射扫描电子显微镜(FE-SEM)和X射线粉末衍射仪(XRD)对样品的形貌和结构进行表征。结果表明所制备的材料其一级结构为ZnO微米线,二级机构为四周均匀生长的ZnO微米短棒。设计制作出一种基于单根ZnO微米线的自供电传感器,并以乙醇为目标检测物进行敏感性能测试。结果表明:在不加外部电源的情况下,接触乙醇液体可以得到0.15 V的输出电压或25 nA的输出电流。     

掺杂室沉积本征微晶硅材料及其在太阳能电池中的应用

在掺杂P室采用甚高频等离子体增强化学气相沉积(VHF-PECVD)技术,制备了不同硅烷浓度条件下的本征微晶硅薄膜.对薄膜电学特性和结构特性的测试结果分析表明:随硅烷浓度的增加,材料的光敏性先略微降低后提高,而晶化率的变化趋势与之相反;X射线衍射(XRD)测试表明材料具有(220)择优晶向.在P腔室中用VHF-PECVD方法制备单结微晶硅太阳能电池的i层和p层,其光电转换效率为4.7%,非晶硅/微晶硅叠层电池(底电池的p层和i层在P室沉积)的效率达8.5%.     

Si基薄膜叠层太阳电池中顶底电池电流匹配的实现

以中间层对非晶硅/微晶硅(a-Si/μc-Si)叠层太阳电池电学特性的影响为研究对象,运用太阳能电池模拟软件,计算了中间层折射率和厚度的变化对顶/底电池电流的影响.针对当前Si基薄膜叠层太阳电池中存在的顶、底电池电流不匹配的问题,提供了解决方案.结果表明,应选用折射率小于3.1的材料作中间层;顶、底电池电流完全匹配的中...     

p型微晶硅薄膜的沉积及其在微晶硅薄膜太阳电池中的应用

采用等离子体化学气相沉积(PECVD)方法制备了硼掺杂微晶硅薄膜和微晶硅薄膜太阳电池.研究了乙硼烷含量、p型膜厚度及沉积温度对硼掺杂薄膜生长特性和高沉积速率的电池性能的影响.通过对p型微晶硅薄膜沉积参数的优化,在本征层沉积速率为0.78nm/s的高沉积速率下,制备了效率为5.5%的单结微晶硅薄膜太阳电池.另外,对P型微晶硅薄膜的载流子疏输运机理进行了讨论.     

聚合物微米线Y型分束器工作特性研究

对基于聚苯乙烯(PS)微米线的光学分束器分光 特性进行了研究,结果发现,通过调整分束器两输出臂间 的耦合长度可以调节器件的分光比。讨论了传输损耗与表面散射损耗对器件分光性能的影 响,实验测量了直径为1.5μm的聚合物微米线在波长为650nm的红光下传输损耗约为0.010dB/μm;发现在Y型分束器中,PS微米线的传输损耗可近似忽略;而 散射损耗对分光特性器件的影响较大。利用散射损耗对分光特性的影响,可制备基于PS微米 线的悬浮颗粒传感器。     

基于AM-OLED基板的拓展多晶硅薄膜功能层的研究

在有源寻址有机发光二极管(active matrix organic light emitting diode,AM-OLED)显示基板中,将电学功能层--薄膜晶体管(thin film transistor,TFT)有源层材料p型掺杂金属诱导晶化(metal induced crystallized,MIC)多品硅(p+-MIC poly-Si)薄膜的版图适当延伸,来充当OLED的阳极,由于它具有低方块电阻、高功函数的电学特性和半反半透、低吸收率的光学特性.与OLED的金属铝阴极形成了微腔器件,成功地形成了显示基板上的多晶硅薄膜的光学功能层.对这一功能层的厚度进行了优化,比较了不同厚度下TFT器件的电学特性和OLED的光学特性.当其厚度为40nm时为最佳厚度,此时,TFT器件场迁移率、阈值电压、亚阈值幅摆、电流开关比和栅压诱导漏极漏电等性能为最佳,且红光微腔式OLED(microcavity-OLED,MOLED)的出光强度增大,光谱窄化,电流效率与功率效率均有所提高.这不仅使器件的性能有所提高,而且大大地简化了AM-OLED基板的制备流程.     

LP-MOCVD法制作n-ZnO/p-Si异质结及其电致发光研究

采用低压-金属有机化学气相沉积法(LP-MOCVD)在(100)p-Si衬底上制备未掺杂n型ZnO薄膜,并制作了相应的n-ZnO/p-Si异质结器件.通过X射线衍射(XRD)、光致发光(PL)光谱和霍尔测试分别研究了所制备薄膜的结构、光学和电学特性.得到具有较高质量的n型ZnO薄膜.在室温条件下,测得了该类异质结器件正向注入电流下可见光和近红外区域的电致发光(EL).     

a-Si剩余膜厚对TFT特性的影响

本文通过电学特性测试设备在黑暗(Dark)和光照(Photo)两种测试环境下,研究了沟道不同a-Si剩余厚度对TFT电学特性的影响。通过调整刻蚀时间改变沟道内a-Si剩余厚度,找出电学特性稳定区域以及突变的临界点。实验结果表明:在黑暗(Dark)环境下a-Si剩余厚度在30%～48%之间时,TFT器件的电学特性比较稳定,波动较小;而剩余厚度少于30%时,TFT特性变差,工作电流变小,开启电压变大,电子迁移率变小;在光照环境下主要考虑漏电流的影响,在a-Si剩余厚度43%以内时,光照I_(off)相对较低(小于Spec 20pA),同时变化趋势较缓;而剩余厚度大于43%时,光照I_(off)增加25%,同时变化趋势陡峭。综合黑暗和光照测试环境,在其他条件不变的情况下,a-Si剩余厚度在30%～43%之间时TFT的电学特性较好,同时相对稳定。     

VHF-PECVD低温高速生长的硅薄膜材料特性研究

采用甚高频等离子体增强化学气相沉积(VHF-PECVD)方法,在保持其它参量不变的条件下,通过改变SiH,浓度(SC)成功地制备了一系列Si基薄膜样品。对材料特性的测试结果表明,同射频PECVD相比VHF-PECVD技术提高了薄膜的沉积速率．并且SC大相应的沉积速率也大;微区Raman谱测试计算结果表明,样品的晶化率(Xo)随SC、的逐渐增大而减小;X射线衍射(XRE))测试结果计算显示．样品的晶粒尺寸在20～30nm之间原子力显微镜(AFM)和微区Raman谱测试分析结果一致表明,过渡区在SC、在6％～8％之间;激活能测试结果表明,制备出接近本征的微晶Si材料。     

Au/Cd复合电极沉积方法对其与(111)面CdZnTe衬底接触性能的影响

CdZnTe晶片是HgCdTe外延薄膜的理想衬底。为了优化CdZnTe衬底的电学接触性能,作者基于真空蒸发法和磁控溅射法分别在p型导电性CdZnTe晶片(111)B (富碲面)制备Au/Cd复合电极。通过接触粘附试验,研究了复合电极的制备方法对电极与衬底之间的粘附性;利用卢瑟福背散射光谱法（RBS）比较了不同沉积方法下样品的元素深度分布;采用电流-电压(I-V)测试比较了两种制备工艺对Au/Cd复合电极与CdZnTe衬底欧姆接触特性的影响,从而确定了最佳复合电极的制备工艺。     

碳化硅衬底外延石墨烯

通过高温热解法和化学气相沉积(CVD)法在SiC(0001)衬底外延石墨烯。采用光学显微镜、原子力显微镜、扫描电子显微镜、喇曼光谱、X射线光电子能谱和霍尔测试系统对样品进行表征,并对比了两种不同生长方法对石墨烯材料的影响以及不同的成核机理。结果表明,高温热解法制备的石墨烯材料有明显的台阶形貌,台阶区域平坦均匀,褶皱少,晶体质量取决于SiC衬底表面原子层,电学特性受衬底影响大,迁移率较低。CVD法制备的石墨烯材料整体均匀,褶皱较多,晶体质量更好。该方法制备的石墨烯薄膜悬浮在SiC衬底表面,与衬底之间为范德华力连接,电学特性受衬底影响小,迁移率较高。     

The AFM LAO lithography on GaMnAs layers

We prepared constrictions on ferromagnetic GaMnAs layer by the local anodic oxidation (LAO) using the atomic force microscope (AFM). These oxide lines, produced by the negatively biased AFM tip, formed the electrical barrier to the conducting holes in the layer. The constricted samples were characterized at low temperature (12 K). They showed magnetoresistance effect specific for nanoconstrictions during in-plane magnetic field sweep in both polarities for the different mutual orientation of magnetic field and current. The LAO appears to become a useful patterning technique for research of ferromagnetic semiconductor nanostructures. Further optimization of LAO parameters for reaching better homogeneity of the oxide lines is needed.     

A Comprehensive Study of Cobalt Salicide-Induced SRAM Leakage for 90-nm CMOS Technology

Cobalt salicide-induced static random access memory (SRAM) leakage in 90-nm technology is investigated in this paper. We found that the junction leakages are the origins of abnormal SRAM leakage, leading to a high direct-drain quiescent current and low function yield at wafer level. Cobalt salicide penetration at active edges is a dominant path for the junction leakage current. Both junction-area-intensive and active-edge-intensive test structures are employed to characterize the junction leakage. The SRAM function failure sites are carefully examined using conducting atomic force microscope and transmission electron microscope techniques. A full-factorial design of experiment (DOE) is implemented to systematically study the influences of Co thickness and temperatures of RTP1 and RTP2 on the junction leakage characteristics. Within the DOE window, it is found that both junction area and junction edge leakages increase with the Co thickness. The RTP1 temperature is critical in controlling Co salicide penetration at the active edge, while the RTP2 temperature is the main factor that affects the junction area leakage. SRAM leakage can be minimized by optimizing the salicide process scheme.     

Fabrication and characterization of single ZnO microwire Schottky light emitting diodes

ZnO microwires were grown using noncatalytic chemical vapor deposition method. The average diameter of the ZnO microwires were about 30 μm with length of up to 1–1.5 cm. Single ZnO microwire Schottky light emitting diode was fabricated using Au as Schottky contact electrode and using Al as ohmic contact electrode. The current–voltage (I–V) characteristics of Schottky diodes reveal good rectifying behavior. The Schottky barrier height and ideality factor were calculated to be 0.78 eV and 4.3, respectively. Furthermore, distinct electroluminescence with ultraviolet and visible emissions was detected from this device at room temperature.     

Features of the selective manganese doping of GaAs structures

The effect of technological parameters on the selective manganese doping of arsenide–gallium heterostructures fabricated by a combination of methods of MOS-hydride epitaxy and pulsed-laser deposition is investigated. As these parameters, the impurity content in the manganese δ layer and the structureformation temperature are used. It is established that the prepared structures demonstrate the highest electrical activity and have ferromagnetic properties at a growth temperature of ~400°C and an impurity content of no higher than 0.2–0.3 monolayers. Studying the grown structures by the methods of reflection spectroscopy, high-resolution transmission electron microscopy, and secondary-ion mass spectrometry shows that use of the above conditions in the case of pulsed laser deposition makes it possible to obtain arsenide–gallium structures, which have good crystalline quality, and manganese is concentrated in them within a thin (7–8 nm) layer without substantial diffusion-induced spreading and segregation.     

Composite screen with magnetic-field-controlled radio transparency

The effect of static magnetic field on dielectric spectra (in a frequency band of 6–12 GHz) of plane composite sheets filled with amorphous microwires made of Fe and Co alloys is studied in experiments and with the aid of computer simulation. Two intervals of the dependence of permittivity on the external static magnetic field are analyzed. The effect at relatively strong fields (800–1000 Oe) is related to the dependence of the parameters of ferromagnetic resonance (FMR) on the external field, and the effect in the presence of weak fields (about 100 Oe) is due to the rearrangement of the domain structure of Co microwire. The analysis of relation of magnetic impedance and dipole resonance in fragments of microwire is used to determine the effect of the FMR parameters, diameter and length of wire, and the structure of composite on the dielectric spectrum of the composite sample. The results are used in the study of screens with tunable radio transparency.     

Template-electrodeposition preparation and structural properties of CdS nanowire arrays

Directional CdS nanowire arrays were prepared by template-electrodeposition method and anodic alumina membrane (AAM) template in aqueous solution containing and Cd²⁺ at room temperature. The results of scanning electron microscope and transmission electron microscope indicated that uniform length and diameter of CdS nanowires were obtained, and the diameter and length of CdS nanowires are dependent on the pore diameter and the thickness of the applied AAM template. X-ray energy dispersion analysis indicates that the chemical composition of Cd and S is very close to 1:1 stoichiometry. X-ray diffraction and electron diffraction pattern investigations demonstrate that CdS nanowires are cubic polycrystalline in nature. Furthermore, the mechanism and preparation condition of CdS nanowires were discussed.     

Controlling of electrical and interface state density properties of ZnO:Co/p-silicon diode structures by compositional fraction of cobalt dopant

The heterojunction diodes based on cobalt doped zinc oxide (ZnO) were prepared by sol-gel deposition method. The compositional fraction of cobalt dopant was varied to control the electrical parameters of the diode. Atomic force microscopy was used to determine the structural properties of ZnO:Co films. The ZnO:Co films have a microfiber structure and the structure of microfibers was changed with the cobalt dopant. The ideality factor values of 5% and 15% Co doped ZnO:Co/p-Si diodes were determined to be 3.49 and 7.51, respectively. The barrier height of the ZnO:Co/p-Si diodes were found to vary from 0.75 eV to 0.78 eV.It is concluded that the electrical and interface state density properties of ZnO:Co/p-Si diodes can be controlled by compositional fraction of cobalt dopant.     

Fabrication of magnetic micro- and nanostructures by scanning probe lithography

Planar magnetic structures based on cobalt nanofilms have been obtained by scanning probe lithography. It has been shown that ferromagnetic nanoparticles with different domain structures can be formed by local oxidation of a cobalt film on a graphite substrate with the use of a conductive probe of an atomic force microscope (AFM). Using AFM nanoengraving of polymethylmethacrylate, masks were formed to obtain microcontact pads connected by cobalt nanowires with a width of 250–1400 nm and a thickness of 10–30 nm on the silicon dioxide surface. The topography and magnetization structure of the obtained samples were controlled by atomic and magnetic force microscopy.     

离子束沉积PdC_x纳米结构及其输运性能

采用离子束沉积方法制备了PdCx纳米结构,并对材料的电子输运性能进行了研究。利用扫描电子显微镜(SEM)和X射线能谱仪(EDX)分析了材料的微观结构和组成,利用原子力显微镜(AFM)分析了纳米结构的尺寸大小,利用高分辨率透射电子显微镜(HRTEM)分析了材料的原子结构。采用电阻桥测试了PdCx纳米结构的电阻,在低温保持器(OXFORD2)中对其电子传输性能进行了测试。X射线能谱仪(EDX)检测结果表明,该纳米结构金属含量低,表现出非金属性。高分辨率透射电子显微镜(HRTEM)检测结果表明,其为PdCx多晶纳米结构,与所观测到的电子输运性能结果一致。